KR101671323B1 - 하전 입자선 장치 및 시료 관찰 방법 - Google Patents

하전 입자선 장치 및 시료 관찰 방법 Download PDF

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Publication number
KR101671323B1
KR101671323B1 KR1020147036503A KR20147036503A KR101671323B1 KR 101671323 B1 KR101671323 B1 KR 101671323B1 KR 1020147036503 A KR1020147036503 A KR 1020147036503A KR 20147036503 A KR20147036503 A KR 20147036503A KR 101671323 B1 KR101671323 B1 KR 101671323B1
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KR
South Korea
Prior art keywords
sample
charged particle
detector
particle beam
housing body
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Expired - Fee Related
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KR1020147036503A
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English (en)
Korean (ko)
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KR20150022907A (ko
Inventor
유스케 오미나미
스케히로 이토
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
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Publication of KR20150022907A publication Critical patent/KR20150022907A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24455—Transmitted particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020147036503A 2012-08-20 2013-06-28 하전 입자선 장치 및 시료 관찰 방법 Expired - Fee Related KR101671323B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-181305 2012-08-20
JP2012181305A JP5936484B2 (ja) 2012-08-20 2012-08-20 荷電粒子線装置及び試料観察方法
PCT/JP2013/067756 WO2014030430A1 (ja) 2012-08-20 2013-06-28 荷電粒子線装置及び試料観察方法

Publications (2)

Publication Number Publication Date
KR20150022907A KR20150022907A (ko) 2015-03-04
KR101671323B1 true KR101671323B1 (ko) 2016-11-02

Family

ID=50149746

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147036503A Expired - Fee Related KR101671323B1 (ko) 2012-08-20 2013-06-28 하전 입자선 장치 및 시료 관찰 방법

Country Status (8)

Country Link
US (1) US9418818B2 (enExample)
JP (1) JP5936484B2 (enExample)
KR (1) KR101671323B1 (enExample)
CN (1) CN104584181B (enExample)
DE (2) DE202013012246U1 (enExample)
GB (1) GB2519038A (enExample)
IN (1) IN2015DN00908A (enExample)
WO (1) WO2014030430A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105190824B (zh) * 2013-05-10 2016-11-23 株式会社日立高新技术 带电粒子线装置
NL2013437B1 (en) * 2013-09-07 2016-05-18 Mapper Lithography Ip Bv Target processing unit.
JP6169506B2 (ja) * 2014-02-19 2017-07-26 株式会社日立ハイテクノロジーズ 試料ホルダ、観察システム、および画像生成方法
US10903042B2 (en) 2014-05-08 2021-01-26 Technische Universiteit Delft Apparatus and method for inspecting a sample using a plurality of charged particle beams
NL2012780B1 (en) * 2014-05-08 2016-02-23 Univ Delft Tech Apparatus and method for inspecting a sample using a plurality of charged particle beams.
AT516561B1 (de) * 2014-12-10 2019-07-15 Verein Zur Foerderung Der Elektronenmikroskopie Und Feinstrukturforschung Elektronenmikroskop und Verfahren zum Untersuchen einer Probe mit einem Elektronenmikroskop
JP2017050046A (ja) * 2015-08-31 2017-03-09 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US11024481B2 (en) * 2016-03-04 2021-06-01 Fei Company Scanning electron microscope
NL2016367B1 (en) * 2016-03-04 2017-09-19 Phenom-World Holding B V Scanning electron microscope
CN109075002B (zh) * 2016-04-22 2020-09-29 株式会社日立高新技术 带电粒子显微镜以及试样拍摄方法
JP6463555B2 (ja) * 2016-05-23 2019-02-06 株式会社日立ハイテクノロジーズ 試料保持装置、およびこれを備えた荷電粒子線装置
JP2020017415A (ja) * 2018-07-26 2020-01-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US10777379B1 (en) * 2019-03-19 2020-09-15 Hitachi High-Tech Corporation Holder and charged particle beam apparatus
CN113966465B (zh) * 2019-06-12 2025-06-06 学校法人东海大学 观察试样用覆盖用具、覆盖用具包装体及观察试样的覆盖方法
BE1028265B1 (nl) * 2020-05-05 2021-12-06 Matthias Iturrospe Scanning microscoop mechanisme en werkwijze voor het laden van preparaten

Citations (2)

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Publication number Priority date Publication date Assignee Title
JP2009245944A (ja) * 2008-03-28 2009-10-22 Fei Co 粒子光学装置用環境セル
JP2012160267A (ja) * 2011-01-31 2012-08-23 Hitachi High-Technologies Corp 荷電粒子線装置

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GB2066618A (en) 1979-12-28 1981-07-08 Nat Res Dev Electron microscope image recording system
JP2602287B2 (ja) 1988-07-01 1997-04-23 株式会社日立製作所 Ｘ線マスクの欠陥検査方法及びその装置
US4975578A (en) * 1989-04-17 1990-12-04 The Research Foundation Of State University Of Ny Method and apparatus for determining distribution of mass density
JPH1064467A (ja) * 1996-08-23 1998-03-06 Toshiba Corp 電子顕微鏡
JPH10283978A (ja) * 1997-04-10 1998-10-23 Hamamatsu Photonics Kk 電子検出器
EP1058943B1 (en) * 1998-12-29 2004-07-28 Fei Company Sem for transmission operation with a location-sensitive detector
IL156027A0 (en) 2000-12-01 2003-12-23 El Mul Technologies Ltd Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope
US6844543B2 (en) * 2002-07-03 2005-01-18 The Regents Of The University Of California Quantitation of absorbed or deposited materials on a substrate that measures energy deposition
JP4636897B2 (ja) * 2005-02-18 2011-02-23 株式会社日立ハイテクサイエンスシステムズ 走査電子顕微鏡
JP5002251B2 (ja) * 2006-12-06 2012-08-15 日本電子株式会社 試料検査方法及び試料検査装置
JP5253800B2 (ja) 2007-12-26 2013-07-31 日本電子株式会社 試料保持体及び観察・検査方法並びに観察・検査装置
US8334510B2 (en) 2008-07-03 2012-12-18 B-Nano Ltd. Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US8299432B2 (en) * 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
JP2011129343A (ja) * 2009-12-17 2011-06-30 Jeol Ltd 荷電粒子線装置の試料ホルダ
JP2011243483A (ja) 2010-05-20 2011-12-01 Jeol Ltd 試料保持体、検査装置、及び検査方法
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009245944A (ja) * 2008-03-28 2009-10-22 Fei Co 粒子光学装置用環境セル
JP2012160267A (ja) * 2011-01-31 2012-08-23 Hitachi High-Technologies Corp 荷電粒子線装置

Also Published As

Publication number Publication date
CN104584181B (zh) 2017-07-25
GB201501866D0 (en) 2015-03-18
US20150228447A1 (en) 2015-08-13
DE112013003726T5 (de) 2015-05-13
US9418818B2 (en) 2016-08-16
WO2014030430A1 (ja) 2014-02-27
GB2519038A (en) 2015-04-08
CN104584181A (zh) 2015-04-29
IN2015DN00908A (enExample) 2015-06-12
DE202013012246U1 (de) 2015-10-21
JP5936484B2 (ja) 2016-06-22
JP2014038787A (ja) 2014-02-27
KR20150022907A (ko) 2015-03-04

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