KR101746874B1 - 펠리클 프레임, 그 제조 방법 및 펠리클 - Google Patents

펠리클 프레임, 그 제조 방법 및 펠리클 Download PDF

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Publication number
KR101746874B1
KR101746874B1 KR1020120013154A KR20120013154A KR101746874B1 KR 101746874 B1 KR101746874 B1 KR 101746874B1 KR 1020120013154 A KR1020120013154 A KR 1020120013154A KR 20120013154 A KR20120013154 A KR 20120013154A KR 101746874 B1 KR101746874 B1 KR 101746874B1
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KR
South Korea
Prior art keywords
pellicle frame
pellicle
frame
resin
carbon fibers
Prior art date
Application number
KR1020120013154A
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English (en)
Korean (ko)
Other versions
KR20120113176A (ko
Inventor
가즈토시 세키하라
Original Assignee
신에쓰 가가꾸 고교 가부시끼가이샤
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Application filed by 신에쓰 가가꾸 고교 가부시끼가이샤 filed Critical 신에쓰 가가꾸 고교 가부시끼가이샤
Publication of KR20120113176A publication Critical patent/KR20120113176A/ko
Application granted granted Critical
Publication of KR101746874B1 publication Critical patent/KR101746874B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
KR1020120013154A 2011-04-04 2012-02-09 펠리클 프레임, 그 제조 방법 및 펠리클 KR101746874B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011082844A JP5663376B2 (ja) 2011-04-04 2011-04-04 ペリクルフレーム、その製造方法、及びペリクル
JPJP-P-2011-082844 2011-04-04

Publications (2)

Publication Number Publication Date
KR20120113176A KR20120113176A (ko) 2012-10-12
KR101746874B1 true KR101746874B1 (ko) 2017-06-14

Family

ID=46992130

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120013154A KR101746874B1 (ko) 2011-04-04 2012-02-09 펠리클 프레임, 그 제조 방법 및 펠리클

Country Status (5)

Country Link
JP (1) JP5663376B2 (zh)
KR (1) KR101746874B1 (zh)
CN (1) CN102736401B (zh)
HK (1) HK1174400A1 (zh)
TW (1) TWI460532B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5940283B2 (ja) * 2011-11-04 2016-06-29 信越化学工業株式会社 ペリクル
JP6027319B2 (ja) * 2012-03-02 2016-11-16 旭化成株式会社 塗装材及びペリクル
CN103279008A (zh) * 2013-05-23 2013-09-04 上海华力微电子有限公司 掩膜板覆盖膜设计方法
US10558129B2 (en) 2014-11-17 2020-02-11 Asml Netherlands B.V. Mask assembly
KR102495880B1 (ko) * 2022-09-06 2023-02-06 주식회사에이피에스케미칼 카본복합재 펠리클 프레임 제조방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001291757A (ja) * 2000-02-03 2001-10-19 Nippon Mitsubishi Oil Corp 加工面を被覆処理したｃｆｒｐ製搬送用部材およびその処理方法

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JP2630396B2 (ja) * 1987-04-30 1997-07-16 三菱レイヨン株式会社 ドクターナイフブレード
JPH04279331A (ja) * 1991-03-08 1992-10-05 Sekisui Chem Co Ltd 繊維強化樹脂積層体
JP4116236B2 (ja) * 2000-10-06 2008-07-09 東芝アイテック株式会社 積層部材およびそれを用いた回転電機
JP2002161157A (ja) * 2000-11-27 2002-06-04 Toho Tenax Co Ltd 硬質被膜を有する炭素繊維強化樹脂複合材料製板材
JP2002295737A (ja) * 2001-03-29 2002-10-09 Toray Ind Inc 炭素繊維強化プラスチック製角形管およびその製造方法
JP4024596B2 (ja) * 2002-06-03 2007-12-19 三菱電機株式会社 光学機器用反射鏡およびその製造方法
JP2006301525A (ja) * 2005-04-25 2006-11-02 Shin Etsu Chem Co Ltd ペリクルフレーム
KR20060116152A (ko) * 2005-05-09 2006-11-14 미쓰이 가가쿠 가부시키가이샤 오염이 적은 펠리클
JP4324944B2 (ja) * 2005-06-29 2009-09-02 信越ポリマー株式会社 精密部材収納容器
JP2007082645A (ja) * 2005-09-21 2007-04-05 Asahi Glass Matex Co Ltd 洗浄用ブラシ
CN102681334B (zh) * 2007-07-06 2015-09-30 旭化成电子材料株式会社 从容纳容器取出大型表膜构件的取出方法
JP2009063740A (ja) * 2007-09-05 2009-03-26 Shin Etsu Chem Co Ltd ペリクルフレーム
JP2009139879A (ja) * 2007-12-11 2009-06-25 Toppan Printing Co Ltd ペリクル
JP2009233254A (ja) * 2008-03-28 2009-10-15 Toray Ind Inc Ｘ線診断装置用天板およびその製造方法
JP2010076356A (ja) * 2008-09-29 2010-04-08 Toray Ind Inc プリフォームおよび繊維強化プラスチックの成型方法
JP5133229B2 (ja) * 2008-12-05 2013-01-30 信越ポリマー株式会社 ペリクル収納容器
JP5280243B2 (ja) * 2009-02-16 2013-09-04 東海旅客鉄道株式会社 まくら木
TWI395683B (zh) * 2009-03-30 2013-05-11 Kawasaki Heavy Ind Ltd Railway vehicle structure and manufacturing method thereof
JP2011052417A (ja) * 2009-08-31 2011-03-17 Sekisui Chem Co Ltd 転轍機取付用まくら木

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001291757A (ja) * 2000-02-03 2001-10-19 Nippon Mitsubishi Oil Corp 加工面を被覆処理したｃｆｒｐ製搬送用部材およびその処理方法

Also Published As

Publication number Publication date
CN102736401B (zh) 2015-01-21
HK1174400A1 (zh) 2013-06-07
KR20120113176A (ko) 2012-10-12
JP2012220532A (ja) 2012-11-12
TWI460532B (zh) 2014-11-11
TW201303485A (zh) 2013-01-16
CN102736401A (zh) 2012-10-17
JP5663376B2 (ja) 2015-02-04

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