KR101764444B1 - 모듈식 반도체 처리 시스템 - Google Patents

모듈식 반도체 처리 시스템 Download PDF

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KR101764444B1
KR101764444B1 KR1020120104952A KR20120104952A KR101764444B1 KR 101764444 B1 KR101764444 B1 KR 101764444B1 KR 1020120104952 A KR1020120104952 A KR 1020120104952A KR 20120104952 A KR20120104952 A KR 20120104952A KR 101764444 B1 KR101764444 B1 KR 101764444B1
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substrate
processing unit
processing
reactor
substrates
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KR20130035198A (ko
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테오도루스 지.엠. 우스테르라켄
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에이에스엠 인터내셔널 엔.브이.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020120104952A 2011-09-29 2012-09-21 모듈식 반도체 처리 시스템 Active KR101764444B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/248,468 2011-09-29
US13/248,468 US9048271B2 (en) 2011-09-29 2011-09-29 Modular semiconductor processing system

Publications (2)

Publication Number Publication Date
KR20130035198A KR20130035198A (ko) 2013-04-08
KR101764444B1 true KR101764444B1 (ko) 2017-08-02

Family

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KR1020120104952A Active KR101764444B1 (ko) 2011-09-29 2012-09-21 모듈식 반도체 처리 시스템

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Country Link
US (1) US9048271B2 (enExample)
JP (1) JP6306813B2 (enExample)
KR (1) KR101764444B1 (enExample)

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JP5617708B2 (ja) * 2011-03-16 2014-11-05 東京エレクトロン株式会社 蓋体開閉装置
WO2014088414A1 (en) * 2012-12-03 2014-06-12 Asm Ip Holding B.V. Modular vertical furnace processing system
US9818633B2 (en) * 2014-10-17 2017-11-14 Lam Research Corporation Equipment front end module for transferring wafers and method of transferring wafers
US10515834B2 (en) 2015-10-12 2019-12-24 Lam Research Corporation Multi-station tool with wafer transfer microclimate systems
US10566216B2 (en) 2017-06-09 2020-02-18 Lam Research Corporation Equipment front end module gas recirculation
US10651066B2 (en) * 2017-11-24 2020-05-12 Taiwan Semiconductor Manufacturing Co., Ltd. Metrology method in wafer transportation
US11049740B1 (en) 2019-12-05 2021-06-29 Applied Materials, Inc. Reconfigurable mainframe with replaceable interface plate
CN117174604A (zh) * 2022-05-27 2023-12-05 弘塑科技股份有限公司 整合式晶圆解键合与清洗设备及解键合与清洗方法
TWI809901B (zh) 2022-05-27 2023-07-21 弘塑科技股份有限公司 整合式晶圓解鍵合與清洗設備及解鍵合與清洗方法

Citations (3)

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JP2002246439A (ja) * 2001-02-20 2002-08-30 Tokyo Electron Ltd 被処理体の搬出入装置と処理システム
JP3453223B2 (ja) * 1994-08-19 2003-10-06 東京エレクトロン株式会社 処理装置
JP4385954B2 (ja) * 2005-01-25 2009-12-16 株式会社Ｉｈｉ ワーク搬送システムおよびワーク搬送装置

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JPH06105742B2 (ja) * 1983-11-28 1994-12-21 株式会社日立製作所 真空処理方法及び装置
US4824209A (en) 1988-03-30 1989-04-25 Albany International Corporation Light source assembly
KR0153250B1 (ko) 1990-06-28 1998-12-01 카자마 겐쥬 종형 열처리 장치
US5387265A (en) 1991-10-29 1995-02-07 Kokusai Electric Co., Ltd. Semiconductor wafer reaction furnace with wafer transfer means
NL9200446A (nl) 1992-03-10 1993-10-01 Tempress B V Inrichting voor het behandelen van microschakeling-schijven (wafers).
JP3258748B2 (ja) 1993-02-08 2002-02-18 東京エレクトロン株式会社 熱処理装置
JP3965343B2 (ja) * 1994-08-19 2007-08-29 東京エレクトロン株式会社 処理装置
US6176667B1 (en) * 1996-04-30 2001-01-23 Applied Materials, Inc. Multideck wafer processing system
US5820366A (en) 1996-07-10 1998-10-13 Eaton Corporation Dual vertical thermal processing furnace
NL1008143C2 (nl) 1998-01-27 1999-07-28 Asm Int Stelsel voor het behandelen van wafers.
JP2001023872A (ja) * 1999-07-09 2001-01-26 Hitachi Ltd 半導体基板処理装置
JP2001351963A (ja) * 2000-06-09 2001-12-21 Hitachi Kokusai Electric Inc 基板処理装置
US6630053B2 (en) * 2000-08-22 2003-10-07 Asm Japan K.K. Semiconductor processing module and apparatus
JP2003077974A (ja) * 2001-08-31 2003-03-14 Hitachi Kokusai Electric Inc 基板処理装置および半導体装置の製造方法
JP2003142360A (ja) * 2001-11-02 2003-05-16 Daikin Ind Ltd 半導体装置の製造装置
US6732006B2 (en) * 2002-02-06 2004-05-04 Asm International Nv Method and system to process semiconductor wafers
US7351291B2 (en) * 2002-02-20 2008-04-01 Tokyo Electron Limited Semiconductor processing system
US6934606B1 (en) * 2003-06-20 2005-08-23 Novellus Systems, Inc. Automatic calibration of a wafer-handling robot
US20050223837A1 (en) * 2003-11-10 2005-10-13 Blueshift Technologies, Inc. Methods and systems for driving robotic components of a semiconductor handling system
JP4376072B2 (ja) 2004-01-16 2009-12-02 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP2006278619A (ja) * 2005-03-29 2006-10-12 Hitachi Kokusai Electric Inc 半導体製造装置
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US7833351B2 (en) * 2006-06-26 2010-11-16 Applied Materials, Inc. Batch processing platform for ALD and CVD
US7690881B2 (en) * 2006-08-30 2010-04-06 Asm Japan K.K. Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
US7740437B2 (en) * 2006-09-22 2010-06-22 Asm International N.V. Processing system with increased cassette storage capacity
US20080210168A1 (en) 2007-01-18 2008-09-04 May Su Single chamber, multiple tube high efficiency vertical furnace system
JP5511273B2 (ja) 2008-09-12 2014-06-04 株式会社日立国際電気 基板処理装置及び基板処理方法
JP5736687B2 (ja) 2009-10-06 2015-06-17 東京エレクトロン株式会社 基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3453223B2 (ja) * 1994-08-19 2003-10-06 東京エレクトロン株式会社 処理装置
JP2002246439A (ja) * 2001-02-20 2002-08-30 Tokyo Electron Ltd 被処理体の搬出入装置と処理システム
JP4385954B2 (ja) * 2005-01-25 2009-12-16 株式会社Ｉｈｉ ワーク搬送システムおよびワーク搬送装置

Also Published As

Publication number Publication date
JP2013077819A (ja) 2013-04-25
US20130085593A1 (en) 2013-04-04
JP6306813B2 (ja) 2018-04-04
KR20130035198A (ko) 2013-04-08
US9048271B2 (en) 2015-06-02

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