KR101504906B1 - 투명 피막 형성용 도료 및 투명 피막부 기재 - Google Patents

투명 피막 형성용 도료 및 투명 피막부 기재 Download PDF

Info

Publication number
KR101504906B1
KR101504906B1 KR1020070060252A KR20070060252A KR101504906B1 KR 101504906 B1 KR101504906 B1 KR 101504906B1 KR 1020070060252 A KR1020070060252 A KR 1020070060252A KR 20070060252 A KR20070060252 A KR 20070060252A KR 101504906 B1 KR101504906 B1 KR 101504906B1
Authority
KR
South Korea
Prior art keywords
film
transparent
refractive index
resin
forming
Prior art date
Application number
KR1020070060252A
Other languages
English (en)
Korean (ko)
Other versions
KR20070074518A (ko
Inventor
마사유키 마츠다
미츠아키 쿠마자와
토시하루 히라이
Original Assignee
니끼 쇼꾸바이 카세이 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 니끼 쇼꾸바이 카세이 가부시키가이샤 filed Critical 니끼 쇼꾸바이 카세이 가부시키가이샤
Publication of KR20070074518A publication Critical patent/KR20070074518A/ko
Application granted granted Critical
Publication of KR101504906B1 publication Critical patent/KR101504906B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/65—Additives macromolecular
KR1020070060252A 2006-06-26 2007-06-20 투명 피막 형성용 도료 및 투명 피막부 기재 KR101504906B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00175773 2006-06-26
JP2006175773A JP2008001869A (ja) 2006-06-26 2006-06-26 透明被膜形成用塗料および被膜付基材

Publications (2)

Publication Number Publication Date
KR20070074518A KR20070074518A (ko) 2007-07-12
KR101504906B1 true KR101504906B1 (ko) 2015-03-23

Family

ID=38508634

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070060252A KR101504906B1 (ko) 2006-06-26 2007-06-20 투명 피막 형성용 도료 및 투명 피막부 기재

Country Status (4)

Country Link
JP (1) JP2008001869A (zh)
KR (1) KR101504906B1 (zh)
CN (1) CN101096564B (zh)
TW (1) TWI454543B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5411477B2 (ja) * 2008-09-30 2014-02-12 積水化学工業株式会社 中空有機−無機ハイブリッド微粒子、反射防止性樹脂組成物、反射防止フィルム用コーティング剤、反射防止積層体及び反射防止フィルム
ATE513874T1 (de) * 2008-10-14 2011-07-15 Dsm Ip Assets Bv Fleckenresistente partikel
JP5596920B2 (ja) * 2008-11-28 2014-09-24 日揮触媒化成株式会社 透明被膜形成用塗料および透明被膜付基材
JP5412932B2 (ja) * 2009-04-08 2014-02-12 旭硝子株式会社 ハードコート付き樹脂基材およびハードコート付き樹脂基材の製造方法
CN102102857B (zh) * 2009-12-18 2014-08-13 比亚迪股份有限公司 一种导光部件的制备方法及由该方法制得的导光部件
JP6112753B2 (ja) * 2009-12-28 2017-04-12 日揮触媒化成株式会社 透明被膜形成用塗布液ならびに透明被膜付基材、および疎水性金属酸化物粒子の製造方法
JP2012140533A (ja) * 2010-12-28 2012-07-26 Jgc Catalysts & Chemicals Ltd 透明被膜形成用塗布液および透明被膜付基材
JP5825055B2 (ja) * 2011-09-29 2015-12-02 王子ホールディングス株式会社 反射防止体、静電容量式タッチパネルおよび静電容量式タッチパネル付き表示装置
WO2013082488A2 (en) 2011-11-30 2013-06-06 Corning Incorporated Optical coating method, apparatus and product
US10077207B2 (en) 2011-11-30 2018-09-18 Corning Incorporated Optical coating method, apparatus and product
US9957609B2 (en) 2011-11-30 2018-05-01 Corning Incorporated Process for making of glass articles with optical and easy-to-clean coatings
TWI486412B (zh) 2011-12-16 2015-06-01 Eternal Materials Co Ltd 抗反射塗料組合物及其製備方法
CN105418952B (zh) * 2015-12-31 2018-08-21 金达科技股份有限公司 一种抗静电显示屏保护膜片及制备方法
CN109706783B (zh) * 2018-12-26 2021-09-14 罗力诚 一种高性能无甲醛木纹纸浸渍胶水及制备方法
KR102527634B1 (ko) * 2022-11-11 2023-05-02 대한도로페인트(주) 수용성 차선도색용 도료 조성물

