KR101932769B1 - 염 및 착색 경화성 조성물 - Google Patents

염 및 착색 경화성 조성물 Download PDF

Info

Publication number
KR101932769B1
KR101932769B1 KR1020120066701A KR20120066701A KR101932769B1 KR 101932769 B1 KR101932769 B1 KR 101932769B1 KR 1020120066701 A KR1020120066701 A KR 1020120066701A KR 20120066701 A KR20120066701 A KR 20120066701A KR 101932769 B1 KR101932769 B1 KR 101932769B1
Authority
KR
South Korea
Prior art keywords
parts
formula
group
salt
meth
Prior art date
Application number
KR1020120066701A
Other languages
English (en)
Korean (ko)
Other versions
KR20130001146A (ko
Inventor
유지 아키야마
상동 김
데츠오 아카사카
소연 박
Original Assignee
스미또모 가가꾸 가부시끼가이샤
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미또모 가가꾸 가부시끼가이샤, 동우 화인켐 주식회사 filed Critical 스미또모 가가꾸 가부시끼가이샤
Publication of KR20130001146A publication Critical patent/KR20130001146A/ko
Application granted granted Critical
Publication of KR101932769B1 publication Critical patent/KR101932769B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
    • C07C311/02—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C311/09—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton the carbon skeleton being further substituted by at least two halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D285/00—Heterocyclic compounds containing rings having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by groups C07D275/00 - C07D283/00
    • C07D285/15—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B49/00—Sulfur dyes
    • C09B49/12—Sulfur dyes from other compounds, e.g. other heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00—Liquid crystal materials
    • C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/58—Dopants or charge transfer agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Pyrane Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
KR1020120066701A 2011-06-24 2012-06-21 염 및 착색 경화성 조성물 KR101932769B1 (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2011140335 2011-06-24
JPJP-P-2011-140335 2011-06-24
JPJP-P-2011-162918 2011-07-26
JP2011162918 2011-07-26
JPJP-P-2011-169888 2011-08-03
JP2011169888 2011-08-03
JPJP-P-2011-195701 2011-09-08
JP2011195701 2011-09-08

Publications (2)

Publication Number Publication Date
KR20130001146A KR20130001146A (ko) 2013-01-03
KR101932769B1 true KR101932769B1 (ko) 2018-12-27

Family

ID=47366338

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120066701A KR101932769B1 (ko) 2011-06-24 2012-06-21 염 및 착색 경화성 조성물

Country Status (4)

Country Link
JP (1) JP5993626B2 (ja)
KR (1) KR101932769B1 (ja)
CN (1) CN102838578B (ja)
TW (1) TWI534209B (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5807568B2 (ja) * 2011-02-14 2015-11-10 住友化学株式会社 着色感光性樹脂組成物及び化合物
KR101992867B1 (ko) * 2013-03-29 2019-06-25 동우 화인켐 주식회사 착색 감광성 수지 조성물
CN105264442B (zh) * 2013-06-07 2020-12-22 东友精细化工有限公司 着色固化性树脂组合物
JP6152074B2 (ja) 2013-07-05 2017-06-21 富士フイルム株式会社 色素多量体、着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP6453493B2 (ja) * 2013-07-09 2019-01-16 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置
JP6333604B2 (ja) 2013-07-09 2018-05-30 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置
JP6018984B2 (ja) 2013-07-31 2016-11-02 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP6496350B2 (ja) * 2013-09-06 2019-04-03 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素
CN104516200B (zh) * 2013-10-07 2019-10-18 东友精细化工有限公司 着色固化性树脂组合物
TW201525077A (zh) * 2013-12-19 2015-07-01 Fujifilm Corp 著色組成物、著色組成物的製造方法、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及液晶顯示裝置
TWI705109B (zh) * 2014-11-11 2020-09-21 日商住友化學股份有限公司 著色硬化性樹脂組合物
CN111218126A (zh) * 2014-12-18 2020-06-02 富士胶片和光纯药株式会社 消光剂、化合物以及聚合物
KR101856051B1 (ko) * 2015-10-14 2018-05-09 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
JP6722442B2 (ja) * 2015-12-21 2020-07-15 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 化合物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
JP6889543B2 (ja) * 2016-01-14 2021-06-18 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 染料溶解液の製造方法
KR102378450B1 (ko) * 2016-03-31 2022-03-23 스미또모 가가꾸 가부시끼가이샤 착색 경화성 수지 조성물
US11576352B2 (en) 2019-11-21 2023-02-14 Lg Electronics Inc. Treadmill having sterilizer
US11559041B2 (en) 2019-11-22 2023-01-24 Lg Electronics Inc. Treadmill having sensors
US11565146B2 (en) 2019-11-21 2023-01-31 Lg Electronics Inc. Treadmill having adjustable inclination
US11576351B2 (en) 2019-11-21 2023-02-14 Lg Electronics Inc. Treadmill

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007503477A (ja) * 2003-08-21 2007-02-22 メルク　パテント　ゲゼルシャフト　ミット　ベシュレンクテル　ハフトング シアノホウ酸塩、フルオロアルキルリン酸塩、フルオロアルキルホウ酸塩またはイミド染料

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4876166A (en) * 1988-05-19 1989-10-24 Eastman Kodak Company Color filter array
JPH05271559A (ja) * 1992-03-26 1993-10-19 Taoka Chem Co Ltd ローダミン染料の製造方法
US5256799A (en) * 1992-07-14 1993-10-26 The United States Of Americas As Represented By The United States Department Of Energy Preparation of 6-hydroxyindolines and their use for preparation of novel laser dyes
US5283336A (en) * 1992-09-08 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Method for preparation of 7-hydroxy-1,2,3,4-tetrahydroquinoline from 1,2,3,4-tetrahydroquinoline
US5554664A (en) * 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
JP2000044824A (ja) * 1998-07-28 2000-02-15 Idemitsu Kosan Co Ltd 色変換膜及び有機エレクトロルミネッセンス素子
US20030096192A1 (en) * 2001-03-28 2003-05-22 Horst Berneth Optical data carrier comprising a xanthene dye as light-absorbent compound in the information layer
CN1653532A (zh) * 2002-05-17 2005-08-10 西巴特殊化学品控股有限公司 高性能光学存储介质
JP2004085657A (ja) * 2002-08-23 2004-03-18 Toray Ind Inc ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法
US6998493B2 (en) * 2003-06-26 2006-02-14 Xerox Corporation Colorant compounds
US7939644B2 (en) * 2003-08-21 2011-05-10 Merck Patent Gmbh Cyanoborate, fluoroalkylphosphate, fluoroalkylborate or imide dyes
JP4731923B2 (ja) * 2004-02-13 2011-07-27 キヤノン株式会社 新規な色素化合物、インク、インクタンク、記録ユニット、記録装置及び記録方法
JP2005309408A (ja) * 2004-03-23 2005-11-04 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2006089724A (ja) * 2004-08-25 2006-04-06 Idemitsu Kosan Co Ltd 赤色変換材料組成物及び赤色変換膜
JP4858758B2 (ja) * 2006-02-09 2012-01-18 山田化学工業株式会社 ローダミン系化合物
WO2008040648A1 (en) * 2006-10-04 2008-04-10 Ciba Holding Inc. Sulphonium salt photoinitiators
JP2008242311A (ja) * 2007-03-28 2008-10-09 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
CN101482699B (zh) * 2007-12-14 2015-07-01 住友化学株式会社 着色感光性树脂组合物
JP5428223B2 (ja) * 2008-07-08 2014-02-26 山田化学工業株式会社 金属錯体色素及びディスプレイ用フィルタ
TW201035677A (en) * 2008-12-09 2010-10-01 Sumitomo Chemical Co Colored photosensitive resin composition
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
TW201036941A (en) * 2009-03-30 2010-10-16 Sumitomo Chemical Co Method for producing sulfonamide compound
TW201113303A (en) * 2009-10-07 2011-04-16 Sumitomo Chemical Co Colored photosensitive resin compositions
CN102472851A (zh) * 2010-06-15 2012-05-23 日本化药株式会社 着色树脂组合物、着色固化膜、滤色器、显示装置和固态图像传感器
SG178427A1 (en) * 2010-06-15 2012-03-29 Nippon Kayaku Kk Colored resin composition
JP5772263B2 (ja) * 2010-07-30 2015-09-02 Jsr株式会社 着色組成物、カラーフィルタ及び表示素子
JPWO2012023474A1 (ja) * 2010-08-20 2013-10-28 Jsr株式会社 着色剤、着色組成物、カラーフィルタ及び表示素子
JP6019580B2 (ja) * 2011-01-19 2016-11-02 住友化学株式会社 塩
TWI524143B (zh) * 2011-04-18 2016-03-01 Sumitomo Chemical Co Coloring hardening resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007503477A (ja) * 2003-08-21 2007-02-22 メルク　パテント　ゲゼルシャフト　ミット　ベシュレンクテル　ハフトング シアノホウ酸塩、フルオロアルキルリン酸塩、フルオロアルキルホウ酸塩またはイミド染料

Also Published As

Publication number Publication date
TWI534209B (zh) 2016-05-21
KR20130001146A (ko) 2013-01-03
TW201311831A (zh) 2013-03-16
CN102838578A (zh) 2012-12-26
JP2013067776A (ja) 2013-04-18
JP5993626B2 (ja) 2016-09-14
CN102838578B (zh) 2016-03-16

Similar Documents

Publication Publication Date Title
KR101932769B1 (ko) 염 및 착색 경화성 조성물
KR101669727B1 (ko) 착색 경화성 수지 조성물
KR102282903B1 (ko) 착색 조성물
KR101995094B1 (ko) 착색 감광성 수지 조성물
KR101910520B1 (ko) 착색 감광성 수지 조성물
KR101849456B1 (ko) 착색 경화성 수지 조성물
TWI544035B (zh) 著色硬化性樹脂組合物
KR101961637B1 (ko) 착색 경화성 수지 조성물
KR101734978B1 (ko) 착색 감광성 수지 조성물
KR102403575B1 (ko) 착색 경화성 수지 조성물, 상기 착색 경화성 수지 조성물로 형성되는 컬러 필터 및 표시 장치
KR102062295B1 (ko) 적색 착색 경화성 수지 조성물
KR20140026284A (ko) 색소용 화합물
KR101910521B1 (ko) 착색 감광성 수지 조성물
KR101950514B1 (ko) 착색 감광성 수지 조성물
KR20130051417A (ko) 착색 감광성 수지 조성물
KR20160015251A (ko) 화합물 및 착색 경화성 수지 조성물
KR102003237B1 (ko) 착색 감광성 수지 조성물
KR20190022323A (ko) 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
KR101766745B1 (ko) 착색 감광성 수지 조성물 및 화합물
KR102023779B1 (ko) 착색 경화성 수지 조성물
KR20130038172A (ko) 착색 감광성 수지 조성물
KR20120102530A (ko) 착색 감광성 수지 조성물
KR20180022617A (ko) 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
KR101632461B1 (ko) 착색 경화성 수지 조성물
KR20160016799A (ko) 착색 경화성 수지 조성물

Legal Events

Date Code Title Description
N231 Notification of change of applicant
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant