KR101678873B1 - 반도체 장치 제조용 가접착제와 그것을 사용한 접착성 지지체, 및 반도체 장치의 제조 방법 - Google Patents
반도체 장치 제조용 가접착제와 그것을 사용한 접착성 지지체, 및 반도체 장치의 제조 방법 Download PDFInfo
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- KR101678873B1 KR101678873B1 KR1020157007079A KR20157007079A KR101678873B1 KR 101678873 B1 KR101678873 B1 KR 101678873B1 KR 1020157007079 A KR1020157007079 A KR 1020157007079A KR 20157007079 A KR20157007079 A KR 20157007079A KR 101678873 B1 KR101678873 B1 KR 101678873B1
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- radical polymerization
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J101/00—Adhesives based on cellulose, modified cellulose, or cellulose derivatives
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J101/00—Adhesives based on cellulose, modified cellulose, or cellulose derivatives
- C09J101/08—Cellulose derivatives
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J101/00—Adhesives based on cellulose, modified cellulose, or cellulose derivatives
- C09J101/08—Cellulose derivatives
- C09J101/10—Esters of organic acids
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09J101/00—Adhesives based on cellulose, modified cellulose, or cellulose derivatives
- C09J101/08—Cellulose derivatives
- C09J101/10—Esters of organic acids
- C09J101/12—Cellulose acetate
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J101/00—Adhesives based on cellulose, modified cellulose, or cellulose derivatives
- C09J101/08—Cellulose derivatives
- C09J101/10—Esters of organic acids
- C09J101/14—Mixed esters, e.g. cellulose acetate-butyrate
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- C—CHEMISTRY; METALLURGY
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- C09J101/00—Adhesives based on cellulose, modified cellulose, or cellulose derivatives
- C09J101/08—Cellulose derivatives
- C09J101/26—Cellulose ethers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J125/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
- C09J125/02—Homopolymers or copolymers of hydrocarbons
- C09J125/04—Homopolymers or copolymers of styrene
- C09J125/06—Polystyrene
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012218585 | 2012-09-28 | ||
| JPJP-P-2012-218585 | 2012-09-28 | ||
| JPJP-P-2013-097784 | 2013-05-07 | ||
| JP2013097784A JP5909460B2 (ja) | 2012-09-28 | 2013-05-07 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法。 |
| PCT/JP2013/073669 WO2014050455A1 (ja) | 2012-09-28 | 2013-09-03 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20150047535A KR20150047535A (ko) | 2015-05-04 |
| KR101678873B1 true KR101678873B1 (ko) | 2016-11-23 |
Family
ID=50387864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020157007079A Expired - Fee Related KR101678873B1 (ko) | 2012-09-28 | 2013-09-03 | 반도체 장치 제조용 가접착제와 그것을 사용한 접착성 지지체, 및 반도체 장치의 제조 방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20150184032A1 (OSRAM) |
