SG155146A1 - Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device - Google Patents

Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Info

Publication number
SG155146A1
SG155146A1 SG200901295-6A SG2009012956A SG155146A1 SG 155146 A1 SG155146 A1 SG 155146A1 SG 2009012956 A SG2009012956 A SG 2009012956A SG 155146 A1 SG155146 A1 SG 155146A1
Authority
SG
Singapore
Prior art keywords
radiation
sensitive composition
forming
coloring layer
liquid crystal
Prior art date
Application number
SG200901295-6A
Inventor
Takumi Matoba
Takaki Minowa
Toshiyuki Koide
Hidenori Naruse
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG155146A1 publication Critical patent/SG155146A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Provided is a radiation-sensitive composition, which is excellent in adhesion to a substrate, and may form a pixel and a black matrix each having a high- definition and excellent pattern form. A radiation-sensitive composition for forming a coloring layer contains a colorant (A), an alkali-soluble resin (B), a monomer having two or more radical polymerizabie unsaturated bonds (C), a radiation-sensitive radical generating agent (D), and a specific phenolic compound (E).
SG200901295-6A 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device SG155146A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008047271A JP5157522B2 (en) 2008-02-28 2008-02-28 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element

Publications (1)

Publication Number Publication Date
SG155146A1 true SG155146A1 (en) 2009-09-30

Family

ID=41094655

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200901295-6A SG155146A1 (en) 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5157522B2 (en)
KR (1) KR101705894B1 (en)
CN (1) CN101526741B (en)
SG (1) SG155146A1 (en)
TW (1) TWI569099B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013041156A (en) * 2011-08-17 2013-02-28 Mitsubishi Chemicals Corp Colored resin composition, color filter, liquid crystal display device, and organic el display device
JP5778568B2 (en) * 2011-12-16 2015-09-16 東京応化工業株式会社 Chemical amplification type positive photoresist composition for thick film, thick film photoresist laminate, method for producing thick film photoresist pattern, and method for producing connection terminal
WO2015053183A1 (en) * 2013-10-11 2015-04-16 富士フイルム株式会社 Light-sensitive composition, dispersion composition, method for manufacturing color filter using same, color filter, and solid-state imaging element
JP6520091B2 (en) 2013-12-16 2019-05-29 Jsr株式会社 Colored composition, colored cured film and display device
JP6847580B2 (en) * 2016-02-09 2021-03-24 東京応化工業株式会社 A photosensitive resin composition for a black column spacer, a black column spacer, a display device, and a method for forming the black column spacer.
JP6689434B1 (en) * 2019-02-06 2020-04-28 昭和電工株式会社 Photosensitive resin composition, organic EL element partition wall, and organic EL element

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214580A (en) * 1999-01-26 2000-08-04 Mitsubishi Chemicals Corp Photopolymerizable composition for color filter and color filter
KR100783603B1 (en) * 2002-01-05 2007-12-07 삼성전자주식회사 Photoresist Composition And Method of Forming Pattern Using The Same
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
JP2004264747A (en) * 2003-03-04 2004-09-24 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
JP4393258B2 (en) * 2003-08-29 2010-01-06 富士フイルム株式会社 Image recording material and planographic printing plate
CN101023394B (en) * 2004-09-17 2011-12-21 凸版印刷株式会社 Colored alkali developable photosensitive resin composition, and color filter using said colored alkali developable photosensitive resin composition
JP4483769B2 (en) * 2004-11-11 2010-06-16 三菱化学株式会社 Color material dispersion, colored resin composition, color filter, and liquid crystal display device
JP2006195425A (en) * 2004-12-15 2006-07-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP2006251562A (en) * 2005-03-11 2006-09-21 Fuji Photo Film Co Ltd Pattern forming material, pattern forming apparatus and pattern forming method
JP4661384B2 (en) * 2005-06-16 2011-03-30 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer and color filter
JP4685664B2 (en) * 2005-11-25 2011-05-18 三菱製紙株式会社 Photosensitive lithographic printing plate material
JP2007256445A (en) * 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd Photopolymerizable composition and photosensitive lithographic printing plate material
JP4635935B2 (en) * 2006-03-29 2011-02-23 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP4706559B2 (en) * 2006-05-29 2011-06-22 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP4752649B2 (en) * 2006-07-12 2011-08-17 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
TWI437366B (en) * 2007-09-26 2014-05-11 Fujifilm Corp Color photosensitive composition for solid-state imaging device, color filter for solid-state imaging device and fabricating method thereof

Also Published As

Publication number Publication date
TWI569099B (en) 2017-02-01
JP2009204895A (en) 2009-09-10
KR101705894B1 (en) 2017-02-10
CN101526741B (en) 2013-10-23
TW200941140A (en) 2009-10-01
KR20090093822A (en) 2009-09-02
JP5157522B2 (en) 2013-03-06
CN101526741A (en) 2009-09-09

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