KR101514909B1 - 그래핀 제조용 동박 및 그것을 사용한 그래핀의 제조 방법 - Google Patents
그래핀 제조용 동박 및 그것을 사용한 그래핀의 제조 방법 Download PDFInfo
- Publication number
- KR101514909B1 KR101514909B1 KR1020137021614A KR20137021614A KR101514909B1 KR 101514909 B1 KR101514909 B1 KR 101514909B1 KR 1020137021614 A KR1020137021614 A KR 1020137021614A KR 20137021614 A KR20137021614 A KR 20137021614A KR 101514909 B1 KR101514909 B1 KR 101514909B1
- Authority
- KR
- South Korea
- Prior art keywords
- graphene
- copper foil
- less
- copper
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/02—Alloys based on copper with tin as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/02—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working in inert or controlled atmosphere or vacuum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/40—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling foils which present special problems, e.g. because of thinness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
- B21B2003/005—Copper or its alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Metal Rolling (AREA)
- Carbon And Carbon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011033362 | 2011-02-18 | ||
| JPJP-P-2011-033362 | 2011-02-18 | ||
| JPJP-P-2011-250982 | 2011-11-16 | ||
| JP2011250982A JP5822669B2 (ja) | 2011-02-18 | 2011-11-16 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
| PCT/JP2012/053945 WO2012111840A1 (ja) | 2011-02-18 | 2012-02-20 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130121157A KR20130121157A (ko) | 2013-11-05 |
| KR101514909B1 true KR101514909B1 (ko) | 2015-04-23 |
Family
ID=46672747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020137021614A Active KR101514909B1 (ko) | 2011-02-18 | 2012-02-20 | 그래핀 제조용 동박 및 그것을 사용한 그래핀의 제조 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | USRE47195E1 (https=) |
| EP (1) | EP2664580B1 (https=) |
| JP (1) | JP5822669B2 (https=) |
| KR (1) | KR101514909B1 (https=) |
| CN (1) | CN103370275B (https=) |
| ES (1) | ES2639917T3 (https=) |
| WO (1) | WO2012111840A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180013973A (ko) | 2015-05-29 | 2018-02-07 | 코이토 덴코 가부시키가이샤 | 누름 버튼 박스 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5822669B2 (ja) | 2011-02-18 | 2015-11-24 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
| CN103596879B (zh) | 2011-06-02 | 2018-06-12 | Jx日矿日石金属株式会社 | 石墨烯制造用铜箔以及石墨烯的制造方法 |
| JP5850720B2 (ja) | 2011-06-02 | 2016-02-03 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔、及びグラフェンの製造方法 |
| ES2639493T3 (es) * | 2011-11-04 | 2017-10-26 | Jx Nippon Mining & Metals Corporation | Lámina de cobre para producción de grafeno y procedimiento de producción de la misma, y procedimiento de producción de grafeno |
| JP5721609B2 (ja) * | 2011-11-15 | 2015-05-20 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔、及びグラフェンの製造方法 |
| JP2014037577A (ja) * | 2012-08-16 | 2014-02-27 | Jx Nippon Mining & Metals Corp | グラフェン製造用圧延銅箔、及びグラフェンの製造方法 |
| JP5865211B2 (ja) * | 2012-08-16 | 2016-02-17 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
| JP5756834B2 (ja) * | 2013-10-02 | 2015-07-29 | 尾池工業株式会社 | 転写フィルムおよびその製造方法、並びに透明導電性積層体の製造方法 |
| JP6277490B2 (ja) * | 2014-02-10 | 2018-02-14 | パナソニックIpマネジメント株式会社 | 塗膜物の製造装置 |
| JP6078024B2 (ja) | 2014-06-13 | 2017-02-08 | Jx金属株式会社 | 2次元六角形格子化合物製造用圧延銅箔、及び2次元六角形格子化合物の製造方法 |
| CN104198389B (zh) * | 2014-09-22 | 2017-02-01 | 上海理工大学 | 用于超高分辨率荧光成像的铜基悬空样品台制备方法 |
| WO2016147475A1 (ja) * | 2015-03-17 | 2016-09-22 | リンテック株式会社 | シート製造装置および製造方法 |
| CN107267792A (zh) * | 2017-06-29 | 2017-10-20 | 广东省材料与加工研究所 | 一种石墨烯增强铜或铜合金棒材的制备方法 |
Family Cites Families (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69100377T2 (de) | 1990-01-22 | 1994-01-20 | Atd Corp | Kissenartig geformtes Gebilde mit Wärmeleitzonen und thermischen Isolierzonen und verformbares Laminat. |
| JP3481797B2 (ja) | 1996-10-03 | 2003-12-22 | 片山特殊工業株式会社 | 電池電極用基板の製造方法および電池電極用基板 |
| JP3859384B2 (ja) | 1999-03-08 | 2006-12-20 | 日鉱金属株式会社 | 屈曲性に優れるフレキシブルプリント回路基板用圧延銅箔およびその製造方法 |
| JP4056175B2 (ja) | 1999-05-13 | 2008-03-05 | 株式会社神戸製鋼所 | プレス打抜き性が優れたリードフレーム、端子、コネクタ、スイッチ又はリレー用銅合金板 |
| JP3521074B2 (ja) | 2000-01-06 | 2004-04-19 | 三井金属鉱業株式会社 | 電解銅箔の物性検査方法 |
| JP3552043B2 (ja) | 2000-08-07 | 2004-08-11 | 古河電気工業株式会社 | ベルト&ホイール式連続鋳造圧延法による無酸素銅線材の製造方法および銅合金線材の製造方法 |
| TWI298988B (en) * | 2002-07-19 | 2008-07-11 | Ube Industries | Copper-clad laminate |
| JP2004074214A (ja) | 2002-08-16 | 2004-03-11 | Nikko Metal Manufacturing Co Ltd | ラミネート材とのピーリング強度を向上した金属圧延箔 |
| CN1286716C (zh) | 2003-03-19 | 2006-11-29 | 清华大学 | 一种生长碳纳米管的方法 |
| WO2006019035A1 (ja) | 2004-08-17 | 2006-02-23 | Kabushiki Kaisha Kobe Seiko Sho | 曲げ加工性を備えた電気電子部品用銅合金板 |
| JP4401998B2 (ja) * | 2005-03-31 | 2010-01-20 | 日鉱金属株式会社 | 銅張積層基板用高光沢圧延銅箔及びその製造方法 |
| CN101146933B (zh) * | 2005-03-31 | 2010-11-24 | 三井金属矿业株式会社 | 电解铜箔及电解铜箔的制造方法、采用该电解铜箔得到的表面处理电解铜箔、采用该表面处理电解铜箔的覆铜层压板及印刷电路板 |
| JP4522972B2 (ja) | 2005-04-28 | 2010-08-11 | 日鉱金属株式会社 | 銅張積層基板用高光沢圧延銅箔 |
| TW200738913A (en) * | 2006-03-10 | 2007-10-16 | Mitsui Mining & Smelting Co | Surface treated elctrolytic copper foil and process for producing the same |
| KR101344493B1 (ko) | 2007-12-17 | 2013-12-24 | 삼성전자주식회사 | 단결정 그라펜 시트 및 그의 제조방법 |
| JP4960215B2 (ja) | 2007-12-28 | 2012-06-27 | パナソニック株式会社 | 金属箔負極集電体加工用ローラ及び金属箔負極集電体加工方法 |
| US7479590B1 (en) | 2008-01-03 | 2009-01-20 | International Business Machines Corporation | Dry adhesives, methods of manufacture thereof and articles comprising the same |
| JP2009215146A (ja) | 2008-03-13 | 2009-09-24 | Panasonic Corp | 金属含有ナノ粒子、これを用いて成長したカーボンナノチューブ構造体、及びこのカーボンナノチューブ構造体を用いた電子デバイス及びその製造方法 |
| EP2330224B1 (en) | 2008-09-30 | 2013-05-29 | JX Nippon Mining & Metals Corporation | High-purity copper and process for electrolytically producing high-purity copper |
| JP4972115B2 (ja) * | 2009-03-27 | 2012-07-11 | Jx日鉱日石金属株式会社 | 圧延銅箔 |
| CN102439802B (zh) | 2009-04-13 | 2014-02-26 | 新加坡国立大学 | 基于石墨烯的可饱和吸收体器件和方法 |
| JP5569769B2 (ja) * | 2009-08-31 | 2014-08-13 | 独立行政法人物質・材料研究機構 | グラフェンフィルム製造方法 |
| KR101736462B1 (ko) | 2009-09-21 | 2017-05-16 | 한화테크윈 주식회사 | 그래핀의 제조 방법 |
| JP5219973B2 (ja) | 2009-09-24 | 2013-06-26 | Jx日鉱日石金属株式会社 | せん断加工性に優れる圧延銅箔ならびにこれを用いた負極集電体、負極板および二次電池 |
| JP5094834B2 (ja) | 2009-12-28 | 2012-12-12 | Jx日鉱日石金属株式会社 | 銅箔の製造方法、銅箔及び銅張積層板 |
| JP2013517274A (ja) | 2010-01-12 | 2013-05-16 | ナショナル ナノマテリアルズ インコーポレイテッド | グラフェンおよびグラフェンオールを製造するための方法および系 |
| US20110195207A1 (en) | 2010-02-08 | 2011-08-11 | Sungkyunkwan University Foundation For Corporate Collaboration | Graphene roll-to-roll coating apparatus and graphene roll-to-roll coating method using the same |
| JP5563500B2 (ja) | 2010-05-28 | 2014-07-30 | 日本電信電話株式会社 | グラフェン及び炭素分子薄膜の合成方法 |
| US20120132516A1 (en) | 2010-11-29 | 2012-05-31 | Zimmerman Paul A | Synthesis of Graphene Films Cycloalkanes |
| JP5822669B2 (ja) | 2011-02-18 | 2015-11-24 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
