KR102336186B1 - 노광장치 - Google Patents

노광장치 Download PDF

Info

Publication number
KR102336186B1
KR102336186B1 KR1020170038213A KR20170038213A KR102336186B1 KR 102336186 B1 KR102336186 B1 KR 102336186B1 KR 1020170038213 A KR1020170038213 A KR 1020170038213A KR 20170038213 A KR20170038213 A KR 20170038213A KR 102336186 B1 KR102336186 B1 KR 102336186B1
Authority
KR
South Korea
Prior art keywords
substrate
exposure apparatus
exposure
unit
moving
Prior art date
Application number
KR1020170038213A
Other languages
English (en)
Korean (ko)
Other versions
KR20170113266A (ko
Inventor
마사루 야마가
마사아키 마츠다
유키 로쿠가와
Original Assignee
가부시키가이샤 오크세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 오크세이사쿠쇼 filed Critical 가부시키가이샤 오크세이사쿠쇼
Publication of KR20170113266A publication Critical patent/KR20170113266A/ko
Application granted granted Critical
Publication of KR102336186B1 publication Critical patent/KR102336186B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020170038213A 2016-03-31 2017-03-27 노광장치 KR102336186B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016071990A JP6773435B2 (ja) 2016-03-31 2016-03-31 露光装置
JPJP-P-2016-071990 2016-03-31

Publications (2)

Publication Number Publication Date
KR20170113266A KR20170113266A (ko) 2017-10-12
KR102336186B1 true KR102336186B1 (ko) 2021-12-06

Family

ID=60004537

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170038213A KR102336186B1 (ko) 2016-03-31 2017-03-27 노광장치

Country Status (2)

Country Link
JP (1) JP6773435B2 (ja)
KR (1) KR102336186B1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004233608A (ja) * 2003-01-30 2004-08-19 Fuji Photo Film Co Ltd 露光装置
JP2010217803A (ja) 2009-03-19 2010-09-30 Ushio Inc 露光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61201440A (ja) * 1985-03-04 1986-09-06 Hitachi Electronics Eng Co Ltd ウエハのアライメント装置
JPH04239797A (ja) * 1991-01-23 1992-08-27 Sharp Corp スクリーン印刷装置
JP2832673B2 (ja) * 1993-10-29 1998-12-09 株式会社オーク製作所 露光装置およびワークの露光方法
JP3070006B2 (ja) 1997-02-07 2000-07-24 株式会社オーク製作所 薄板状ワークの搬送方法
JPH11237744A (ja) * 1997-12-18 1999-08-31 Sanee Giken Kk 露光装置および露光方法
JP4342663B2 (ja) 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
US8599359B2 (en) * 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
WO2011102410A1 (ja) 2010-02-17 2011-08-25 株式会社ニコン 搬送装置、搬送方法、露光装置、及びデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004233608A (ja) * 2003-01-30 2004-08-19 Fuji Photo Film Co Ltd 露光装置
JP2010217803A (ja) 2009-03-19 2010-09-30 Ushio Inc 露光装置

Also Published As

Publication number Publication date
KR20170113266A (ko) 2017-10-12
JP2017181936A (ja) 2017-10-05
JP6773435B2 (ja) 2020-10-21

Similar Documents

Publication Publication Date Title
JP6191721B2 (ja) 搬送装置、搬送方法、露光装置、及びデバイス製造方法
KR101699120B1 (ko) 처리 장치, 디바이스 제조 방법, 및 처리 방법
JP2006031025A (ja) 平板表示装置の製造システム及び製造方法
JP2007238287A (ja) ワーク搬送装置およびワーク搬送方法
JP2009117571A (ja) 基板処理装置及び塗布装置及び塗布方法
US20180244480A1 (en) Transport unit, transfer apparatus, and transfer method
JP2009295950A (ja) スキャン露光装置およびスキャン露光方法
JP2009208964A (ja) 基板搬送装置、及び、基板搬送方法
JP2007112626A (ja) 基板搬送装置及び基板検査装置並びに基板搬送方法
JP2010281984A (ja) パネル基板搬送装置および表示パネルモジュール組立装置
JP6717908B2 (ja) 基板の搬送装置、搬送方法、及びフォトリソグラフィ設備
KR102020227B1 (ko) 캐리어 이송 장치 및 방법
KR102336186B1 (ko) 노광장치
JP5310665B2 (ja) 部品実装システム及び部品実装システムにおける基板搬送方法
TWI779014B (zh) 曝光裝置
TWI457717B (zh) Exposure device
KR102458992B1 (ko) 기판 반송 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 기판 반송 방법, 및 노광 방법
JP2012129254A (ja) 電子部品実装装置
JP2001343753A (ja) 基板搬送機構および露光装置
JP2010256578A (ja) 表示パネル搬送装置および表示パネルモジュール組立装置
JP6175184B2 (ja) 基板処理装置
JP2007238292A (ja) ワーク搬送装置
WO2013151146A1 (ja) 露光装置及び露光方法
CN110880461A (zh) 基板处理装置
JP2013003157A (ja) 露光ユニット及びそれを用いた露光方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant