HK1199502A1 - Dust-prevention film assembly - Google Patents

Dust-prevention film assembly

Info

Publication number
HK1199502A1
HK1199502A1 HK14113026.5A HK14113026A HK1199502A1 HK 1199502 A1 HK1199502 A1 HK 1199502A1 HK 14113026 A HK14113026 A HK 14113026A HK 1199502 A1 HK1199502 A1 HK 1199502A1
Authority
HK
Hong Kong
Prior art keywords
dust
prevention film
film assembly
assembly
prevention
Prior art date
Application number
HK14113026.5A
Other languages
Chinese (zh)
Inventor
堀越淳
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1199502A1 publication Critical patent/HK1199502A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
HK14113026.5A 2013-04-30 2014-12-25 Dust-prevention film assembly HK1199502A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095025A JP6004582B2 (en) 2013-04-30 2013-04-30 Pellicle

Publications (1)

Publication Number Publication Date
HK1199502A1 true HK1199502A1 (en) 2015-07-03

Family

ID=51806074

Family Applications (1)

Application Number Title Priority Date Filing Date
HK14113026.5A HK1199502A1 (en) 2013-04-30 2014-12-25 Dust-prevention film assembly

Country Status (5)

Country Link
JP (1) JP6004582B2 (en)
KR (2) KR102188973B1 (en)
CN (1) CN104133341A (en)
HK (1) HK1199502A1 (en)
TW (1) TWI572488B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6376601B2 (en) * 2015-05-18 2018-08-22 信越化学工業株式会社 Pellicle support means, pellicle support apparatus and pellicle mounting method using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219023A (en) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd Manufacture of resin membrane
US4861402A (en) 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPS6327707A (en) 1986-07-21 1988-02-05 Matsushita Electric Ind Co Ltd Apparatus for inspecting hyperbolic mirror
JP2945201B2 (en) 1992-01-31 1999-09-06 信越化学工業株式会社 Pellicle
JP3347224B2 (en) * 1994-09-09 2002-11-20 三菱電機株式会社 Pellicle
JPH0922111A (en) * 1995-07-05 1997-01-21 Shin Etsu Chem Co Ltd Pellicle
JP3642145B2 (en) * 1997-02-21 2005-04-27 信越化学工業株式会社 Method for producing pellicle and liner for attaching pellicle to adhesive layer for attaching reticle to reticle
JP4185232B2 (en) 2000-03-08 2008-11-26 信越化学工業株式会社 Pellicle for lithography
JP2005308901A (en) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd Pellicle frame and pellicle for photo lithography using it
JP4358683B2 (en) * 2004-05-31 2009-11-04 信越化学工業株式会社 Pellicle frame and pellicle for photolithography
CN101968606B (en) * 2009-07-27 2013-01-23 北京京东方光电科技有限公司 Masking film substrate and border adhesive solidification system
JP5478463B2 (en) * 2010-11-17 2014-04-23 信越化学工業株式会社 Pellicle for lithography

Also Published As

Publication number Publication date
KR102188973B1 (en) 2020-12-09
CN104133341A (en) 2014-11-05
TWI572488B (en) 2017-03-01
KR20200140766A (en) 2020-12-16
KR102259620B1 (en) 2021-06-02
JP2014215572A (en) 2014-11-17
JP6004582B2 (en) 2016-10-12
TW201501936A (en) 2015-01-16
KR20140130010A (en) 2014-11-07

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