| JP (1) | JP5909460B2 (OSRAM) |
| KR (1) | KR101678873B1 (OSRAM) |
| TW (1) | TWI588225B (OSRAM) |
| WO (1) | WO2014050455A1 (OSRAM) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106068551B (zh) * | 2014-01-07 | 2019-12-17 | 布鲁尔科技公司 | 用于暂时性晶片粘结方法的环状烯烃聚合物组合物和聚硅氧烷剥离层 |
| US9865490B2 (en) * | 2014-01-07 | 2018-01-09 | Brewer Science Inc. | Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes |
| JP6330346B2 (ja) * | 2014-01-29 | 2018-05-30 | 日立化成株式会社 | 接着剤組成物、接着剤組成物を用いた電子部材、及び半導体装置の製造方法 |
| JP5678228B1 (ja) * | 2014-06-27 | 2015-02-25 | 積水化学工業株式会社 | 回路基板の処理方法及び硬化型接着剤組成物 |
| JP2016044222A (ja) * | 2014-08-21 | 2016-04-04 | 日立化成株式会社 | 接着剤組成物及び接続構造体 |
| CN104559852B (zh) * | 2014-12-31 | 2018-02-27 | 深圳市化讯半导体材料有限公司 | 一种用于薄晶圆加工的临时键合胶及其制备方法 |
| KR102021302B1 (ko) * | 2015-05-08 | 2019-09-16 | 후지필름 가부시키가이샤 | 디바이스 기판 및 반도체 디바이스의 제조 방법 |
| MX2018006900A (es) * | 2015-12-07 | 2018-09-06 | Acetate Int Llc | Composiciones de relleno de madera de acetato de celulosa. |
| TWI627251B (zh) * | 2017-04-10 | 2018-06-21 | 台虹科技股份有限公司 | 暫時性接著用組成物、暫時性接著用溶液以及暫時性接著用膜材 |
| WO2019106846A1 (ja) * | 2017-12-01 | 2019-06-06 | 日立化成株式会社 | 半導体装置の製造方法、仮固定材用樹脂組成物、及び仮固定材用積層フィルム |
| KR102470448B1 (ko) | 2017-12-15 | 2022-11-24 | 주식회사 엘지화학 | 의류용 수성 아크릴계 점착제 및 이의 제조 방법 |
| JP2019026851A (ja) * | 2018-09-19 | 2019-02-21 | 日立化成株式会社 | 接着剤組成物及び接続構造体 |
| JP7452433B2 (ja) * | 2018-11-02 | 2024-03-19 | 日本ゼオン株式会社 | 固定部材および積層体 |
| JP2020111760A (ja) * | 2020-04-07 | 2020-07-27 | 日立化成株式会社 | 接着剤組成物及び接続構造体 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011219686A (ja) | 2010-04-14 | 2011-11-04 | Denki Kagaku Kogyo Kk | 接着剤組成物及びそれを用いた部材の仮固定方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3483161B2 (ja) | 1994-08-11 | 2004-01-06 | リンテック株式会社 | 粘接着テープおよびその使用方法 |
| JP3146888B2 (ja) | 1994-10-31 | 2001-03-19 | 松下電器産業株式会社 | 電子部品の仮止め用ボンド |
| JP4072927B2 (ja) * | 1997-08-28 | 2008-04-09 | リンテック株式会社 | エネルギー線硬化型親水性粘着剤組成物およびその利用方法 |
| KR100878971B1 (ko) * | 2001-08-03 | 2009-01-19 | 세키스이가가쿠 고교가부시키가이샤 | 양면 점착 테이프 및 이를 이용한 ic 칩의 제조 방법 |
| JP4485165B2 (ja) | 2002-10-22 | 2010-06-16 | 株式会社クラレ | 粘・接着剤組成物 |
| US6920159B2 (en) * | 2002-11-29 | 2005-07-19 | Optitune Plc | Tunable optical source |
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| SG176494A1 (en) * | 2005-03-18 | 2011-12-29 | Denki Kagaku Kogyo Kk | Adhesive composition and temporary fixation method of member using it |
| JP4643360B2 (ja) | 2005-05-24 | 2011-03-02 | 株式会社イーテック | 粘着性樹脂組成物、並びに粘着シートおよびその製造方法 |
| EP1900761B1 (en) * | 2005-07-04 | 2012-06-13 | Denki Kagaku Kogyo Kabushiki Kaisha | Curable composition and method for temporal fixation of structural member using the same |
| JP2007045939A (ja) | 2005-08-10 | 2007-02-22 | Jsr Corp | 粘着フィルムの粘着力低減方法 |
| EP1994554B1 (de) | 2006-03-01 | 2015-07-29 | Thin Materials GmbH | Verfahren zum bearbeiten insbesondere dünnen der rückseite eines wafers, wafer-träger-anordnung hierfür und verfahren zur herstellung einer solchen wafer-träger-anordnung |
| JP5057697B2 (ja) * | 2006-05-12 | 2012-10-24 | 日東電工株式会社 | 半導体ウエハ又は半導体基板加工用粘着シート |
| KR101073153B1 (ko) * | 2006-08-10 | 2011-10-12 | 덴끼 가가꾸 고교 가부시키가이샤 | 접착성 조성물 및 그것을 이용한 부재의 가고정 방법 |
| JP2008063464A (ja) | 2006-09-07 | 2008-03-21 | Tokyo Ohka Kogyo Co Ltd | 接着剤組成物、接着フィルム及び当該接着剤組成物の製造方法 |
| JP2008063463A (ja) | 2006-09-07 | 2008-03-21 | Tokyo Ohka Kogyo Co Ltd | 接着剤組成物、接着フィルム及び当該接着剤組成物の製造方法 |
| US20080200011A1 (en) | 2006-10-06 | 2008-08-21 | Pillalamarri Sunil K | High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach |
| KR100773634B1 (ko) * | 2006-10-26 | 2007-11-05 | 제일모직주식회사 | 아크릴 바인더 수지조성물를 포함하는 광경화형 점착조성물및 이를 이용한 점착테이프 |
| JP5016296B2 (ja) | 2006-11-22 | 2012-09-05 | 東京応化工業株式会社 | 接着剤組成物、及び接着フィルム |
| JP4976829B2 (ja) | 2006-11-29 | 2012-07-18 | 東京応化工業株式会社 | 接着剤組成物、及び接着フィルム |
| JP2009185197A (ja) | 2008-02-07 | 2009-08-20 | Tokyo Ohka Kogyo Co Ltd | 接着剤組成物及びその利用、並びに接着剤組成物の製造方法 |
| JP5499454B2 (ja) * | 2008-03-11 | 2014-05-21 | 日立化成株式会社 | 感光性接着剤組成物、接着シート、接着剤パターン、接着剤層付半導体ウェハ、並びに半導体装置及びその製造方法 |
| JP5497276B2 (ja) * | 2008-07-08 | 2014-05-21 | 東京応化工業株式会社 | 接着剤組成物の製造方法 |
| JP4920097B2 (ja) * | 2009-06-01 | 2012-04-18 | アイカ工業株式会社 | 接着剤組成物 |
| TWI479259B (zh) | 2009-06-15 | 2015-04-01 | Sumitomo Bakelite Co | A temporary fixing agent for a semiconductor wafer, and a method of manufacturing the semiconductor device using the same |
| JP2011052142A (ja) | 2009-09-03 | 2011-03-17 | Jsr Corp | 接着剤組成物、それを用いた基材の加工または移動方法および半導体素子 |
| JP5010668B2 (ja) | 2009-12-03 | 2012-08-29 | 信越化学工業株式会社 | 積層型半導体集積装置の製造方法 |
| JP5691538B2 (ja) | 2010-04-02 | 2015-04-01 | Jsr株式会社 | 仮固定用組成物、仮固定材、基材の処理方法、および半導体素子 |
| JP5624908B2 (ja) * | 2010-08-09 | 2014-11-12 | 東京応化工業株式会社 | 接着剤組成物 |
| JP5545239B2 (ja) * | 2011-02-21 | 2014-07-09 | Jnc株式会社 | 接着した部材からの光硬化性接着剤の除去方法、及び二部材の接着方法 |
-
2013
- 2013-05-07 JP JP2013097784A patent/JP5909460B2/ja not_active Expired - Fee Related
- 2013-09-03 KR KR1020157007079A patent/KR101678873B1/ko not_active Expired - Fee Related
- 2013-09-03 WO PCT/JP2013/073669 patent/WO2014050455A1/ja not_active Ceased
- 2013-09-26 TW TW102134654A patent/TWI588225B/zh not_active IP Right Cessation
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2015
- 2015-03-09 US US14/641,656 patent/US20150184032A1/en not_active Abandoned
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011219686A (ja) | 2010-04-14 | 2011-11-04 | Denki Kagaku Kogyo Kk | 接着剤組成物及びそれを用いた部材の仮固定方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20150184032A1 (en) | 2015-07-02 |
| JP5909460B2 (ja) | 2016-04-26 |
| WO2014050455A1 (ja) | 2014-04-03 |
| TWI588225B (zh) | 2017-06-21 |
| TW201418390A (zh) | 2014-05-16 |
| JP2014080570A (ja) | 2014-05-08 |
| KR20150047535A (ko) | 2015-05-04 |
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