TW200941140A - Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display element - Google Patents

Abstract

The present invention provides a radiation sensitive composition having excellent adherence to a substrate and capable of forming a pixel and a black matrix which have high fineness andexcellent pattern configuration. A radiation sensitive composition for forming colored layer characterized in comprising (A) a colorant, (B) an alkali-soluble resin, (C) a monomer having two or more radical-polymerizable unsaturated bonds, (D) a radiation sensitive generator and (E) a certain phenolic compound.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a radiation-sensitive composition for forming a colored layer, a color filter, and a liquid crystal display element, and more particularly, to a structure for forming a transmission type. a radiation sensitive composition of a coloring layer useful in a color filter such as a reflective color liquid crystal display device or a color image sensor device, a color filter including a coloring layer formed using the radiation sensitive composition, and A color liquid crystal display element having the color filter.先前 [Prior Art] As a method of forming a color filter using a coloring sensitizing radiation composition, it is known that a color ray-forming linear composition is formed on a substrate or a substrate on which a light-shielding layer having a desired pattern is formed in advance The coating film is irradiated with radiation (hereinafter referred to as "exposure") through a mask having a predetermined pattern, and then developed to dissolve and remove the unexposed portion, followed by post-baking to obtain a method of each color pixel (for example, refer to the patent) Documents 1 and 2). _ Moreover, in recent years, it has been desired to obtain a bright and color-reproducible picture by using a radiation-sensitive composition for a monitor or a television, and it is necessary to improve the color of the backlight while improving the color of the radiation-sensitive composition. The content of the agent, particularly the pigment (Non-Patent Document 1). Further, there is a tendency to refine the LCD monitor screen or the LCD TV screen, and the number of pixels per unit area on the screen increases. Therefore, it is required that the radiation sensitive composition can form a finer pattern while forming a black matrix and forming a pixel. In view of the above-mentioned requirements, for example, Patent Document 3 discloses that a pattern having a ruthenium resolution can be formed by including an alkali-soluble resin having a specific structure in the radiation composition of 200941140. However, in the so-called negative-type radiation linear composition, the line width of the formed pattern is wider than the design size of the photomask due to the influence of the diffracted light during the proximity exposure, so that it is impossible to obtain a desired line width. The problem of fine patterns. On the other hand, as a method of eliminating the broadening of the pattern line width of the negative-type radiation-sensitive linear composition described above, there are known methods such as reducing the exposure amount, enhancing the development condition, and reducing the radiation-induced linear polymerization in the radiation-sensitive composition.含量 The content of the initiator or the method of containing a polymerization inhibitor in the radiation sensitive composition. However, according to either method, there is still a tendency to easily cause pattern defects or detachment and undercut during development, and in particular, when the content of the coloring agent contained in the radiation sensitive composition becomes high, the above method is not applicable at all. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. New Developments, First Edition, (Dong) Dongli Research Center, September 2002 [Invention] The object of the present invention is to provide a radiation-sensitive composition for forming a colored layer. Even when the content of the coloring agent contained in the radiation sensitive composition is high, the composition is excellent in adhesion to the substrate, and a pixel and a black matrix having a high-definition and excellent pattern shape can be formed, and are close to each other. Equation -4- 200941140 The line width of the pattern will not widen during exposure. Another object of the present invention is to provide a color filter including a coloring layer formed of the photosensitive layer forming radiation composition, and a color liquid crystal display element including the color filter. In view of the above-mentioned facts, the inventors of the present invention have found that the above problems can be solved by including a phenolic compound having a specific structure in a radiation-sensitive layer-forming radiation sensitive composition, thereby completing the above problem. This invention was invented. In other words, the present invention provides a radiation sensitive composition for forming a colored layer, comprising: (A) a colorant, (B) an alkali-soluble resin, and (C) a single one or more radical polymerizable unsaturated bonds. a body, (D) a radiation radical generating agent, and (E) a compound selected from the group consisting of the following formulas (1) to (5), a phenolic compound having a flavan skeleton, and a spirobiindane skeleton. At least one compound of a phenolic compound and a phenolic compound having a spirobiindole skeleton: (〇Η) „

Ο) [In the formula (1), R1 represents a hydrogen atom, an alkyl group having 4 or less carbon atoms, an alkoxy group having 4 or less carbon atoms, a phenyl group, a naphthyl group or a -(CHz)x-COOZ group. The plurality of R1 present may be the same or different from each other; Z represents an alkoxyalkyl group, a cyclic ether group, a vinyloxyalkyl group or a third alkoxycarbonylalkyl group. It may be different; X is an integer of 〇-4; Α represents a single bond, -S-group, -0-yl, -C0-yl, -C00-yl, -SO-yl, -S〇2-yl, -C (R2) (R3)- group or (〇H)k group (wherein k is an integer of 0 to 4.) The ruler 2 and r3 may be the same or different from each other, and represent a hydrogen atom and a carbon number of 6 The following substituents, a fluorenyl group having 6 or less carbon atoms, a phenyl group, a naphthyl group or a -(CH2)X_C00Z group; m, η, p and q are integers of 0 or more, satisfying m + n$5, P + Q刍5, n + q2 1 relationship. ]

[In the formula (2), R1 represents the same group as R1 of the formula (1); R4 represents the same group as R2 of the formula (1); n, p, q, r and δ are integers above 〇, satisfying m + n capacity 5, P + q$5, r + s$5, n + Q + relationship. (°H)n R '^ (〇H)q 200941140 [In the formula (3), R1 represents the same group as R1 of the formula (1); and R4 represents the same group as R2 of the formula (1), However, two R4s may be the same or different from each other; A represents the same group as A of the formula (1); m, n, p, q, r, s, t, and u are integers of 0 or more, satisfying m + n The relationship of $5, p + qS5, r + sS5, t + u ^ 5 ' n + q + s + u2 1 . ]

[In the formula (4), R1 represents the same group as R1 of the formula (1); and R2, R3 and R4 represent the same groups as R2 of the formula (1), R3 and R4 of the formula (2); , n, p, q, r, s, t, and u are integers of 0 or more, satisfying the relationship of m + nS5, p + qS5, ❹ r + sS5, t + uS4, n + q + s + u2 1 . ]

Wherein R1, R2 and R3 represent the same groups as R1, R2 and R3 of the formula (1); m, n, p, q, r and s are integers of 0 or more, satisfying m + n$5, 200941140 The relationship between p + qS4, r + sS5, n + q + s22; 1 represents the integer of Bu 5 . ]. The present invention also provides a color filter having a coloring layer formed using the photosensitive layer forming radiation sensitive composition, and a color liquid crystal display element including the color filter. According to the radiation sensitive composition containing the component (E) of the present invention, even when the content of the coloring agent contained in the radiation sensitive composition is high, the adhesion to the substrate is excellent, and it is possible to form Highly fine and excellent pattern-shaped pixels and black matrix, and the line width of the pattern does not widen in proximity exposure. Therefore, the color filter of the present invention is useful, for example, in a transmissive or reflective type color liquid crystal display device, a color image pickup device element, a color sensor, or the like. [Embodiment] (The luminescent layer for forming a colored layer) The "colored layer" of the luminescent layer forming composition for coloring layer formation (hereinafter, simply referred to as "radius-sensitive composition") is Refers to a layer formed by a pixel and/or a black matrix for a color filter. Hereinafter, the constituent components of the radiation sensitive composition for forming a colored layer of the present invention will be described. - (A) Colorant - The coloring agent (A) in the present invention is not particularly limited, and may be an organic pigment or an inorganic pigment 200941140. The organic pigment may, for example, be a dye index (CI; issued by The Society of Dyers and Colourists) The compound classified as a pigment in the present invention is not particularly limited as the (A) coloring agent in the present invention. The compound classified as an organic pigment can be specifically described as a compound having a dye index (CI) number. CI Pigment Yellow 12, CI Pigment Yellow 13, CI Pigment Yellow 14, CI Pigment Yellow 17, CI Pigment Yellow 20, CI Pigment Yellow 24, CI Pigment Yellow 31, CI Pigment Yellow 55, CI·Pig Yellow 83, CI·Pig Yellow 93, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 138, CI Pigment Yellow 139, CI 〇 Pigment Yellow 150, CI Pigment Yellow 153, CI Pigment Yellow 154, CI Pigment Yellow 155, CI Pigment Yellow 166, CI Pigment Yellow 168, CI Pigment Yellow 211; CI Pigment Orange 5, CI Pigment Orange 13, CI Pigment Orange 14, CI Pigment Orange 24, CI Pigment Orange 34, CI Pigment Orange 36, CI Pigment Orange 38, CI Pigment Orange 40, CI Pigment Orange 43, CI Pigment Orange 46, CI Pigment Orange 49, CI Pigment Orange 61, CI Pigment Orange 64, CI Pigment Orange 68, CI Pigment Orange 70, CI Pigment Orange 71, CI Pigment Orange 72, CI Pigment Orange 73, CI Yan φ Orange 74; CI Pigment Red 1, CI Pigment Red 2, CI Pigment Red 5, CI Pigment Red 17, CI·Pigment Red 31, CI Pigment Red 32, CI Pigment Red 41, CI Pigment Red 122, C_I. Pigment Red 123, CI Pigment Red 144, CI Pigment Red 149, CI·Pigment Red 166, CI Pigment Red 168, CI Pigment Red 170, CI Pigment Red 171, CI Pigment Red 175, CI Pigment Red 176, CI Pigment Red 177, CI Pigment Red 178, CI Pigment Red 179, (: 丄 Pigment Red 180, CI Pigment Red 185, CI Pigment Red 187 , CI Pigment Red 202, CI Pigment Red 206, 200941140 " CI Pigment Red 207, CI Pigment Red 209, CI Pigment Red 214, CI Pigment Red 220, CI Pigment Red 221 'C_I·Pigment Red 224, Cl Pigment Red 242, CI Pigment Red 243, CI Pigment Red 254, CI Pigment Red 255, ci Pigment Red 262, CI Pigment Red 264, CI Pigment Red 272; CI·Pigment Violet 1, CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29 , CI·Pigment Violet 32, CI Pigment Violet 36, 匚丄Pigment Violet 38; CI·Pigment Blue 15, C_I. Pigment Blue 15: 3, C.I_Pigment Blue 15: 4, ❹ C_I. Pigment Blue 15 : 6 , ci·Pigment Blue 6〇, cL Pigment Blue 8〇; CI Pigment Green 7, CI Pigment Green 36, CM•Pig Green 58; CI Pigment Brown 23, CI·Pigment Brown 25; CI Pigment Black 1, CI Pigment Black 7 . In the present invention, the 'organic pigments' can be used after being subjected to recrystallization, reprecipitation, solvent washing, sublimation, vacuum heating or a combination of the above methods. Further, 'the above inorganic pigments may, for example, be titanium oxide, barium sulfate, © calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc yellow, iron oxide red (red iron oxide (III)), cadmium red, ultramarine blue, Prussian blue. , chrome oxide green, green, brown earth, titanium black, synthetic iron black, carbon black and so on. The above coloring agent can be used by modifying the surface of its particles with a polymer as needed. For example, a polymer described in Japanese Laid-Open Patent Publication No. Hei 8-259876, or a commercially available polymer or oligomer for pigment dispersion, or the like, may be used. The coating method is disclosed in, for example, Japanese Laid-Open Patent Publication No. Hei 9-7 No. Hei. No. Hei 9- No. Hei 9-124969. The above colorants may be used singly or in combination of two or more. When the radiation sensitive composition of the present invention is used for pixel formation, since the pixel is required to have high definition color development and heat resistance, the colorant (A) is preferably a color former having high color rendering property and high heat resistance. In particular, a coloring agent having high heat decomposition resistance is preferably an organic coloring agent, and particularly preferably an organic pigment. On the other hand, when the radiation sensitive composition of the present invention is used for the formation of a black moment β array, since the black matrix is required to have light shielding properties, it is preferred to use an organic pigment or carbon black as the coloring agent. According to the radiation sensitive composition of the present invention, even when the content of the colorant reaches 30% by weight or more in the total solid content of the radiation sensitive composition, it is possible to form no defects and fall off, and the line width is not changed. Wide pattern. Further, in the present invention, from the viewpoint of ensuring developability, the upper limit of the content of the colorant in the total solid content of the radiation sensitive composition is preferably 60% by weight or less, more preferably 50% by weight or less. Here, the solid component means a component other than the following solvent. The coloring agent in the present invention can be used together with a dispersing agent or a dispersing aid as needed. As the dispersing agent, for example, a suitable dispersing agent such as a cationic system, an anionic non-ionic surfactant or an amphoteric dispersant can be used, and a polymer dispersant is preferred. Specific examples thereof include a modified acrylic copolymer, an acrylic copolymer, a polyurethane, a polyester, an alkylammonium salt of a polymer copolymer, or a phosphorus-11-200941140 acid ester salt, and a cationic comb type. Branch polymers, etc. Here, the cationic comb-type graft polymer refers to a polymer having a structure in which two molecules of a branched polymer are graft-bonded to one molecule of a main polymer containing a plurality of basic groups (cationic functional groups), and examples thereof include For example, a polymer in which the dry polymer portion is composed of polyethyleneimine and the branched polymer portion is composed of a ring-opening polymer of e-caprolactone. Among the above dispersants, preferred are modified acrylic copolymers, polyurethanes, and cationic comb-type graft polymers. The above dispersing agent is commercially available. For example, modified acrylic copolymers include Disperbyk-2000, Disperbyk-2001 (above prepared by BYK Chemie (BYK); and polyurethanes: Disperbyk-161 , Disperbyk-162, Disperbyk-165,

Disperbyk-167, Disperbyk-170, Disperbyk-182 (prepared by BYK Chemie (BYK), EFKA4046 (made by Ciba Specialty Chemicals), Solsperse 76500 (manufactured by Lubricol); cationic comb-type graft polymerization For example, Solsperse 24000 (manufactured by Lubricol Co., Ltd.), ❹AJISPER PB821, A JIS PER PB 8 2 2 (manufactured by Ajinomoto Fine-Techno Co., Ltd.), and the like can be mentioned. The above dispersing agents may be used singly or in combination of two or more. The content of the dispersant is usually 1 part by weight or less, preferably 0.5 to 100 parts by weight, more preferably 1 to 70 parts by weight, particularly preferably 10 to 50 parts by weight, per 100 parts by weight of the (A) coloring agent. . In this case, if the content of the dispersant exceeds 1 part by weight, the developability or the like may be impaired. The dispersing aid may, for example, be a blue pigment derivative or a yellow -12-200941140 pigment derivative, and specific examples thereof include a copper phthalocyanine derivative. —(B) Alkali-soluble resin—The (B) alkali-soluble resin contained in the radiation-sensitive composition of the present invention may be soluble as long as it is soluble in the alkaline developer used in the development treatment step in forming the colored layer. Defined, it is usually a polymer having an acidic functional group such as a carboxyl group or a phenolic hydroxyl group. Among them, a polymer having a carboxyl group is preferable, and a polymer selected from a repeating unit represented by the following formula (6) (hereinafter referred to as "polymer (B1)")) and having the following formula (7) is preferable. At least one of a polymer of a repeating unit (hereinafter referred to as "polymer (B2)")). COOH (6) (wherein R5 represents a hydrogen atom or a methyl group.) R7

(wherein R6, R7 and R8 each independently represent a hydrogen atom or an alkyl group having a carbon number of 200941140 1-10; and X represents a monovalent organic group containing a propylene fluorenyl group or a methacryl fluorenyl group, a vinyl group or a methyl group; Vinyl; Y represents a divalent organic group; h represents an integer of 1-5.) In the above formula (7), R6 is preferably a hydrogen atom or a methyl group, more preferably a hydrogen atom. R7 and R8 are preferably a hydrogen atom. h is preferably 1. In the above formula (7), the monovalent organic group containing an acrylonitrile group or a methacryl group is preferably a group represented by the following formula (X-1) or the following formula (X-2). X in the above formula (7) is preferably a vinyl group or a vinyl group. ♦

(X -1) (wherein R16 represents a hydrogen atom or a methyl group; i represents an integer of 2-5; j represents an integer of 1-10;" represents a bond.) R17 *-Rie-c-ο-C2H4-Ο -CC " ch2 0 0 (X -2) (wherein r17 represents a hydrogen atom or a methyl group; and R18 represents a single bond, a methylene group, an alkylene group having 2 to 6 carbon atoms, or cyclohexane-1 , 2-diyl or 1,2-phenylene; " " represents a bond.) Y in the above formula (7) is preferably a methylene group, an alkylene group having 2 to 6 carbon atoms, and a carbon number. Is an alkenyl group of 2 to 6 (wherein the alkylene group and the deuterated group may be interrupted by an oxygen atom), cyclohexanediyl, cyclohexyl-14-200941140 diyl or the number of carbon atoms is a aryl group of 6 to 12 (wherein the aryl group may have a carboxyl group or an acid anhydride group), more preferably a methylene group, an ethyl group, a 1,3-propyl group, a 1,2-vinyl group, 1,2-extended propenyl, 1,3-extended propenyl, 2,3-extended propenyl, cyclohexane-1,2-diyl, 4-cyclohexene-1,2-diyl, 1, a divalent group represented by 2-phenyl, biphenyl-2,2'-diyl or -CH2-0-CH2-. (B) alkali soluble contained in the radiation sensitive composition of the present invention The lipid preferably has a repeating unit represented by the following formula (8) in addition to the repeating unit represented by the above formula (6) or the above formula (7), and a repeating unit represented by the following formula (9): a polymer of at least one repeating unit.

(8) (wherein R1 2 3 represents a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms.)

R15 R14 -15- 1 2 (wherein R1()-R15 independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a 3-hydroxymethyl group or a carboxyl group.) 200941140 In the above formula (8), the carbon number of R9 is The linear, branched or cyclic alkyl group of 1 to 12 may, for example, be a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a second butyl group or a third group. Butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-decyl, n-decyl, n-decyl, n-dodecyl, cyclopentyl, cyclohexyl and the like. Further, examples of the aryl group having 6 to 12 carbon atoms of R9 include a phenyl group, a benzyl group, a m-tolyl group, a p-tolyl group, a 1-naphthyl group, a 2-naphthyl group and the like. In the above formula (8), R9 is preferably a cyclohexyl group, a phenyl group or the like, and particularly preferably a phenyl group.卤 The halogen atom of 'R1()-R15 in the above formula (9) may, for example, be a chlorine atom, a bromine atom or an iodine atom, preferably a chlorine atom. In the above formula (9), 'R1()-R15 is preferably a hydrogen atom, or preferably r·2 is a chlorine atom, a hydroxyl group or a hydroxymethyl group, and R1° and R11 and Rl3-R15 are each a hydrogen atom, more preferably R1()-R15 are each a hydrogen atom. In the polymer (B1), the repeating unit represented by the above formula (6) is preferably 40% by weight, more preferably 5 to 30% by weight based on the total repeating unit of the polymer (B1). In the polymer (B 2 ), the repeating unit represented by the above formula (7) with respect to all repeating units of the polymer (B 2) is preferably from 5 to 80% by weight, more preferably from 10 to 60% by weight. When the proportion of the repeating unit represented by the formula (6) or the formula (7) in the (B) alkali-soluble resin is in the above range, the developability of the radiation-sensitive composition containing the same is improved, and the development can be more effectively suppressed. The generation of residue is preferred. It is preferred that the polymer (B1) and the polymer (B2) of the present invention contain the above formula of the range of 6% to 0.001% by weight based on the total amount of the polymer (B1) or the polymer (B2). The repeating unit represented by (8) preferably contains 5 to 4% by weight. Further, it is preferred that all of the repeating units of the polymer (B1) or the polymer (B2) are represented by the above formula (9) in which the polymer (B1) and the polymerization * (B2) are contained in an amount of 6% by weight or less. The repeating unit preferably contains 5 to 4% by weight. Further, the polymer (B1) and the polymer (B2) may contain both the repeating unit represented by the above formula (8) and the repeating unit represented by the above formula (9), in this case, with respect to the polymer (B1) or polymerization. The total repeating unit of the substance (B2) preferably has a total content ratio of 80% by weight or less, more preferably 10% to 70% by weight. In this case, the respective content ratios of the repeating unit represented by the above formula e (8) or the repeating unit represented by the above formula (9) are preferably within the range of the above enthalpy. When the content ratio of the repeating unit represented by the above formula (8) and the repeating unit represented by the above formula (9) in the polymer (B1) and the polymer (B 2) is in the above range, adhesion to the substrate can be further obtained. The advantage of improvement is therefore better. In the present invention, the polystyrene-equivalent weight average molecular weight (hereinafter, sometimes referred to as "Mw") measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran) of the (B) alkali-soluble resin is usually preferred. It is 1,000-45,000, and the best is 3,000-20,000. In the present invention, the polystyrene-equivalent number average molecular weight (hereinafter sometimes referred to as "Μη") measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran) of the (B) alkali-soluble resin is usually compared with The best is 1,000-45,000, and the best is 3,000-20,000. In this case, when the Mw is less than 1,000 Å, the residual film ratio of the obtained film is lowered from -17 to 200941140, or the pattern shape and heat resistance are deteriorated, or the electrical characteristics are deteriorated. If it exceeds 45,000, the resolution is improved. When the coating is reduced, or the shape of the pattern is damaged, or when the coating is performed by the slit nozzle method, drying of foreign matter is likely to occur. The polymer (B1) can be produced, for example, by subjecting a radically polymerizable compound formed with (meth)acrylic acid in a suitable solvent to 2,2'-azobisisobutyronitrile, 2,2'-even. Polymerization in the presence of a radical polymerization initiator such as nitrogen bis(2,4-dimethylvaleronitrile) or 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile). Further, the polymer (B1) may be subjected to radical polymerization of the radically polymerizable compound as described above, and then purified by a reprecipitation method using two or more organic solvents having different polarities. That is, the solution in the good solvent after polymerization is removed by filtration, centrifugation or the like as necessary, and then injected into a precipitant (poor solvent) in a large amount (usually 5 to 10 times the volume of the polymer solution). The polymer was reprecipitated for purification. At this time, among the impurities remaining in the polymer solution, impurities soluble in the precipitant remain in the liquid phase Q and are separated from the purified polymer (B1). Examples of the combination of the good solvent/precipitant used in the reprecipitation method include, for example, cyclohexanone/n-hexane, propylene glycol monoethyl ether/n-hexane, cyclohexanone/n-heptane, propylene glycol monoethyl ether/n-heptane, and the like. . Further, the polymer (B1) can also be produced by the above-mentioned radical polymerization initiator, and pyrazol-1-dithiocarboxylate cyano (dimethyl)methyl ester, pyridin-1-dithiocarboxylate. Benzyl acrylate, tetraethyl thiuram disulfide, bis(pyrazole-fluorenylthiocarbonyl) disulfide, bis(3-methyl-pyrazol-1-ylthiocarbonyl) disulfide, -18 - 200941140 Bis(4-methyl-pyrazol-1-ylthiocarbonyl) disulfide, bis(5-methyl-pyrazol-1-ylthiocarbonyl) disulfide, bis(3,4,5- Trimethyl-pyrazol-1-ylthiocarbonyl) disulfide, bis(pyrrole-1-ylthiocarbonyl) disulfide, dithiobenzamide disulfide, etc., function as an initiator-transfer-terminator (iniferter) In the presence of a molecular weight controlling agent in action, in an inert solvent, the reaction temperature is usually 〇-1 5 (TC, preferably 50 to 20 ° C, for living radical polymerization. In the polymer (B1)' The other U radical polymerizable compound which is preferably copolymerized with (meth)acrylic acid is a compound represented by the following formula (8-D (hereinafter sometimes referred to as "compound (bl)")), and the following formula (9_1) indicates a compound (hereinafter sometimes referred to as "compound (b2)"), and a radical polymerizable compound other than (meth)acrylic acid, compound (b1), and compound (b2) (hereinafter referred to as 'compound (b3) Further, in the polymer (B1), for example, an unsaturated isocyanate compound such as 2-(meth)acryloyloxyethyl isocyanate or 2-hydroxyethyl (meth)acrylate may be used. The polymer (B1) obtained by copolymerizing a hydroxyl group-containing radical polymerizable compound is reacted to introduce a polymerizable unsaturated bond into the side chain of the ruthenium polymer.

