KR102338165B1 - 검사 장치 및 검사 방법 - Google Patents

검사 장치 및 검사 방법 Download PDF

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Publication number
KR102338165B1
KR102338165B1 KR1020170088177A KR20170088177A KR102338165B1 KR 102338165 B1 KR102338165 B1 KR 102338165B1 KR 1020170088177 A KR1020170088177 A KR 1020170088177A KR 20170088177 A KR20170088177 A KR 20170088177A KR 102338165 B1 KR102338165 B1 KR 102338165B1
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KR
South Korea
Prior art keywords
retardation film
inspection
film
orientation direction
retardation
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KR1020170088177A
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English (en)
Korean (ko)
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KR20180010982A (ko
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요이치 기가와
고지 시젠
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닛토덴코 가부시키가이샤
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Publication of KR20180010982A publication Critical patent/KR20180010982A/ko
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Publication of KR102338165B1 publication Critical patent/KR102338165B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
KR1020170088177A 2016-07-22 2017-07-12 검사 장치 및 검사 방법 KR102338165B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-144024 2016-07-22
JP2016144024A JP6924002B2 (ja) 2016-07-22 2016-07-22 検査装置及び検査方法

Publications (2)

Publication Number Publication Date
KR20180010982A KR20180010982A (ko) 2018-01-31
KR102338165B1 true KR102338165B1 (ko) 2021-12-09

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Application Number Title Priority Date Filing Date
KR1020170088177A KR102338165B1 (ko) 2016-07-22 2017-07-12 검사 장치 및 검사 방법

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JP (1) JP6924002B2 (ja)
KR (1) KR102338165B1 (ja)
CN (1) CN107643612B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111721776B (zh) * 2019-03-22 2024-02-20 住友化学株式会社 检查方法及检查装置
JP7474569B2 (ja) * 2019-03-22 2024-04-25 住友化学株式会社 検査方法及び検査装置
JP7455527B2 (ja) * 2019-03-22 2024-03-26 住友化学株式会社 検査方法及び検査装置
KR102154618B1 (ko) * 2020-06-19 2020-09-10 강신탁 김 이물질 검출 비전검사 장치 및 이를 이용한 검사 방법
KR20230079051A (ko) * 2020-09-30 2023-06-05 닛토덴코 가부시키가이샤 세퍼레이터
JP2022072182A (ja) * 2020-10-29 2022-05-17 住友化学株式会社 検査方法
JP2022114832A (ja) * 2021-01-27 2022-08-08 住友化学株式会社 欠陥検査方法及び欠陥検査装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292201A (ja) * 2007-05-22 2008-12-04 Nitto Denko Corp 積層フィルムの検査方法及び積層フィルムの検査装置
JP2013050393A (ja) * 2011-08-31 2013-03-14 Fujifilm Corp パターン化位相差フィルムの欠陥検出装置及び方法、並びに製造方法
JP2013109220A (ja) 2011-11-22 2013-06-06 Nippon Zeon Co Ltd 位相差フィルムを評価する評価方法
JP2014038030A (ja) 2012-08-16 2014-02-27 Fujifilm Corp 等間隔パターン評価装置及び等間隔パターン評価方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4869053B2 (ja) * 2006-01-11 2012-02-01 日東電工株式会社 積層フィルムの製造方法、積層フィルムの欠陥検出方法、積層フィルムの欠陥検出装置、積層フィルム、及び画像表示装置
JP5024935B2 (ja) * 2007-01-16 2012-09-12 富士フイルム株式会社 光透過性部材の欠陥検出装置及び方法
JP5258349B2 (ja) * 2008-03-28 2013-08-07 富士フイルム株式会社 欠陥検出装置及び方法
JP5399453B2 (ja) * 2011-08-31 2014-01-29 富士フイルム株式会社 パターン化位相差フィルムの欠陥検査装置及び方法並びに製造方法
JP2013210245A (ja) 2012-03-30 2013-10-10 Dainippon Printing Co Ltd フィルム検査システム、フィルム検査方法
JP6182806B2 (ja) * 2013-06-04 2017-08-23 住友化学株式会社 欠陥検査システム及びフィルムの製造装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292201A (ja) * 2007-05-22 2008-12-04 Nitto Denko Corp 積層フィルムの検査方法及び積層フィルムの検査装置
JP2013050393A (ja) * 2011-08-31 2013-03-14 Fujifilm Corp パターン化位相差フィルムの欠陥検出装置及び方法、並びに製造方法
JP2013109220A (ja) 2011-11-22 2013-06-06 Nippon Zeon Co Ltd 位相差フィルムを評価する評価方法
JP2014038030A (ja) 2012-08-16 2014-02-27 Fujifilm Corp 等間隔パターン評価装置及び等間隔パターン評価方法

Also Published As

Publication number Publication date
CN107643612A (zh) 2018-01-30
KR20180010982A (ko) 2018-01-31
CN107643612B (zh) 2022-03-22
JP2018013438A (ja) 2018-01-25
JP6924002B2 (ja) 2021-08-25

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