JP5157522B2 - 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 - Google Patents

着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 Download PDF

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JP5157522B2
JP5157522B2 JP2008047271A JP2008047271A JP5157522B2 JP 5157522 B2 JP5157522 B2 JP 5157522B2 JP 2008047271 A JP2008047271 A JP 2008047271A JP 2008047271 A JP2008047271 A JP 2008047271A JP 5157522 B2 JP5157522 B2 JP 5157522B2
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group
formula
weight
parts
radiation
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Japanese (ja)
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JP2009204895A (ja
Inventor
拓巳 的場
貴樹 蓑輪
利幸 小出
秀則 成瀬
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JSR Corp
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JSR Corp
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Priority to JP2008047271A priority Critical patent/JP5157522B2/ja
Priority to TW098105364A priority patent/TWI569099B/zh
Priority to KR1020090014398A priority patent/KR101705894B1/ko
Priority to CN2009100047558A priority patent/CN101526741B/zh
Priority to SG200901295-6A priority patent/SG155146A1/en
Publication of JP2009204895A publication Critical patent/JP2009204895A/ja
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2008047271A 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 Active JP5157522B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008047271A JP5157522B2 (ja) 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
TW098105364A TWI569099B (zh) 2008-02-28 2009-02-20 著色層形成用感放射線性組成物、彩色濾光片及彩色液晶顯示元件
KR1020090014398A KR101705894B1 (ko) 2008-02-28 2009-02-20 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정표시 소자
CN2009100047558A CN101526741B (zh) 2008-02-28 2009-02-20 着色层形成用放射线敏感性组合物、滤色片和彩色液晶显示元件
SG200901295-6A SG155146A1 (en) 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008047271A JP5157522B2 (ja) 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Publications (2)

Publication Number Publication Date
JP2009204895A JP2009204895A (ja) 2009-09-10
JP5157522B2 true JP5157522B2 (ja) 2013-03-06

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Family Applications (1)

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JP2008047271A Active JP5157522B2 (ja) 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Country Status (5)

Country Link
JP (1) JP5157522B2 (zh)
KR (1) KR101705894B1 (zh)
CN (1) CN101526741B (zh)
SG (1) SG155146A1 (zh)
TW (1) TWI569099B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013041156A (ja) * 2011-08-17 2013-02-28 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機el表示装置
JP5778568B2 (ja) * 2011-12-16 2015-09-16 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物、厚膜ホトレジスト積層体、厚膜ホトレジストパターンの製造方法及び接続端子の製造方法
WO2015053183A1 (ja) * 2013-10-11 2015-04-16 富士フイルム株式会社 感光性組成物、分散組成物、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子
JP6520091B2 (ja) 2013-12-16 2019-05-29 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6847580B2 (ja) * 2016-02-09 2021-03-24 東京応化工業株式会社 ブラックカラムスペーサ用感光性樹脂組成物、ブラックカラムスペーサ、表示装置、及びブラックカラムスペーサの形成方法
JP6689434B1 (ja) * 2019-02-06 2020-04-28 昭和電工株式会社 感光性樹脂組成物、有機el素子隔壁、及び有機el素子

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214580A (ja) * 1999-01-26 2000-08-04 Mitsubishi Chemicals Corp カラ―フィルタ―用光重合性組成物、およびカラ―フィルタ―
KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
JP2004264747A (ja) * 2003-03-04 2004-09-24 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4393258B2 (ja) * 2003-08-29 2010-01-06 富士フイルム株式会社 画像記録材料及び平版印刷版
CN101023394B (zh) * 2004-09-17 2011-12-21 凸版印刷株式会社 着色碱性显影性感光性树脂组合物和使用了该着色碱性显影性感光性树脂组合物的彩色滤光片
JP4483769B2 (ja) * 2004-11-11 2010-06-16 三菱化学株式会社 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP2006251562A (ja) * 2005-03-11 2006-09-21 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4661384B2 (ja) * 2005-06-16 2011-03-30 Jsr株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP4685664B2 (ja) * 2005-11-25 2011-05-18 三菱製紙株式会社 感光性平版印刷版材料
JP2007256445A (ja) * 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd 光重合性組成物および感光性平版印刷版材料
JP4635935B2 (ja) * 2006-03-29 2011-02-23 Jsr株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4706559B2 (ja) * 2006-05-29 2011-06-22 Jsr株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4752649B2 (ja) * 2006-07-12 2011-08-17 Jsr株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
TWI437366B (zh) * 2007-09-26 2014-05-11 Fujifilm Corp 固態攝像元件用著色感光性組成物、固態攝像元件用彩色濾光器及其製造方法

Also Published As

Publication number Publication date
TWI569099B (zh) 2017-02-01
SG155146A1 (en) 2009-09-30
JP2009204895A (ja) 2009-09-10
KR101705894B1 (ko) 2017-02-10
CN101526741B (zh) 2013-10-23
TW200941140A (en) 2009-10-01
KR20090093822A (ko) 2009-09-02
CN101526741A (zh) 2009-09-09

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