(wherein 'R9 is synonymous with R9 in the above formula (8).) -19- 200941140 p10

Ytt^R15 R "人?\^kR14 R12 R13 (9-1) (wherein, Rie-R15 is synonymous with R1〇_Rl5 in the above formula (9).) The above compound (bl) is (B) alkali soluble. A repeating unit represented by the above formula (8) is introduced into the resin. Specific examples of the compound (b1) include, for example, N-fluorenylmethylmaleimide, N-ethylmaleimide, and N-n-propyl group. Maleimide, N-isopropylmaleimide, N-n-butylmaleimide, N-t-butylmaleimide, N-n-hexylmaleimide, N-cyclopentylmaleimide, N-cyclohexylmaleimide, N-phenylmaleimide, N-1-naphthylmaleimide, etc. Among the above compounds (bl) Preferably, it is N-cyclohexylmaleimide, N-phenylmaleimide, particularly preferably N-phenylmaleimide. In the polymer (B1), the compound (bl) can be Used alone or in combination of two or more.

Cl V The above compound (b2) is introduced into the (B) alkali-soluble resin into a repeating unit represented by the above formula (9). Specific examples of the compound (b2) include, for example, terpene, 5-chlorodecene, 5-hydroxymethyldecene, 5-hydroxydecene, etc. Among the above compounds (b 2), preferred are terpenes, 5 - Chlorodecene, particularly preferably terpene. In the polymer (B1), the unsaturated compound (b 2) may be used singly or in combination of two or more. The above compound (b3) may, for example, be a crotonic acid, Unsaturated monocarboxylic acids such as α-chloroacrylic acid and cinnamic acid; -20- 200941140 Maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid, etc. Unsaturated dicarboxylic acid or its anhydride; succinic acid mono [2-(methyl) propylene methoxyethyl] ester, mono [2-(methyl) propylene methoxyethyl] phthalate a [(meth)acryloxyalkylene] ester of a divalent or higher polycarboxylic acid; a polymer having a carboxyl group and a hydroxyl group at both terminal ends, such as ω-carboxypolycaprolactone-(meth)acrylate Mono(meth)acrylates; o-vinylphenol, m-vinylphenol, p-vinylphenol, 2-mercapto-4-vinylphenol, 3-methyl- Unsaturated phenols such as 4-vinylphenol, o-isopropenylphenol, m-isopropenylphenol, p-isopropenylphenol; 2-vinyl-1-naphthol, 3-vinyl-1-naphthol' 1 - unsaturated naphthols such as vinyl-2-naphthol, 3-vinyl-2-naphthol, 2-isopropenyl-1-naphthol, 3-isopropenyl-1-naphthol; styrene, Α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxy styrene, p-methoxy styrene, o Vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, etc. Aromatic vinyl compounds; anthracene such as hydrazine or 1-methylhydrazine; methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate , n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, (meth)acrylic acid-21- 200941140 tert-butyl ester , 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, ( 2-hydroxybutyl methacrylate, 3-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate Ester, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, 2-methoxyethyl (meth)acrylate, 2-phenoxyethyl (meth)acrylate, (methyl) ) methoxy diglycol acrylate, methoxy triglycol (meth) acrylate, methoxy propylene glycol (meth) acrylate, methoxy propylene dimethacrylate (meth) acrylate, ( Isobornyl methyl methacrylate, tricyclo[5.2.1. 〇2'6] 癸-8-yl (meth) acrylate, 2-hydroxy-3 phenoxypropyl (meth) acrylate, one (meth)acrylic acid glycerol ester, 4-hydroxyphenyl (meth) acrylate, unsaturated carboxylic acid ester such as ethylene oxide modified (meth) acrylate of cumenyl phenol; ( 2-Aminoethyl methacrylate, 2-dimethylaminoethyl (meth)acrylate, 2-aminopropyl (meth)acrylate, 2-dimethyl@ylamine (meth)acrylate Alkyl propyl esters of propyl acrylate, 3-aminopropyl (meth) acrylate, 3-dimethylaminopropyl (meth) acrylate, etc.; (meth)acrylic acid a glycidyl ester of an unsaturated carboxylic acid such as glycidyl ester; a vinyl cyanide compound such as (meth)acrylonitrile or α-chloroacrylonitrile dimercaptoethylene; (meth) propyl amide, α-chloropropyl Unsaturated guanamines such as decylamine, Ν-2-mercaptoethyl (meth) acrylamide; -22- 200941140 Carboxyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate, etc. Acidic vinyl esters; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether; aliphatic groups such as 1,3-butadiene, isoprene, chloroprene, etc. a conjugated diene; a polymer molecular chain such as polystyrene, poly(methyl) methacrylate, poly(methyl) methacrylate or polyoxyalkylene has a (meth) acrylonitrile at the end ^ Based on macromonomers and so on. Ο In the polymer (B1), the compound (b3) is preferably a [(meth) propylene oxyalkyl] ester of a polybasic carboxylic acid having two or more conjugated polymers having a carboxyl group and a hydroxyl group at both terminal ends. Mono(meth)acrylates, unsaturated phenols, aromatic vinyl compounds, unsaturated carboxylic acid esters, macromonomers having a (meth)acryloyl group at the end of the polymer molecular chain, Particularly preferred is [2-(methyl)propenyloxyethyl] succinate, (〇-carboxypolycaprolactone-(meth)acrylate, p-isopropenylphenol, styrene, α-A Styrene, (meth) oxime methyl acrylate, n-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, (meth) acrylate Allyl ester, benzyl (meth) acrylate, phenyl (meth) acrylate, glycerol mono (meth) acrylate, 4-hydroxyphenyl (meth) acrylate, epoxy for cumenyl phenol Ethane modified (meth) acrylate, polystyrene macromonomer, polymethyl methacrylate macromonomer, etc. In the polymer (Β1), the compound (b 3) may be used singly or in combination of two or more. -23- 200941140 In addition, the polymer (B2) can be produced as follows: It contains the following formula (7-1) The polymer of the radically polymerizable compound (hereinafter sometimes referred to as "styrene epoxy polymer") formed by the compound (hereinafter sometimes referred to as "compound (b4)")) is added to the following formula. The compound represented by (7-2) (hereinafter referred to as "unsaturated monocarboxylic acid (X)") is added to a compound represented by the following formula (7-3) (hereinafter, referred to as "polybasic acid anhydride (y) )").

(wherein R6, R7, R8 and h are synonymous with r6, R7, R8 and h in the above formula (7), respectively.) (7-2)

H〇〇c—X (where X is synonymous with X in the above formula (7).)

0 (7-3) (wherein Y is synonymous with Y in the above formula (7).) -24- 200941140 Specific examples of the compound (b4) include, for example, o-vinylbenzyl glycidyl ether and m-vinyl group. Benzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-ethylene Glycidyl glycidyl ether, 2,3-diglycidoxymethylstyrene, 2,4-diglycidoxymethylstyrene, 2,5-diglycidoxymethylstyrene, 2 ,6-diglycidoxymethylstyrene, 2,3,4-triglycidoxymethylstyrene, 2,3,5-triglycidoxymethylstyrene, 2,3,6 - triglycidyloxymethyl styrene, 3,4,5-triglycidoxymethylstyrene, 2,4,6-triglycidoxymethylstyrene, and the like. Among the above compounds (b4), o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether and p-vinylbenzyl glycidyl ether are preferred, and p-vinylbenzyl glycidyl ether is particularly preferred. In the polymer (B 2), the compound (b4) may be used singly or in combination of two or more. In the styrene epoxy polymer, an example of the other radical polymerizable compound copolymerized with the compound (b4) is exemplified by the above compound (b1), the compound (b2) and the compound (b3). In the styrene epoxy polymer, the compound (b1) and the compound (b2) are preferably the same compound as the compound exemplified in the polymer (B1). Further, in the styrene epoxy polymer, the compound (b3) is preferably an aromatic vinyl compound, an unsaturated carboxylic acid ester, or a macromonomer having a (meth)acryl fluorenyl group at the terminal of the polymer molecular chain. Etc., particularly preferred are styrene, methyl styrene, methyl (meth) acrylate, n-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxy (meth) acrylate B-25- 200941140 Ester, allyl (meth) acrylate, benzyl (meth) acrylate, phenyl (meth) acrylate, glycerol mono (meth) acrylate, ring of p-alkenylphenol Oxyethane modified (meth) acrylate, polystyrene macromonomer, polymethyl methacrylate macromonomer, and the like. In the styrene epoxy polymer, each of the compound (b1), the compound (b2) and the compound (b3) may be used singly or in combination of two or more. The styrene epoxy polymer can be produced in the same manner as the polymer (B1), and its Mw and Μη can be set according to the Mw and Μη of the desired (B) alkali-soluble resin. The above unsaturated carboxylic acid (X) can be appropriately selected according to the kind of X required in the above formula (7). Preferred unsaturated carboxylic acids (X) include, for example, acrylic acid, methacrylic acid, carboxy-polycaprolactone monoacrylate, ω-carboxy-polycaprolactone monomethacrylate, 2-propenyloxy group. Ethyl succinic acid, 2-methyl propylene methoxyethyl succinic acid, and the like. In the above ω-carboxy-polycaprolactone monoacrylate and ω-carboxy-polycaprolactone monomethacrylate, the number of repeating units of polyhexanolactone is preferably from 1 to 10, more preferably from 2 to 5. . Among the above unsaturated carboxylic acids (X), acrylic acid or methacrylic acid is more preferred because it is highly reactive, and particularly preferably acrylic acid. The unsaturated carboxylic acid (X) may be used singly or in combination of two or more. The addition reaction of the unsaturated monocarboxylic acid (X) on the above styrene epoxy polymer can be carried out in accordance with a known method. The amount of the unsaturated monocarboxylic acid (X) to be used is preferably -26-200941140 0% with respect to 1 equivalent of the epoxy group of the styrene epoxy polymer. 7-1. The range of 3 equivalents is more preferably in the range of l 9 l 2 equivalents. The polybasic acid liver (y) may be selected according to the type of γ required in the above formula (7). Examples of preferred polybasic acid anhydrides (y) include, for example, malonic anhydride, maleic anhydride, citraconic anhydride, succinic anhydride, glutaric anhydride, glutaconic anhydride, itaconic anhydride, diglycol anhydride, O-benzoic anhydride 'cyclohexane-oxime' octacarboxylate anhydride, 4_cyclohexene oxime, 2 dicarboxylic anhydride, hydrazine anhydride, and the like. Among them, succinic anhydride, glutaric anhydride orthophthalic acid anhydride or 4-cyclohexene-1,2·dicarboxylic anhydride is particularly reactive, so that it is particularly preferable. The addition reaction of the polybasic acid anhydride (y) on the styrene epoxy polymer can be carried out in accordance with a known method. The amount of addition of 1 equivalent of the epoxy 'polyanhydride (y) to the styrene epoxy polymer is preferably 〇. 2_1 〇 equivalent range, more preferably 0. 4-0. A range of 9 equivalents. In the present invention, the polymer (B1) and the polymer (B 2) may each be used singly or in combination of two or more. Further, as the alkali-soluble resin, for example, a copolymer of (meth)acrylic acid and the above compound (b 3) and a polymerized anthracene (B1) and/or a polymer (B2) may be used together. In the present invention, the content of the alkali-soluble resin is usually preferably from 10 to 1,000 parts by weight, particularly preferably from 20 to 500 parts by weight, per 100 parts by weight of the (A) coloring agent. In this case, if the content of the alkali-soluble resin is less than 10 parts by weight, for example, the alkali developability is lowered, or a residue or dirt is generated on the unexposed portion of the substrate or the light-shielding layer; and if it exceeds 1,000 parts by weight, Then, since the concentration of the colorant is relatively lowered, it is difficult to achieve the target color density as a film. -27- 200941140 - (C) Monomer having two or more radically polymerizable unsaturated bonds - a monomer having two or more radically polymerizable unsaturated bonds in the present invention (hereinafter, sometimes referred to as "multifunctional" Examples of the monomer ") include di(meth)acrylates of alkylene glycols such as ethylene glycol and propylene glycol; and di(methyl) polyalkylene glycols such as polyethylene glycol and polypropylene glycol. Acrylates; poly(meth)acrylates of ternary or higher polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol or the like; or their dicarboxylic acid modified oximes; polyester, epoxy resin, Oligo(meth)acrylates such as urethane resins, alkyd resins, oxime resins, and spiro resins; poly-1,3-butadiene having hydroxyl groups at both ends, and hydroxyl groups at both ends Polyisoprene, poly(caprolactone) having a hydroxyl group at both ends, and the like, or a di(meth)acrylate of a polymer having a hydroxyl group at both ends; or a tris[2-(methyl)propenyloxyethyl group; Phosphate ester; or Q isocyanuric acid ethylene oxide modified triacrylate and the like. Among these polyfunctional monomers, poly(meth)acrylates of polyhydric alcohols having a ternary or higher or a dicarboxylic acid modification thereof are preferred, and specifically, trimethylolpropane is preferred. Triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethyl Acrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, pentaerythritol tri-28-200941140 monoester of acrylate and succinic acid, monoester of pentaerythritol trimethacrylate and succinic acid, dipentaerythritol a monoester of acrylate and succinic acid, a monoester of dipentaerythritol pentamethyl acrylate and succinic acid, and the like. From the viewpoints of high strength of the colored layer, excellent surface smoothness of the colored layer, and difficulty in generation of dirt and film residue on the unexposed portion of the substrate and the light shielding layer, it is particularly preferable to be trimethylolpropane triacrylate or pentaerythritol. Triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, a monoester of pentaerythritol triacrylate and succinic acid, and a monoester of diquaternium pentaerythritol pentaacrylate with succinic acid. The above polyfunctional monomers may be used singly or in combination of two or more. The content of the (C) polyfunctional monomer of the present invention is usually preferably from 5 to 500 parts by weight, particularly preferably from 20 to 300 parts by weight, per 100 parts by weight of the (B) alkali-soluble resin. In this case, when the amount of the polyfunctional monomer used is less than 5 parts by weight, the strength or surface smoothness of the colored layer tends to decrease. When φ exceeds 500 parts by weight, for example, the alkali developability is lowered, or Contaminants, film residues, and the like tend to occur on the unexposed portion of the substrate or on the light shielding layer. In the present invention, a part of the polyfunctional monomer may be replaced with a monomer having one radically polymerizable unsaturated bond (hereinafter sometimes referred to as "monofunctional monomer"). The above monofunctional monomer may, for example, be succinic acid mono-[2-(methyl) propylene methoxyethyl ester], phthalic acid mono [2-(methyl) propylene oxy oxyethylene -29- 200941140 a [(meth) propylene oxiranyl] ester of a divalent or higher polycarboxylic acid such as an ester; a ω-carboxypolycaprolactone mono(meth) acrylate having a carboxyl group and a hydroxyl group at both ends One (meth) acrylate of polymer; Ν-(meth) propylene hydrazinomorph, Ν-vinyl pyrrolidone, Ν-vinyl-ε-caprolactam; Μ-5600 (trade name, East Asian synthesis (stock) preparation) and so on. These monofunctional monomers may be used singly or in combination of two or more. The content of the monofunctional monomer is usually 90% by weight or less, preferably 50% by weight or less based on the total amount of the polyfunctional monomer and the monofunctional monomer. In this case, when the content ratio of the monofunctional monomer exceeds 90% by weight, the strength or surface smoothness of the obtained colored layer may be insufficient. . - (D) Radiation-induced Radical Generating Agent - The radiation-sensitive radical generating agent in the present invention refers to exposure of radiation such as visible light, ultraviolet light, far ultraviolet light, electron beam, or X-ray to cause the above-mentioned polyfunctional single The polymerization of a monofunctional Q monomer used as the case may be, thereby producing a living radical-releasing compound. Examples of the radiation-sensitive radical generating agent include, for example, an acetophenone-based compound, a biimidazole-based compound, a triazine-based compound, an anthraquinone-based fluorene-based compound, a benzoin-based compound, and an α-diketone-based compound. In the present invention, the radiation-sensitive radical generating agent may be used singly or in combination of two or more. However, the radiation-sensitive radical generating agent in the present invention is preferably selected from the group consisting of an acetophenone-based compound and a biimidazole-based compound. At least one of a triazine-based compound and a 0-fluorenyl fluorene-based compound -30- 200941140 In the present invention, the general content of the radiation-sensitive radical generating agent is usually relative to 100 parts by weight of the (C) polyfunctional monomer. Is 0. 01-120 parts by weight' is preferably 1-100 parts by weight. At this time, if the content of the radiation-induced linear radical generator is less than 0. 01 parts by weight, the curing by exposure is insufficient, and it is difficult to obtain a color filter in which the colored layer patterns are arranged in a predetermined arrangement; and if it exceeds 120 parts by weight, the formed coloring layer is easily formed from the substrate during development. The tendency to fall off. In a preferred radiation-sensitive radical generator of the present invention, specific examples of the acetophenone-based compound include 2-hydroxy-2-methyl-1-phenylpropan-1-one and 2-methyl group. 1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) Butyl-buxoton, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one, 1-hydroxycyclohexyl·benzene Keto' 2,2-dimethoxy-1,2-diphenylethan-1-one, 1,2-octanedione, and the like. Among these acetophenone-based compounds, particularly preferred are 2-methyl-1-[4-(methylthio) Q phenyl]-2-morpholinopropan-1-one and 2-benzyl-2-di Methylamino-1-(4-morpholinophenyl)butan-1-one, 2-(4-methylbenzyl)-2·(dimethylamino)-1-(4-morpholine Phenyl) butan-1-one, 1,2-octane, etc. The above acetophenone-based compounds may be used singly or in combination of two or more. In the present invention, the content of the acetophenone-based compound as the radiation-sensitive radical generating agent is usually preferably 0% by weight based on 1 part by weight of the (c) polyfunctional monomer. 01_80 parts by weight, more preferably 1 to 70 parts by weight, particularly preferably -31 - 200941140 1-60 parts by weight. In this case, if the content of the acetophenone-based compound is less than 重量1 part by weight, the curing by exposure is insufficient, and it is difficult to obtain a color filter in which the colored layer patterns are arranged in a predetermined arrangement; and if it exceeds 80 parts by weight 'The coloring layer formed tends to be easily detached from the substrate during development. Further, specific examples of the above biimidazole-based compound include 2,2,-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1. , 2, biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylbenzoquinonebiimidazole, 2,2'-double (2-Chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4 ',5,5'_Tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl 1,2- 2'-biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2' -bis(2,4-dibromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-tribromo Phenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, etc. Among these biimidazole compounds, 2,2'-bis(2-chlorophenylφ group is preferred )-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5' -tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2' -Link Oxazole, etc., particularly preferably 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole. These biimidazole compounds are in a solvent. It has excellent solubility, does not produce impurities such as undissolved matter and precipitates, and has high sensitivity. The curing reaction can be sufficiently carried out by low-energy exposure, and the curing reaction does not occur in the unexposed portion, so the coated film after exposure It can be clearly distinguished as a solidified portion which is insoluble in the developing-32-200941140 liquid and an uncured portion which has high solubility to the developing solution, whereby a high-definition color filter in which the undercut-cut coloring pattern is arranged in a predetermined arrangement can be formed. The above biimidazole compound may be used singly or in combination of two or more.  In the present invention, the content of the biimidazole-based compound as the radiation-sensitive radical generating agent is usually preferably 0. 0 parts by weight based on the total of 100 parts by weight of the (C) polyfunctional monomer. 01-4 parts by weight, more preferably 1-30 parts by weight, particularly preferably 1-20 parts by weight. At this time, if the content of the biimidazole compound is insufficient. 01 parts by weight, the curing by exposure is insufficient, and it is difficult to obtain a color filter in which the colored layer patterns are arranged in a predetermined arrangement; and if it exceeds 40 parts by weight, the coloring layer formed at the time of development is easily obtained from the substrate. The film on the surface of the peeled or colored layer tends to be rough. In the present invention, when a biimidazole-based compound is used as the radiation-sensitive linear radical generator, it is preferred to use the following hydrogen donor in combination to further improve the sensitivity. The term "hydrogen donor" as used herein means a compound which can supply a hydrogen atom to a radical generated by a bisimidazole compound by exposure. The hydrogen donor in the present invention is preferably a thiol compound or an amine compound defined below. The thiol compound includes a compound having one or more, preferably 1-3, more preferably 1-2 directly bonded fluorenyl groups on the mother nucleus, which has a benzene ring or a heterocyclic ring as a nucleus ( Hereinafter, it is referred to as "thiol-based hydrogen supply-33-200941140.  The amine-based compound includes a benzene ring or a heterocyclic ring as a core, and one or more, preferably 1-3, more preferably 1-2, directly bonded amine groups on the mother nucleus. The compound (hereinafter referred to as "amine-based hydrogen donor"). It is to be noted that these hydrogen donors may have both a mercapto group and an amine group. Hereinafter, the hydrogen donor will be described more specifically. The hydrogen donor may have one or more benzene rings or heterocycles, and may have both a benzene ring and a hetero ring. When two or more of these rings are present, the fused ring may or may not be formed. When the hydrogen donor has two or more mercapto groups, as long as at least one free mercapto group remains, the remaining one or more mercapto groups may be substituted with an alkyl group, an aralkyl group or an aryl group, and at least one free sulfhydryl group remains. It may have a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group, or a structural unit in which two sulfur atoms are bonded in the form of a disulfide. φ and 'thiol-derived hydrogen donor In the part other than the sulfhydryl group, a carboxyl group, an alkoxy ore group, or a substituted alkoxy group may be used. Substituted by a carbonyl group, a phenoxycarbonyl group, a substituted phenoxycarbonyl group, a nitrile group, etc. Specific examples of the above-mentioned thiol-based hydrogen donor include 2-mercaptobenzothiazole and 2-mercaptobenzoxazole, 2 - mercaptobenzimidazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto-2,5-dimethylaminopyridine, etc. These thiols are hydrogen donors Preferably, the 2-mercaptobenzothiazole and the 2-mad benzobenzophenone are particularly preferably 2-mercaptobenzothiazole. -34- 200941140 In addition, the amine-based hydrogen donor may have one or more benzenes respectively. The ring or heterocyclic ring may have both a benzene ring and a heterocyclic ring, and when it has two or more of these rings, it may or may not form a fused ring. Further, in the amine-based hydrogen donor, one or more amine groups may be used. Substituted by an alkyl group or a substituted alkyl group, and a moiety other than the amine group may be substituted by a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, a substituted phenoxycarbonyl group, a nitrile group or the like. Specific examples of the hydrogen donor include 4,4'-bis(dimethylaminoindenyl)benzophenone, 4,4'-bis(diethylamino)benzophenone, and 4-diethyl. Aminophenyl , 4-dimethylaminophenylpropanone, ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylaminobenzonitrile, etc. These amine systems In the hydrogen donor, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, and particularly preferably 4,4 are preferred. '-bis(diethylamino)benzophenone. It is to be noted that the amine-based hydrogen donor has a sensitizer even when a radical generator other than the conjugated carbamide compound is used. In the present invention, the hydrogen donor may be used singly or in combination of two or more, but it is preferable from the viewpoint that the formed coloring layer is hard to be detached from the substrate during development, and the strength and sensitivity of the colored layer are also high. In order to use one or more thiol-based hydrogen donors and one or more amine-based hydrogen donors. Specific examples of the combination of the thiol-based hydrogen donor and the amine-based hydrogen donor include 2-mercaptobenzothiazole/4,4'-bis(dimethylamino)benzophenone and 2-mercaptobenzoene. Thiazole/4,4, bis(diethylamino)benzophenone, 2-mercaptobenzoxazole-35- 200941140 /4,4'·bis(dimethylamino)benzophenone, 2-mercaptobenzoxazole/4,4,-bis(diethylamino)benzophenone, etc., a better combination is 2-mercaptobenzothiazole/4,4,-bis (two Aminophenone) benzophenone, 2-mercaptobenzoxazole/4,4,-bis(diethylamino)benzophenone, a particularly preferred combination is 2-mercaptobenzothiazole/4 , 4'-bis(diethylamino)benzophenone. In the combination of the thiol-based hydrogen donor and the amine-based hydrogen donor, the weight ratio of the thiol-based hydrogen donor to the amine-based hydrogen donor is usually from 1:1 to 1:4, preferably from 1:1 to 1. :3. In the present invention, the content of the hydrogen donor and the biimidazole compound is preferably 0 in combination with the total of 1 part by weight of the (C) polyfunctional monoterpene. 01-40 parts by weight, more preferably 1-30 parts by weight, particularly preferably 1.2 parts by weight. At this time, if the content of the hydrogen donor is less than 0. When the amount is 0.1 part by weight, the effect of improving the sensitivity tends to be lowered. When the amount is more than 40 parts by weight, the formed coloring layer tends to fall off from the substrate during development. Further, when the amine-based hydrogen donor is used in combination with a radiation-sensitive radical generator other than a biimidazole-based compound such as an acetophenone-based compound, it can function as a φ sensitizer. When an amine-based hydrogen donor is used as the sensitizer, the content thereof is usually preferably 300 parts by weight or less, more preferably 200 parts by weight or less based on 100 parts by weight of the radiation-sensitive radical generating agent other than the biimidazole-based compound. It is particularly preferably 100 parts by weight or less, but if the content is too small, it is difficult to obtain a sufficient effect. Therefore, the lower limit of the content is preferably 2 parts by weight, more preferably 5 parts by weight. Specific examples of the above triazine-based compound include 2,4,6-tris(trichloromethyl)-s-triazine and 2-methyl-4,6-bis(trichloromethyl)-s-three. Oxazine, 2-[2-(5- -36- 200941140 methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)_s_triazine, 2_[2_(furan-2- Vinyl]-4,6-bis(trichloromethyl)_s_triazine, 2-[2_(4-diethylamino-2-methylphenyl)ethenyl]-4,6 - bis(trichloromethyl)-s. Triazine, 2-[2-(3,4-dimethoxyphenyl)ethylidene]-4,6-bis(trichloromethyl)-5-triazine, 2-(4-methoxy) Phenyl)-4,6-bis(trichloromethyl)_s_triazine, 2-(4-ethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, A triazine-based compound having a halogenated methyl group such as 2_(4·n-butoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine. © Among these diazine-based compounds, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)-s-triazine is particularly preferred. The above triazine-based compounds may be used singly or in combination of two or more. In the present invention, the content of the triazine-based compound as a radiation-sensitive radical generating agent is preferably 0% with respect to 100 parts by weight of the (C) polyfunctional monomer. 01 to 40 parts by weight, more preferably 1 to 30 parts by weight, particularly preferably 1 to 20 parts by weight. At this time, if the content of the triazine compound is less than 0. 01 parts by weight, the curing by exposure is insufficient, and it is difficult to obtain a color filter in which the colored layer patterns are arranged in a predetermined arrangement; and if it exceeds 40 parts by weight, the formed coloring layer is easily formed on the substrate during development. The tendency to fall off. Specific examples of the above fluorene-fluorenyl fluorene-based compound include 1,2-octanedione-1-[4.(phenylthio)phenyl]-2-(0-benzoguanidinopurine), 1- [9-Ethyl-6-benzylidenyl-9H-indazol-3-yl]-decane-1,2-decane-2-indole-benzoic acid ester, 1-[9-B -6-benzylidenyl-9H-indazol-3-yl]-decane-1,2-decane-2-indole-37- 200941140-0-acetate, 1-[9-ethyl -6-benzylidenyl-9H-indazol-3-yl]-pentane-1,2-pentane-2_肟-0-acetate, 1-[9-ethyl-6-benzene Mercapto-9H-carbazol-3-yl]-octane-1-one oxime-0-acetate, 1-[9-ethyl-6-(2-methylbenzomethyl)-9H- Oxazol-3-yl]-ethane-1-one oxime oxime benzoate, i-[9-ethyl-6-(1,3,5-trimethylbenzylidene)-911 -oxazol-3-yl]-ethane-1-one oxime-indole-benzoate, 1-[9-butyl-6-(2-ethylbenzylidene)-9H-carbazole- 3-yl]-ethane-1-one oxime-0·benzoate, 1-[9-ethyl-6-(2-methylbenzomethyl)-9H-indazol-3-yl] 1-(0-acetamido)ethanone oxime, i-[9-ethyl-6-[2-methylindolyl-4-(2,2-dimethyl-1,3-dioxo) Amyl)methoxybenzylidene]-911-miso-3-yl]-1-(0-ethyl-branched) acetaminophen and the like. Among these fluorene-fluorenyl lanthanide compounds, particularly preferred is 1,2-octanedione-1-[4-(phenylthio)phenyl]-2-(0-benzylidene fluorenyl), 1-[ 9-ethyl-6-(2-methylbenzhydryl)-9-indazol-3-yl]-1-(indolyl)acetone oxime, 1-[9-ethyl-6 -[2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)methoxybenzylidene]-9Η-oxazol-3-yl]-1- (0-Ethyl) Ethylene and the like. ❹ The above 0-fluorenyl lanthanide compounds may be used singly or in combination of two or more. In the present invention, the content of the 0-fluorenyl fluorene compound as the radiation-sensitive radical generating agent is preferably 0% with respect to 100 parts by weight of the (C) polyfunctional monomer. 01 to 80 parts by weight, more preferably 1 to 60 parts by weight, particularly preferably 1 to 50 parts by weight. At this time, if the content of the 0-fluorenyl lanthanide compound is less than 0. 01 parts by weight, the curing by exposure is insufficient, and it is difficult to obtain a color filter in which the colored layer patterns are arranged in a predetermined arrangement; and if it exceeds 80 parts by weight - 38 to 200941140, the formed coloring layer is developed. There is a tendency to easily fall off from the substrate. —(E) Component— The component (E) in the present invention is a compound selected from the above formulas (1) to (5), a phenolic compound having a flavan skeleton, a phenolic compound having a spirobiindane skeleton, and At least one compound having a phenolic compound of a spirobiguanide skeleton. By containing this component, the pattern does not become defective or peeled off during development, and I undercuts. In the proximity exposure, the pattern line width can be suppressed from being wider than the design of the mask. In the compound represented by the above formula (1), the group A in the formula is preferably a -CO- group, a methylene group or an isopropylidene group. Further, Ri is preferably a hydrogen atom or an alkyl group or alkoxy group having 4 or less carbon atoms. Specific examples of the compound represented by the above formula (1), for example, examples of the (poly-perylene) benzophenones include 2,3,4·trihydroxybenzophenone, 2,4,6-three. Hydroxybenzophenone, 2,2,,4,4,-tetrahydroxybenzophenone, 〇2,3,4,3'·tetrahydroxybenzophenone, 2,3,4,4'. -tetrahydroxybenzophenone, 2,3,4,2'-tetrahydroxy-4,-methylbenzophenone, 2,3,4,4'-tetrahydroxy-3'-methoxydiphenyl Methyl ketone, 2,3,4,2,,6'_ pentahydroxybenzophenone, 2,4,6,3',4',5'_ hexa-benzophenone, 3,4,5 Examples of 3,4,4,5'-hexahydroxybenzophenone and the like; ^(phenyl)alkane can be exemplified by bis(p-hydroxyphenyl)methane or the like; bis(polyphenylene) chain Examples of the alkanes include bis(2,4-dihydroxyphenyl)methyl, bis(2,3,-4-trihydroxyphenyl)methane, and 2,2_bis (2,3,4_3). -39- 200941140 Hydroxyphenyl)propane, etc. In the compound represented by the above formula (2), R1 in the formula is preferably an amino group or a group having 4 or less carbon atoms. In the formula, R4 is preferably a hydrogen atom or an alkene having 6 or less carbon atoms. . Specific examples of the compound represented by the above formula (2) include, for example, tris(p-hydroxyphenyl)methane, anthracene, 1, tris(p-hydroxyphenyl)ethane, bis(2,5-dimethyl-4) -Hydroxyphenyl)-2-hydroxyphenylmethane, 2-[bis{(5-isopropyl-4-hydroxy-2-methyl)phenyl}methyl]phenol, and the like. In the compound represented by the above formula (3), the group A in the formula is preferably a methylene group. R1 in the formula is preferably a hydrogen atom or an alkyl group having 4 or less carbon atoms; and R4 is preferably a hydrogen atom or an alkyl group having 6 or less carbon atoms. Specific examples of the compound represented by the above formula (3) include 1,1,3-tris(2,5-dimethyl-4-hydroxyphenyl)-3-phenylpropane and the like. In the compound represented by the above formula (4), R1 in the formula is preferably a hydrogen atom, and R2, R3 and R4 are preferably a hydrogen atom or an alkyl group having 6 or less carbon atoms. Specific examples of the compound represented by the above formula (4) include, for example, 4,4'-[1-[4-[1-[4-hydroxyphenyl]-1-methylethyl]phenyl]phenylene Base] Bisphenol and the like. In the compound represented by the above formula (5), R1 in the formula is preferably a hydrogen atom, and R2, R3 and R4 are preferably a hydrogen atom or an alkyl group having 6 or less carbon atoms. Specific examples of the compound represented by the above formula (5) include, for example, 4,6-bis{1_(4-hydroxyphenyl)_1-methylethyl}_13-dihydroxybenzene, and [1-(3-( 1-(4-hydroxyphenyl)methylethyl b 4,6-dihydroxyphenyl)-1- -40- 200941140 methylethyl]-3·(1-(3-{1-(4- Hydroxyphenyl)-p-methylethyl}-4,6-dihydroxyphenyl)-1-methylethyl)benzene, etc. Specific examples of the above phenolic compound having a flavan skeleton include, for example, 2-methyl group. 2-(2,4-Dihydroxyphenyl)-4-(4-hydroxyphenyl)-7-hydroxychroman, 2,4,4-trimethyl-7,2',4'-trihydroxy Specific examples of the above phenolic compound having a spirobiindane skeleton include, for example, 3,3,3',3'-tetramethyl-1,1'-spiroindole-5,6, 7,5',6',7'-hexanol oxime, etc. Specific examples of the above phenolic compound having a spirobiguanide skeleton include, for example, 3,3'-dimethyl-1,1'-spirobiguanide. -5,6,7,5',6',7'-hexanol, etc. Among these compounds, a (polyhydroxy)benzophenone, a compound represented by the above formula (4), and a flavan skeleton are preferable. Phenolic compounds a compound; particularly preferred is 2,3,4-trihydroxybenzophenone, 2,3,4,4'-tetrahydroxybenzophenone, 2,3,4,2',6'-pentahydroxydiene Benzene, 4,4'-[1-[4-[1-[4-hydroxyphenyl Q-yl]-1-methylethyl]phenyl]ethylidene]bisphenol, 2-methyl-2 -(2,4-dihydroxyphenyl)-4-(4-hydroxyphenyl)-7-hydroxychroman" In the present invention, (E) with respect to 1 part by weight of (B) alkali-soluble resin The content of the component is preferably 0. It is preferably 1 to 10 parts by weight, more preferably 1 to 5 parts by weight, particularly preferably 1 to 3 parts by weight. At this time, if the content of the (E) component is insufficient. When 1 part by weight, there is a possibility that the desired effect cannot be obtained. On the other hand, if it exceeds i by weight, the formed pattern tends to be easily detached from the substrate during development. —Additive~~41- 200941140 The radiation sensitive composition of the present invention contains the above components (A) to (E), but may further contain other additives as needed. Examples of the other additives include a chelating agent such as glass or alumina, a polymer compound such as polyvinyl alcohol or poly(fluoroalkyl acrylate), a nonionic surfactant, a cationic surfactant, and an anionic interface. Surfactant such as active agent; vinyl trimethoxy decane, vinyl triethoxy decane, vinyl tris(2-methoxyethoxy) decane, N-(2-aminoethyl)-3- Aminopropylmethyldimethoxydecane, N-(2-aminoethyl)-3-aminopropylpropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-shrinkage Glyceroxypropyltrimethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropylmethyl An adhesion promoter such as dimethoxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane or 3-mercaptopropyltrimethoxydecane; 2,2 Antioxidants such as '-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-t-butylphenol; 2-(3-tert-butyl-5-methyl-2 -hydroxyphenyl fluorenyl)-5- Ultraviolet absorbers such as benzotriazole and alkoxybenzophenone; anti-agglomerating agents such as sodium polyacrylate; malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid, etc. Alkali solubility improver, etc. Solvent The sensitizing radioactive composition for forming a colored layer of the present invention contains the above-mentioned (Α)·(Ε) component as an essential component, and if necessary, the above-mentioned additive component, but usually is mixed with a solvent to prepare a liquid composition. The solvent may be appropriately selected and used as long as it disperses or dissolves the -42-200941140 (A)-(E) component or the additive component constituting the radiation sensitive composition and does not react with these components and has moderate volatility. The above solvent may, for example, be exemplified by: ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, two Glycol-n-propyl ether, diethylene glycol-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, one Dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, propylene dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. An alkylene glycol monoalkyl ether. ; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol methyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether (poly)alkylene glycol monoalkyl ether acetates such as acetate and 3-methoxybutyl acetate; stilbene dimethyl ether, diethylene glycol methyl ethyl ether, digan Other ethers such as alcohol diethyl ether and tetrahydrofuran; ketones such as butanone, cyclohexanone, 2-heptanone and 3-heptanone; alkyl lactates such as methyl lactate and ethyl lactate; 2-hydroxy-2- Ethyl methacrylate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxylate Ethyl acetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl Propionic acid-43- 200941140 Ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, butyric acid Ethyl ester, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, Other esters such as methyl ketone, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxobutanoate, etc.; aromatic hydrocarbons such as toluene and xylene : decylamine such as N,N-dimethylformamide, N,N-dimethylacetamide or N-methylpyrrolidone or an indoleamine. Among these solvents, from the viewpoints of solubility, pigment dispersibility, coatability and the like, 'preferably propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate Ester, 3-methoxybutyl acetate, diglyme, diethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl lactate, 3-methyl Ethyl oxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate, n-butyl acetate, acetic acid Butyl ester, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, isopropyl butyrate, n-butyl butyrate, ethyl pyruvate, and the like. The above solvents may be used singly or in combination of two or more. The above solvent may also be combined with benzyl ether, di-n-hexyl ether, acetone acetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, decyl decyl alcohol, benzyl alcohol, acetic acid vinegar, ethyl benzoate. A high boiling point solvent such as diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate or ethylene glycol monophenyl ether acetate is used in combination. -44- 200941140 The above high boiling point solvents may be used singly or in combination of two or more. The content of the solvent is not particularly limited, and the total concentration of each component after the solvent is removed from the composition is usually from 5 to 50% by weight, particularly preferably from 10 to 40, from the viewpoints of coatability and stability of the obtained radiation sensitive composition. The amount of % weight. Color filter The color filter of the present invention comprises a coloring layer formed of the radiation-sensitive composition for forming a colored layer of the present invention. 〇 Hereinafter, a method of forming the color filter of the present invention will be described. First, on the surface of the substrate, a light-shielding layer is formed as needed to partition a portion where a pixel is formed, and a liquid composition such as a radiation-sensitive linear composition in which a red pigment is dispersed is applied onto the substrate, and then pre-baked to evaporate the solvent. Forming a coating film. Then, the coating film is exposed through a photomask, and then developed using an alkaline developing solution to dissolve and remove the unexposed portion of the coating film, and then post-baking is performed to form a red pixel pattern. Array. Thereafter, coating, prebaking, exposure, development, and post-baking of each liquid composition are carried out on the same substrate by using a liquid composition of each of the radiation-sensitive linear compositions in which green or blue pigment is dispersed. A green pixel array and a blue pixel array are sequentially formed to obtain a color filter in which a pixel array of three primary colors of red, green, and blue is disposed on the substrate. However, the order of formation of the respective color pixels in the present invention is not limited to the above order. In addition, The black matrix can be formed by using the sensitizing layer for forming a coloring layer of the present invention -45-200941140, in the same manner as in the case of forming the above-mentioned pixels. As the substrate used in forming the pixel and/or the black matrix, there may be mentioned, for example, glass, ruthenium, polycarbonate, polyester, aromatic polyamine, polyamine-imine, polyimine or the like. Further, if necessary, these substrates may be subjected to a suitable pretreatment such as drug treatment, plasma treatment, ion plating, sputtering, gas phase reaction method, or vacuum vapor deposition using a decane coupling agent or the like. When the liquid composition of the radiation-linear composition is sensed, a spray method, a roll coating method, a spin coating method (spin coating method), a slit die coating method, a bar coating method, an inkjet method, or the like may be used. The coating method is particularly preferably a spin coating method or a slit die coating method. The coating thickness is usually 0, 1-10 Am, preferably 0. 2-8. 0 #m, especially good 0. 2-6. 0 Am. The radiation used for forming the pixels and/or the black matrix may be, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray or the like, and radiation having a wavelength in the range of 190 to 50 50 nm is preferable. The exposure amount of the radiation is preferably from 10 to 10,000 J/m2. As the above alkaline developing solution, for example, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5. 4. 0]-7-undecene, 1,5-diazabicyclo-[4. 3. An aqueous solution of 0]-5-pinene or the like. A water-soluble organic solvent such as methanol or ethanol or a surfactant may be added to the alkaline developing solution in an appropriate amount. Further, it is usually washed with water after alkaline development. -46- 200941140 As the development processing method, a shower development method, a spray development method, a soaking (immersion) development method, a stirring (a large amount of liquid) development method, or the like can be applied. The developing conditions are preferably carried out at room temperature for 5 to 300 seconds. The color filter 'of the present invention obtained in this manner is extremely useful in high-definition color liquid crystal display elements, color image sensor elements, color sensors, and the like. Color liquid crystal display element The color liquid crystal display element of the present invention comprises the color filter of the present invention. As one embodiment of the color liquid crystal display element of the present invention, it is possible to form a pixel and/or a black matrix by using the sensitizing radiation composition for forming a coloring layer of the present invention as described above, and to form a pixel and/or a black matrix as described above. Fine color liquid crystal display elements. [Example 1] Hereinafter, examples of the present invention will be specifically described by way of examples. However, the invention is not limited to the following embodiments. The Mw and Μη of the resin obtained in each of the following Synthesis Examples were measured by gel permeation chromatography (GPC) of the following specifications. Device: GPC-101 (prepared by Showa Denko (share)). Column: Combine GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804. Eluent solvent: contains 0. 5% by weight of phosphoric acid in tetrahydrofuran. Synthesis of alkali-soluble resin - 47 - 200941140 Synthesis Example 1 To a flask equipped with a condenser and a stirrer, 3 parts by weight of 2,2'-azobisisobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate were added, followed by 20 parts by weight of methacrylic acid, 30 parts by weight of N-phenylmaleimide, 30 parts by weight of benzyl methacrylate, 20 parts by weight of styrene and 5 parts by weight of a chain transfer agent as a molecular weight controlling agent-α- The methyl styrene dimer was subjected to nitrogen substitution, and then the reaction solution was heated to 80 ° C while stirring slowly, and the temperature was maintained at this temperature for 3 hours. Add 0. 5 parts by weight of 2,2'-azobisisobutyronitrile, which was further polymerized for 1 hour', then the reaction solution was raised to 100 ° C, and polymerization was continued for 1 hour, thereby obtaining a resin solution (solid content concentration = 33. 0% by weight). The obtained resin had Mw = 9,500' (Mw/Mn) = 2. 0. This resin was referred to as "resin (B-1)". Synthesis Example 2 To a flask equipped with a condenser and a stirrer, 4 parts by weight of 2,2'-azobisisobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate were added, followed by @15 parts by weight of methacrylic acid, 20 Parts by weight of N-phenylmaleimide, 35 parts by weight of benzyl methacrylate, 1 part by weight of styrene, 10 parts by weight of glycerol monomethacrylate, 1 part by weight of ω-carboxypoly Ester monoacrylate and 6 parts by weight of a chain transfer agent as a molecular weight controlling agent, α-methyl benzene ethane dimer, subjected to nitrogen substitution 'and then slowly stirred' while raising the reaction solution to 80 ° C, maintaining the temperature Polymerization for 3 hours. Add 0. 5 parts by weight of 2,2,-azobisisobutyronitrile was repolymerized for 1 hour and then the reaction solution was raised to 10 Torr. (:, the polymerization was continued for 1 hour, thereby obtaining a resin solution (solid content concentration -48 - 200941140 degrees = 33. 0% by weight). The obtained resin had Mw = 7,500, and this resin was referred to as "resin (B_2)". Synthesis Example 3 To a flask equipped with a condenser and a stirrer, nitrogen diisobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether 15 parts by weight of methacrylic acid, 30 parts by weight of decene, benzyl tetradecanoate, and 10 parts by weight of propylene were added. Triol-methacrylate carboxypolycaprolactone monoacrylate and 5 parts by weight as a chain transfer agent-α-methylstyrene dimer, while slowly stirring nitrogen, the reaction solution is heated to 8 (TC, 3 hours. Add 0. When 5 parts by weight of 2,2'-azobisisobutylene was used, the reaction solution was then raised to 100 ° C, and polymerization was continued to the resin solution (solid content concentration = 33. 0% by weight). =11,000, (Mw/Mn) = 2. 2. This resin was used as a synthesis example 4, and a flask equipped with a condenser and a stirrer was added with nitrogen diisobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether 15 parts by weight of methacrylic acid, and 25 parts by weight of N-phenyl by weight of methyl group. Benzyl acrylate, 15 parts by weight of styrene alcohol monomethacrylate, 10 parts by weight of ω-carboxypolyacetate, and 5 parts by weight of a chain transfer olefin dimer as a molecular weight controlling agent, undergoing nitrogen substitution' and then slowly stirring the solution to raise the temperature To 80 ° C, maintain the temperature for 3 hours (Mw / Mn) = 2. 1. 3 parts by weight of 2,2'-monoester, followed by addition of parts by weight of methacrylic acid, 5 parts by weight of ω-molecular weight controlling agent, and then polymerizing the nitrile while maintaining the temperature, and further polymerizing for 1 hour and 1 hour, thereby obtaining the obtained product Mw 'resin (B-3)" of the resin. 3 parts by weight of 2,2' acrylate, followed by maleic imine, 25, 10 parts by weight of propylene tricaprolactone-acrylic acid-α-methyl Mix benzene and ethylene, and add the reaction. Add 0. 5 wt-49- 200941140 parts 2,2'-azobisisobutyronitrile'repolymerization for 1 hour, then the reaction solution was raised to 100 ° C 'to continue polymerization for 1 hour' to thereby obtain a resin solution (solid content concentration = 33 . 0% by weight). The obtained resin]\4西=1〇,〇〇〇,(1^/1^11)= 2. 2. This resin was referred to as "resin (B-4)". Synthesis Example 5 To a flask equipped with a condenser and a stirrer, 4 parts by weight of 2,2'-azobisisobutyronitrile and 200 parts by weight of propylene glycol monoethyl ether were added, followed by 15 parts by weight of methacrylic acid and 30 parts by weight of decene. 35 parts by weight of methacrylic acid ester' 20 parts by weight of glycerol monomethacrylate and 6 parts by weight of a chain transfer agent-α-methylstyrene dimer as a molecular weight controlling agent, subjected to nitrogen replacement, and then slowly The reaction solution was heated to 80 ° C while stirring, and the temperature was maintained at this temperature for 3 hours. Add 0. 5 parts by weight of 2,2'-azobisisobutyronitrile was further polymerized for 1 hour, and then the reaction solution was raised to 10 ° C, and polymerization was continued for a few hours, thereby obtaining a resin solution (solid content concentration = 33. 0% by weight). The obtained resin had Mw = 12,000, (Mw/Mn) = 2. 2. This resin was designated as "tree φ grease (B-5)". Synthesis Example 6 In a flask equipped with a condenser and a stirrer, '40 parts by weight of p-vinylbenzyl glycidyl ether and 27 parts by weight of N-phenyl horse The imine, 17 parts by weight of styrene and 16 parts by weight of benzyl methacrylate are dissolved in 300 parts by weight of propylene glycol monomethyl acetate, and then 4 parts by weight of 2,2'-azobisisobutyronitrile are added. And 6 parts by weight of ct-methylstyrene dimer' followed by purging nitrogen for 15 minutes. After purging the nitrogen, the reactor was heated to 80 ° C with stirring for 5 hours, -50-200941140 a resin solution of 25 % by weight of styrene epoxy resin. The Mw of the styrene epoxy resin is 6,000 '(Mw/Mn) = 2. 5. To the flask, 200 parts by weight of the obtained resin solution containing a styrene epoxy resin, 10 parts by weight of methyl methacrylate as the unsaturated monocarboxylic acid (X), and 0. 2 parts by weight of p-methoxyphenol, 0. 2 parts by weight of tetrabutylammonium bromide and 300 parts by weight of propylene glycol monomethyl ether acetate were reacted at a temperature of 120 ° C for 9 hours. Thus, one equivalent of methacrylic acid is reacted with one equivalent of an epoxy group of the styrene epoxy resin. Further, 16 parts by weight of 4-ecyclohexene-1,2-dicarboxylic anhydride as a polybasic acid anhydride (y) was added, and the mixture was reacted at 80 t for 6 hours. The liquid temperature of the reaction mixture was maintained at 80 ° C, and the mixture was washed twice with water in this state, and concentrated under reduced pressure to obtain a resin solution containing 20% by weight of an alkali-soluble resin. The obtained resin had Mw = 7,800, (Mw/Mn) = 2. 6. This resin was referred to as "resin (B-6)". Preparation of Pigment Dispersion Preparation Example 1 φ 15 parts by weight of C as a coloring agent (A). I. Pigment Red 254/C. I. Pigment red 1 77 = 80/20 (by weight) mixture, 4 parts by weight as a dispersing agent (in terms of solid content) Disperbyk-2001, and 6 parts by weight of (B) alkali-soluble resin (in terms of solid content) (B-1) And 75 parts by weight of propylene glycol monomethyl ether acetate as a solvent were treated with a sand mill to prepare a pigment dispersion liquid (r). Preparation Example 2 15 parts by weight of C as a coloring agent (A). I. Pigment Green 36/C. I. Pigment Yellow 138/C. I. Pigment Yellow 1 50 = 50/40/10 (by weight) mixture, 4 parts by weight of Dispersion-51-200941140 (in terms of solid content) Disperbyk-2001, and 5 parts by weight of (B) alkali-soluble resin (solid content In the same manner as in Example 1, 76 parts by weight of propylene glycol monomethyl ether acetate as a solvent was converted to prepare a pigment dispersion liquid (g). Preparation Example 3, 15 parts by weight of C as a coloring agent (A). I. Pigment Blue 15 : 6/C. I. Pigment Violet 23 = 95/5 (by weight) mixture, 4 parts by weight as a dispersant (in terms of solid content), Disperbyk-2001, and (B) 5 parts by weight of alkali-soluble resin (in terms of solid content) (B-2) And 76 parts by weight of propylene glycol monomethyl ether acetate as a solvent, the same treatment as in Example 1 was carried out to prepare a pigment dispersion liquid (b) 〇 Preparation Example 4 20 parts by weight of carbon black as (A) coloring agent 2 parts by weight of the dispersant (in terms of solid content) Disperbyk-2001, 4 parts by weight of (B) alkali-soluble resin (in terms of solids) (B-3) and as a solvent 74 parts by weight of 3-methoxybutyl acetate was subjected to the same treatment as in Example 1 to prepare a pigment dispersion (bk1). Preparation Example 5 20 parts by weight of carbon black (manufactured by Royal Chinese Co., Ltd.) as a coloring agent (A), 2 parts by weight (in terms of solid content) Disperbyk-167 as a dispersing agent, and (B) an alkali-soluble resin 3 parts by weight (in terms of solid content) (B-3) and 75 parts by weight of 3-methoxybutylacetic acid vinegar as a solvent were subjected to the same treatment as in Example 1 to prepare a pigment dispersion liquid (bk2). -52-200941140 Example 1 Preparation of a liquid composition 100 parts by weight of a pigment dispersion liquid (as a (B) alkali-soluble resin (6 parts by weight (solid content conversion) resin (B-4)) as (c 8 parts by weight of difunctional pentaerythritol hexaacrylate, 3 parts by weight of 2-hydroxy-2-meryl-2-dimethylamino-1-(4-) Phenyl)butan-1-one (trade name: IRGACURE 369, prepared by Ciba Specialty Chemicals), as component (E). 5 parts by weight of 4,4'-[1-[4-[1-[4-hydroxyphenyl]-1-methylethyl]phenyl]indenyl]bisphenol and 150 parts by weight as a solvent A liquid composition (R1) for forming a colored layer was prepared by mixing 3 - ethoxypropionic acid ethyl vinegar and 25 parts by weight of propylene glycol monomethyl ether acetate. The liquid composition (R1) was evaluated in the following order. Evaluation results See Table 2 ^ Formation of the pattern The liquid composition Q (R1) was applied onto the surface of the glass substrate by a spin coater, and then prebaked at 90 ° C for 2 minutes to form a film thickness of 2. 5 Am film. Thereafter, the substrate was cooled to room temperature, and the coating film on the substrate was exposed through a mask with an exposure gap of 200 #111 and an exposure amount of 1,000 Å/1112 using a high pressure mercury lamp. Then, the coating film on the substrate was sprayed at a temperature of 23 ° C at a developing pressure of 2 kg f/cm 2 (nozzle diameter of 1 mm). A 04% by weight aqueous solution of potassium hydroxide was spray-developed for 50 seconds' and then post-baked at 230 ° C for 30 minutes to form a pixel array in which a red line/space (L/S) pattern was arranged on the substrate. Evaluation -53- 200941140 When the pixel array on the substrate was observed using an optical microscope, no defect was confirmed at the edge of the pixel pattern. Further, when the cross section of the pixel pattern on the substrate was observed by a scanning electron microscope (SEM), the undercut was not confirmed. When the line width of the pixel pattern formed by the mask having a slit width of 90 Å was measured by an optical microscope, the line width was 93. 0 A m. Example 2 -1 7 and Comparative Example 1 - 6 The same operation as in Example 1 was carried out except that the type and amount of the constituent components in Example 1 were changed as shown in Table 2 to prepare a liquid composition ( R2)-(R3), (G1)-(G3), (B1)-(B3), and (BK1)-(BK14). Then, in addition to using the liquid compositions (R2)-(R3), (G1)-(G3), (B1)-(B3), (BK1)-(BK14) instead of the liquid composition (R1), The same operation as in Example 1 was carried out, and evaluation was performed. The results are shown in Table 2.

