KR101743806B1 - 광학 장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법 - Google Patents

광학 장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법 Download PDF

Info

Publication number
KR101743806B1
KR101743806B1 KR1020140129975A KR20140129975A KR101743806B1 KR 101743806 B1 KR101743806 B1 KR 101743806B1 KR 1020140129975 A KR1020140129975 A KR 1020140129975A KR 20140129975 A KR20140129975 A KR 20140129975A KR 101743806 B1 KR101743806 B1 KR 101743806B1
Authority
KR
South Korea
Prior art keywords
actuators
mirror
actuator
reflecting surface
driving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020140129975A
Other languages
English (en)
Korean (ko)
Other versions
KR20150037610A (ko
Inventor
초쇼쿠 사이
고헤이 이모토
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20150037610A publication Critical patent/KR20150037610A/ko
Application granted granted Critical
Publication of KR101743806B1 publication Critical patent/KR101743806B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020140129975A 2013-09-30 2014-09-29 광학 장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법 Active KR101743806B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013205353A JP6168957B2 (ja) 2013-09-30 2013-09-30 光学装置、投影光学系、露光装置および物品の製造方法
JPJP-P-2013-205353 2013-09-30

Publications (2)

Publication Number Publication Date
KR20150037610A KR20150037610A (ko) 2015-04-08
KR101743806B1 true KR101743806B1 (ko) 2017-06-05

Family

ID=52739844

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140129975A Active KR101743806B1 (ko) 2013-09-30 2014-09-29 광학 장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법

Country Status (5)

Country Link
US (1) US9568729B2 (https=)
JP (1) JP6168957B2 (https=)
KR (1) KR101743806B1 (https=)
CN (1) CN104516212B (https=)
TW (1) TWI536044B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014225639A (ja) * 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP6484853B2 (ja) * 2014-04-17 2019-03-20 株式会社ブイ・テクノロジー 露光装置用反射鏡ユニット及び露光装置
JP2017129685A (ja) * 2016-01-19 2017-07-27 キヤノン株式会社 光学装置、投影光学系、露光装置およびデバイス製造方法
JP6929024B2 (ja) * 2016-07-06 2021-09-01 キヤノン株式会社 光学装置、露光装置及び物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
JP6853659B2 (ja) * 2016-12-09 2021-03-31 キヤノン株式会社 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法
CN110581984A (zh) * 2018-06-08 2019-12-17 深圳光峰科技股份有限公司 投影设备
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels
DE102020201724A1 (de) 2020-02-12 2021-08-12 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
DE102020210024B4 (de) * 2020-08-07 2024-02-08 Carl Zeiss Smt Gmbh Optische Baugruppe und Projektionsbelichtungsanlage
US12181660B2 (en) * 2020-11-11 2024-12-31 Northrop Grumman Systems Corporation Actively deformable metamirror
DE102022116700A1 (de) * 2022-07-05 2024-01-11 Carl Zeiss Smt Gmbh Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithographie und Verfahren

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004064076A (ja) * 2002-07-23 2004-02-26 Nikon Corp 変形ミラー構造体、変形ミラーの制御方法及び露光装置
JP2005004146A (ja) * 2002-07-03 2005-01-06 Nikon Corp 反射光学素子及び露光装置

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1139831C (zh) 2001-06-05 2004-02-25 中国科学院国家天文台南京天文光学技术研究所 大型天文望远镜镜面位移控制系统
JP4817702B2 (ja) * 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置
JP4432839B2 (ja) 2005-06-20 2010-03-17 船井電機株式会社 形状可変ミラー及びそれを備えた光ピックアップ装置
JP5069232B2 (ja) * 2005-07-25 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物レンズ
JP2007103657A (ja) * 2005-10-04 2007-04-19 Canon Inc 光学素子保持装置、露光装置およびデバイス製造方法
JP2007317713A (ja) 2006-05-23 2007-12-06 Canon Inc 光学素子駆動装置
JP2007316132A (ja) 2006-05-23 2007-12-06 Canon Inc 反射装置
JP2008040299A (ja) 2006-08-09 2008-02-21 Funai Electric Co Ltd 形状可変ミラー及び形状可変ミラーの製造方法
JP2008270569A (ja) 2007-04-20 2008-11-06 Canon Inc 露光装置及びその制御方法並びに製造方法
JP2009026862A (ja) * 2007-07-18 2009-02-05 Canon Inc 光学素子位置決めシステム、投影光学系及び露光装置
CN100587547C (zh) 2007-11-29 2010-02-03 上海交通大学 压电驱动的可变形反射镜及其制造方法
US8553207B2 (en) 2008-12-31 2013-10-08 Asml Holdings N.V. Optically compensated unidirectional reticle bender
CN101504487A (zh) 2009-03-20 2009-08-12 中国科学院光电技术研究所 大口径可拆卸压电变形反射镜
WO2011074319A1 (ja) 2009-12-14 2011-06-23 株式会社ニコン デフォーマブルミラー、照明光学系、露光装置、およびデバイス製造方法
JP2011171386A (ja) * 2010-02-16 2011-09-01 Nikon Corp 変位センサ、駆動装置、露光装置、及びデバイスの製造方法
CN201615788U (zh) 2010-03-18 2010-10-27 杭州创惠仪器有限公司 分布光度计测量用的反光镜
CN101923214A (zh) 2010-08-04 2010-12-22 中国科学院光电技术研究所 基于压电驱动器的变形次镜
DE102011075393B4 (de) * 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
JP2013106017A (ja) * 2011-11-17 2013-05-30 Nikon Corp 光学素子保持装置、光学装置、及び露光装置
CN202393061U (zh) 2011-12-29 2012-08-22 中国华能集团清洁能源技术研究院有限公司 一种线聚焦太阳能反射框架双层复合式自平衡结构
JP2013161992A (ja) * 2012-02-06 2013-08-19 Nikon Corp 変形可能な反射光学素子、光学系、及び露光装置
CN103207440B (zh) 2013-04-18 2015-04-08 大连理工大学 一种双向多拱形大口径空间反射镜

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005004146A (ja) * 2002-07-03 2005-01-06 Nikon Corp 反射光学素子及び露光装置
JP2004064076A (ja) * 2002-07-23 2004-02-26 Nikon Corp 変形ミラー構造体、変形ミラーの制御方法及び露光装置

Also Published As

Publication number Publication date
US20150092172A1 (en) 2015-04-02
JP2015070214A (ja) 2015-04-13
TWI536044B (zh) 2016-06-01
TW201512704A (zh) 2015-04-01
JP6168957B2 (ja) 2017-07-26
CN104516212B (zh) 2017-06-30
US9568729B2 (en) 2017-02-14
KR20150037610A (ko) 2015-04-08
CN104516212A (zh) 2015-04-15

Similar Documents

Publication Publication Date Title
KR101743806B1 (ko) 광학 장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법
JP6336274B2 (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
JP5127985B2 (ja) アクチュエータおよび投影露光システム
US9678444B2 (en) Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article
US9557560B2 (en) Mirror unit and exposure apparatus
US7989756B2 (en) Active-isolation mounts for optical elements
JP6021559B2 (ja) 振動型駆動装置及び撮像装置
US20100134770A1 (en) Exposure apparatus and method for manufacturing device
US20230228798A1 (en) Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithography
JP2016092309A (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
KR102165797B1 (ko) 광학 장치, 노광 장치 및 물품의 제조 방법
KR102138113B1 (ko) 광학 디바이스, 노광 장치 및 물품의 제조 방법
JP2013195479A (ja) 光偏向器、光走査装置、画像形成装置及び画像投影装置
KR102321780B1 (ko) 결정 방법, 광학 장치, 투영 광학계, 노광 장치 및 물품의 제조 방법
CN107015341B (zh) 光学设备、投影光学系统、曝光装置及物品制造方法

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20140929

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20150925

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20140929

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20160810

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20170328

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20170530

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20170530

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20200520

Year of fee payment: 4

PR1001 Payment of annual fee

Payment date: 20200520

Start annual number: 4

End annual number: 4

FPAY Annual fee payment

Payment date: 20210426

Year of fee payment: 5

PR1001 Payment of annual fee

Payment date: 20210426

Start annual number: 5

End annual number: 5

FPAY Annual fee payment

Payment date: 20220422

Year of fee payment: 6

PR1001 Payment of annual fee

Payment date: 20220422

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20240424

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20250507

Start annual number: 9

End annual number: 9