SG155146A1 - Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device - Google Patents
Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display deviceInfo
- Publication number
- SG155146A1 SG155146A1 SG200901295-6A SG2009012956A SG155146A1 SG 155146 A1 SG155146 A1 SG 155146A1 SG 2009012956 A SG2009012956 A SG 2009012956A SG 155146 A1 SG155146 A1 SG 155146A1
- Authority
- SG
- Singapore
- Prior art keywords
- radiation
- sensitive composition
- forming
- coloring layer
- liquid crystal
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Provided is a radiation-sensitive composition, which is excellent in adhesion to a substrate, and may form a pixel and a black matrix each having a high- definition and excellent pattern form. A radiation-sensitive composition for forming a coloring layer contains a colorant (A), an alkali-soluble resin (B), a monomer having two or more radical polymerizabie unsaturated bonds (C), a radiation-sensitive radical generating agent (D), and a specific phenolic compound (E).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008047271A JP5157522B2 (en) | 2008-02-28 | 2008-02-28 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
Publications (1)
Publication Number | Publication Date |
---|---|
SG155146A1 true SG155146A1 (en) | 2009-09-30 |
Family
ID=41094655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200901295-6A SG155146A1 (en) | 2008-02-28 | 2009-02-24 | Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5157522B2 (en) |
KR (1) | KR101705894B1 (en) |
CN (1) | CN101526741B (en) |
SG (1) | SG155146A1 (en) |
TW (1) | TWI569099B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013041156A (en) * | 2011-08-17 | 2013-02-28 | Mitsubishi Chemicals Corp | Colored resin composition, color filter, liquid crystal display device, and organic el display device |
JP5778568B2 (en) * | 2011-12-16 | 2015-09-16 | 東京応化工業株式会社 | Chemical amplification type positive photoresist composition for thick film, thick film photoresist laminate, method for producing thick film photoresist pattern, and method for producing connection terminal |
WO2015053183A1 (en) * | 2013-10-11 | 2015-04-16 | 富士フイルム株式会社 | Light-sensitive composition, dispersion composition, method for manufacturing color filter using same, color filter, and solid-state imaging element |
JP6520091B2 (en) | 2013-12-16 | 2019-05-29 | Jsr株式会社 | Colored composition, colored cured film and display device |
JP6847580B2 (en) * | 2016-02-09 | 2021-03-24 | 東京応化工業株式会社 | A photosensitive resin composition for a black column spacer, a black column spacer, a display device, and a method for forming the black column spacer. |
JP6689434B1 (en) * | 2019-02-06 | 2020-04-28 | 昭和電工株式会社 | Photosensitive resin composition, organic EL element partition wall, and organic EL element |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000214580A (en) * | 1999-01-26 | 2000-08-04 | Mitsubishi Chemicals Corp | Photopolymerizable composition for color filter and color filter |
KR100783603B1 (en) * | 2002-01-05 | 2007-12-07 | 삼성전자주식회사 | Photoresist Composition And Method of Forming Pattern Using The Same |
TWI314943B (en) * | 2002-08-29 | 2009-09-21 | Radiation-sensitive resin composition | |
JP2004264747A (en) * | 2003-03-04 | 2004-09-24 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
JP4393258B2 (en) * | 2003-08-29 | 2010-01-06 | 富士フイルム株式会社 | Image recording material and planographic printing plate |
CN101023394B (en) * | 2004-09-17 | 2011-12-21 | 凸版印刷株式会社 | Colored alkali developable photosensitive resin composition, and color filter using said colored alkali developable photosensitive resin composition |
JP4483769B2 (en) * | 2004-11-11 | 2010-06-16 | 三菱化学株式会社 | Color material dispersion, colored resin composition, color filter, and liquid crystal display device |
JP2006195425A (en) * | 2004-12-15 | 2006-07-27 | Jsr Corp | Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel |
JP2006251562A (en) * | 2005-03-11 | 2006-09-21 | Fuji Photo Film Co Ltd | Pattern forming material, pattern forming apparatus and pattern forming method |
JP4661384B2 (en) * | 2005-06-16 | 2011-03-30 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer and color filter |
JP4685664B2 (en) * | 2005-11-25 | 2011-05-18 | 三菱製紙株式会社 | Photosensitive lithographic printing plate material |
JP2007256445A (en) * | 2006-03-22 | 2007-10-04 | Mitsubishi Paper Mills Ltd | Photopolymerizable composition and photosensitive lithographic printing plate material |
JP4635935B2 (en) * | 2006-03-29 | 2011-02-23 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
JP4706559B2 (en) * | 2006-05-29 | 2011-06-22 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
JP4752649B2 (en) * | 2006-07-12 | 2011-08-17 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
TWI437366B (en) * | 2007-09-26 | 2014-05-11 | Fujifilm Corp | Color photosensitive composition for solid-state imaging device, color filter for solid-state imaging device and fabricating method thereof |
-
2008
- 2008-02-28 JP JP2008047271A patent/JP5157522B2/en active Active
-
2009
- 2009-02-20 CN CN2009100047558A patent/CN101526741B/en active Active
- 2009-02-20 KR KR1020090014398A patent/KR101705894B1/en active IP Right Grant
- 2009-02-20 TW TW098105364A patent/TWI569099B/en active
- 2009-02-24 SG SG200901295-6A patent/SG155146A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
TWI569099B (en) | 2017-02-01 |
JP2009204895A (en) | 2009-09-10 |
KR101705894B1 (en) | 2017-02-10 |
CN101526741B (en) | 2013-10-23 |
TW200941140A (en) | 2009-10-01 |
KR20090093822A (en) | 2009-09-02 |
JP5157522B2 (en) | 2013-03-06 |
CN101526741A (en) | 2009-09-09 |
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