-54- 200941140 [I揪] Solvent 1 ϋ ίβ 150/25 150/25 1 125/50 1 125/50 150/25 150/25 125/50 1 125/50 125/50 125/50 1 125/50 I 125/50 125/50 1 125/50 1 125/50 125/50 1 125/50 150/25 125/50 150/25 1 125/50 1 125/50 1 125/50 I 1 m EEP/PGMEAI EEP/ GM/PGMEA MBA/PGMEA EEP/PGMEA lS S a. PGMEA EEP/PGMEA MBA/PGMEA EEP/PGMEA MBA/PGMEA Additives 1 1 \ 5 s LT3 c=5 LO sssss tA in ΪΤ» S 1 5 s IA s 0.5/0.08 knees 1 1 丄I CM 丄oi lL CM 丄CM 丄eJ 丄C4 丄04 丄OJ LI. CM 丄Csl 丄CM 丄CM iL CJ LL·. 1 I OJ Ul. CM JL CSJ JL F-2/F-3 E component 1 a ut> ur» —1 if» ixn 5 II cx> 苕3 stupid s OP 〇e> i » 1 I 1 1 1 郷 τ —· 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山Io mountain 1 t 1 1 1 1 photopolymerization initiator 1 tft part CO : c〇: CO _| two <〇Ώ esi s 9X9 Osi s ur> CN* _J &r> cnI s tr> 〇j CO 1 CO CO c*> s 3 Jun 35l P X- τ— A ϊ τ— A CJ —1 Csl CO Λ CO Λ CO A CO ό CO Λ CQ Λ CO Q CO Λ CO CO 1 O 3 丄1 CSI Λ CO Λ CO Λ oo Λ SS Miscellaneous 1 簠 * share. L οο ΟΟ 〇〇e〇cr><〇CO<〇CO CO <〇«〇CO eo GO丨<〇CO 1 P Τ Ο τ τ— ο C-1 ▼— Λ ώ Λ C-1/C-2 ▼— 1 o T— Λ lt— Λ T— 〇▼— Λ 1 Λ T— 可溶性 Solubility Solvent 1 i CO CO r— r «—C〇<〇L〇ir> CO CO CO CO eo CO CO CO CO CO r — CO ΙΑ CO CO | P LO inch CD to 丄CD m to CD <〇03 tr> CD u> CD CO Λ U> CD to 03 iO cL u> occupies U> occupies LO 甘 dust LO ώ tr> mm-wm 1 霞量份 S — S η ssssss S s Q ss SBO is 1 ss 3 1 1 — s '« «MJ knee 35« W tkfl -° 1 Oj OJ oa S ou txO -O Csl § rnmtm 鲫 dwarf mm 1 CNI 5 : CD B 1 CM 〇〇i CM CO CD i ir> CQ CO m £ m GO σ gt Ax I BK10 3 CO _ CO ss IBK12 IBK13 I BK14 1 embodiment ιy 1 embodiment 2 1 | example 3 1 | K example 4 { Example 5 I | Example 6 | | Example 7 | | Example 8 Example 9 - Example 10 | «Example 11 fl I | Example 13 i K. | Example 15 1 Example 16 | Example π | Ratio i i | Comparative Example 2 1 Comparative Example 3 | Comparative Example 4 | Comparative Example 5 t Comparative Example 6 - 55 - 200941140 In Table 1, the respective components are as follows. C-1: dipentaerythritol hexaacrylate C-2: tris(2-hydroxyethyl)isocyanuric acid triacrylate (trade name M-315, manufactured by Toagosei Co., Ltd.) D-1 : 2-benzyl-2 -Dimethylamino-1-(4-morpholinophenyl)butan-1-one (trade name: IRGACURE 369, prepared by Ciba Specialty Chemicals) D-2: 2-methyl-1-[4- (Methylthio)phenyl]-2-morpholinopropan-1-one (trade name: IRGACURE 907, prepared by Ciba Specialty Chemicals) 〇D-3: 1-[9-ethyl-6·(2- Methyl benzhydryl)-9H-carbazol-3-yl]-l·(O-ethinyl)ethanone oxime (trade name: IRGACUREOX02, prepared by Ciba Specialty Chemicals) Ε-1:4,4' -Π-[4-[1-[4-Hydroxyphenyl]-1-methylethyl]phenyl]ethylidene]bisphenolphthalein-2 : 2,3,4-trihydroxybenzophenone oxime -3 : 2,3,4,4'-tetrahydroxybenzophenone oxime-4: 2-methyl-2-(2,4-dihydroxyphenyl)-4-(4-hydroxyphenyl)- 7-Hydroxyβ base color Ε-5 : 2,3,4,2',6,pentahydroxybenzophenone F-1 :malonic acid F-2 :nonionic surfactant (trade name Α-60 , Kao (stock) prepared) F-3: polymerization inhibitor phenothiazine oxime: 3-ethoxypropionate ethyl ester PGMEA: propylene glycol monomethyl ether acetate MBA : 3-methoxybutyl acetate -56- 200941140

