KR101991618B1 - 복합의 얇은 전착 동박 및 캐리어 - Google Patents
복합의 얇은 전착 동박 및 캐리어 Download PDFInfo
- Publication number
- KR101991618B1 KR101991618B1 KR1020180013094A KR20180013094A KR101991618B1 KR 101991618 B1 KR101991618 B1 KR 101991618B1 KR 1020180013094 A KR1020180013094 A KR 1020180013094A KR 20180013094 A KR20180013094 A KR 20180013094A KR 101991618 B1 KR101991618 B1 KR 101991618B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- copper foil
- nodal
- foil
- electrodeposited copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/448—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications characterised by the additives used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
- C25D1/22—Separating compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/007—Manufacture or processing of a substrate for a printed circuit board supported by a temporary or sacrificial carrier
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/05—Flexible printed circuits [FPCs]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0143—Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Wood Science & Technology (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/422,960 | 2017-02-02 | ||
| US15/422,960 US10057984B1 (en) | 2017-02-02 | 2017-02-02 | Composite thin copper foil and carrier |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20180090207A KR20180090207A (ko) | 2018-08-10 |
| KR101991618B1 true KR101991618B1 (ko) | 2019-06-20 |
Family
ID=62980505
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020180013094A Active KR101991618B1 (ko) | 2017-02-02 | 2018-02-01 | 복합의 얇은 전착 동박 및 캐리어 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10057984B1 (https=) |
| JP (1) | JP6509392B2 (https=) |
| KR (1) | KR101991618B1 (https=) |
| CN (1) | CN108391372B (https=) |
| TW (1) | TWI658926B (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI656682B (zh) * | 2018-10-16 | 2019-04-11 | 長春石油化學股份有限公司 | 電解銅箔、包含其的電極、及包含其的鋰離子電池 |
| US11365486B2 (en) | 2018-10-16 | 2022-06-21 | Chang Chun Petrochemical Co., Ltd. | Electrolytic copper foil, electrode comprising the same, and lithium ion battery comprising the same |
| KR102331091B1 (ko) * | 2019-02-01 | 2021-11-25 | 장 춘 페트로케미컬 컴퍼니 리미티드 | 캐리어가 있는 동박 및 동박적층판 |
| US10581081B1 (en) * | 2019-02-01 | 2020-03-03 | Chang Chun Petrochemical Co., Ltd. | Copper foil for negative electrode current collector of lithium ion secondary battery |
| CN110241422B (zh) * | 2019-05-28 | 2021-03-30 | 电子科技大学 | 一种多层高频印制电路板铜箔表面粗化液及其使用方法 |
| US10697082B1 (en) * | 2019-08-12 | 2020-06-30 | Chang Chun Petrochemical Co., Ltd. | Surface-treated copper foil |
| TWI700393B (zh) | 2019-08-27 | 2020-08-01 | 長春石油化學股份有限公司 | 電解銅箔以及包含其之電極與鋰離子電池 |
| CN111424294A (zh) * | 2020-05-15 | 2020-07-17 | 惠州联合铜箔电子材料有限公司 | 反转铜箔生产工艺 |
| CN112226790B (zh) * | 2020-10-19 | 2022-04-22 | 九江德福科技股份有限公司 | 一种超薄高强度电子铜箔的生产方法 |
| TWI746345B (zh) * | 2021-01-08 | 2021-11-11 | 昂筠國際股份有限公司 | 金屬箔結構及其製造方法 |
| CN113388868A (zh) * | 2021-06-21 | 2021-09-14 | 集美大学 | 一种利用离散铬晶核制备自剥离超薄铜箔的方法 |
| CN114539174B (zh) * | 2022-01-11 | 2023-09-26 | 广东省科学院化工研究所 | 一种粘结增强剂及其制备方法和在pcb内层棕化中的应用 |
| KR102511335B1 (ko) * | 2022-05-09 | 2023-03-17 | 와이엠티 주식회사 | 캐리어 부착 금속박용 복합 이형층 및 이를 포함하는 금속박 |
| CN115087198B (zh) * | 2022-08-11 | 2022-12-20 | 广州方邦电子股份有限公司 | 金属箔的支持体、金属箔及其应用 |
| CN116288161B (zh) * | 2023-03-09 | 2024-10-25 | 珠海凯赛奥表面技术有限公司 | 一种极薄可剥离铜的制备方法 |
| TWI892146B (zh) * | 2023-06-01 | 2025-08-01 | 万閎企業有限公司 | 具超薄銅箔層的銅箔基板的製造方法 |
| CN117661046A (zh) * | 2023-11-30 | 2024-03-08 | 九江德福科技股份有限公司 | 一种具备双面疏松结构的电解铜箔及其制法、用途 |
| CN118685827B (zh) * | 2024-08-23 | 2024-12-13 | 安徽华威铜箔科技有限公司 | 一种一体式载体铜箔生产设备 |
| TWI911988B (zh) * | 2024-11-05 | 2026-01-11 | 南亞塑膠工業股份有限公司 | 複合銅箔及其製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001089892A (ja) | 1999-09-21 | 2001-04-03 | Mitsui Mining & Smelting Co Ltd | キャリア箔付電解銅箔及びその製造方法並びにそのキャリア箔付電解銅箔を用いた銅張積層板 |
| JP2004131836A (ja) | 2002-08-12 | 2004-04-30 | Mitsui Mining & Smelting Co Ltd | キャリア箔付電解銅箔並びにその製造方法及びそのキャリア箔付電解銅箔を用いた銅張積層板 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3998601A (en) * | 1973-12-03 | 1976-12-21 | Yates Industries, Inc. | Thin foil |
| US5262247A (en) | 1989-05-17 | 1993-11-16 | Fukuda Kinzoku Hakufun Kogyo Kabushiki Kaisha | Thin copper foil for printed wiring board |
| JPH0818401B2 (ja) | 1989-05-17 | 1996-02-28 | 福田金属箔粉工業株式会社 | 複合箔とその製法 |
| JP3329572B2 (ja) * | 1994-04-15 | 2002-09-30 | 福田金属箔粉工業株式会社 | 印刷回路用銅箔およびその表面処理方法 |
| US6322904B1 (en) * | 1996-06-17 | 2001-11-27 | Mitsui Mining & Smelting Co., Ltd. | Copper foil for printed circuit boards |
| US6319620B1 (en) | 1998-01-19 | 2001-11-20 | Mitsui Mining & Smelting Co., Ltd. | Making and using an ultra-thin copper foil |
| US6569543B2 (en) | 2001-02-15 | 2003-05-27 | Olin Corporation | Copper foil with low profile bond enahncement |
| US6346335B1 (en) * | 2000-03-10 | 2002-02-12 | Olin Corporation | Copper foil composite including a release layer |
| JP3743702B2 (ja) * | 2000-04-28 | 2006-02-08 | 三井金属鉱業株式会社 | プリント配線板のセミアディティブ製造法 |
| US6660406B2 (en) * | 2000-07-07 | 2003-12-09 | Mitsui Mining & Smelting Co., Ltd. | Method for manufacturing printed wiring board comprising electrodeposited copper foil with carrier and resistor circuit; and printed wiring board comprising resistor circuit |
| US7132158B2 (en) * | 2003-10-22 | 2006-11-07 | Olin Corporation | Support layer for thin copper foil |
| US8866018B2 (en) * | 2009-01-12 | 2014-10-21 | Oak-Mitsui Technologies Llc | Passive electrical devices and methods of fabricating passive electrical devices |
| JP5448616B2 (ja) * | 2009-07-14 | 2014-03-19 | 古河電気工業株式会社 | 抵抗層付銅箔、該銅箔の製造方法および積層基板 |
| CN103154327A (zh) * | 2010-10-06 | 2013-06-12 | 古河电气工业株式会社 | 铜箔及其制备方法、带有载体的铜箔及其制备方法、印刷电路板、多层印刷电路板 |
| JP5875350B2 (ja) * | 2011-11-30 | 2016-03-02 | 三井金属鉱業株式会社 | 電解銅合金箔及びキャリア箔付電解銅合金箔 |
| CN104203567B (zh) * | 2012-02-01 | 2016-11-23 | 昭和电工包装株式会社 | 成型用包装材及其制造方法 |
| KR101909352B1 (ko) * | 2013-07-24 | 2018-10-17 | 제이엑스금속주식회사 | 표면 처리 동박, 캐리어가 부착된 동박, 기재, 수지 기재, 프린트 배선판, 구리 피복 적층판 및 프린트 배선판의 제조 방법 |
| JP6190500B2 (ja) * | 2015-08-06 | 2017-08-30 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| CN105357868A (zh) * | 2015-11-19 | 2016-02-24 | 吴祖 | 双面线路板及加工方法 |
-
2017
- 2017-02-02 US US15/422,960 patent/US10057984B1/en active Active
-
2018
- 2018-01-26 TW TW107102898A patent/TWI658926B/zh active
- 2018-02-01 KR KR1020180013094A patent/KR101991618B1/ko active Active
- 2018-02-01 CN CN201810100850.7A patent/CN108391372B/zh active Active
- 2018-02-02 JP JP2018017060A patent/JP6509392B2/ja active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001089892A (ja) | 1999-09-21 | 2001-04-03 | Mitsui Mining & Smelting Co Ltd | キャリア箔付電解銅箔及びその製造方法並びにそのキャリア箔付電解銅箔を用いた銅張積層板 |
| JP2004131836A (ja) | 2002-08-12 | 2004-04-30 | Mitsui Mining & Smelting Co Ltd | キャリア箔付電解銅箔並びにその製造方法及びそのキャリア箔付電解銅箔を用いた銅張積層板 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180090207A (ko) | 2018-08-10 |
| JP6509392B2 (ja) | 2019-05-08 |
| CN108391372A (zh) | 2018-08-10 |
| US20180220531A1 (en) | 2018-08-02 |
| US10057984B1 (en) | 2018-08-21 |
| TWI658926B (zh) | 2019-05-11 |
| JP2018123430A (ja) | 2018-08-09 |
| TW201829183A (zh) | 2018-08-16 |
| CN108391372B (zh) | 2020-09-18 |
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