| JP5411192B2 (ja) | 2011-03-25 | 2014-02-12 | Jx日鉱日石金属株式会社 | 圧延銅箔及びその製造方法 |
| JP5850720B2 (ja) | 2011-06-02 | 2016-02-03 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔、及びグラフェンの製造方法 |
| CN103596879B (zh) | 2011-06-02 | 2018-06-12 | Jx日矿日石金属株式会社 | 石墨烯制造用铜箔以及石墨烯的制造方法 |
| JP5758254B2 (ja) * | 2011-09-27 | 2015-08-05 | Jx日鉱日石金属株式会社 | 圧延銅箔 |
| ES2639493T3 (es) | 2011-11-04 | 2017-10-26 | Jx Nippon Mining & Metals Corporation | Lámina de cobre para producción de grafeno y procedimiento de producción de la misma, y procedimiento de producción de grafeno |
| JP5721609B2 (ja) | 2011-11-15 | 2015-05-20 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔、及びグラフェンの製造方法 |
| JP5909082B2 (ja) | 2011-11-21 | 2016-04-26 | Jx金属株式会社 | グラフェン製造用銅箔及びグラフェンの製造方法 |
| JP5475897B1 (ja) * | 2012-05-11 | 2014-04-16 | Jx日鉱日石金属株式会社 | 表面処理銅箔及びそれを用いた積層板、銅箔、プリント配線板、電子機器、並びに、プリント配線板の製造方法 |
| JP5298225B1 (ja) * | 2012-06-29 | 2013-09-25 | Jx日鉱日石金属株式会社 | 圧延銅箔及びその製造方法、並びに、積層板 |
| JP2014037577A (ja) | 2012-08-16 | 2014-02-27 | Jx Nippon Mining & Metals Corp | グラフェン製造用圧延銅箔、及びグラフェンの製造方法 |
| JP6078024B2 (ja) | 2014-06-13 | 2017-02-08 | Jx金属株式会社 | 2次元六角形格子化合物製造用圧延銅箔、及び2次元六角形格子化合物の製造方法 |
-
2011
- 2011-11-16 JP JP2011250982A patent/JP5822669B2/ja active Active
-
2012
- 2012-02-20 US US15/432,383 patent/USRE47195E1/en active Active
- 2012-02-20 WO PCT/JP2012/053945 patent/WO2012111840A1/ja not_active Ceased
- 2012-02-20 CN CN201280008963.5A patent/CN103370275B/zh active Active
- 2012-02-20 US US13/985,931 patent/US9260310B2/en not_active Ceased
- 2012-02-20 EP EP12747854.3A patent/EP2664580B1/en active Active
- 2012-02-20 KR KR1020137021614A patent/KR101514909B1/ko active Active
- 2012-02-20 ES ES12747854.3T patent/ES2639917T3/es active Active
Non-Patent Citations (1)
| Title |
|---|
| Chem. Mater. 2011, Vol. 23, pp. 1441-1447 (2011.02.10.) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180013973A (ko) | 2015-05-29 | 2018-02-07 | 코이토 덴코 가부시키가이샤 | 누름 버튼 박스 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103370275B (zh) | 2016-08-10 |
| US20140216650A1 (en) | 2014-08-07 |
| US9260310B2 (en) | 2016-02-16 |
| EP2664580A1 (en) | 2013-11-20 |
| USRE47195E1 (en) | 2019-01-08 |
| EP2664580B1 (en) | 2017-06-14 |
| KR20130121157A (ko) | 2013-11-05 |
| JP2012183583A (ja) | 2012-09-27 |
| ES2639917T3 (es) | 2017-10-30 |
| JP5822669B2 (ja) | 2015-11-24 |
| EP2664580A4 (en) | 2014-11-05 |
| WO2012111840A1 (ja) | 2012-08-23 |
| CN103370275A (zh) | 2013-10-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101514909B1 (ko) | 그래핀 제조용 동박 및 그것을 사용한 그래핀의 제조 방법 | |
| KR101589392B1 (ko) | 그래핀 제조용 동박 및 그 제조 방법, 그리고 그래핀의 제조 방법 | |
| KR101538259B1 (ko) | 그래핀 제조용 구리박 및 그래핀의 제조 방법 | |
| KR101577882B1 (ko) | 그래핀 제조용 구리박 및 그래핀의 제조 방법 | |
| JP5721609B2 (ja) | グラフェン製造用銅箔、及びグラフェンの製造方法 | |
| JP5758205B2 (ja) | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 | |
| KR20150034264A (ko) | 그래핀 제조용 압연 동박 및 그래핀의 제조 방법 | |
| JP5865211B2 (ja) | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 | |
| JP2012251209A (ja) | グラフェン製造用銅箔、及びグラフェンの製造方法 | |
| TWI516316B (zh) | A copper foil for graphene production, and a method for producing graphene using the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 10 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 11 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 12 |
|
| U11 | Full renewal or maintenance fee paid |
Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE) Year of fee payment: 12 |