TWI572488B - 防塵薄膜組件 - Google Patents

防塵薄膜組件 Download PDF

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Publication number
TWI572488B
TWI572488B TW103115109A TW103115109A TWI572488B TW I572488 B TWI572488 B TW I572488B TW 103115109 A TW103115109 A TW 103115109A TW 103115109 A TW103115109 A TW 103115109A TW I572488 B TWI572488 B TW I572488B
Authority
TW
Taiwan
Prior art keywords
pellicle
film
adhesive layer
frame
adhesive
Prior art date
Application number
TW103115109A
Other languages
English (en)
Chinese (zh)
Other versions
TW201501936A (zh
Inventor
堀越淳
Original Assignee
信越化學工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業股份有限公司 filed Critical 信越化學工業股份有限公司
Publication of TW201501936A publication Critical patent/TW201501936A/zh
Application granted granted Critical
Publication of TWI572488B publication Critical patent/TWI572488B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
TW103115109A 2013-04-30 2014-04-28 防塵薄膜組件 TWI572488B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095025A JP6004582B2 (ja) 2013-04-30 2013-04-30 ペリクル

Publications (2)

Publication Number Publication Date
TW201501936A TW201501936A (zh) 2015-01-16
TWI572488B true TWI572488B (zh) 2017-03-01

Family

ID=51806074

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103115109A TWI572488B (zh) 2013-04-30 2014-04-28 防塵薄膜組件

Country Status (5)

Country Link
JP (1) JP6004582B2 (xx)
KR (2) KR102188973B1 (xx)
CN (1) CN104133341A (xx)
HK (1) HK1199502A1 (xx)
TW (1) TWI572488B (xx)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6376601B2 (ja) * 2015-05-18 2018-08-22 信越化学工業株式会社 ペリクル支持手段及びこれを用いたペリクル支持装置とペリクル装着方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW454104B (en) * 1995-07-05 2001-09-11 Shinetsu Chemical Co Frame-supported pellicle for photomask protection
JP2005338722A (ja) * 2004-05-31 2005-12-08 Shin Etsu Chem Co Ltd ペリクルフレーム及びフォトリソグラフィー用ペリクル

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219023A (ja) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
US4861402A (en) 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPS6327707A (ja) 1986-07-21 1988-02-05 Matsushita Electric Ind Co Ltd 双曲面鏡検査装置
JP2945201B2 (ja) 1992-01-31 1999-09-06 信越化学工業株式会社 ペリクル
JP3347224B2 (ja) * 1994-09-09 2002-11-20 三菱電機株式会社 ペリクル
JP3642145B2 (ja) * 1997-02-21 2005-04-27 信越化学工業株式会社 ペリクルの製造方法及びペリクルのレチクル貼着用粘着剤層への貼着用ライナー
JP4185232B2 (ja) 2000-03-08 2008-11-26 信越化学工業株式会社 リソグラフィー用ペリクル
JP2005308901A (ja) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd ペリクルフレーム及びそれを用いたフォトリソグラフィー用ペリクル
CN101968606B (zh) * 2009-07-27 2013-01-23 北京京东方光电科技有限公司 掩膜基板和边框胶固化系统
JP5478463B2 (ja) * 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW454104B (en) * 1995-07-05 2001-09-11 Shinetsu Chemical Co Frame-supported pellicle for photomask protection
JP2005338722A (ja) * 2004-05-31 2005-12-08 Shin Etsu Chem Co Ltd ペリクルフレーム及びフォトリソグラフィー用ペリクル

Also Published As

Publication number Publication date
HK1199502A1 (en) 2015-07-03
KR102188973B1 (ko) 2020-12-09
CN104133341A (zh) 2014-11-05
KR20200140766A (ko) 2020-12-16
KR102259620B1 (ko) 2021-06-02
JP2014215572A (ja) 2014-11-17
JP6004582B2 (ja) 2016-10-12
TW201501936A (zh) 2015-01-16
KR20140130010A (ko) 2014-11-07

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