CN201815456U - Structure of pressure reduced drying chamber - Google Patents
Structure of pressure reduced drying chamber Download PDFInfo
- Publication number
- CN201815456U CN201815456U CN 201020558816 CN201020558816U CN201815456U CN 201815456 U CN201815456 U CN 201815456U CN 201020558816 CN201020558816 CN 201020558816 CN 201020558816 U CN201020558816 U CN 201020558816U CN 201815456 U CN201815456 U CN 201815456U
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- Prior art keywords
- supporting mechanism
- dried
- substrate
- reduced pressure
- under reduced
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Abstract
The utility model provides a structure of a pressure reduced drying chamber, which comprises an upper cover and a lower cover. The upper cover and the lower cover are fastened with each other to form an interior space, a supporting mechanism is arranged inside the interior space for placing a to-be-dried substrate coated with chemicals, and an exhaust port is arranged at the lower part of the lower cover. A concave rectification component is arranged below the supporting mechanism and comprises a main body part parallel to the supporting mechanism and a side wall part perpendicular to the supporting mechanism, wherein the side wall part is positioned on the edge of the supporting mechanism and protrudes towards the supporting mechanism. The structure provided by the utility model reduces the airflow concentration on the edge of the to-be-dried substrate, so as to improve the uniformity of drying process.
Description
Technical field
The utility model relates to a kind of drying under reduced pressure cell structure, belongs to dry processing technology field.
Background technology
The equipment that the substrate that the drying under reduced pressure chamber is used to mixed chemical product such as being coated with photoresist, coating provides even drying under reduced pressure to handle.As shown in Figure 1, existing drying under reduced pressure cell structure mainly comprises: loam cake 11 and lower cover 12, fasten each other and form the interior space, in this interior space, be provided with supporting mechanism 13, be used to place the substrate to be dried 14 that is coated with chemicals, offer exhaust outlet 15 in described lower cover 12 bottoms, to realize exhaust in vacuum.The direction of arrow among the figure is represented gas flow.
As shown in Figure 1, though existing drying under reduced pressure cell structure can utilize substrate 14 own rectification effects to be dried to make the air-flow in the interior space obtain certain control, but this design very easily causes the air-flow of substrate to be dried 14 edges comparatively concentrated, makes the evaporation degree of chemicals (as the solvent composition in the photoresist) of substrate to be dried 14 edges and central part inhomogeneous.In photoetching process, the inhomogeneous one side of solvent composition evaporation degree can cause critical size (the Critical Dimension of substrate 14 to be dried in the photoresist, be called for short: CD) inhomogeneous, also can cause the photoresist surface to produce tiny flaw on the other hand owing to the local surfaces rate of drying of substrate 14 to be dried is too fast.
The utility model content
The utility model provides a kind of drying under reduced pressure cell structure, in order to improve the uniformity of dry run.
The utility model provides a kind of drying under reduced pressure cell structure, comprising: loam cake and lower cover, fasten each other and form the interior space, in this interior space, be provided with supporting mechanism, be used to place the substrate to be dried that is coated with chemicals, bottom at described lower cover offers exhaust outlet, wherein: the below of described supporting mechanism is provided with the spill rectification part, this spill rectification part comprises main part parallel with described supporting mechanism and the side wall portion vertical with described supporting mechanism, and described side wall portion is positioned at the edge of described supporting mechanism and gives prominence to setting towards described supporting mechanism.
Alternatively, described side wall portion extends to the surface that is higher than described substrate to be dried from described main part towards described supporting mechanism.
Alternatively, described main part center is formed with opening.
Alternatively, the top of described substrate to be dried also is provided with the plate shape rectification part parallel with this supporting mechanism, is formed with a plurality of rectification hole on this plate shape rectification part.
Structure described in the utility model has reduced the air-flow at substrate edges to be dried place to be concentrated, thereby has improved the uniformity of dry run.
Description of drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to do one to the accompanying drawing of required use in embodiment or the description of the Prior Art below introduces simply, apparently, accompanying drawing in describing below is embodiment more of the present utility model, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the structural representation of existing drying under reduced pressure cell structure;
Fig. 2 is the structural representation of drying under reduced pressure cell structure embodiment one described in the utility model;
Fig. 3 is the structural representation of drying under reduced pressure cell structure embodiment two described in the utility model;
Fig. 4 is the structural representation of drying under reduced pressure cell structure embodiment three described in the utility model;
Fig. 5 is the structural representation of drying under reduced pressure cell structure embodiment four described in the utility model.
