KR101541538B1 - 웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션 - Google Patents

웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션 Download PDF

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Publication number
KR101541538B1
KR101541538B1 KR1020080129885A KR20080129885A KR101541538B1 KR 101541538 B1 KR101541538 B1 KR 101541538B1 KR 1020080129885 A KR1020080129885 A KR 1020080129885A KR 20080129885 A KR20080129885 A KR 20080129885A KR 101541538 B1 KR101541538 B1 KR 101541538B1
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KR
South Korea
Prior art keywords
wafer
unit
plate
transfer arm
transfer
Prior art date
Application number
KR1020080129885A
Other languages
English (en)
Korean (ko)
Other versions
KR20100071243A (ko
Inventor
진전호
최기욱
정진영
황인욱
김우열
황찬욱
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020080129885A priority Critical patent/KR101541538B1/ko
Priority to TW098116142A priority patent/TWI460115B/zh
Priority to PCT/KR2009/002676 priority patent/WO2010071278A1/en
Publication of KR20100071243A publication Critical patent/KR20100071243A/ko
Application granted granted Critical
Publication of KR101541538B1 publication Critical patent/KR101541538B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020080129885A 2008-12-19 2008-12-19 웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션 KR101541538B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020080129885A KR101541538B1 (ko) 2008-12-19 2008-12-19 웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션
TW098116142A TWI460115B (zh) 2008-12-19 2009-05-15 晶圓搬運單元及包括該單元之探針台
PCT/KR2009/002676 WO2010071278A1 (en) 2008-12-19 2009-05-21 Wafer transfer unit and probe station including the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080129885A KR101541538B1 (ko) 2008-12-19 2008-12-19 웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션

Publications (2)

Publication Number Publication Date
KR20100071243A KR20100071243A (ko) 2010-06-29
KR101541538B1 true KR101541538B1 (ko) 2015-08-04

Family

ID=42268927

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080129885A KR101541538B1 (ko) 2008-12-19 2008-12-19 웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션

Country Status (3)

Country Link
KR (1) KR101541538B1 (zh)
TW (1) TWI460115B (zh)
WO (1) WO2010071278A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101503143B1 (ko) * 2013-01-31 2015-03-18 세메스 주식회사 프로브 카드의 반송 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231781A (ja) 2001-01-31 2002-08-16 Tokyo Electron Ltd 基板処理装置及び基板処理装置における基板搬送方法
JP2006123135A (ja) * 2004-11-01 2006-05-18 Daihen Corp 直線移動機構およびこれを用いた搬送ロボット

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940005476B1 (ko) * 1989-05-18 1994-06-20 대우전자 주식회사 전자펌프용 원형 필터망 제조방법
JP2975792B2 (ja) * 1992-12-28 1999-11-10 株式会社日立製作所 カバー付搬送ロボット
JPH0997825A (ja) * 1995-07-26 1997-04-08 Fujitsu Ltd 基板搬送装置と基板処理システム及び基板搬送方法と半導体装置の製造方法
US6364762B1 (en) * 1999-09-30 2002-04-02 Lam Research Corporation Wafer atmospheric transport module having a controlled mini-environment
US6690993B2 (en) * 2000-10-12 2004-02-10 R. Foulke Development Company, Llc Reticle storage system
JP3950299B2 (ja) * 2001-01-15 2007-07-25 東京エレクトロン株式会社 基板処理装置及びその方法
KR100483428B1 (ko) * 2003-01-24 2005-04-14 삼성전자주식회사 기판 가공 장치
WO2008078939A1 (en) * 2006-12-27 2008-07-03 Secron Co., Ltd. Probe station, and testing method of wafer using the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231781A (ja) 2001-01-31 2002-08-16 Tokyo Electron Ltd 基板処理装置及び基板処理装置における基板搬送方法
JP2006123135A (ja) * 2004-11-01 2006-05-18 Daihen Corp 直線移動機構およびこれを用いた搬送ロボット

Also Published As

Publication number Publication date
KR20100071243A (ko) 2010-06-29
WO2010071278A1 (en) 2010-06-24
TWI460115B (zh) 2014-11-11
TW201024194A (en) 2010-07-01

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