KR102396229B1 - Reduced pressure drying apparatus and reduced pressure drying method - Google Patents

Abstract

(Project) To provide a technique for reducing the occurrence of non-uniformity in drying in a processing liquid when drying the processing liquid on a substrate under reduced pressure.
(Solution) The recessed part 12 is formed in the bottom face 100 in the chamber 10, and the exhaust port 14 is formed in the bottom face 120 of the said recessed part 12. As shown in FIG. The first baffle plate 30 is formed at a position overlapping the exhaust port 14 in the Z-axis direction (depth direction of the recess 12 ) in the accommodation space 10S. The end of the first baffle plate 30 (the -X side end 32a or the +X side end 32b) and the inner edge portion of the concave portion 12 (the -X side edge portion 124a or the +X side edge) The second baffle plate 40 is formed at a position overlapping the portion 124b) in the Z-axis direction (the depth direction of the recessed portion 12). The plurality of holding portions 52 hold the substrate 9 at a position above the first baffle plate 30 and the second baffle plate 40 (upper position L1 or lower position L2).

Description

A reduced pressure drying apparatus and a reduced pressure drying method

The present invention relates to a reduced pressure drying apparatus and a reduced pressure drying method, and more particularly, to a technique for drying a treatment liquid applied on a substrate. The substrate to be treated includes, for example, a semiconductor substrate, a substrate for a flat panel display (FPD) such as a liquid crystal display device and an organic EL (Electroluminescence) display device, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk A substrate, a substrate for a photomask, a ceramic substrate, a substrate for a solar cell, a printed circuit board, and the like are included.

Conventionally, in a substrate processing apparatus (for example, a liquid crystal panel manufacturing apparatus, etc.), the reduced-pressure drying apparatus which performs a reduced-pressure drying process with respect to the board|substrate with which the processing liquid was apply|coated to the surface is known. For example, in a photolithography process, in order to dry suitably the coating film of the resist liquid apply|coated on to-be-processed substrates, such as a glass substrate, prior to prebaking, a reduced pressure drying apparatus may be used.

A conventional typical reduced pressure drying apparatus, as described in Patent Document 1, for example, places a substrate horizontally on a substrate support member disposed and formed at an appropriate height in an openable and openable chamber, and then closes the chamber and reduces the pressure A drying process is performed (for example, refer patent documents 1, 2).

In this type of reduced pressure drying process, first, the inside of the chamber is evacuated by an external vacuum pump through an exhaust port formed in the chamber. By this evacuation, the pressure in the chamber changes from the conventional atmospheric pressure state to the reduced pressure state, and the solvent component is evaporated from the resist coating film on the substrate under this reduced pressure state. When the pressure in the chamber is reduced to a certain pressure, the pressure in the chamber is terminated, and then, an inert gas (eg nitrogen gas) or air is blown out or diffused out from a supply port formed in the chamber to reduce the pressure in the chamber. Return to atmospheric pressure (recompression). When the inside of the chamber is pressurized, the chamber is opened and the substrate is taken out from the inside of the chamber.

When evacuating the chamber, in general, the closer to the exhaust port, the greater the flow velocity of the atmosphere. When the flow rate is large, there is a fear that the surface state of the processing liquid on the substrate becomes rough, and there is a possibility that drying unevenness occurs. In Patent Document 1, a middle plate is formed above the exhaust port formed in the bottom part of the chamber. The exhaust port is covered with the middle plate, thereby forming an exhaust path leading to the exhaust port via between the middle plate and the bottom of the chamber. Moreover, also in patent document 2, it is described to arrange|position a baffle plate above the exhaust port formed in the bottom part.

Japanese Patent Laid-Open No. 9-320949 Japanese Laid-Open Patent Publication No. 2004-47582

In the prior art, since the atmosphere is sucked in from the gap between the peripheral end of the middle plate and the side wall of the chamber, the flow velocity of the atmosphere increases in a region close to the gap. For this reason, there is a possibility that drying unevenness may occur with respect to the processing liquid on a board|substrate by arrange|positioning a board|substrate in the periphery of this clearance gap, and there exists room for improvement.

An object of the present invention is to provide a technique for reducing the occurrence of non-uniformity in drying in a processing liquid when drying the processing liquid on a substrate under reduced pressure.

In order to solve the above problems, a first aspect provides a reduced pressure drying apparatus for drying a processing liquid existing on the first main surface of a substrate having a first main surface and a second main surface by reduced pressure, wherein the A casing having an accommodating space for accommodating a substrate and having a first surface facing the accommodating space, a concave portion formed on the first surface, and an exhaust port formed on a bottom surface of the concave portion in the depth direction; a suction mechanism for sucking the atmosphere of the accommodation space through the exhaust port; a first member disposed in the accommodation space at a position overlapping the exhaust port in the depth direction; and in the accommodation space, a second member disposed at a position spaced apart from an end portion of the first member and an inner edge portion of the concave portion in the depth direction and overlapping the end portion and the inner edge portion in the depth direction; and a substrate holding part for holding the substrate at a position opposite to the exhaust port with respect to the first member and the second member.

A second aspect is the reduced-pressure drying apparatus according to the first aspect, wherein the substrate holding unit includes a plurality of fins for supporting the second main surface of the substrate.

A third aspect is the reduced-pressure drying apparatus of the second aspect, wherein the plurality of fins include a plurality of first fins arranged in a first direction, and a second direction orthogonal to the first direction from the plurality of first fins. and a plurality of second fins arranged in the first direction at an interval from each other, wherein the second member is disposed between the plurality of first fins and the plurality of second fins.

A fourth aspect is the reduced-pressure drying apparatus according to the second aspect or the third aspect, wherein by moving the plurality of fins in the depth direction, a first substrate position and a second position closer to the exhaust port than the first substrate position Between the positions of the substrates, it further includes a movement driving unit for moving the substrate.

A fifth aspect is the reduced pressure drying apparatus according to the fourth aspect, wherein the movement driving unit removes the substrate from the first substrate position after the suction mechanism starts to suck the atmosphere of the accommodation space through the exhaust port. 2 Move it to the board position.

A sixth aspect is the reduced-pressure drying apparatus according to any one of the first to fifth aspects, wherein the first member is provided between the second member and the exhaust port.

A seventh aspect is the reduced-pressure drying apparatus according to the sixth aspect, wherein at least a part of the first member is in the recess.

An eighth aspect is the reduced-pressure drying apparatus according to the seventh aspect, wherein all of the first member is in the concave portion.

A ninth aspect is the reduced-pressure drying apparatus of an 8th aspect, The said edge part and the said inner edge part are located on the same plane.

A tenth aspect is the reduced pressure drying apparatus according to any one of the first to ninth aspects, wherein the substrate holding unit holds the substrate in a horizontal posture in which the first main surface is upward in a vertical direction, and the first member , the second member and the exhaust port are located on the side of the second main surface of the substrate held by the substrate holding unit.

An eleventh aspect is a reduced pressure drying method in which a processing liquid existing on the first main surface of a substrate having a first main surface and a second main surface is dried under reduced pressure, wherein an accommodating space and a first surface facing the accommodating space are dried under reduced pressure. A first step of loading the substrate into the accommodating space of a casing having a second step of sucking the atmosphere of the space, wherein the second step is performed by a first member disposed at a position overlapping the exhaust port in the depth direction in the accommodation space, whereby the airflow toward the exhaust port is reduced. a step of changing a direction, and a position spaced apart from both the end of the first member and the inner edge of the recess in the depth direction in the accommodating space in the depth direction. and changing the direction of the airflow toward the exhaust port by a second member disposed at a position overlapping both sides.

According to the reduced-pressure drying apparatus of the first aspect, since the upper side of the exhaust port is covered with the first member, when the atmosphere of the accommodation space is exhausted, it is possible to prevent the atmosphere above the first member from being directly sucked into the exhaust port. Moreover, since the clearance gap between the edge part of a recessed part and the edge part of a 1st member is covered with the 2nd member, it can inhibit that the atmosphere above a 2nd member is sucked in directly into the said clearance gap. Since the flow rate of the atmosphere around the substrate can be reduced by these actions, the occurrence of non-uniform drying in the processing liquid can be reduced.

According to the reduced-pressure drying apparatus of the second aspect, since the contact area can be reduced by supporting the second main surface with a plurality of pins, it is possible to suppress the occurrence of non-uniformity in drying in the processing liquid due to the contact of the supporting member.

According to the reduced pressure drying apparatus of a 3rd aspect, the direction of the airflow toward an exhaust port can be changed between a 1st fin and a 2nd fin.

According to the reduced pressure drying apparatus of the fourth aspect, the substrate can be moved between the first substrate position far from the exhaust port and the second substrate position close to the exhaust port. For this reason, the position of the board|substrate can be adjusted according to the speed|rate of the atmosphere sucked into the exhaust port.

According to the reduced pressure drying apparatus of the fifth aspect, immediately after the start of the pressure reduction in the accommodation space, the substrate can be disposed at a position away from the exhaust port with a high air flow, and after the pressure reduction progresses and the flow rate in the vicinity of the exhaust port decreases, the substrate is removed from the exhaust port By making it approach to, the influence of a flow velocity can be suppressed. Further, by bringing the substrate closer to the exhaust port, it is possible to accelerate drying of the processing liquid under reduced pressure.

According to the reduced pressure drying apparatus of the sixth aspect, the first member is disposed at a position closer to the exhaust port than the second member. In the vicinity of the exhaust port where the airflow becomes relatively large, the first member suppresses direct suction of the atmosphere to the exhaust port. For this reason, the influence of the airflow at the time of drying the process liquid on the 1st main surface of a board|substrate can be reduced, and the drying nonuniformity in a process liquid can be suppressed.

According to the reduced pressure drying apparatus of the seventh aspect, since at least a part of the first member is in the recess, the portion of the first member that protrudes outside the recess can be made small. Thereby, the space in which the board|substrate in accommodation space can be arrange|positioned can be ensured large.

According to the reduced-pressure drying apparatus of the eighth aspect, since all of the first member is in the concave portion, it is possible to ensure a large space in which the substrate can be arranged in the accommodation space.

According to the reduced pressure drying apparatus of the ninth aspect, since the end of the first member and the inner edge of the recess are located on the same plane, when the atmosphere passes through the gap between the end of the first member and the inner edge of the recess, the airflow is It can reduce clutter.

According to the reduced pressure drying apparatus of the tenth aspect, the atmosphere around the substrate is changed in the vertical direction by sucking the atmosphere of the accommodation space through the exhaust port in a state in which the surface of the substrate on which the processing liquid is present is arranged upward in the vertical direction. It can be moved downwards.

According to the reduced pressure drying method of the eleventh aspect, since the upper side of the exhaust port is covered with the first member, when the atmosphere of the accommodation space is exhausted, it is possible to prevent the atmosphere above the first member from being directly sucked into the exhaust port. Moreover, since the gap|interval of the edge part of a recessed part and the edge part of a 1st member is covered with the 2nd member, it can inhibit that the atmosphere above a 2nd member is sucked directly into the said gap|interval. Since the flow rate of the atmosphere around the substrate can be reduced by these actions, the occurrence of non-uniform drying in the processing liquid can be reduced.

1 : is a schematic top view which shows the mode which looked at the inside of the chamber 10 of the reduced-pressure drying apparatus 1 in embodiment from the upper side of the vertical direction.
Fig. 2 is a schematic plan view showing the inside of the chamber 10 excluding the four second baffle plates 40 and the lifting mechanism 50 in the reduced pressure drying apparatus 1 of the embodiment seen from the upper side in the vertical direction. am.
3 : is a schematic sectional drawing of the reduced pressure drying apparatus 1 in the position along the AA line of FIG.
4 : is a schematic sectional drawing which shows the reduced pressure drying apparatus 1 when the board|substrate 9 which is a process object is carried in.
Fig. 5 is a schematic cross-sectional view showing the reduced pressure drying apparatus 1 when exhaust is started.
6 is a schematic cross-sectional view showing the reduced pressure drying apparatus 1 when a predetermined time has elapsed after starting exhaust.
7 : is a schematic sectional drawing which shows the reduced pressure drying apparatus 1 at the time of carrying out the board|substrate 9 after a process to the outside.
8 : is a figure which shows 1 A of reduced pressure drying apparatuses which concern on a modified example.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described, referring an accompanying drawing. In addition, the component described in this embodiment is an illustration to the last, and it is not the meaning of limiting the scope of the present invention only to them. In the drawings, in some cases, the dimensions and numbers of each part are exaggerated or simplified as necessary for easy understanding.

Expressions indicating a relative or absolute positional relationship (for example, "in one direction", "along one direction", "parallel", "orthogonal", "center," "concentric," "coaxial," etc.) Not only is it strictly indicated, but also the state displaced with respect to an angle or a distance relative to a tolerance or a range in which a function of the same degree is obtained shall be indicated. Expressions indicating an equivalent state (for example, "same", "equivalent", "homogeneous", etc.), unless otherwise specified, not only indicate a quantitatively and strictly equivalent state, but also have tolerances or differences in which functions of the same degree are obtained. It shall also indicate the state of Expressions representing shapes (for example, "square shape" or "cylindrical shape", etc.), unless otherwise specified, not only represent the shape strictly geometrically, but also in the range where the same degree of effect is obtained, for example, For example, it is assumed that a shape having irregularities, chamfers, or the like is also indicated. Expressions of "having", "having", "having", "including" or "having" one component are not exclusive expressions excluding the existence of other components. Unless otherwise specified, the "image of" includes the case where two elements are in contact with each other, as well as the case where two elements are separated from each other.

<1. Embodiment>

1 : is a schematic top view which shows the mode which looked at the inside of the chamber 10 of the reduced-pressure drying apparatus 1 in embodiment from the upper side of the vertical direction. Fig. 2 is a schematic plan view showing the inside of the chamber 10 excluding the four second baffle plates 40 and the lifting mechanism 50 in the reduced pressure drying apparatus 1 of the embodiment seen from the upper side in the vertical direction. am. 3 : is a schematic sectional drawing of the pressure reduction drying apparatus 1 in the position along the A-A line of FIG.

In each figure, in order to clarify the positional relationship of each part of the reduced pressure drying apparatus 1, the X-axis, the Y-axis, and the Z-axis are provided. In this example, the X-axis direction and the Y-axis direction are horizontal directions, and the Z-axis direction is a vertical direction. In each axis, the direction to which the tip of the arrow points is the + (plus) direction, and the opposite direction is set to the - (minus) direction. Let the upward direction of the vertical direction be "+Z direction", and let the downward direction be "-Z direction". The positional relationship of each part demonstrated below is an example, and is not intended to limit to this.

The reduced pressure drying apparatus 1 includes a chamber 10 . The chamber 10 is a rectangular parallelepiped shape, and is a casing which has the accommodation space 10S inside. The reduced pressure drying apparatus 1 accommodates the substrate 9 in this accommodation space 10S, and dries the processing liquid applied to the upper surface 90 (first main surface) of the substrate 9 under reduced pressure. processing is carried out.

An opening/closing portion 10P is formed in a portion near the +Z side of the +Y side sidewall of the chamber 10 . The opening/closing portion 10P forms an opening for passing the substrate 9 between the outside of the chamber 10 and the accommodation space 10S of the chamber 10 . Moreover, the opening-and-closing part 10P blocks the exterior and the accommodation space 10S by closing the said opening, and makes it impossible for the board|substrate 9 to pass through.

The chamber 10 has a bottom surface 100 facing the accommodation space 10S. The bottom surface 100 constitutes a horizontal surface. Four concave portions 12 are formed in the bottom surface 100 . The four concave portions 12 include two -X side concave portions 12a arranged on the -X side and two +X side concave portions 12b arranged on the +X side.

The quantity of the recessed part 12 is not limited to four, You may change arbitrarily. For example, only one recessed part 12 may be formed.

Hereinafter, it demonstrates paying attention to the one recessed part 12. As shown in FIG. The concave portion 12 has a shape concave in the -Z direction from the bottom surface 100 . Although the recessed part 12 is a rectangular shape as seen from the upper side of a perpendicular direction, this is not essential. The bottom surface 120 of the depth direction (Z-axis direction) of the recessed part 12 is a horizontal surface. The concave portion 12 has an inner wall surface 122 that rises upward in the vertical direction from the outer periphery of the bottom surface 120 . The inner wall surface 122 has a portion extending in the vertical direction so as to be perpendicular to the bottom surface 120 . When the inner wall surface 122 extends in the vertical direction, the flow of the atmosphere toward the exhaust port 14 can be made parallel to the vertical direction.

An exhaust port 14 is formed on the bottom surface 120 of the concave portion 12 . That is, the reduced pressure drying apparatus 1 has four exhaust ports 14 . The exhaust port 14 is connected to the accommodation space 10S via the recess 12 . The exhaust port 14 is connected to the suction mechanism 20 . The suction mechanism 20 has a vacuum pump (not shown) that operates according to a control command from the control unit 70 . The suction mechanism 20 sucks the atmosphere in the accommodation space 10S through the exhaust port 14 in response to a control command, and discharges it to the outside.

The reduced pressure drying apparatus 1 is provided with the four 1st baffle plates 30 (1st member). In this example, the 1st baffle plate 30 is arrange|positioned one by one inside each of the four recessed parts 12. As shown in FIG. The four first baffle plates 30 include two -X side first baffle plates 30a arranged one by one inside each of the two -X side concave portions 12a, and two +X side concave portions. It includes two +X-side first baffle plates 30b arranged one by one inside each of the portions 12b.

Each 1st baffle plate 30 is arrange|positioned in the accommodation space 10S at the position which overlaps with the exhaust port 14 in the Z-axis direction. In other words, for each first baffle plate 30, when the first baffle plate 30 and the exhaust port 14 are viewed in plan view from the upper side in the vertical direction to the downward (-Z direction) in the vertical direction, the first flow The plate 30 is arrange|positioned at the position which overlaps the exhaust port 14 in the accommodation space 10S. The first baffle plate 30 is disposed at a position spaced apart from the exhaust port 14 in the Z-axis direction. The first baffle plate 30 is a plate-shaped member, and is smaller than the opening of each concave portion 12 when viewed in the depth direction, and is larger than the opening of each exhaust port 14 . The 1st baffle plate 30 is arrange|positioned in the attitude|position parallel to a horizontal plane. In other words, when the first baffle plate 30, the concave portion 12 and the exhaust port 14 are viewed in a plan view from the upper side in the vertical direction to the downward (-Z direction) in the vertical direction, the first baffle plate 30 is , smaller than the opening of the concave portion 12 and larger than the opening of the exhaust port 14 . In addition, the opening of the recessed part 12 is a part in which the space in the recessed part 12 is connected to the space located above the recessed part 12 of the accommodation space 10S, The opening of the exhaust port 14 is , the space in the exhaust port 14 is a part connected to the space in the recess 12 .

As for each 1st baffle plate 30, the whole is arrange|positioned in the recessed part 12 corresponding to it. In this example, the upper surface of each first baffle plate 30 is flush with the outer surface 102 including the end of the corresponding recess 12 . The upper surface of each first baffle plate 30 is flush with the outer surface 102 including the inner edge surrounding each recess 12 of the bottom surface 100 which is the inner edge of the corresponding recess 12 . (face one) is to be done. In other words, the upper surface of the first baffle plate 30 and the bottom surface 100 as the inner edge portion of the concave portion 12 corresponding to the first baffle plate 30 surround each concave portion 12 . The outer surface 102 comprising the inner edge is coplanar. Thus, by providing the 1st baffle plate 30 in the recessed part 12, the space which can arrange|position the board|substrate 9 in the accommodation space 10S can be enlarged. Moreover, the longitudinal dimension of the Z-axis direction of the accommodation space 10S can be made small.

In addition, a part of the 1st baffle plate 30 may exist in the bottom surface 120 side (-Z side) rather than the outer surface 102 as the inside of the recessed part 12. That is, a part of the first baffle plate 30 may be located above the outer surface 102 (+Z side) as the outside of the concave portion 12 . Thus, even if it is a part, the length of the Z-axis direction of the chamber 10 can be made small by putting the 1st baffle plate 30 in the recessed part 12. As shown in FIG.

A gap is formed between the first baffle plate 30 and the square-shaped inner edge of the concave portion 12 . Specifically, a -X side gap 34a is formed between the -X side end 32a of the first baffle plate 30 and the -X side edge portion 124a of the recessed portion 12, and the first rectifying A +X-side gap 34b is formed between the +X-side end 32b of the plate 30 and the +X-side edge 124b of the recess 12 . The -X side edge part 32a is an edge part located on the -X side of the first baffle plate 30 , and the -X side edge part 124a is an edge part located on the -X side of the recessed part 12 . , the +X side end 32b is an end located on the +X side of the first baffle plate 30 , and the +X side edge portion 124b is located on the +X side of the concave portion 12 . is the edge

The reduced pressure drying apparatus 1 is equipped with the four 2nd baffle plate 40 (2nd member). The four second baffle plates 40 sequentially include the second baffle plates 40a, 40b, 40c, 40d from the -X side toward the +X side. In other words, from the -X side toward the +X side, the second baffle plate 40a, the second baffle plate 40b, the second baffle plate 40c, and the second baffle plate 40d are in this order of description. are listed as Each of these four second rectifying plates 40a, 40b, 40c, 40d is a rectangular plate shape. The length dimension in the Y-axis direction is the same in the four second baffle plates 40a, 40b, 40c, 40d. Moreover, the width dimension of the X-axis direction is the same in the two second baffle plates 40a, 40d, and is the same in the two 2nd baffle plates 40b, 40c. The two 2nd baffle plates 40a, 40d are arrange|positioned at intervals in the X-axis direction, and two 2nd baffle plates 40b, 40c are arrange|positioned between them. The two second baffle plates 40b and 40c are also arranged at a distance from each other in the X-axis direction. The two second baffle plates 40a and 40b are also arranged at intervals from each other in the X-axis direction. The two second baffle plates 40c and 40d are also arranged at a distance from each other in the X-axis direction.

Each of the second baffle plates 40a, 40b, 40c, 40d is spaced apart from both the outer peripheral end of the first baffle plate 30 and the outer surface 102 in the Z-axis direction, and in the Z-axis direction formed in overlapping positions. In other words, when the second baffle plates 40a, 40b, 40c, 40d, the first baffle plate 30 and the outer surface 102 are viewed from above in the vertical direction downward (-Z direction) in a plan view, Each of the second baffle plates 40a, 40b, 40c, 40d is disposed in a position overlapping with both the outer peripheral end of the first baffle plate 30 and the inner edge of the recess 12 in the accommodation space 10S. .

For example, the second baffle plate 40a on the most -X side is the -X side end 32a of the two -X side first baffle plates 30a and the two -X side concave which oppose them. It overlaps with the part of the outer surface 102 including the -X side edge part 124a (inner edge part) of the part 12a in the Z-axis direction. In other words, when the second baffle plate 40a, the first baffle plate 30 and the outer surface 102 are viewed in plan view from the upper side in the vertical direction to the downward (-Z direction) in the vertical direction, the second baffle plate 40a ) is the -X side end 32a of each of the two -X side first baffle plates 30a in the accommodating space 10S and the two -X side concave portions opposing these -X side end portions 32a ( It is arrange|positioned at the position which overlaps with both sides of the -X side edge part 124a of 12a). That is, the 2nd baffle plate 40a has covered the upper part of the -X side clearance gap 34a of the two -X side recessed parts 12a.

The 2nd baffle plate 40b is the +X side edge part 32b of the two -X side 1st baffle plate 30a, and the +X side edge part of the two -X side recessed parts 12a opposing these. The portion of the outer surface 102 including the 124b (inner edge portion) overlaps in the Z-axis direction. In other words, when the second baffle plate 40b, the first baffle plate 30, and the outer surface 102 are viewed from above in the vertical direction downward (-Z direction) in the vertical direction, the second baffle plate 40b ) is the +X side end 32b of each of the two -X side first baffle plates 30a in the accommodating space 10S and the two -X side concave portions opposing these +X side end portions 32b ( It is arrange|positioned at the position which overlaps both of the +X side edge part 124b of 12a). That is, the 2nd baffle plate 40b has covered the upper part of the +X side clearance gap 34b of the two -X side recessed parts 12a.

The second baffle plate 40c includes -X side end portions 32a of the two +X side first baffle plates 30b and -X side edge portions of the two +X side recessed portions 12b opposing them. The portion of the outer surface 102 including the 124a (inner edge portion) overlaps in the Z-axis direction. In other words, when the second baffle plate 40c, the first baffle plate 30, and the outer surface 102 are viewed from above in the vertical direction downward (-Z direction) in the vertical direction, the second baffle plate 40c ) is the -X side end 32a of each of the two +X side first baffle plates 30b in the accommodating space 10S and the two +X side concave portions opposing these -X side end portions 32a ( It is arrange|positioned at the position which overlaps with both of the two -X side edge parts 124a of 12b). That is, the 2nd baffle plate 40c has covered the upper part of the -X side clearance gap 34a of the two +X side recessed parts 12b.

The second baffle plate 40d on the most +X side includes the +X side end 32b of the two +X side first baffle plate 30b and the two +X side concave portions 12b opposing them. The +X side edge portion 124b (inner edge portion) of the outer surface 102 including the portion overlaps in the Z-axis direction. In other words, when the second baffle plate 40d, the first baffle plate 30, and the outer surface 102 are viewed in plan view from the upper side in the vertical direction to the downward (-Z direction) in the vertical direction, the second baffle plate 40d ) is the +X side end 32b of each of the two +X side first baffle plates 30b in the accommodating space 10S and the two +X side concave portions opposing these +X side end portions 32b ( It is arrange|positioned at the position which overlaps both of the +X side edge part 124b of 12b). That is, the 2nd baffle plate 40d has covered the upper part of the +X side clearance gap 34b of the two +X side recessed parts 12b.

The raising/lowering mechanism 50 supports the board|substrate 9 from the upper side of the some 2nd baffle plate 40, and moves the board|substrate 9 up and down in a vertical direction. The raising/lowering mechanism 50 includes six supporting parts 52 and a raising/lowering drive part 54 .

The six support parts 52 are arranged on the side opposite to the exhaust port 14 with respect to the first baffle plate 30 . That is, the six support parts 52 and the exhaust port 14 are arrange|positioned at the mutually opposite position with the 1st baffle plate 30 interposed therebetween. The six support parts 52 include three support parts 52a and three support parts 52b. Each of the supporting parts 52a and 52b includes a lift plate 520 extending in the Y-axis direction, and a plurality of pins 522 disposed on one lift plate 520 at intervals in the Y-axis direction. are doing In this example, one support part 52a, 52b is arrange|positioned at each of the position near the -X side in the accommodation space 10S, the position at the center of an X-axis direction, and the position near the +X side. Viewed from the upper side in the vertical direction, between the second baffle plate 40a and the second baffle plate 40b, between the second baffle plate 40b and the second baffle plate 40c, the second baffle plate 40c and the second baffle plate 40c Between the two baffle plates 40d, each of the support parts 52a, 52b is arrange|positioned one by one. The board|substrate 9 is supported by the upper end of the some fin 522 with which the support part 52a or the support part 52b is equipped, and is an exhaust port with respect to the 1st baffle plate 30 and the 2nd baffle plate 40. (14) is held in a position opposite to that of (14). That is, the board|substrate 9 is hold|maintained at the position opposite to the exhaust port 14 with the 1st baffle plate 30 and the 2nd baffle plate 40 as a reference|standard.

The raising/lowering drive part 54 is connected to the lift plate 520 of each of the three support parts 52a and the three support parts 52b, and raises and lowers these individually in a vertical direction. The driving force of the lifting driving unit 54 as the moving driving unit may be transmitted through a rod-shaped member (not shown) connected to the lower surface of the lift plate 520 through the bottom surface 100 of the chamber 10 . The support part 52a and the support part 52b respectively raise/lower by the driving force of the raising/lowering drive part 54 in a vertical direction. In addition, two or more support parts 52 among the six support parts 52 may be directly connected so that it may raise/lower integrally. For example, the three support parts 52a may be connected to each other and may be raised and lowered integrally. Moreover, you may mutually connect also about the three support parts 52b, and you may make it raise/lower integrally. In such a case, since the operation shaft (rod-shaped member) of the lift drive part 54 can be reduced, the structure of the lift drive part 54 can be simplified.

The plurality of pins 522 included in the support portion 52a are arranged so as to be different from those in the Y-axis direction from the plurality of pins 522 included in the support portion 52b. This is in order to correspond to the board|substrate 9 of various sizes. In addition, the position of each pin 522 is not limited to this, You may set arbitrarily.

For example, the plurality of pins 522 included in the support portion 52a near the -X side is an example of the plurality of first pins arranged in the Y-axis direction. The plurality of pins 522 included in the central support portion 52a in the X-axis direction are spaced apart from the plurality of pins 522 included in the support portion 52a near the -X side in the X-axis direction, and the Y-axis It is an example of a plurality of second pins arranged in the direction. The 2nd baffle plate 40b is an example of the 2nd member arrange|positioned between these some 1st fins and a some 2nd fin.

In addition, the plurality of pins 522 provided by the support portion 52a at the center in the X-axis direction is an example of the plurality of first pins, and the plurality of pins 522 provided by the support portion 52a near the +X side are a plurality of pins. is an example of the second pin of The 2nd baffle plate 40c is an example of the 2nd member arrange|positioned between these some 1st fins and a some 2nd fin.

The reduced pressure drying apparatus 1 is provided with a control part 70 . The control unit 70 may be configured as a general computer including a CPU that performs various arithmetic processing, a ROM that is a read-only memory that stores a basic program, and a RAM that is a freely readable and writable memory that stores various information. The control unit 70 may include an auxiliary storage device that stores a control application (program) or various data. What is necessary is just to implement|achieve various functions by the CPU operating according to the application for control. The control unit 70 is communicatively connected to the opening/closing unit 10P, the suction mechanism 20, and the lifting/lowering drive unit 54, and by transmitting a control command to these, controls these operations.

<Operation Description>

The operation in the reduced pressure drying process of the reduced pressure drying apparatus 1 having the above configuration will be described. In addition, it is assumed that the operation|movement of the reduced pressure drying apparatus 1 is performed according to the control instruction|command from the control part 70 unless otherwise indicated.

4 : is a schematic side view which shows the pressure reduction drying apparatus 1 when the board|substrate 9 which is a process object is carried in. The reduced pressure drying process includes a carrying-in step S1 in which the substrate 9 to be processed (the substrate 9 coated with the processing liquid on the upper surface 90) is loaded into the accommodation space 10S of the chamber 10 from the outside. .

In the carrying-in process S1, the control part 70 places the some support part 52 (in the example shown in FIG. 4, three support parts 52a in the example shown in FIG. 4) corresponding to the support of the board|substrate 9 which is a process object to a predetermined|prescribed vertical position. place it The predetermined vertical position is a predetermined position in the vertical direction. Then, the control part 70 opens the opening-and-closing part 10P. Through the open/closed portion 10P, an unillustrated transfer device carries the substrate 9 into the accommodation space 10S. And the conveyance apparatus (not shown) mounts the board|substrate 9 on each pin 522 of the said some support part 52. As shown in FIG. Thereby, the board|substrate 9 will be in the state hold|maintained at the upper position L1 (1st board|substrate position).

The conveying apparatus may be provided with the some finger part 80 extending in the Y-axis direction which supports the lower surface of the board|substrate 9, for example. The plurality of finger portions 80 includes one or more finger portions 80 entering between the support portion 52b disposed at a position near the -X side and the support portion 52a disposed at a central position, and a central position. What is necessary is just to include one or more finger parts 80 capable of entering a position between the support part 52b disposed in the and the support part 52a disposed at a position on the +X side (see FIG. 4 ). Each finger portion 80 supporting the substrate 9 is made to enter the accommodation space 10S through the opening/closing portion 10P, and thereafter, each finger portion 80 is moved downward between the respective supporting portions 52 corresponding to each other. move to Thereby, each finger part 80 and each support part 52 do not interfere, but the board|substrate 9 is sent and received by each support part 52. As shown in FIG.

5 : is a schematic side view which shows the pressure reduction drying apparatus 1 when exhaust_gas|exhaustion is started. When carrying-in process S1 is completed, exhaust process S2 is implemented. In the exhaust step S2 , the control unit 70 operates the suction mechanism 20 to discharge the atmosphere of the accommodation space 10S from the plurality of exhaust ports 14 .

As shown in FIG. 5 , the atmosphere of the accommodation space 10S moves toward the exhaust port 14 . Here, the direction of movement of the atmosphere toward the exhaust port 14 of the accommodation space 10S is changed by the second flow baffle plates 40a - 40d. In detail, the advancing direction of the atmosphere on 2nd baffle plate 40a, 40b, 40c, 40d is changed to the horizontal direction toward the edge part by these upper surfaces which are horizontal planes. And the atmosphere is the gap between the second baffle plate 40a and the second baffle plate 40b, the gap between the second baffle plate 40b and the second baffle plate 40c, and the second baffle plate 40c and the second baffle plate 40c. Passing downward through the gap between the two baffle plates 40d, and the gap between the wall 104 surrounding all four sides of the accommodation space 10S and the ends of the second baffle plates 40a, 40b, 40c, 40d, It moves below the 2nd baffle plate 40a, 40b, 40c, 40d.

Moreover, the direction of movement toward the exhaust port 14 of the atmosphere is changed by the plurality of first baffle plates 30 . In detail, the advancing direction of the atmosphere moving downward of the second baffle plates 40a, 40b, 40c, 40d is a horizontal plane of the plurality of first baffle plates 30 (-X side first baffle plate 30a). and by the upper surface of the +X side first baffle plate 30b), the ends of the plurality of first baffle plates 30 (including the -X side end 32a and the +X side end 32b) is changed in the horizontal direction toward Moreover, the advancing direction of the atmosphere which has moved downward of the 2nd baffle plate 40a, 40b, 40c, 40d is the floor surface 100 (outer surface 102) which is a horizontal surface, and the floor surface 100 (outer surface) (102)) is changed in the horizontal direction toward the inner edge of the concave portion 12, which is the end. Thereafter, the atmosphere is a gap between the inner edge portion of the recessed portion 12 (including the -X side edge portion 124a and the +X side edge portion 124b) and the peripheral end of the first baffle plate 30 . By moving downwardly (including the -X side gap 34a and the +X side gap 34b), it enters into each recessed part 12. As shown in FIG. And, it is discharged|emitted to the outside through the exhaust port 14 in each recessed part 12.

Immediately after the start of the exhaust step S2 , since many atmospheres exist in the accommodation space 10S, the flow velocity of the atmosphere increases in the vicinity of the exhaust port 14 . In the present embodiment, immediately after the start of the exhaust step S2, the substrate 9 is disposed on the first substrate position L1 away from the exhaust port 14 vicinity where the flow rate increases, so that the upper surface 90 It can suppress that the surface of the apply|coated processing liquid becomes disordered or bumpy. Thereby, generation|occurrence|production of the drying nonuniformity in a process liquid can be reduced.

6 : is a schematic side view which shows the pressure reduction drying apparatus 1 when predetermined time has elapsed after starting exhaust_gas|exhaustion. During the exhaust process S2, a descending process S3 is performed. In the lowering step S3 , the control unit 70 lowers the plurality of supporting units 52 after a predetermined time (a first predetermined time) has elapsed after starting the exhaust. Thereby, the substrate 9 moves from the upper position L1 to the lower position L2 (second substrate position). The lower value L2 is a position lower than the upper value L1 in the vertical direction and is closer to the exhaust port 14 .

Since the lower value L2 is closer to the exhaust port 14 than the upper value L1, the atmosphere is relatively light and the atmospheric pressure is low. For this reason, the processing liquid of the board|substrate 9 can be dried efficiently by arrange|positioning the board|substrate 9 at the lower tooth L2. Here, even if the substrate 9 is disposed at the lower position L2 , the flow velocity of the atmosphere around the substrate 9 is relatively small, so the possibility that the surface of the processing liquid is disturbed or the processing liquid is bumped is low. This is because the first predetermined time has elapsed after starting the exhaust.

7 : is a schematic side view which shows the reduced pressure drying apparatus 1 at the time of carrying out the board|substrate 9 after a process to the outside. When exhaust process S3 is completed, carrying out process S4 is implemented. In the carrying out step S4 , the control unit 70 stops the exhaust after a predetermined time (the second predetermined time) has elapsed after starting the exhaust. Thereby, the flow of the atmosphere remaining in the accommodation space 10S is stopped. And when the air release of the accommodation space 10S is implemented, the atmospheric pressure in the accommodation space 10S is returned. The air release of the accommodation space 10S may be implemented through the exhaust port 14, or may be implemented through the intake port (not shown).

In carrying-out process S4, the control part 70 moves the board|substrate 9 from the lower position L2 to the upper position L1 by raising the some support part 52 which is supporting the board|substrate 9. . In addition, the air release of the accommodation space 10S is after moving the board|substrate 9 from the lower position L2 to the upper position L1, or the board|substrate 9 is moved from the lower position L2 to the upper position L1. ) may be carried out in the middle of moving toward

In addition, when the control unit 70 opens the opening/closing portion 10P, the transport device (not shown) receives the substrate 9 supported by the upper position L1 via the opened opening/closing portion 10P, and receives the accommodating space 10S. The said board|substrate 9 is carried out from it.

5 and 6 , in the reduced pressure drying apparatus 1 , the exhaust port 14 is formed in the concave portion 12 which is a recess formed in the bottom surface 100 of the chamber 10 . For this reason, since the opening of the recessed part 12 is larger than the exhaust port 14, the apparent opening area of the exhaust port 14 can be enlarged. Thereby, in the exhaust process S2, the flow velocity of the atmosphere toward the exhaust port 14 can be reduced.

5 and 6 , in the reduced pressure drying apparatus 1 , the upper side of the exhaust port 14 is covered with the first baffle plate 30 . With this 1st baffle plate 30, it can be inhibited that the atmosphere above the 1st baffle plate 30 of the accommodation space 10S is directly sucked into the exhaust port 14. As shown in FIG. Since the atmosphere is sucked in from the circumference of the first baffle plate 30 to the lower side of the first baffle plate 30 , the suction port of the apparent atmosphere seen from the substrate 9 can be enlarged and dispersed. Thereby, the flow velocity of the atmosphere around the board|substrate 9 can be reduced.

5 and 6 , in the reduced pressure drying apparatus 1, the gap between the inner edge of the recess 12 and the end of the first baffle plate 30 (-X side gap 34a and +X) The upper side of the side gap 34b is covered with the 2nd baffle plate 40 (2nd baffle plate 40a, 40b, 40c, 40d). Thereby, it can inhibit that the atmosphere directly above the 2nd baffle plate 40 is sucked into the clearance gap between the recessed part 12 and the 1st baffle plate 30 directly. Since the atmosphere is sucked from the periphery of the second baffle plate 40 to the lower side of the second baffle plate 40, the suction port of the apparent atmosphere seen from the substrate 9 can be enlarged and dispersed. Thereby, the flow velocity of the atmosphere around the board|substrate 9 can be reduced.

5 and 6, the gap between the second baffle plate 40 and the first baffle plate 30, the gap between the second baffle plate 40 and the bottom face 100 (outer face 102), and the gap between the first baffle plate 30 and the bottom surface 120 is widened in the horizontal direction, respectively. For this reason, by passing these clearance gaps until the atmosphere of the accommodation space 10S reaches the exhaust port 14 formed below the vertical direction, the direction of an airflow is changed in a zigzag form in a vertical direction and a horizontal direction. In this case, compared with the case where the first baffle plate 30 and the second baffle plate 40 are not provided, the total distance of the passage through which the atmosphere flows can be made longer. Thereby, the fall of the flow rate of an atmosphere can be aimed at.

By making the 1st baffle plate 30 and the 2nd baffle plate 40 into flat plate shape, it can suppress that an airflow is disturbed by these surfaces. Moreover, by making the bottom surface 100 (outer surface 102) of the chamber 10 and the bottom surface 120 of the recessed part 12 also planar, it can suppress that an airflow is disturbed by these surfaces. .

<2. Modifications>

As mentioned above, although embodiment was demonstrated, this invention is not limited to the above, and various deformation|transformation is possible.

Although the exhaust port 14 is formed in the bottom surface 120 of the depth direction of the recessed part 12 in the said embodiment, it may be formed in the inner wall surface 122 of the recessed part 12. As shown in FIG.

In the said embodiment, the exhaust port 14 is formed in the recessed part 12 formed in the bottom surface 100 of the lower side in the vertical direction. The exhaust port 14 may be formed in the wall surface 104 which faces the accommodation space 10S and rises vertically upward from the outer peripheral edge part of the floor surface 100. As shown in FIG.

8 : is a figure which shows 1 A of reduced pressure drying apparatuses which concern on a modified example. In the above embodiment, the first baffle plate 30 is disposed inside the recess 12 . Like the reduced pressure drying apparatus 1A shown in FIG. 8, you may provide the 1st baffle plate 30 above the recessed part 12 (outside of the recessed part 12). Moreover, like the reduced pressure drying apparatus 1A, the 2nd baffle plate 40 (2nd baffle plate 40a, 40b, 40c, 40d) is lower than the 1st baffle plate 30 (closer to the exhaust port 14). side) may be placed. The second baffle plate 40 includes an end (-X side end 32a or +X side end 32b) of the first baffle plate 30 and an inner edge portion (-X side edge) of the recessed portion 12 . It is arrange|positioned at the position which overlaps with the part 124a or the +X side edge part 124b) in the Z-axis direction. In other words, when the first baffle plate 30, the second baffle plate 40, and the concave portion 12 are viewed in plan view from the upper side in the vertical direction to the downward (-Z direction) in the vertical direction, the second baffle plate ( 40 is arrange|positioned at the position which overlaps with both the outer peripheral edge part of the 1st baffle plate 30, and the inner edge part of the recessed part 12 in accommodation space 10S. Also by forming the 2nd baffle plate 40 in this way, it can inhibit that the atmosphere is sucked into the clearance gap between the 1st baffle plate 30 and the recessed part 12. As shown in FIG.

Although the present invention has been described in detail, the foregoing description is illustrative in all respects, and the present invention is not limited thereto. It is to be understood that numerous modifications not illustrated can be made without departing from the scope of the present invention. Each structure demonstrated in each said embodiment and each modified example can be combined or abbreviate|omitted suitably unless it contradicts each other.

1, 1A: vacuum drying device
10: chamber (casing)
100: bottom surface (first surface)
10S: Receiving space
12: recess
12a: -X side recess
12b: +X side recess
120: bottom
122: inner wall surface
124a: -X side edge (inner edge)
124b: +X side edge (inner edge)
14: exhaust port
20: suction mechanism
30: first baffle plate (first member)
30a: -X side first rectifier plate
30b: +X side first rectifier plate
32a: -X side end
32b: +X side end
34a: -X side gap
34b: +X side clearance
40, 40a, 40b, 40c, 40d: second baffle plate (second member)
50: elevating mechanism
52, 52a, 52b: support part (substrate holding part)
520: lift plate
522: pin
54: elevating driving unit (moving driving unit)
70: control unit
9: substrate
90: top
L1: upper position (first substrate position)
L2: lower position (second substrate position)

Claims (11)

A reduced pressure drying apparatus for drying a processing liquid existing on the first main surface of a substrate having a first main surface and a second main surface by reduced pressure, comprising:
a casing having an accommodating space accommodating the substrate and having a first surface facing the accommodating space;
a concave portion formed on the first surface;
an exhaust port formed on the bottom surface in the depth direction of the recess;
a suction mechanism for sucking the atmosphere of the accommodation space through the exhaust port;
a first member disposed at a position overlapping the exhaust port in the depth direction in the accommodating space;
A second position in the accommodating space spaced apart from the end of the first member and the inner edge of the recess in the depth direction and disposed at a position overlapping the end and the inner edge in the depth direction. absence and
and a substrate holding part for holding the substrate at a position opposite to the exhaust port with respect to the first member and the second member in the accommodation space. The method of claim 1,
The substrate holding unit includes a plurality of pins for supporting the second main surface of the substrate. 3. The method of claim 2,
The plurality of pins,
a plurality of first pins arranged in a first direction;
a plurality of second fins arranged in the first direction at intervals from the plurality of first fins in a second direction orthogonal to the first direction;
The said 2nd member is arrange|positioned between the said some 1st fin and the said some 2nd fin, the reduced-pressure drying apparatus. 4. The method according to claim 2 or 3,
Further comprising a movement driving unit for moving the substrate between a first substrate position and a second substrate position closer to the exhaust port than the first substrate position by moving the plurality of pins in the depth direction; reduced pressure drying device. 5. The method of claim 4,
and the movement driving unit moves the substrate from the first substrate position to the second substrate position after the suction mechanism starts to suck the atmosphere of the accommodation space through the exhaust port. 4. The method according to any one of claims 1 to 3,
and the first member is formed between the second member and the exhaust port. 7. The method of claim 6,
The reduced pressure drying apparatus, wherein at least a part of the first member is in the concave portion. 8. The method of claim 7,
The reduced pressure drying apparatus, wherein all of the first member is in the concave portion. 9. The method of claim 8,
and the end portion and the inner edge portion are positioned on the same plane. 4. The method according to any one of claims 1 to 3,
The substrate holding unit holds the substrate in a horizontal posture in which the first main surface is upward in a vertical direction,
and the first member, the second member, and the exhaust port are located on the side of the second main surface of the substrate held by the substrate holding unit. A reduced pressure drying method for drying a treatment liquid present on the first main surface of a substrate having a first main surface and a second main surface by reduced pressure, the method comprising:
a first step of loading the substrate into the accommodation space of a casing having an accommodation space and a first surface facing the accommodation space;
After the first step, there is provided a second step of sucking the atmosphere of the accommodation space through an exhaust port formed on a bottom surface in the depth direction of the recess formed on the first surface,
The second process is
changing the direction of the airflow toward the exhaust port by a first member disposed at a position overlapping the exhaust port in the depth direction in the accommodating space;
In the accommodating space, a position spaced apart from both the end of the first member and the inner edge of the concave portion in the depth direction is disposed at a position overlapping both of the end and the inner edge in the depth direction. The reduced-pressure drying method including the process of changing the direction of the airflow toward the said exhaust port by a 2nd member.

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