KR101982922B1 - 비접촉형 회로 패턴 검사 수복 장치 - Google Patents

비접촉형 회로 패턴 검사 수복 장치 Download PDF

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Publication number
KR101982922B1
KR101982922B1 KR1020170083515A KR20170083515A KR101982922B1 KR 101982922 B1 KR101982922 B1 KR 101982922B1 KR 1020170083515 A KR1020170083515 A KR 1020170083515A KR 20170083515 A KR20170083515 A KR 20170083515A KR 101982922 B1 KR101982922 B1 KR 101982922B1
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KR
South Korea
Prior art keywords
inspection
defect
unit
substrate
restoration
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KR1020170083515A
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English (en)
Korean (ko)
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KR20180003477A (ko
Inventor
히로시 하모리
아쯔시 우에다
Original Assignee
오에이치티 가부시끼가이샤
브이 테크놀로지 씨오. 엘티디
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Publication of KR20180003477A publication Critical patent/KR20180003477A/ko
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Publication of KR101982922B1 publication Critical patent/KR101982922B1/ko

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    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Signal Processing (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1020170083515A 2016-06-30 2017-06-30 비접촉형 회로 패턴 검사 수복 장치 KR101982922B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016130683 2016-06-30
JPJP-P-2016-130683 2016-06-30
JPJP-P-2017-112827 2017-06-07
JP2017112827A JP6476234B2 (ja) 2016-06-30 2017-06-07 非接触型回路パターン検査修復装置

Publications (2)

Publication Number Publication Date
KR20180003477A KR20180003477A (ko) 2018-01-09
KR101982922B1 true KR101982922B1 (ko) 2019-05-27

Family

ID=60995485

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170083515A KR101982922B1 (ko) 2016-06-30 2017-06-30 비접촉형 회로 패턴 검사 수복 장치

Country Status (3)

Country Link
JP (1) JP6476234B2 (ja)
KR (1) KR101982922B1 (ja)
TW (1) TWI651796B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020059014A1 (ja) * 2018-09-18 2020-03-26 国立大学法人東北大学 容量検出エリアセンサ及び、その容量検出エリアセンサを有する導電パターン検査装置
CN109725228A (zh) * 2018-12-24 2019-05-07 安徽省大富光电科技有限公司 一种柔性电路板导电图形在线监测装置
CN111261078A (zh) * 2020-03-24 2020-06-09 深圳市华星光电半导体显示技术有限公司 显示面板的检测方法及检测装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006284545A (ja) * 2005-04-04 2006-10-19 Quanta Display Inc 回路欠陥検査補修装置及び方法
JP2008014918A (ja) * 2006-06-30 2008-01-24 Oht Inc 回路パターン検査装置及び回路パターン検査方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101013243B1 (ko) * 2002-11-30 2011-02-09 오에이치티 가부시끼가이샤 회로 패턴 검사 장치 및 회로 패턴 검사 방법
CN101461063B (zh) * 2006-08-01 2011-12-28 株式会社岛津制作所 基板检查及修正装置、以及基板评估系统
US8439717B2 (en) * 2009-06-29 2013-05-14 Sharp Kabushiki Kaisha Device and method for manufacturing active matrix substrate, and device and method for manufacturing display panel

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006284545A (ja) * 2005-04-04 2006-10-19 Quanta Display Inc 回路欠陥検査補修装置及び方法
JP2008014918A (ja) * 2006-06-30 2008-01-24 Oht Inc 回路パターン検査装置及び回路パターン検査方法

Also Published As

Publication number Publication date
JP2018009976A (ja) 2018-01-18
KR20180003477A (ko) 2018-01-09
TW201812969A (zh) 2018-04-01
TWI651796B (zh) 2019-02-21
JP6476234B2 (ja) 2019-02-27

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