KR102092094B1 - 정전 척 - Google Patents

정전 척 Download PDF

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Publication number
KR102092094B1
KR102092094B1 KR1020130041512A KR20130041512A KR102092094B1 KR 102092094 B1 KR102092094 B1 KR 102092094B1 KR 1020130041512 A KR1020130041512 A KR 1020130041512A KR 20130041512 A KR20130041512 A KR 20130041512A KR 102092094 B1 KR102092094 B1 KR 102092094B1
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KR
South Korea
Prior art keywords
electrostatic chuck
suction
plate
insulator
adhesive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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KR1020130041512A
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English (en)
Korean (ko)
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KR20130121020A (ko
Inventor
노리오 시라이와
지로 가와이
Original Assignee
신꼬오덴기 고교 가부시키가이샤
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Application filed by 신꼬오덴기 고교 가부시키가이샤 filed Critical 신꼬오덴기 고교 가부시키가이샤
Publication of KR20130121020A publication Critical patent/KR20130121020A/ko
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Publication of KR102092094B1 publication Critical patent/KR102092094B1/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
KR1020130041512A 2012-04-26 2013-04-16 정전 척 Active KR102092094B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-100925 2012-04-26
JP2012100925A JP6006972B2 (ja) 2012-04-26 2012-04-26 静電チャック

Publications (2)

Publication Number Publication Date
KR20130121020A KR20130121020A (ko) 2013-11-05
KR102092094B1 true KR102092094B1 (ko) 2020-03-23

Family

ID=49477074

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130041512A Active KR102092094B1 (ko) 2012-04-26 2013-04-16 정전 척

Country Status (4)

Country Link
US (1) US9240340B2 (https=)
JP (1) JP6006972B2 (https=)
KR (1) KR102092094B1 (https=)
TW (1) TWI587441B (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5829509B2 (ja) * 2011-12-20 2015-12-09 東京エレクトロン株式会社 載置台及びプラズマ処理装置
US9101038B2 (en) 2013-12-20 2015-08-04 Lam Research Corporation Electrostatic chuck including declamping electrode and method of declamping
JP5811513B2 (ja) 2014-03-27 2015-11-11 Toto株式会社 静電チャック
JP6219227B2 (ja) * 2014-05-12 2017-10-25 東京エレクトロン株式会社 ヒータ給電機構及びステージの温度制御方法
JP6292977B2 (ja) * 2014-05-22 2018-03-14 新光電気工業株式会社 静電チャック及び半導体・液晶製造装置
JP6308871B2 (ja) 2014-05-28 2018-04-11 新光電気工業株式会社 静電チャック及び半導体・液晶製造装置
JP6433204B2 (ja) * 2014-09-01 2018-12-05 株式会社ディスコ 静電支持プレート及び静電支持プレートの製造方法
US10002782B2 (en) 2014-10-17 2018-06-19 Lam Research Corporation ESC assembly including an electrically conductive gasket for uniform RF power delivery therethrough
JP6572788B2 (ja) * 2016-01-29 2019-09-11 住友大阪セメント株式会社 静電チャック装置
JP6238097B1 (ja) * 2016-07-20 2017-11-29 Toto株式会社 静電チャック
JP6238098B1 (ja) * 2016-07-20 2017-11-29 Toto株式会社 静電チャック
WO2018016587A1 (ja) * 2016-07-20 2018-01-25 Toto株式会社 静電チャック
WO2018016588A1 (ja) * 2016-07-20 2018-01-25 Toto株式会社 静電チャック
US10388558B2 (en) * 2016-12-05 2019-08-20 Tokyo Electron Limited Plasma processing apparatus
JP6758175B2 (ja) * 2016-12-21 2020-09-23 日本特殊陶業株式会社 静電チャック
WO2019146796A1 (ja) * 2018-01-29 2019-08-01 京セラ株式会社 試料保持具
JP7090481B2 (ja) * 2018-06-15 2022-06-24 新光電気工業株式会社 静電チャック及びその製造方法
JP2020061445A (ja) * 2018-10-09 2020-04-16 京セラ株式会社 試料保持具
WO2020111194A1 (ja) * 2018-11-30 2020-06-04 京セラ株式会社 試料保持具
KR102203859B1 (ko) * 2019-05-14 2021-01-15 주식회사 동탄이엔지 절연 저항이 우수한 정전척
JP7586682B2 (ja) * 2020-10-07 2024-11-19 日本特殊陶業株式会社 保持装置
JP7550685B2 (ja) 2021-03-17 2024-09-13 新光電気工業株式会社 静電チャック及び基板固定装置
JP7797762B2 (ja) * 2021-08-25 2026-01-14 新光電気工業株式会社 基板固定装置
JP7554171B2 (ja) * 2021-10-19 2024-09-19 日本碍子株式会社 ウエハ載置台
US20250273498A1 (en) * 2024-02-23 2025-08-28 Applied Materials, Inc. Embedded electrostatic chuck (esc)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000188321A (ja) 1998-12-14 2000-07-04 Applied Materials Inc 静電チャックコネクタとそのコンビネ―ション
JP2003060016A (ja) 2001-07-31 2003-02-28 Applied Materials Inc 電流導入端子及び半導体製造装置
JP2003115529A (ja) 2001-10-05 2003-04-18 Tomoegawa Paper Co Ltd 静電チャック装置、その組立方法および静電チャック装置用部材
JP2011091297A (ja) 2009-10-26 2011-05-06 Shinko Electric Ind Co Ltd 静電チャック

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
JP2003197727A (ja) * 2001-12-21 2003-07-11 Kyocera Corp ウエハ載置ステージ
JP2006344613A (ja) 2003-06-24 2006-12-21 Shin-Etsu Engineering Co Ltd 基板貼り合わせ装置
US8038796B2 (en) 2004-12-30 2011-10-18 Lam Research Corporation Apparatus for spatial and temporal control of temperature on a substrate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000188321A (ja) 1998-12-14 2000-07-04 Applied Materials Inc 静電チャックコネクタとそのコンビネ―ション
JP2003060016A (ja) 2001-07-31 2003-02-28 Applied Materials Inc 電流導入端子及び半導体製造装置
JP2003115529A (ja) 2001-10-05 2003-04-18 Tomoegawa Paper Co Ltd 静電チャック装置、その組立方法および静電チャック装置用部材
JP2011091297A (ja) 2009-10-26 2011-05-06 Shinko Electric Ind Co Ltd 静電チャック

Also Published As

Publication number Publication date
TW201347082A (zh) 2013-11-16
JP6006972B2 (ja) 2016-10-12
TWI587441B (zh) 2017-06-11
US20130286531A1 (en) 2013-10-31
KR20130121020A (ko) 2013-11-05
US9240340B2 (en) 2016-01-19
JP2013229464A (ja) 2013-11-07

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