KR101583104B1 - 액 처리 장치 및 액 처리 방법 - Google Patents

액 처리 장치 및 액 처리 방법 Download PDF

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Publication number
KR101583104B1
KR101583104B1 KR1020110128293A KR20110128293A KR101583104B1 KR 101583104 B1 KR101583104 B1 KR 101583104B1 KR 1020110128293 A KR1020110128293 A KR 1020110128293A KR 20110128293 A KR20110128293 A KR 20110128293A KR 101583104 B1 KR101583104 B1 KR 101583104B1
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South Korea
Prior art keywords
substrate
discharge port
nozzle
liquid
discharge
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KR1020110128293A
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English (en)
Korean (ko)
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KR20120075361A (ko
Inventor
지로 히가시지마
노부히로 오가타
사토시 가네코
슈이치 나가미네
요시히로 가이
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도쿄엘렉트론가부시키가이샤
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Publication of KR20120075361A publication Critical patent/KR20120075361A/ko
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Publication of KR101583104B1 publication Critical patent/KR101583104B1/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0424—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7608—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers

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  • Cleaning Or Drying Semiconductors (AREA)
  • Coating Apparatus (AREA)
  • Weting (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020110128293A 2010-12-28 2011-12-02 액 처리 장치 및 액 처리 방법 Active KR101583104B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2010-293775 2010-12-28
JP2010293775 2010-12-28
JPJP-P-2011-240325 2011-11-01
JP2011240325A JP5743853B2 (ja) 2010-12-28 2011-11-01 液処理装置および液処理方法

Publications (2)

Publication Number Publication Date
KR20120075361A KR20120075361A (ko) 2012-07-06
KR101583104B1 true KR101583104B1 (ko) 2016-01-07

Family

ID=46315214

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110128293A Active KR101583104B1 (ko) 2010-12-28 2011-12-02 액 처리 장치 및 액 처리 방법

Country Status (5)

Country Link
US (1) US9048269B2 (enExample)
JP (1) JP5743853B2 (enExample)
KR (1) KR101583104B1 (enExample)
CN (1) CN102553851B (enExample)
TW (1) TWI517225B (enExample)

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US8877075B2 (en) * 2012-02-01 2014-11-04 Infineon Technologies Ag Apparatuses and methods for gas mixed liquid polishing, etching, and cleaning
JP6229933B2 (ja) 2013-09-27 2017-11-15 株式会社Ｓｃｒｅｅｎホールディングス 処理カップ洗浄方法、基板処理方法および基板処理装置
US20170014873A1 (en) * 2014-03-10 2017-01-19 SCREEN Holdings Co., Ltd. Substrate processing system and pipe cleaning method
JP2015167938A (ja) * 2014-03-10 2015-09-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6338904B2 (ja) 2014-03-24 2018-06-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP2015185813A (ja) * 2014-03-26 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
US9460944B2 (en) 2014-07-02 2016-10-04 SCREEN Holdings Co., Ltd. Substrate treating apparatus and method of treating substrate
JP6376863B2 (ja) * 2014-07-02 2018-08-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6359477B2 (ja) * 2014-08-27 2018-07-18 東京エレクトロン株式会社 基板液処理装置
CN104377153B (zh) * 2014-11-18 2018-07-17 通富微电子股份有限公司 一种圆片清洗机及其喷嘴移动方法、圆片移动方法
KR101629471B1 (ko) * 2014-12-30 2016-06-10 주식회사 케이씨텍 기판세정장치
KR101880232B1 (ko) * 2015-07-13 2018-07-19 주식회사 제우스 기판 액처리 장치 및 방법
KR102432858B1 (ko) * 2015-09-01 2022-08-16 삼성전자주식회사 약액 공급 장치 및 이를 구비하는 반도체 처리 장치
JP6649837B2 (ja) * 2016-04-13 2020-02-19 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
US10388537B2 (en) 2016-04-15 2019-08-20 Samsung Electronics Co., Ltd. Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same
KR20170128801A (ko) 2016-05-16 2017-11-24 삼성전자주식회사 기판 세정 방법 및 이를 수행하기 위한 장치
US11769686B2 (en) 2016-09-29 2023-09-26 Intel Corporation Methods and apparatus for electroless plating dispense
JP6804325B2 (ja) 2017-02-09 2020-12-23 東京エレクトロン株式会社 液処理装置
TWI865303B (zh) * 2017-12-13 2024-12-01 日商東京威力科創股份有限公司 基板處理裝置
JP6971865B2 (ja) * 2018-01-17 2021-11-24 キオクシア株式会社 処理装置
CN112543991B (zh) * 2018-08-06 2024-12-03 应用材料公司 非接触式的清洁模块
EP3705266B1 (de) * 2019-03-08 2022-08-17 Ivoclar Vivadent AG Verfahren zum additiven aufbau eines dreidimensionalen produkts
KR102640172B1 (ko) 2019-07-03 2024-02-23 삼성전자주식회사 기판 처리 장치 및 이의 구동 방법

Citations (4)

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JP2007180144A (ja) 2005-12-27 2007-07-12 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2007318140A (ja) 2006-05-25 2007-12-06 Semes Co Ltd 基板処理装置及び方法、そしてこれに用いられる噴射ヘッド
JP2008118086A (ja) 2006-10-10 2008-05-22 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2008288604A (ja) 1997-09-24 2008-11-27 Interuniv Micro Electronica Centrum Vzw 回転基材の表面から液体を除去する方法および装置

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US6398975B1 (en) 1997-09-24 2002-06-04 Interuniversitair Microelektronica Centrum (Imec) Method and apparatus for localized liquid treatment of the surface of a substrate
JPH11260779A (ja) * 1997-12-02 1999-09-24 Tadahiro Omi スピン洗浄装置及びスピン洗浄方法
US6287178B1 (en) * 1999-07-20 2001-09-11 International Business Machines Corporation Wafer carrier rinsing mechanism
US6827814B2 (en) * 2000-05-08 2004-12-07 Tokyo Electron Limited Processing apparatus, processing system and processing method
JP3979464B2 (ja) * 2001-12-27 2007-09-19 株式会社荏原製作所 無電解めっき前処理装置及び方法
JP2005353739A (ja) 2004-06-09 2005-12-22 Dainippon Screen Mfg Co Ltd 基板洗浄装置
JP2006114884A (ja) * 2004-09-17 2006-04-27 Ebara Corp 基板洗浄処理装置及び基板処理ユニット
JP4928234B2 (ja) 2006-11-20 2012-05-09 大日本スクリーン製造株式会社 基板処理装置
US7741583B2 (en) * 2007-03-22 2010-06-22 Tokyo Electron Limited Bake plate lid cleaner and cleaning method
JP4819010B2 (ja) * 2007-09-04 2011-11-16 東京エレクトロン株式会社 処理装置、処理方法および記憶媒体
WO2009084406A1 (ja) * 2007-12-27 2009-07-09 Tokyo Electron Limited 液処理装置、液処理方法および記憶媒体
JP5642574B2 (ja) * 2011-01-25 2014-12-17 東京エレクトロン株式会社 液処理装置および液処理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008288604A (ja) 1997-09-24 2008-11-27 Interuniv Micro Electronica Centrum Vzw 回転基材の表面から液体を除去する方法および装置
JP2007180144A (ja) 2005-12-27 2007-07-12 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2007318140A (ja) 2006-05-25 2007-12-06 Semes Co Ltd 基板処理装置及び方法、そしてこれに用いられる噴射ヘッド
JP2008118086A (ja) 2006-10-10 2008-05-22 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
TWI517225B (zh) 2016-01-11
JP2012151439A (ja) 2012-08-09
US9048269B2 (en) 2015-06-02
JP5743853B2 (ja) 2015-07-01
KR20120075361A (ko) 2012-07-06
CN102553851A (zh) 2012-07-11
TW201246322A (en) 2012-11-16
CN102553851B (zh) 2015-06-03
US20120160278A1 (en) 2012-06-28

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