KR101742744B1 - 기판, 특히 프레스 플래튼의 플라즈마 코팅을 위한 장치 및 방법 - Google Patents

기판, 특히 프레스 플래튼의 플라즈마 코팅을 위한 장치 및 방법 Download PDF

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Publication number
KR101742744B1
KR101742744B1 KR1020157006106A KR20157006106A KR101742744B1 KR 101742744 B1 KR101742744 B1 KR 101742744B1 KR 1020157006106 A KR1020157006106 A KR 1020157006106A KR 20157006106 A KR20157006106 A KR 20157006106A KR 101742744 B1 KR101742744 B1 KR 101742744B1
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KR
South Korea
Prior art keywords
electrode
segment
electrode segment
segments
press platen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020157006106A
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English (en)
Korean (ko)
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KR20150042817A (ko
Inventor
안드레아스 게베슈베르
다니엘 하임
조한 라이메르
토마스 뮐러
미카엘 프로쉑
오토 스타들레르
헤르베르트 스퇴리
Original Assignee
베른도르프 휘크 반트-운트 프레쎄블레흐테크니크 게엠베하
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Application filed by 베른도르프 휘크 반트-운트 프레쎄블레흐테크니크 게엠베하 filed Critical 베른도르프 휘크 반트-운트 프레쎄블레흐테크니크 게엠베하
Publication of KR20150042817A publication Critical patent/KR20150042817A/ko
Application granted granted Critical
Publication of KR101742744B1 publication Critical patent/KR101742744B1/ko
Assigned to 베른도르프악티엔게젤샤프트 reassignment 베른도르프악티엔게젤샤프트 권리의 전부이전등록 Assignors: 베른도르프 휘크 반트-운트 프레쎄블레흐테크니크 게엠베하
Assigned to 베른도르프 이노베이션즈 운트 테크놀로지 게엠베하 reassignment 베른도르프 이노베이션즈 운트 테크놀로지 게엠베하 권리의 전부이전등록 Assignors: 베른도르프악티엔게젤샤프트
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06—Platens or press rams
    • B30B15/062—Press plates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
KR1020157006106A 2012-08-08 2013-08-06 기판, 특히 프레스 플래튼의 플라즈마 코팅을 위한 장치 및 방법 Expired - Fee Related KR101742744B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ATA877/2012A AT513190B9 (de) 2012-08-08 2012-08-08 Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs
ATA877/2012 2012-08-08
PCT/AT2013/050152 WO2014022872A2 (de) 2012-08-08 2013-08-06 Vorrichtung und verfahren zur plasmabeschichtung eines substrats, insbesondere eines pressblechs

Publications (2)

Publication Number Publication Date
KR20150042817A KR20150042817A (ko) 2015-04-21
KR101742744B1 true KR101742744B1 (ko) 2017-06-01

Family

ID=49584535

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157006106A Expired - Fee Related KR101742744B1 (ko) 2012-08-08 2013-08-06 기판, 특히 프레스 플래튼의 플라즈마 코팅을 위한 장치 및 방법

Country Status (18)

Country Link
US (1) US9530624B2 (https=)
EP (1) EP2882885B8 (https=)
JP (1) JP6140286B2 (https=)
KR (1) KR101742744B1 (https=)
CN (1) CN104755653B (https=)
AT (1) AT513190B9 (https=)
AU (1) AU2013302202B2 (https=)
BR (1) BR112015002657A8 (https=)
CA (1) CA2881069C (https=)
CL (1) CL2015000301A1 (https=)
DK (1) DK2882885T3 (https=)
ES (1) ES2587929T3 (https=)
IN (1) IN2015DN01149A (https=)
MY (1) MY176134A (https=)
NZ (1) NZ704253A (https=)
PL (1) PL2882885T3 (https=)
RU (1) RU2615743C2 (https=)
WO (1) WO2014022872A2 (https=)

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JP2017025389A (ja) * 2015-07-24 2017-02-02 株式会社ユーテック プラズマｃｖｄ装置及び成膜方法
US11251019B2 (en) * 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
CN107283551B (zh) * 2017-08-21 2018-07-24 阜南盛原木业有限公司 一种具有良好防霉防虫性能的胶合板
JP6863199B2 (ja) * 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置
CN109055917B (zh) * 2018-09-07 2020-09-08 信阳师范学院 一种单室双面镀膜等离子体化学气相沉积系统
DE102019127659A1 (de) * 2019-10-15 2021-04-15 Hueck Rheinische Gmbh Presswerkzeug und Verfahren zum Herstellen eines Presswerkzeugs
US11884426B2 (en) * 2020-07-08 2024-01-30 Hamilton Sundstrand Corporation Compression apparatus and methods of making and using the same

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US20030052085A1 (en) * 2000-03-28 2003-03-20 Richard Parsons Control of power delivered to a multiple segment inject electrode

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Also Published As

Publication number Publication date
JP6140286B2 (ja) 2017-05-31
WO2014022872A2 (de) 2014-02-13
JP2015531820A (ja) 2015-11-05
AT513190A1 (de) 2014-02-15
CL2015000301A1 (es) 2015-09-21
US9530624B2 (en) 2016-12-27
ES2587929T3 (es) 2016-10-27
EP2882885B8 (de) 2016-08-31
CA2881069A1 (en) 2014-02-13
IN2015DN01149A (https=) 2015-06-26
AU2013302202B2 (en) 2015-12-03
CN104755653A (zh) 2015-07-01
DK2882885T3 (en) 2016-09-05
BR112015002657A8 (pt) 2019-07-30
EP2882885B1 (de) 2016-05-25
EP2882885A2 (de) 2015-06-17
AT513190B9 (de) 2014-05-15
PL2882885T3 (pl) 2016-11-30
CA2881069C (en) 2017-11-07
AT513190B1 (de) 2014-03-15
NZ704253A (en) 2016-08-26
WO2014022872A3 (de) 2014-05-15
RU2015107784A (ru) 2016-09-27
RU2615743C2 (ru) 2017-04-11
AU2013302202A1 (en) 2015-02-26
KR20150042817A (ko) 2015-04-21
BR112015002657A2 (pt) 2017-07-04
CN104755653B (zh) 2017-09-19
MY176134A (en) 2020-07-24
US20150255254A1 (en) 2015-09-10

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