KR102188973B1 - 펠리클 - Google Patents

펠리클 Download PDF

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Publication number
KR102188973B1
KR102188973B1 KR1020140003992A KR20140003992A KR102188973B1 KR 102188973 B1 KR102188973 B1 KR 102188973B1 KR 1020140003992 A KR1020140003992 A KR 1020140003992A KR 20140003992 A KR20140003992 A KR 20140003992A KR 102188973 B1 KR102188973 B1 KR 102188973B1
Authority
KR
South Korea
Prior art keywords
pellicle
adhesive layer
frame
film
adhesive
Prior art date
Application number
KR1020140003992A
Other languages
English (en)
Korean (ko)
Other versions
KR20140130010A (ko
Inventor
준 호리코시
Original Assignee
신에쓰 가가꾸 고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신에쓰 가가꾸 고교 가부시끼가이샤 filed Critical 신에쓰 가가꾸 고교 가부시끼가이샤
Publication of KR20140130010A publication Critical patent/KR20140130010A/ko
Priority to KR1020200165444A priority Critical patent/KR102259620B1/ko
Application granted granted Critical
Publication of KR102188973B1 publication Critical patent/KR102188973B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
KR1020140003992A 2013-04-30 2014-01-13 펠리클 KR102188973B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020200165444A KR102259620B1 (ko) 2013-04-30 2020-12-01 펠리클

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013095025A JP6004582B2 (ja) 2013-04-30 2013-04-30 ペリクル
JPJP-P-2013-095025 2013-04-30

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020200165444A Division KR102259620B1 (ko) 2013-04-30 2020-12-01 펠리클

Publications (2)

Publication Number Publication Date
KR20140130010A KR20140130010A (ko) 2014-11-07
KR102188973B1 true KR102188973B1 (ko) 2020-12-09

Family

ID=51806074

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020140003992A KR102188973B1 (ko) 2013-04-30 2014-01-13 펠리클
KR1020200165444A KR102259620B1 (ko) 2013-04-30 2020-12-01 펠리클

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020200165444A KR102259620B1 (ko) 2013-04-30 2020-12-01 펠리클

Country Status (5)

Country Link
JP (1) JP6004582B2 (xx)
KR (2) KR102188973B1 (xx)
CN (1) CN104133341A (xx)
HK (1) HK1199502A1 (xx)
TW (1) TWI572488B (xx)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6376601B2 (ja) * 2015-05-18 2018-08-22 信越化学工業株式会社 ペリクル支持手段及びこれを用いたペリクル支持装置とペリクル装着方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005308901A (ja) 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd ペリクルフレーム及びそれを用いたフォトリソグラフィー用ペリクル
JP2005338722A (ja) * 2004-05-31 2005-12-08 Shin Etsu Chem Co Ltd ペリクルフレーム及びフォトリソグラフィー用ペリクル
JP2012108277A (ja) 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219023A (ja) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
US4861402A (en) 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPS6327707A (ja) 1986-07-21 1988-02-05 Matsushita Electric Ind Co Ltd 双曲面鏡検査装置
JP2945201B2 (ja) 1992-01-31 1999-09-06 信越化学工業株式会社 ペリクル
JP3347224B2 (ja) * 1994-09-09 2002-11-20 三菱電機株式会社 ペリクル
JPH0922111A (ja) * 1995-07-05 1997-01-21 Shin Etsu Chem Co Ltd ペリクル
JP3642145B2 (ja) * 1997-02-21 2005-04-27 信越化学工業株式会社 ペリクルの製造方法及びペリクルのレチクル貼着用粘着剤層への貼着用ライナー
JP4185232B2 (ja) 2000-03-08 2008-11-26 信越化学工業株式会社 リソグラフィー用ペリクル
CN101968606B (zh) * 2009-07-27 2013-01-23 北京京东方光电科技有限公司 掩膜基板和边框胶固化系统

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005308901A (ja) 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd ペリクルフレーム及びそれを用いたフォトリソグラフィー用ペリクル
JP2005338722A (ja) * 2004-05-31 2005-12-08 Shin Etsu Chem Co Ltd ペリクルフレーム及びフォトリソグラフィー用ペリクル
JP2012108277A (ja) 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル

Also Published As

Publication number Publication date
JP6004582B2 (ja) 2016-10-12
KR20140130010A (ko) 2014-11-07
TW201501936A (zh) 2015-01-16
HK1199502A1 (en) 2015-07-03
KR20200140766A (ko) 2020-12-16
JP2014215572A (ja) 2014-11-17
TWI572488B (zh) 2017-03-01
KR102259620B1 (ko) 2021-06-02
CN104133341A (zh) 2014-11-05

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E902 Notification of reason for refusal
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X091 Application refused [patent]
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A107 Divisional application of patent
GRNT Written decision to grant