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264520A (ja) 2000-03-16 2001-09-26 Dainippon Printing Co Ltd 反射防止フィルム、偏光素子、および表示装置、ならびに反射防止フィルムの製造方法
KR20010099783A (ko) * 1998-12-21 2001-11-09 우츠미 오사무 미립자, 미립자분산졸, 동분산졸의 제조방법 및피막부착기재
JP2005099778A (ja) 2003-08-28 2005-04-14 Dainippon Printing Co Ltd 反射防止積層体
JP2006154200A (ja) 2004-11-29 2006-06-15 Konica Minolta Opto Inc 防眩性反射防止フィルム、防眩性反射防止フィルムの製造方法、それを用いた偏光板及び表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3946357B2 (ja) * 1997-09-18 2007-07-18 富士フイルム株式会社 反射防止膜およびそれを用いた画像表示装置
WO2001098222A1 (en) * 2000-06-20 2001-12-27 Kabushiki Kaisha Toshiba Transparent film-coated substrate, coating liquid for transparent film formation, and display device
JP2004083812A (ja) * 2002-08-28 2004-03-18 Catalysts & Chem Ind Co Ltd 透明被膜形成用塗布液および透明被膜付基材、表示装置
JP4471564B2 (ja) * 2002-10-31 2010-06-02 日揮触媒化成株式会社 低誘電率非晶質シリカ系被膜形成用塗布液および該塗布液の調製方法
US20060269733A1 (en) * 2003-08-28 2006-11-30 Dai Nippon Printing Co., Ltd. Antireflection laminate
JP4740603B2 (ja) * 2004-01-23 2011-08-03 富士フイルム株式会社 反射防止フィルムの製造方法
WO2006025503A1 (ja) * 2004-09-02 2006-03-09 Catalysts & Chemicals Industries Co., Ltd. チタニウム含有シリカゾルおよびその製造方法、防汚被膜およびインク受容層付基材、ならびに記録用基材の再生方法
JP4726198B2 (ja) * 2005-04-27 2011-07-20 日本化薬株式会社 感光性樹脂組成物及びその硬化皮膜を有するフィルム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010099783A (ko) * 1998-12-21 2001-11-09 우츠미 오사무 미립자, 미립자분산졸, 동분산졸의 제조방법 및피막부착기재
JP2001264520A (ja) 2000-03-16 2001-09-26 Dainippon Printing Co Ltd 反射防止フィルム、偏光素子、および表示装置、ならびに反射防止フィルムの製造方法
JP2005099778A (ja) 2003-08-28 2005-04-14 Dainippon Printing Co Ltd 反射防止積層体
JP2006154200A (ja) 2004-11-29 2006-06-15 Konica Minolta Opto Inc 防眩性反射防止フィルム、防眩性反射防止フィルムの製造方法、それを用いた偏光板及び表示装置

Also Published As

Publication number Publication date
TW200808928A (en) 2008-02-16
CN101096564A (zh) 2008-01-02
KR20070074518A (ko) 2007-07-12
TWI454543B (zh) 2014-10-01
JP2008001869A (ja) 2008-01-10
CN101096564B (zh) 2011-11-09

Similar Documents

Publication Publication Date Title
KR101504906B1 (ko) 투명 피막 형성용 도료 및 투명 피막부 기재
JP5209855B2 (ja) 透明被膜形成用塗料および透明被膜付基材
KR100709527B1 (ko) 실리카 함유 적층체, 및 다공성 실리카층 형성용 도포조성물
JP2008163205A (ja) 透明被膜形成用塗料および透明被膜付基材
JPWO2005121265A1 (ja) シロキサン系塗料、光学物品およびシロキサン系塗料の製造方法
JP5378771B2 (ja) 反射防止膜付基材および反射防止膜形成用塗布液
JP2008291174A (ja) 透明被膜形成用塗料および透明被膜付基材
JP5372417B2 (ja) 反射防止フィルム
JP5546239B2 (ja) ハードコート膜付基材およびハードコート膜形成用塗布液
JP5148846B2 (ja) 透明被膜形成用塗料および透明被膜付基材
JP2007182511A (ja) コーティング材料、その製造方法および光学物品
JP6369187B2 (ja) インサート成型用耐指紋性反射防止フィルム及びこれを用いた樹脂成型品
JP2007316213A (ja) 反射防止膜及びそれを用いた光学部品
JP5159265B2 (ja) 透明被膜付基材および透明被膜形成用塗布液
JP2009160755A (ja) 透明被膜付基材
KR101251720B1 (ko) 눈부심 방지 필름 및 이를 제조하기 위한 눈부심 방지 조성물
JP2009108123A (ja) 表面処理金属酸化物粒子の製造方法、該微粒子を含む透明被膜形成用塗布液および透明被膜付基材
JP2008291175A (ja) 透明被膜形成用塗料および透明被膜付基材
KR20070022311A (ko) 실록산계 도료, 광학물품 및 실록산계 도료의 제조방법
JP6152630B2 (ja) 光学フィルム
JP2006022258A (ja) 組成物、成形物および硬化塗膜の製造方法
JP2010054635A (ja) 反射防止フィルム
JP2010032734A (ja) 反射防止フィルム
JP5931009B2 (ja) 表面処理金属酸化物粒子の製造方法、該粒子を含む透明被膜形成用塗布液および透明被膜付基材
EP4024091B1 (en) Anti-refractive film

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
J201 Request for trial against refusal decision
B701 Decision to grant
FPAY Annual fee payment

Payment date: 20180219

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20200218

Year of fee payment: 6