[cslm] Line width of the formed pattern (μιη) 1 Mask with a slit width of ΙΟμπι | 1 1 1 1 i 1 LO <〇ip oo csi C\J CSI CO 丨 Pattern shedding 1 s 〇> 〇 > 5 ΙΟ1 1 I ur> oo CO ffl case shed | Shield 1 with a slit width of 3 〇 nm 1 I i 1 CO esi CO oo 〇> CM S CO to CO CNI CNJ n CM CO CA CM GO 1 1 1 <£> CO 5 CO ie><〇CM mask with a face width of 90 〇CO cx> CO A ir> CsJ CO m 〇> CO CO 1 f 1 i 1 1 1 1 1 1 1 s 〇> CSI 窆CNI 〇> 1 1 1 State of the pattern defect m 壊mmmm 璀 destroy m destroy mmmmmmm follow m 破 bottom cut m soil m. bad destroy mm pond mmmmmm soil destroy mm wise liquid composition 04 τ- Ο C3 m 04 CQ BK1 I BK2 I BK3 j I BK4 1 1 BK5 1 I BK6 | L BK7 II 6K8 I BK9 I 1 BK10 I 1 BK11 i CO oc CO e> CO CQ 丨BK12 II BK13 I BK14 |Example 1 I 1 Example 2 1 |Example 3 1 1贲Example 4 I [Example 5 I | Example 6 1 | Example 7 | Example 8 I 1 贲 Example 9 I [Example 10 |Example 11 1 Example 12 | Example i3 I | Example 14 I | Example 15 I»Example 16 |Example 17 I |Comparative Example i |Comparative Example 2 |Comparative Example 3 |Comparative Example 4 IComparative Example 5 IComparative Example 6 -57- 200941140 Industrial Applicability The content of the present invention (E The radiation sensitive composition of the component 'is excellent in adhesion to the substrate even when the content of the coloring agent contained in the radiation sensitive composition is high, and can be formed with a high-definition and excellent pattern shape, and is close to In the exposure, the pattern line width does not widen the pixels and the black matrix. Therefore, the radiation sensitive composition of the present invention is very suitable for use in the production of various color filters typified by color filters for color liquid crystal display devices or color separation elements for solid-state imaging devices in the field of electronics. [Simple description of the diagram] None. [Main component symbol description] 4πτ None.

-58-

Claims (1)

200941140 VII. Patent application scope: 1. A radiation sensitive composition for forming a coloring layer, comprising: (A) a coloring agent, (B) an alkali-soluble resin, and (C) having two or more radical polymerizable properties. a monomer having an unsaturated bond, (D) a radiation-sensitive radical generating agent, and (E) a compound selected from the following formulas (1) to (5), a phenolic compound having a flavan skeleton, and a snail double At least one of a phenolic compound having a skeleton and a phenolic compound having a spirobiguanide skeleton: In the formula (1), R1 represents a hydrogen atom, an alkyl group having 4 or less carbon atoms, an alkoxy group having 4 or less carbon atoms, a phenyl group, a naphthyl group or a -(CH2)x-COOZ group, and is present in a plurality of R1 may be the same or different from each other; Z represents an alkoxyalkyl group, a cyclic ether group, a vinyloxyalkyl group or a tertiary alkoxycarbonylalkyl group, and a plurality of Z may be the same or different, X Is an integer of 〇-4 φ; A represents a single bond, -S- group, -0-yl, -CO- group, -COO- group, -SO- group, -S〇2- group, -C(R2) (R3)-based or a group wherein k is an integer of 0 to 4; and R2 and R3 may be the same or different and each represents a hydrogen atom, an alkyl group having 6 or less carbon atoms, a fluorenyl group having 6 or less carbon atoms, a phenyl group, and the like. Naphthyl or -(CHOx-COOZ group; -59- 200941140 m, η, p and q are integers of 0 or more, satisfying the relationship of m + nS5, p + q$5, n + q2 1; In the formula (2), R1 represents the same group as R1 of the formula (1); R4 represents the same group as R2 of the formula (1); m, n, p, q, r and s are integers of 0 or more. , satisfying the relationship of m + n$5, p + qS5, r + sS5, n + q + s2 1 ; In the formula (3), R1 represents the same group as R1 of the formula (1); R4 represents the same group as R2 of the formula (1), and two R4s may be the same or different from each other; A represents a formula (1) A is the same group; m, n, p, q, r, s, t, and u are integers of 0 or more, satisfying m + nS5, p + qS5, r + s$5, t + uS 5, n + Relationship between q + s + u2 1; -60- (4) 200941140 In the formula (4), R1 represents the same group as R1 of the formula (1); and R2, R3 and R' respectively represent the same groups as R2, R3 of the formula (1) and R4 of the formula (2); m, n, p, q, r, s' t and u are integers of 0 or more, satisfying m + n'5, p + q ^ 5 ' r + s$ 5, t + u € 4, n + q + s + u2 1 relationship; η(Η〇) In the formula, R1, R2 and R3 represent the same groups as R1, R2 and R3 of the formula (1); m, n, p, q, r and s are integers of 0 or more, satisfying m + nS5, p + q ^ 4 ' r + sS5, n + q + s22 relationship; 1 means an integer from 1 to 5. 2. The radiation-sensitive composition for forming a color layer according to the first aspect of the invention, wherein the content of the component (E) is 0.1 to 10 parts by weight based on 100 parts by weight of the (B) alkali-soluble resin. 3. The sensitization-radiation-linear-61 - 200941140 composition for forming a color layer according to claim 1 or 2, wherein (B) the soluble resin contains a polymer selected from the group consisting of repeating units represented by the following formula (6) And at least one of a polymer having a repeating unit represented by the following formula (7), COOH (6) wherein R5 represents a hydrogen atom or a methyl group; R7 Wherein R6, R7 and R8 each independently represent a hydrogen atom or a graft having a carbon number; wherein X represents a monovalent organic group having a propylene fluorenyl group or a methacryl fluorenyl group, a vinyl group or a methyl group; Represents a divalent organic group; h represents an integer from 1 to 5. 4. The sensitizing radioactive composition for forming a color layer according to the third aspect of the invention, wherein the (B) alkali-soluble resin further contains a repeating unit selected from the following formula (8) and the following formula (9); a polymer showing at least one repeating unit of a repeating unit, -62· 200941140 Wherein R9 represents a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms; R15 (9) wherein R1()-R15 independently of each other represent a hydrogen atom, a halogen atom, a trans group, a methyl group or a residue. 5. The radiation sensitive composition according to any one of claims 1 to 4, wherein the content of the (A) colorant in the total solid content is 30 to 60% by weight. A color filter comprising a coloring layer formed using the radiation sensitive composition for coloring layer formation according to any one of items 1 to 5 of the patent application. 7. A color liquid crystal display element' This element is provided with a color filter as in item 6 of the patent application. -63- 200941140 IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: 〇 /\\\ ❹ 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: