KR101982554B1 - 싸이올 화합물, 싸이올 화합물의 제조 방법, 폴리머, 조성물, 경화성 조성물, 착색 조성물, 경화막 및 컬러 필터 - Google Patents

싸이올 화합물, 싸이올 화합물의 제조 방법, 폴리머, 조성물, 경화성 조성물, 착색 조성물, 경화막 및 컬러 필터 Download PDF

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KR101982554B1
KR101982554B1 KR1020177004305A KR20177004305A KR101982554B1 KR 101982554 B1 KR101982554 B1 KR 101982554B1 KR 1020177004305 A KR1020177004305 A KR 1020177004305A KR 20177004305 A KR20177004305 A KR 20177004305A KR 101982554 B1 KR101982554 B1 KR 101982554B1
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South Korea
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group
compound
atom
thiol
composition
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KR1020177004305A
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Korean (ko)
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KR20170032410A (ko
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마사유키 하라다
수구루 사메지마
유시 카네코
히로아키 이데이
준이치 이토
아키히로 하라
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후지필름 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/02—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of thiols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C07D251/40—Nitrogen atoms
    • C07D251/54—Three nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C07D251/40—Nitrogen atoms
    • C07D251/54—Three nitrogen atoms
    • C07D251/70—Other substituted melamines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/10—Oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Optical Filters (AREA)
  • Saccharide Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
KR1020177004305A 2014-09-30 2015-09-03 싸이올 화합물, 싸이올 화합물의 제조 방법, 폴리머, 조성물, 경화성 조성물, 착색 조성물, 경화막 및 컬러 필터 KR101982554B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2014199881 2014-09-30
JPJP-P-2014-199881 2014-09-30
JPJP-P-2015-063761 2015-03-26
JP2015063761 2015-03-26
PCT/JP2015/075048 WO2016052069A1 (ja) 2014-09-30 2015-09-03 チオール化合物、チオール化合物の製造方法、ポリマー、組成物、硬化性組成物、着色組成物、硬化膜およびカラーフィルタ

Publications (2)

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KR20170032410A KR20170032410A (ko) 2017-03-22
KR101982554B1 true KR101982554B1 (ko) 2019-05-27

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JP (1) JP6374014B2 (ja)
KR (1) KR101982554B1 (ja)
CN (1) CN106573885B (ja)
TW (1) TWI660937B (ja)
WO (1) WO2016052069A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6764467B2 (ja) * 2016-03-17 2020-09-30 富士フイルム株式会社 多官能チオール化合物の製造方法、多官能チオール化合物、硬化性組成物および硬化性組成物の製造方法
JP6764479B2 (ja) * 2016-07-29 2020-09-30 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
CN110268328B (zh) * 2017-03-31 2022-02-08 东友精细化工有限公司 蓝色感光性树脂组合物、利用该组合物制造的滤色器及图像显示装置
KR101840335B1 (ko) 2017-06-19 2018-03-20 한국화학연구원 신규한 화합물 및 이의 용도
JP7016891B2 (ja) * 2017-12-27 2022-02-07 富士フイルム株式会社 組成物、膜、カラーフィルタ、固体撮像素子、画像表示装置および化合物の製造方法
JP7415342B2 (ja) * 2019-06-25 2024-01-17 東洋インキＳｃホールディングス株式会社 感光性着色組成物、並びにこれを用いたカラーフィルタ、液晶表示装置
US11780940B2 (en) * 2020-06-29 2023-10-10 Baker Hughes Oilfield Operations Llc Hydrate inhibitors
JP2023166744A (ja) * 2022-05-10 2023-11-22 四国化成工業株式会社 チオール化合物及びその用途

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100875957B1 (ko) * 2007-12-28 2008-12-26 제일모직주식회사 압출 성형성이 향상된 내화학성 내충격성 열가소성 수지조성물

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2411954A (en) * 1944-01-25 1946-12-03 Du Pont Treatment of polyunsaturated esters with polythiols and products produced thereby
FR2550213B1 (fr) * 1983-08-02 1986-12-26 Elf Aquitaine Procede de stabilisation thermique de polymeres halogeno-vinyliques et resines ainsi stabilisees
US4594193A (en) * 1984-09-26 1986-06-10 Research Corporation Thiol based lipids and membranes made therefrom
JPH0714978B2 (ja) * 1987-09-24 1995-02-22 出光石油化学株式会社 スチレン系重合体及びその製造方法
DE3837569A1 (de) * 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
IL98824A (en) * 1991-07-14 1995-03-15 Technion Res & Dev Foundation History of tricyclocynazoline
DK2093245T3 (da) * 1999-08-27 2012-06-04 Angiodevice Internat Gmbh Biocompatible polymer device
JP4007125B2 (ja) * 2002-08-30 2007-11-14 コニカミノルタホールディングス株式会社 トナー及び画像形成方法
JP5497133B2 (ja) 2006-03-17 2014-05-21 富士フイルム株式会社 顔料分散組成物、光硬化性組成物、並びに、カラーフィルタおよびその製造方法
JP5171005B2 (ja) 2006-03-17 2013-03-27 富士フイルム株式会社 高分子化合物およびその製造方法、並びに顔料分散剤
WO2009129221A1 (en) 2008-04-15 2009-10-22 Indiana University Research And Technology Corporation Polyfunctional compounds and glass-ionomer cement compositions and methods for using as implant materials
KR101039443B1 (ko) * 2009-04-22 2011-06-08 한국화학연구원 위치 선택적인 설파이드를 곁가지에 포함하는 트리페닐렌계 반응성 메조겐의 제조방법
KR101043634B1 (ko) * 2009-04-22 2011-06-24 한국화학연구원 곁가지에 설파이드를 포함하는 트리페닐렌계 반응성 메조겐 화합물의 합성
EP2586826B1 (en) * 2010-06-23 2015-11-25 Nippon Kasei Chemical Company Limited Inorganic-organic hybrid material, optical material using same, and inorganic-organic composite composition
JP5881471B2 (ja) * 2012-03-01 2016-03-09 株式会社イノアック技術研究所 透明エラストマー
CN103242490B (zh) * 2013-05-03 2015-06-17 张家港市黎明化工有限公司 基于巯基-双键反应的丙烯酸酯/蒙脱土复合材料及制法
JP6162165B2 (ja) * 2014-03-31 2017-07-12 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、有機エレクトロルミネッセンス素子、色素および色素の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100875957B1 (ko) * 2007-12-28 2008-12-26 제일모직주식회사 압출 성형성이 향상된 내화학성 내충격성 열가소성 수지조성물

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Applied Materials & Interfaces, Vol.3, pp.2118-2129, 2011*
Macromolecules, Vol.42, pp.7353-7359, 2009*

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JPWO2016052069A1 (ja) 2017-08-31
WO2016052069A1 (ja) 2016-04-07
CN106573885B (zh) 2020-06-02
JP6374014B2 (ja) 2018-08-15
TWI660937B (zh) 2019-06-01
CN106573885A (zh) 2017-04-19
TW201612156A (en) 2016-04-01
KR20170032410A (ko) 2017-03-22

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