KR101705894B1 - 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 소자 - Google Patents

착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 소자 Download PDF

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Publication number
KR101705894B1
KR101705894B1 KR1020090014398A KR20090014398A KR101705894B1 KR 101705894 B1 KR101705894 B1 KR 101705894B1 KR 1020090014398 A KR1020090014398 A KR 1020090014398A KR 20090014398 A KR20090014398 A KR 20090014398A KR 101705894 B1 KR101705894 B1 KR 101705894B1
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KR
South Korea
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group
weight
parts
radiation
formula
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KR1020090014398A
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English (en)
Korean (ko)
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KR20090093822A (ko
Inventor
다꾸미 마또바
다까끼 미노와
도시유끼 고이데
히데노리 나루세
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제이에스알 가부시끼가이샤
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Publication of KR20090093822A publication Critical patent/KR20090093822A/ko
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Publication of KR101705894B1 publication Critical patent/KR101705894B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020090014398A 2008-02-28 2009-02-20 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 소자 KR101705894B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-047271 2008-02-28
JP2008047271A JP5157522B2 (ja) 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Publications (2)

Publication Number Publication Date
KR20090093822A KR20090093822A (ko) 2009-09-02
KR101705894B1 true KR101705894B1 (ko) 2017-02-10

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090014398A KR101705894B1 (ko) 2008-02-28 2009-02-20 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 소자

Country Status (5)

Country Link
JP (1) JP5157522B2 (zh)
KR (1) KR101705894B1 (zh)
CN (1) CN101526741B (zh)
SG (1) SG155146A1 (zh)
TW (1) TWI569099B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013041156A (ja) * 2011-08-17 2013-02-28 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP5778568B2 (ja) * 2011-12-16 2015-09-16 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物、厚膜ホトレジスト積層体、厚膜ホトレジストパターンの製造方法及び接続端子の製造方法
WO2015053183A1 (ja) * 2013-10-11 2015-04-16 富士フイルム株式会社 感光性組成物、分散組成物、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子
JP6520091B2 (ja) 2013-12-16 2019-05-29 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6847580B2 (ja) * 2016-02-09 2021-03-24 東京応化工業株式会社 ブラックカラムスペーサ用感光性樹脂組成物、ブラックカラムスペーサ、表示装置、及びブラックカラムスペーサの形成方法
JP6689434B1 (ja) * 2019-02-06 2020-04-28 昭和電工株式会社 感光性樹脂組成物、有機ｅｌ素子隔壁、及び有機ｅｌ素子

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214580A (ja) * 1999-01-26 2000-08-04 Mitsubishi Chemicals Corp カラ―フィルタ―用光重合性組成物、およびカラ―フィルタ―
JP2006251562A (ja) * 2005-03-11 2006-09-21 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2007256445A (ja) 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd 光重合性組成物および感光性平版印刷版材料

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KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
JP2004264747A (ja) * 2003-03-04 2004-09-24 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4393258B2 (ja) * 2003-08-29 2010-01-06 富士フイルム株式会社 画像記録材料及び平版印刷版
CN101023394B (zh) * 2004-09-17 2011-12-21 凸版印刷株式会社 着色碱性显影性感光性树脂组合物和使用了该着色碱性显影性感光性树脂组合物的彩色滤光片
JP4483769B2 (ja) * 2004-11-11 2010-06-16 三菱化学株式会社 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4661384B2 (ja) * 2005-06-16 2011-03-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP4685664B2 (ja) * 2005-11-25 2011-05-18 三菱製紙株式会社 感光性平版印刷版材料
JP4635935B2 (ja) * 2006-03-29 2011-02-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4706559B2 (ja) * 2006-05-29 2011-06-22 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4752649B2 (ja) * 2006-07-12 2011-08-17 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
TWI437366B (zh) * 2007-09-26 2014-05-11 Fujifilm Corp 固態攝像元件用著色感光性組成物、固態攝像元件用彩色濾光器及其製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214580A (ja) * 1999-01-26 2000-08-04 Mitsubishi Chemicals Corp カラ―フィルタ―用光重合性組成物、およびカラ―フィルタ―
JP2006251562A (ja) * 2005-03-11 2006-09-21 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2007256445A (ja) 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd 光重合性組成物および感光性平版印刷版材料

Also Published As

Publication number Publication date
TWI569099B (zh) 2017-02-01
SG155146A1 (en) 2009-09-30
JP2009204895A (ja) 2009-09-10
CN101526741B (zh) 2013-10-23
TW200941140A (en) 2009-10-01
KR20090093822A (ko) 2009-09-02
JP5157522B2 (ja) 2013-03-06
CN101526741A (zh) 2009-09-09

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