KR101809073B1 - 근적외광 흡수층 형성재료 및 적층막 - Google Patents

근적외광 흡수층 형성재료 및 적층막 Download PDF

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Publication number
KR101809073B1
KR101809073B1 KR1020110037715A KR20110037715A KR101809073B1 KR 101809073 B1 KR101809073 B1 KR 101809073B1 KR 1020110037715 A KR1020110037715 A KR 1020110037715A KR 20110037715 A KR20110037715 A KR 20110037715A KR 101809073 B1 KR101809073 B1 KR 101809073B1
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KR
South Korea
Prior art keywords
layer
polymer
nir
independently
absorbing
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KR1020110037715A
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English (en)
Korean (ko)
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KR20110118102A (ko
Inventor
세이이치로 타치바나
마사키 오하시
카즈미 노다
쇼조 시라이
타케시 킨쇼
우송 황
다리오 엘. 골드파브
와이킨 리
마틴 글로데
Original Assignee
신에쓰 가가꾸 고교 가부시끼가이샤
인터내셔날 비즈니스 머신 코포레이션
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Publication of KR20110118102A publication Critical patent/KR20110118102A/ko
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Publication of KR101809073B1 publication Critical patent/KR101809073B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020110037715A 2010-04-22 2011-04-22 근적외광 흡수층 형성재료 및 적층막 KR101809073B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010098453 2010-04-22
JPJP-P-2010-098453 2010-04-22
JP2011047254A JP5768410B2 (ja) 2010-04-22 2011-03-04 近赤外光吸収膜形成材料及び積層膜
JPJP-P-2011-047254 2011-03-04

Publications (2)

Publication Number Publication Date
KR20110118102A KR20110118102A (ko) 2011-10-28
KR101809073B1 true KR101809073B1 (ko) 2017-12-14

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ID=44816091

Family Applications (1)

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KR1020110037715A KR101809073B1 (ko) 2010-04-22 2011-04-22 근적외광 흡수층 형성재료 및 적층막

Country Status (4)

Country Link
US (1) US20110262863A1 (zh)
JP (1) JP5768410B2 (zh)
KR (1) KR101809073B1 (zh)
TW (1) TWI477529B (zh)

Cited By (2)

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Publication number Priority date Publication date Assignee Title
US11561331B2 (en) 2019-09-10 2023-01-24 Samsung Electronics Co., Ltd. Combination structures and optical filters and image sensors and camera modules and electronic devices
US11569284B2 (en) 2019-09-03 2023-01-31 Samsung Electronics Co., Ltd. Combination structures and optical filters and image sensors and camera modules and electronic devices

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US20130157463A1 (en) * 2011-12-14 2013-06-20 Shin-Etsu Chemical Co., Ltd. Near-infrared absorbing film composition for lithographic application
WO2013172145A1 (ja) * 2012-05-15 2013-11-21 株式会社Adeka 光硬化性樹脂組成物
JP6477270B2 (ja) * 2015-06-09 2019-03-06 信越化学工業株式会社 パターン形成方法
JP6783435B2 (ja) * 2015-10-01 2020-11-11 トルンプ フォトニック コンポーネンツ ゲーエムベーハー 発光デバイス
JP7434773B2 (ja) * 2019-09-17 2024-02-21 Ｔｏｐｐａｎホールディングス株式会社 赤外光カットフィルター、固体撮像素子用フィルター、固体撮像素子、および、固体撮像素子用フィルターの製造方法
JP7434772B2 (ja) * 2019-09-17 2024-02-21 Ｔｏｐｐａｎホールディングス株式会社 赤外光カットフィルター、固体撮像素子用フィルター、固体撮像素子、および、固体撮像素子用フィルターの製造方法
JP7459468B2 (ja) * 2019-09-17 2024-04-02 Ｔｏｐｐａｎホールディングス株式会社 赤外光カットフィルター、固体撮像素子用フィルター、固体撮像素子、および、固体撮像素子用フィルターの製造方法
JP7404728B2 (ja) * 2019-09-17 2023-12-26 Ｔｏｐｐａｎホールディングス株式会社 赤外光カットフィルター、固体撮像素子用フィルター、固体撮像素子、および、固体撮像素子用フィルターの製造方法
TW202113024A (zh) * 2019-09-17 2021-04-01 日商凸版印刷股份有限公司 紅外光截止濾光片、固態攝影元件用濾光片、固態攝影元件、及固態攝影元件用濾光片之製造方法
JP2022100141A (ja) * 2020-12-23 2022-07-05 凸版印刷株式会社 着色樹脂組成物、光学フィルター、および、光学フィルターの製造方法

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US20090208865A1 (en) * 2008-02-19 2009-08-20 International Business Machines Corporation Photolithography focus improvement by reduction of autofocus radiation transmission into substrate

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GB8720417D0 (en) * 1987-08-28 1987-10-07 Minnesota Mining & Mfg Recording medium for optical data storage
JPH07146551A (ja) * 1991-10-31 1995-06-06 Sony Corp フォトレジスト組成物及びフォトレジストの露光方法
TWI317365B (en) * 2002-07-31 2009-11-21 Jsr Corp Acenaphthylene derivative, polymer, and antireflection film-forming composition
JP4433933B2 (ja) * 2004-08-13 2010-03-17 Ｊｓｒ株式会社 感放射線性組成物およびハードマスク形成材料
JP4086871B2 (ja) * 2004-11-18 2008-05-14 日立マクセル株式会社 近赤外線遮蔽体及びディスプレイ用前面板
KR100938065B1 (ko) * 2005-03-11 2010-01-21 신에쓰 가가꾸 고교 가부시끼가이샤 포토레지스트 하층막 형성 재료 및 패턴 형성 방법
JP4575220B2 (ja) * 2005-04-14 2010-11-04 信越化学工業株式会社 レジスト下層膜材料およびパターン形成方法
JP4666166B2 (ja) * 2005-11-28 2011-04-06 信越化学工業株式会社 レジスト下層膜材料及びパターン形成方法
JP4809376B2 (ja) * 2007-03-09 2011-11-09 信越化学工業株式会社 反射防止膜材料およびこれを用いたパターン形成方法
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JP5417994B2 (ja) * 2008-07-17 2014-02-19 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
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JP2005015532A (ja) * 2003-06-23 2005-01-20 Jsr Corp 重合体および反射防止膜形成組成物
US20090208865A1 (en) * 2008-02-19 2009-08-20 International Business Machines Corporation Photolithography focus improvement by reduction of autofocus radiation transmission into substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11569284B2 (en) 2019-09-03 2023-01-31 Samsung Electronics Co., Ltd. Combination structures and optical filters and image sensors and camera modules and electronic devices
US11561331B2 (en) 2019-09-10 2023-01-24 Samsung Electronics Co., Ltd. Combination structures and optical filters and image sensors and camera modules and electronic devices

Also Published As

Publication number Publication date
KR20110118102A (ko) 2011-10-28
TW201211098A (en) 2012-03-16
JP2011242751A (ja) 2011-12-01
TWI477529B (zh) 2015-03-21
JP5768410B2 (ja) 2015-08-26
US20110262863A1 (en) 2011-10-27

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