KR101587397B1 - 알칼리 가용성 투명 수지 조성물 - Google Patents

알칼리 가용성 투명 수지 조성물 Download PDF

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Publication number
KR101587397B1
KR101587397B1 KR1020110081788A KR20110081788A KR101587397B1 KR 101587397 B1 KR101587397 B1 KR 101587397B1 KR 1020110081788 A KR1020110081788 A KR 1020110081788A KR 20110081788 A KR20110081788 A KR 20110081788A KR 101587397 B1 KR101587397 B1 KR 101587397B1
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KR
South Korea
Prior art keywords
resin composition
alkali
transparent resin
soluble transparent
composition according
Prior art date
Application number
KR1020110081788A
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English (en)
Korean (ko)
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KR20120022640A (ko
Inventor
요시오 오카모토
히로아키 다니구치
인정 양
마사히로 츠치야
케이타 하라시마
Original Assignee
가부시키가이샤 다무라 세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20120022640A publication Critical patent/KR20120022640A/ko
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Publication of KR101587397B1 publication Critical patent/KR101587397B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C08L75/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
KR1020110081788A 2010-08-20 2011-08-17 알칼리 가용성 투명 수지 조성물 KR101587397B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010184820 2010-08-20
JPJP-P-2010-184820 2010-08-20
JPJP-P-2011-034609 2011-02-21
JP2011034609A JP5731229B2 (ja) 2010-08-20 2011-02-21 アルカリ可溶性透明樹脂組成物

Publications (2)

Publication Number Publication Date
KR20120022640A KR20120022640A (ko) 2012-03-12
KR101587397B1 true KR101587397B1 (ko) 2016-01-21

Family

ID=46059466

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110081788A KR101587397B1 (ko) 2010-08-20 2011-08-17 알칼리 가용성 투명 수지 조성물

Country Status (3)

Country Link
JP (1) JP5731229B2 (zh)
KR (1) KR101587397B1 (zh)
CN (1) CN102520585A (zh)

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JP5865725B2 (ja) * 2012-02-16 2016-02-17 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物及びレジスト膜、並びにこれらを用いた電子デバイスの製造方法
JP6184094B2 (ja) * 2012-12-27 2017-08-23 株式会社日本触媒 感光性樹脂組成物および該感光性樹脂組成物を用いたフォトスペーサー
JP5695622B2 (ja) * 2012-09-24 2015-04-08 株式会社タムラ製作所 黒色硬化性樹脂組成物
JP6234317B2 (ja) * 2013-05-28 2017-11-22 株式会社タムラ製作所 感光性樹脂組成物
CN103788125B (zh) * 2013-12-31 2015-02-11 邓娟 一种用于聚合物的添加剂及其制备方法
JP6345947B2 (ja) * 2014-02-27 2018-06-20 株式会社タムラ製作所 感光性樹脂組成物
CN104808442A (zh) * 2015-04-20 2015-07-29 北京欣奕华科技有限公司 组合物、透明树脂保护层及其制备方法、显示装置
JP2020100735A (ja) * 2018-12-21 2020-07-02 太陽インキ製造株式会社 光硬化性熱硬化性接着剤組成物、ドライフィルム、硬化物及び構造体
JP2021089442A (ja) * 2021-03-09 2021-06-10 昭和電工マテリアルズ株式会社 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品

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JP4623890B2 (ja) * 2000-09-11 2011-02-02 昭和電工株式会社 感光性組成物及びその硬化物並びにそれを用いたプリント配線基板
KR100515218B1 (ko) * 2000-09-11 2005-09-16 쇼와 덴코 가부시키가이샤 감광성 조성물, 그것의 경화물, 및 그것을 사용한프린트회로기판
WO2002048202A1 (en) * 2000-12-13 2002-06-20 Ciba Specialty Chemicals Holding Inc. Surface-active photoinitiators
JP2003084429A (ja) * 2001-07-04 2003-03-19 Showa Denko Kk レジスト用硬化性難燃組成物およびその硬化物
JP2003241369A (ja) * 2002-02-19 2003-08-27 Showa Denko Kk ドライフィルムレジスト
JP4609071B2 (ja) * 2002-11-06 2011-01-12 旭硝子株式会社 隔壁を製造する方法及び隔壁
JP4151397B2 (ja) * 2002-12-04 2008-09-17 チッソ株式会社 光硬化性樹脂組成物
KR101204282B1 (ko) * 2004-02-02 2012-11-26 시바 홀딩 인크 관능화된 광개시제
KR100720283B1 (ko) * 2004-10-22 2007-05-22 주식회사 엘지화학 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
JP4986059B2 (ja) 2005-04-07 2012-07-25 日本化薬株式会社 反応性エポキシカルボキシレート化合物及びそれを用いた活性エネルギー線硬化性樹脂組成物
KR20090122184A (ko) * 2007-01-12 2009-11-26 도판 인사츠 가부시키가이샤 착색 조성물, 컬러 필터, 및 그의 제조 방법
JP5051217B2 (ja) * 2007-03-05 2012-10-17 東亞合成株式会社 感光性組成物、ソルダーレジストおよび感光性ドライフィルム
JP4994923B2 (ja) * 2007-04-06 2012-08-08 太陽ホールディングス株式会社 黒色ソルダーレジスト組成物およびその硬化物
JP5294594B2 (ja) * 2007-08-27 2013-09-18 株式会社Ｄｎｐファインケミカル カラーフィルタ保護膜用樹脂組成物、及びカラーフィルタ
JP2010000434A (ja) * 2008-06-19 2010-01-07 Jsr Corp タッチパネルの製造方法
KR101148548B1 (ko) * 2008-09-30 2012-05-21 코오롱인더스트리 주식회사 감광성 수지 조성물
KR101000327B1 (ko) * 2008-10-28 2010-12-13 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 층간 절연막 및 마이크로 렌즈, 그리고 그들의 형성 방법
JP5668348B2 (ja) * 2009-07-24 2015-02-12 東洋インキＳｃホールディングス株式会社 感光性組成物

Also Published As

Publication number Publication date
JP5731229B2 (ja) 2015-06-10
JP2012063739A (ja) 2012-03-29
KR20120022640A (ko) 2012-03-12
CN102520585A (zh) 2012-06-27

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