The specific embodiment
For the purpose, technical scheme and the advantage that make the utility model embodiment clearer, below in conjunction with the accompanying drawing among the utility model embodiment, technical scheme among the utility model embodiment is clearly and completely described, obviously, described embodiment is the utility model part embodiment, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the utility model protection.
Fig. 2 is the structural representation of drying under reduced pressure cell structure embodiment one described in the utility model, as shown in the figure, this drying under reduced pressure cell structure comprises loam cake 11 and lower cover 12, this loam cake 11 and lower cover 12 fasten each other and form the interior space, in this interior space, be provided with supporting mechanism 13, be used to place the substrate to be dried 14 that is coated with chemicals, offer exhaust outlet 15 in the bottom of described lower cover 12, though only shown two exhaust outlets 15 among the figure, but in actual applications, can suitably adjust the quantity of exhaust outlet 15 as required, the utility model is not done qualification to this.
Wherein, below described supporting mechanism 13, also be provided with spill rectification part 20, this spill rectification part 20 comprises main part 21 parallel with described supporting mechanism 13 and the side wall portion 22 vertical with described supporting mechanism 13, and this side wall portion 22 is positioned at the edge of described supporting mechanism 13 and towards described supporting mechanism 13 outstanding settings.The direction of arrow among the figure represents that the described drying under reduced pressure cell structure of present embodiment gas inside flows to.
The described structure of present embodiment makes and crosses slit flow between side wall portion 22 and the interior space sidewall to exhaust outlet 15 from the air communication on substrate to be dried 14 surfaces by spill rectification part 20 is set, the air-flow that has reduced substrate to be dried 14 edges is concentrated, thereby has improved the uniformity of dry run.
Especially in photoetching process, the described structure of present embodiment helps guaranteeing the uniformity of the critical size of substrate 14 to be dried, has also avoided the too fast tiny flaw that causes the photoresist surface to produce of photoresist rate of drying owing to substrate to be dried 14 edges.
Fig. 3 is the structural representation of drying under reduced pressure cell structure embodiment two described in the utility model, and the height of the described structure of present embodiment oppose side wall portion 22 on the basis of the foregoing description one has been done further improvement.Particularly, as shown in Figure 3, described side wall portion 22 extends to the surface that is higher than described substrate to be dried 14 from described main part 21 towards described supporting mechanism 13.
The described structure of present embodiment passes through to increase the height of side wall portion 22 to the surface of substrate 14 to be dried, make the air-flow at substrate to be dried 14 edges further weaken, reduced the evaporation rate of chemicals herein, increase by 14 interior exhaust efficiencies of substrate to be dried, thereby further improved the uniformity of dry run.
Fig. 4 is the structural representation of drying under reduced pressure cell structure embodiment three described in the utility model, and the described structure of present embodiment has been done further improvement to main part 21 on the basis of the foregoing description one or embodiment two.Particularly, as shown in Figure 4, described main part 21 centers are formed with opening 23.The direction of arrow among the figure represents that the described drying under reduced pressure cell structure of present embodiment gas inside flows to.
The described structure of present embodiment is by forming opening 23 in main part 21 centers, increased the exhaust efficiency of substrate to be dried 14 central areas, reduce the current rate difference of substrate to be dried 14 central areas and fringe region, thereby further improved the uniformity of dry run.
Fig. 5 is the structural representation of drying under reduced pressure cell structure embodiment four described in the utility model, and the described structure of present embodiment is further improved on the basis of the foregoing description one, embodiment two or embodiment three.Particularly, as shown in Figure 5, the top of described substrate 14 to be dried also is provided with the plate shape rectification part 30 parallel with this substrate to be dried 14, is formed with a plurality of rectification hole 31 on this plate shape rectification part 30.The direction of arrow among the figure represents that the described drying under reduced pressure cell structure of present embodiment gas inside flows to.
The described structure of present embodiment is by setting up plate shape rectification part 30, the air-flow of further having optimized substrate to be dried 14 tops distributes, further increased the exhaust efficiency of substrate to be dried 14 central areas, reduce the current rate difference of substrate to be dried 14 central areas and fringe region, thereby further improved the uniformity of dry run.
