KR102301413B1 - 웨이퍼의 배면측의 에지 상의 막을 제거하는 장치 및 방법 - Google Patents
웨이퍼의 배면측의 에지 상의 막을 제거하는 장치 및 방법 Download PDFInfo
- Publication number
- KR102301413B1 KR102301413B1 KR1020177000377A KR20177000377A KR102301413B1 KR 102301413 B1 KR102301413 B1 KR 102301413B1 KR 1020177000377 A KR1020177000377 A KR 1020177000377A KR 20177000377 A KR20177000377 A KR 20177000377A KR 102301413 B1 KR102301413 B1 KR 102301413B1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- vacuum chuck
- vacuum
- groove
- seal ring
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02082—Cleaning product to be cleaned
- H01L21/02087—Cleaning of wafer edges
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2014/079323 WO2015184628A1 (en) | 2014-06-06 | 2014-06-06 | Apparatus and method for removing film on edge of backside of wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170013996A KR20170013996A (ko) | 2017-02-07 |
KR102301413B1 true KR102301413B1 (ko) | 2021-09-14 |
Family
ID=54765965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020177000377A KR102301413B1 (ko) | 2014-06-06 | 2014-06-06 | 웨이퍼의 배면측의 에지 상의 막을 제거하는 장치 및 방법 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR102301413B1 (zh) |
CN (1) | CN107615443B (zh) |
WO (1) | WO2015184628A1 (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6726473B2 (ja) * | 2016-02-15 | 2020-07-22 | 株式会社ディスコ | チャックテーブル機構 |
JP6758587B2 (ja) * | 2016-07-06 | 2020-09-23 | エーシーエム リサーチ (シャンハイ) インコーポレーテッド | 基板支持装置 |
CN106684018B (zh) * | 2016-11-18 | 2019-04-09 | 中国电子科技集团公司第四十一研究所 | 一种生瓷片去膜装置及方法 |
CN108375626B (zh) * | 2018-04-18 | 2024-05-31 | 融智生物科技(青岛)有限公司 | 用于基质辅助激光解析电离飞行时间质谱的加载装置 |
CN108588802B (zh) * | 2018-05-29 | 2019-12-24 | 江苏爱矽半导体科技有限公司 | 一种半导体晶圆电镀设备 |
CN108695179B (zh) * | 2018-05-29 | 2020-03-03 | 深圳市冠禹半导体有限公司 | 一种芯片的导电线路制作工艺 |
CN109244029B (zh) * | 2018-09-28 | 2022-12-02 | 上海微松工业自动化有限公司 | 一种晶圆平整固定装置 |
CN109599355B (zh) * | 2019-01-10 | 2024-05-03 | 江苏汇成光电有限公司 | 一种晶圆合框撕胶装置 |
JP2020116692A (ja) * | 2019-01-24 | 2020-08-06 | 東京エレクトロン株式会社 | 加工装置及び加工方法 |
TWI837277B (zh) * | 2019-01-24 | 2024-04-01 | 日商東京威力科創股份有限公司 | 加工裝置及加工方法 |
CN110052370B (zh) * | 2019-05-15 | 2024-04-02 | 苏州美图半导体技术有限公司 | 匀胶机真空匀胶装置 |
KR102372418B1 (ko) * | 2019-11-28 | 2022-03-08 | 한국생산기술연구원 | 회전형 진공 공정챔버의 씰링 구조 |
CN111069163B (zh) * | 2019-12-04 | 2021-12-10 | 惠州易晖光电材料股份有限公司 | 纳米掩膜材料去除生产线及其生产工艺 |
CN111863696A (zh) * | 2020-08-05 | 2020-10-30 | 西安奕斯伟硅片技术有限公司 | 真空吸盘、真空吸附装置及其工作方法 |
CN112071782B (zh) * | 2020-09-16 | 2024-03-15 | 沈阳芯源微电子设备股份有限公司 | 一种晶圆背面清洗装置、方法及清洗单元 |
CN116259571A (zh) * | 2021-12-09 | 2023-06-13 | 盛美半导体设备(上海)股份有限公司 | 晶圆保持装置及其旋转轴 |
CN114850924B (zh) * | 2022-07-11 | 2022-09-16 | 宜宾职业技术学院 | 一种五轴机床快换夹具 |
CN115332129B (zh) * | 2022-10-17 | 2023-02-21 | 宁波润华全芯微电子设备有限公司 | 一种晶圆增粘装置 |
CN118136569B (zh) * | 2024-03-29 | 2024-08-09 | 苏州冠礼科技有限公司 | 一种多尺寸半导体干燥装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001070859A (ja) * | 1999-09-06 | 2001-03-21 | Takata Corp | 薄板円板素材の保持構造 |
JP2003273063A (ja) * | 2002-03-13 | 2003-09-26 | Komatsu Electronic Metals Co Ltd | 半導体ウェーハのエッジ部の酸化膜除去装置および方法 |
JP2005123387A (ja) | 2003-10-16 | 2005-05-12 | Seiko Epson Corp | 基板保持具及び基板の表面処理方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4348473A (en) * | 1981-03-04 | 1982-09-07 | Xerox Corporation | Dry process for the production of microelectronic devices |
JP2615317B2 (ja) * | 1992-08-05 | 1997-05-28 | 東京応化工業株式会社 | スピンナーチャック |
JPH11274280A (ja) * | 1998-03-20 | 1999-10-08 | Speedfam Co Ltd | ワーク用バキュームチャック装置 |
US6579408B1 (en) * | 2002-04-22 | 2003-06-17 | Industrial Technology Research Institute | Apparatus and method for etching wafer backside |
US20040137745A1 (en) * | 2003-01-10 | 2004-07-15 | International Business Machines Corporation | Method and apparatus for removing backside edge polymer |
JP3890026B2 (ja) * | 2003-03-10 | 2007-03-07 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
JP4464293B2 (ja) * | 2005-02-28 | 2010-05-19 | 株式会社高田工業所 | 半導体基板処理装置及び半導体基板処理方法 |
US7967996B2 (en) * | 2007-01-30 | 2011-06-28 | Applied Materials, Inc. | Process for wafer backside polymer removal and wafer front side photoresist removal |
US20080179008A1 (en) * | 2007-01-30 | 2008-07-31 | Collins Kenneth S | Reactor for wafer backside polymer removal using an etch plasma feeding a lower process zone and a scavenger plasma feeding an upper process zone |
JP2008218545A (ja) * | 2007-03-01 | 2008-09-18 | Sumco Corp | ウェーハの枚葉式エッチング装置 |
JP2008251806A (ja) * | 2007-03-30 | 2008-10-16 | Sumco Corp | ウェーハの枚葉式エッチング方法及びそのエッチング装置 |
US8329593B2 (en) * | 2007-12-12 | 2012-12-11 | Applied Materials, Inc. | Method and apparatus for removing polymer from the wafer backside and edge |
US10242890B2 (en) * | 2011-08-08 | 2019-03-26 | Applied Materials, Inc. | Substrate support with heater |
CN203542342U (zh) * | 2013-11-14 | 2014-04-16 | 中芯国际集成电路制造(北京)有限公司 | 晶圆背面研磨装置的真空吸盘 |
-
2014
- 2014-06-06 CN CN201480079603.3A patent/CN107615443B/zh active Active
- 2014-06-06 WO PCT/CN2014/079323 patent/WO2015184628A1/en active Application Filing
- 2014-06-06 KR KR1020177000377A patent/KR102301413B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001070859A (ja) * | 1999-09-06 | 2001-03-21 | Takata Corp | 薄板円板素材の保持構造 |
JP2003273063A (ja) * | 2002-03-13 | 2003-09-26 | Komatsu Electronic Metals Co Ltd | 半導体ウェーハのエッジ部の酸化膜除去装置および方法 |
JP2005123387A (ja) | 2003-10-16 | 2005-05-12 | Seiko Epson Corp | 基板保持具及び基板の表面処理方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20170013996A (ko) | 2017-02-07 |
CN107615443B (zh) | 2021-06-18 |
WO2015184628A1 (en) | 2015-12-10 |
CN107615443A (zh) | 2018-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102301413B1 (ko) | 웨이퍼의 배면측의 에지 상의 막을 제거하는 장치 및 방법 | |
US11648639B2 (en) | Polishing jig assembly for a new or refurbished electrostatic chuck | |
TWI552806B (zh) | 基板處理裝置及基板處理方法 | |
US20160086811A1 (en) | Vertical no-spin process chamber | |
KR101419076B1 (ko) | 단면 식각 | |
WO2016179818A1 (en) | Apparatus for substrate bevel and backside protection | |
JP5775339B2 (ja) | 基板処理装置 | |
JP6338904B2 (ja) | 基板処理装置 | |
JP2014179489A (ja) | 基板処理装置 | |
JP6163315B2 (ja) | 基板処理装置 | |
CN216389313U (zh) | 半导体处理装置 | |
JP2014157901A (ja) | 基板処理装置および基板処理方法 | |
JP2018056223A (ja) | 基板処理装置 | |
TWI665748B (zh) | 去除晶圓背面邊緣薄膜的裝置及其方法 | |
JP2007305644A (ja) | ウェーハの枚葉式エッチング装置 | |
KR100889633B1 (ko) | 기판 고정 척핀 | |
TWI712095B (zh) | 基板斜邊和背面保護裝置 | |
KR20070100245A (ko) | 단일-기판 처리 동안에 기판으로부터 미소량의 액체를제거하는 장치 및 방법 | |
KR100919932B1 (ko) | 실리콘 에피택셜 단결정 기판의 제조방법 및 에칭장치 | |
CN216793620U (zh) | 半导体处理装置 | |
CN216698287U (zh) | 半导体处理装置 | |
KR20110131538A (ko) | 기판의 매엽식 처리 장치 | |
KR101487095B1 (ko) | 웨이퍼 에칭 장치 및 웨이퍼 에칭 방법 | |
JPH11135448A (ja) | 縦型処理装置 | |
CN109759698B (zh) | 一种激光晶圆打标装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E90F | Notification of reason for final refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |