JP6004582B2 - ペリクル - Google Patents

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Publication number
JP6004582B2
JP6004582B2 JP2013095025A JP2013095025A JP6004582B2 JP 6004582 B2 JP6004582 B2 JP 6004582B2 JP 2013095025 A JP2013095025 A JP 2013095025A JP 2013095025 A JP2013095025 A JP 2013095025A JP 6004582 B2 JP6004582 B2 JP 6004582B2
Authority
JP
Japan
Prior art keywords
pellicle
adhesive layer
film
adhesive
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013095025A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014215572A (ja
Inventor
淳 堀越
堀越　　淳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2013095025A priority Critical patent/JP6004582B2/ja
Priority to KR1020140003992A priority patent/KR102188973B1/ko
Priority to TW103115109A priority patent/TWI572488B/zh
Priority to CN201410177846.2A priority patent/CN104133341A/zh
Publication of JP2014215572A publication Critical patent/JP2014215572A/ja
Priority to HK14113026.5A priority patent/HK1199502A1/xx
Application granted granted Critical
Publication of JP6004582B2 publication Critical patent/JP6004582B2/ja
Priority to KR1020200165444A priority patent/KR102259620B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
JP2013095025A 2013-04-30 2013-04-30 ペリクル Active JP6004582B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2013095025A JP6004582B2 (ja) 2013-04-30 2013-04-30 ペリクル
KR1020140003992A KR102188973B1 (ko) 2013-04-30 2014-01-13 펠리클
TW103115109A TWI572488B (zh) 2013-04-30 2014-04-28 防塵薄膜組件
CN201410177846.2A CN104133341A (zh) 2013-04-30 2014-04-29 防尘薄膜组件
HK14113026.5A HK1199502A1 (en) 2013-04-30 2014-12-25 Dust-prevention film assembly
KR1020200165444A KR102259620B1 (ko) 2013-04-30 2020-12-01 펠리클

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095025A JP6004582B2 (ja) 2013-04-30 2013-04-30 ペリクル

Publications (2)

Publication Number Publication Date
JP2014215572A JP2014215572A (ja) 2014-11-17
JP6004582B2 true JP6004582B2 (ja) 2016-10-12

Family

ID=51806074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013095025A Active JP6004582B2 (ja) 2013-04-30 2013-04-30 ペリクル

Country Status (5)

Country Link
JP (1) JP6004582B2 (xx)
KR (2) KR102188973B1 (xx)
CN (1) CN104133341A (xx)
HK (1) HK1199502A1 (xx)
TW (1) TWI572488B (xx)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6376601B2 (ja) * 2015-05-18 2018-08-22 信越化学工業株式会社 ペリクル支持手段及びこれを用いたペリクル支持装置とペリクル装着方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219023A (ja) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
US4861402A (en) 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPS6327707A (ja) 1986-07-21 1988-02-05 Matsushita Electric Ind Co Ltd 双曲面鏡検査装置
JP2945201B2 (ja) 1992-01-31 1999-09-06 信越化学工業株式会社 ペリクル
JP3347224B2 (ja) * 1994-09-09 2002-11-20 三菱電機株式会社 ペリクル
JPH0922111A (ja) * 1995-07-05 1997-01-21 Shin Etsu Chem Co Ltd ペリクル
JP3642145B2 (ja) * 1997-02-21 2005-04-27 信越化学工業株式会社 ペリクルの製造方法及びペリクルのレチクル貼着用粘着剤層への貼着用ライナー
JP4185232B2 (ja) 2000-03-08 2008-11-26 信越化学工業株式会社 リソグラフィー用ペリクル
JP2005308901A (ja) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd ペリクルフレーム及びそれを用いたフォトリソグラフィー用ペリクル
JP4358683B2 (ja) * 2004-05-31 2009-11-04 信越化学工業株式会社 ペリクルフレーム及びフォトリソグラフィー用ペリクル
CN101968606B (zh) * 2009-07-27 2013-01-23 北京京东方光电科技有限公司 掩膜基板和边框胶固化系统
JP5478463B2 (ja) * 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル

Also Published As

Publication number Publication date
HK1199502A1 (en) 2015-07-03
KR102188973B1 (ko) 2020-12-09
CN104133341A (zh) 2014-11-05
TWI572488B (zh) 2017-03-01
KR20200140766A (ko) 2020-12-16
KR102259620B1 (ko) 2021-06-02
JP2014215572A (ja) 2014-11-17
TW201501936A (zh) 2015-01-16
KR20140130010A (ko) 2014-11-07

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