It should be noted that at last: above embodiment only in order to the explanation the technical solution of the utility model, is not intended to limit; Although the utility model is had been described in detail with reference to previous embodiment, those of ordinary skill in the art is to be understood that: it still can be made amendment to the technical scheme that aforementioned each embodiment put down in writing, and perhaps part technical characterictic wherein is equal to replacement; And these modifications or replacement do not make the essence of appropriate technical solution break away from the spirit and scope of each embodiment technical scheme of the utility model.
Claims (5)
1. drying under reduced pressure cell structure, comprise: loam cake and lower cover, fasten each other and form the interior space, in this interior space, be provided with supporting mechanism, be used to place the substrate to be dried that is coated with chemicals, bottom at described lower cover offers exhaust outlet, it is characterized in that: the below of described supporting mechanism is provided with the spill rectification part, this spill rectification part comprises main part parallel with described supporting mechanism and the side wall portion vertical with described supporting mechanism, and described side wall portion is positioned at the edge of described supporting mechanism and gives prominence to setting towards described supporting mechanism.
2. drying under reduced pressure cell structure according to claim 1 is characterized in that: described side wall portion extends to the surface that is higher than described substrate to be dried from described main part towards described supporting mechanism.
3. drying under reduced pressure cell structure according to claim 1 and 2 is characterized in that: described main part center is formed with opening.
4. drying under reduced pressure cell structure according to claim 1 and 2 is characterized in that: the top of described substrate to be dried also is provided with the plate shape rectification part parallel with this supporting mechanism, is formed with a plurality of rectification hole on this plate shape rectification part.
5. drying under reduced pressure cell structure according to claim 3 is characterized in that: the top of described substrate to be dried also is provided with the plate shape rectification part parallel with this substrate to be dried, is formed with a plurality of rectification hole on this plate shape rectification part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201020558816 CN201815456U (en) | 2010-10-09 | 2010-10-09 | Structure of pressure reduced drying chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201020558816 CN201815456U (en) | 2010-10-09 | 2010-10-09 | Structure of pressure reduced drying chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201815456U true CN201815456U (en) | 2011-05-04 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201020558816 Expired - Lifetime CN201815456U (en) | 2010-10-09 | 2010-10-09 | Structure of pressure reduced drying chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201815456U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013174107A1 (en) * | 2012-05-21 | 2013-11-28 | 京东方科技集团股份有限公司 | Prebaking device and exhaust method thereof |
| CN104596205A (en) * | 2015-02-13 | 2015-05-06 | 京东方科技集团股份有限公司 | Vacuum drying device and vacuum drying method |
| CN105214918A (en) * | 2015-08-26 | 2016-01-06 | 京东方科技集团股份有限公司 | Decompression dry device |
| CN110548658A (en) * | 2018-05-31 | 2019-12-10 | 株式会社斯库林集团 | Reduced pressure drying device and reduced pressure drying method |
| TWI836297B (en) * | 2020-11-30 | 2024-03-21 | 日商斯庫林集團股份有限公司 | Reduced pressure drying device |
-
2010
- 2010-10-09 CN CN 201020558816 patent/CN201815456U/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013174107A1 (en) * | 2012-05-21 | 2013-11-28 | 京东方科技集团股份有限公司 | Prebaking device and exhaust method thereof |
| US9234702B2 (en) | 2012-05-21 | 2016-01-12 | Boe Technology Group Co., Ltd. | Prebake equipment and air discharge method thereof |
| CN104596205A (en) * | 2015-02-13 | 2015-05-06 | 京东方科技集团股份有限公司 | Vacuum drying device and vacuum drying method |
| CN104596205B (en) * | 2015-02-13 | 2016-08-03 | 京东方科技集团股份有限公司 | A kind of Minton dryer and vacuum drying method |
| CN105214918A (en) * | 2015-08-26 | 2016-01-06 | 京东方科技集团股份有限公司 | Decompression dry device |
| CN110548658A (en) * | 2018-05-31 | 2019-12-10 | 株式会社斯库林集团 | Reduced pressure drying device and reduced pressure drying method |
| TWI836297B (en) * | 2020-11-30 | 2024-03-21 | 日商斯庫林集團股份有限公司 | Reduced pressure drying device |
| CN114570621B (en) * | 2020-11-30 | 2024-06-18 | 株式会社斯库林集团 | Decompression drying device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110504 |
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| CX01 | Expiry of patent term |