TW200808928A - Paint for forming transparent film and substrate with the film - Google Patents

Abstract

The present invention provides a paint for forming transparent film, which can be used to form a transparent film with low refraction index and excellent properties such as adherence to substrate, strength, water repellency, whitening-resistance, in addition, which can be used to form a transparent film which can reflect the shape of substrate on the surface of lower layer thereof, for instance, when the surface of lower layer thereof has various unevenness, a transparent film having on its surface the same unevenness as the those of the lower layer can be formed, therefore the paint is applicable for the formation of the transparent film being excellent evev in anti-reflection or anti-glare. The paint for forming transparent film comprising microparticles with low refraction index, a matrix forming composition, a polymerization initiator and a solvent, (i) the microparticles with low refraction index have been treated with silane coupling agent, the refraction index of the surface-treated microparticles being within 1.20-1.45, the concentration of the microparticles as solid matter being within 0.1-10 wt%, (ii) the matrix forming composition being a resin of a silicone system or acryl system, the concentration of the composition as solid mater being within 0.5-20 wt%.

Description

200808928, IX. Description of the Invention: [Technical Field] The present invention relates to a transparent film forming coating material and a substrate comprising a low refractive index microparticle, a matrix forming component, a solvent, and a substrate. A transparent transparent film formed of a coating material for forming a transparent film. ,,, in more detail, in addition to the adhesion, water repellency, whitening resistance, etc., which can form a good relationship with the substrate, etc., * " * " transparent rupture film, sound The transparent quilt of the shape of the surface of the layer, for example, the following: each: a transparent film forming coating which is excellent in transparency, etc.::: = transparent enamel substrate. And [Prior Art] In the past, in order to prevent the reflection of glass and plastic sheets, it is known that anti-reflection can be formed on the surface of the substrate, and it is known that the coating method is used. A method of forming a low refractive index such as a fluororesin or a magnesium fluoride by a plating method or a CVD method; and a method of 7 H (for example, refer to the publication of the Japanese Patent No. 5 Marriage No. 5 (Patent Literature), etc.). It is also known that the anti-reflection property is required to be formed, and it is necessary to form a high-refractive-index film of a fine particle such as a radiation-receiving film in the lower layer of the anti-reflection film, and each of the two folds must have irregularities formed on the surface of the anti-reflection film. The glare, and the concentration of the ^ r ^ A 枓 、 、 319 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 Viscosity, solvent, coating method, drying conditions, etc. Rong Chanyu 卉 干 干 卉 卉 卉 卉 卉 卉 卉 卉 卉 ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ Anti-reflection performance, anti-glare performance transparency [solved Means for the problem] The inventors of the present invention have in view of the present use, including: low refractive index microparticles containing a result of a deliberate investigation, and having a specific decane coupling d, ... When the coating liquid of the component is formed, a matrix formed by combining the layers can be formed, and an underlayer film having irregularities such as adhesion, strength, water repellency, and whitening resistance to the substrate can be formed. When the transparent film ' is flat on the surface of the film, and V can be formed into a film, 'the transparent film is not formed, and the present invention is completed to have the same irregularities as the lower portion. The constituent elements of the present invention are as follows. ;: The coating for forming a bright film is formed by a transparent film composed of a low refractive index fine particle, a base material utr, and a starting agent and a solvent. (1) The low refractive index fine particles are in a second firing coupling. = The surface-treated low-refractive-index microparticles have a refractive index of 120 in the dry circumference, and the concentration of the low-refractive-index microparticles is converted into a solid content in the range of Η)% by weight. (9) The matrix-forming component is cholesteric grease 319293 6 200808928 ' And / or C When it comes to acid-based resin, it is at the time. .5 to 2. Heavy, 20% ~ converted into a solid part [Quality 2] formed as a coating, the + '(9) The above-mentioned base oxy-based resin is a tree wax and / / Or Bing, Guan 2::: A wax made by polymerizing acrylic resin monomers. [10], the (10) resin for forming a transparent film in the item m is a (meth) propylene diacid acid tree having a (meth) propyl group. ==There is a transparent coating, which is used as a coating material. Among them, (9) the above-mentioned resin is used as a dialing ===: a single cleavage of a lipid to form a fluorene-based resin, having (AA) 1 bis (meth) propyl A fluorocarbon resin of a propyl group, a long-chain alkyl group-containing resin having a (fluorenyl) group, and a acryl resin. [5] The coating for forming a transparent film according to [1] to [4], which comprises an acrylic resin obtained by polymerizing the following monomers as a stress buffering agent, (1) the substrate is 矽In the case of an oxygen-based resin, when it is a difunctional or trifunctional acid resin monomer or a functional acrylic resin, the (ii) base is an acrylic resin, [6] as in (1) to [5]. In the coating material for forming a transparent film, #319293 7 200808928 The polymerization initiator contains a phosphine-based polymerization initiator or a cationic photopolymerization initiator. [7] The coating material for forming a transparent film according to [1] to [6] wherein the solvent is 50 to 100. a mixed solvent of a solvent (A) of Freund's point and a solvent (B) having a boiling point exceeding ι〇〇2 2 ° C, and a ratio of the solvent (A) in the mixed solvent is in the range of 50 to 9 % by weight, The ratio of the solvent (8) is in the range of from 10 to 50% by weight. [8] The coating film for forming a transparent film according to [1] to [7], wherein (1) the surface-treated low refractive index particle decane coupling agent has a methacryl group selected from the group consisting of a methacryl group and an epoxy group ( A decane coupling agent of a glycidyl group, an aminocarboxylic acid group, an amine group, a fluorine group or a functional group of two or more. M--a substrate to which a transparent film is attached, which is a transparent film formed of a coating material for forming a transparent film in two to m items on a substrate and a substrate. [Effect of the invention] A transparent film having a low refractive index which is excellent in adhesion to a substrate, water repellency and whitening resistance, and a substrate having a surface having irregularities or a lower film is formed to flatten the surface of the transparent film. It is possible to form a coating liquid for forming a transparent film having a transparent film with a lower portion ==. . Take the concave white 'assimilation' using the transparent film forming coating and the transparent film is folded (4) low, „可朗(4) embossing makes anti-reflection performance, anti-glare performance, bright place on the R for LCD display, electricity Pulp display, projection display, 319293 8 200808928 • A substrate containing a transparent film such as an EL_display or a CRT display. [Embodiment] Hereinafter, a coating material for forming a transparent film according to the present invention will be specifically described. The coating film for forming a transparent film according to the present invention is composed of a low refractive index fine particle, a matrix forming component, a polymerization initiator, and a solvent. ϋι·Amphibious rate is slightly used. In the present invention, a decane coupling agent is used. Or surface-treated low-refractive-index microparticles such as acrylate, etc. The low-refractive-index microparticles used have an average particle diameter of 2 Å to 5 Å, and preferably 40 to 〇〇 nm, to 1.40. In the range of low-refractive-index microparticles, as long as it is a low-refractive-index, it is possible to use Si〇2, A12〇3, Ti〇2, Zr02, Sn〇2, and Ce〇. No Oxide or a composite oxide of these, such as si〇2_A, mt'tt3' ΓΓΓ〇2' Si〇2'Ti〇2' si〇2-Ti〇2-Ai2°^3^ ..., 4 but according to the makeup case The applicant's application is disclosed in the Japanese Patent Publication No. 7-133105, the Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. Oxidized granules: low refractive index, microparticles in the colloidal domain, and dispersion suitable for use. Inflammation, and specifically, the microparticles form voids inside the outer shell with pores 319293 9 200808928 = become hollow spherical In the pore (4), the oxidized oxidized fine particles of the fine particle ridge 4 and/or the vesicle are contained. The yield is in the range of 1 to 1, and is 1/50 to 2 degrees in the average particle diameter. = the outer material is good. Moreover, the outer shell layer can be shaped only by the general oxidized stone, and the same, when it contains the oxide _x other than the transparency as exemplified above, 'Mxx/Peach For G. to G 2, it is more appropriate because of high brightness. Methyl benzene 矽 矽 偶 coupling agent can be exemplified by: methyl trimethyl Oxetane, dimethyl f, phenyl sulphate, phenyl trimethoxide, diphenyl methoxy oxa ethoxy oxime, methyl hexaoxy 6 benzene, phenyl triethoxy Ethoxylated sulphur, isobutyltrimethoxysulfate, Ethyltrimethoxycarb, ethoxylated oxime, acetylated ginseng (no methoxyethoxy), diaphoric acid, methyl _3 , 3,3_tri-propyl propyl di-oxygen, base: methylhexyl) ethyltrimethoate, Y, glyceryloxymethylglycine, glycidyloxymethyltriethoxylate, gamma , Shuiguangji Ethyltrimethoxide, γ-glycidoxyethyl=, Υ'glycidoxypropyltrimethicone, trimethoate, hydrazine, glycidoxypropyltriethoxy =C3 glyceryloxyethoxy)propyltrimethoxy I (methyl mail·= Υ-:) A propyl bromide (methyl) propyl methyl triethoxy oxime, (methyl) propylene oxide Ethyl dimethyl-n-ethoxylate sinter 1 Μ (methyl) propylene oxyethyl 7 (methyl) propylene oxypropyl trimethoxy decane, γ _ (methyl hydrazine = methoxypropyl trimethoprim, γ·(methyl)propene (methyl) money, Bu (methyl) propylene, oxypropyl triethoxymethane , butyl three =: 319293 10 200808928 'Alkane, isobutyl triethoxy decane, hexyl triethoxy decane, octyl triethoxy decane, decyl triethoxy decane, butyl triethoxy decane, isobutyl Triethoxy decane, hexyl triethoxy decane, octyl triethoxy decane, decyl triethoxy decane, 3-glycosyl isopropyl propyl triethoxy sulphate, perfluorooctyl ethyl methoxy sulphur Perfluorooctylethyltriethoxydecane, perfluorooctylethyltriisopropoxide, trifluoropropyltrimethoxydecane, amineethyl)guanamine propylmethyldimethoxydecane, N-/S (amine ethyl-amine C Base trimethoxy decane, N_phenyl_γ_aminopropyltrimethoxy decane, hydrazine-thiol propyl trioxane decane, triterpene oxysterol, decyl tri-chlorine chopping, and the like. Wherein, the decane coupling agent is a decane coupling agent having a functional group selected from the group consisting of a (meth) acryl fluorenyl group, an epoxy group (glycidyl group), an amine ester group, an amine group, and a fluorinated group. The reactivity with the low-refractive-index fine particles is excellent, and the surface treatment can be effectively performed, and the obtained surface-treated low-refractive-index fine particles can be excellent in dispersibility in a coating material and a transparent film. Further, since the surface-treated low-refractive-index fine particles have excellent reactivity with the matrix-forming component to be described later, a transparent film excellent in transparency, strength, and abrasion resistance can be obtained. At the same time, the low refractive index microparticles can also be applied to a multi-functional urethane resin treated with hydrophobicity. As the polyfunctional acrylate resin having hydrophobicity, for example, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trishydroxypropyl propyl k bis (meth) acrylate, pentaerythritol tetraacrylate, di-trimethylol group can be exemplified. Propane tetra(indenyl) acrylate, diquaternary sterol hexaacrylate, decyl methacrylate, ethyl methacrylate, butyl methacrylate, decyl propylene 11 319293 200808928 isobutyl acrylate, methacrylic acid 2 -ethylhexyl ester, isodecyl methacrylate, n-dodecyl acrylate, n-octadecyl acrylate, hydrazine, hexanediol dimercapto acrylate, perfluorooctyl decyl acrylate, trifluoroethyl A thiol acrylate, an amino phthalate acrylate or the like. As for the surface treatment method of the low refractive index fine particles, for example,

The above-mentioned (four) money mixture is quantitatively added to the alcohol dispersion of human oxygen-cut microparticles, and water can be added thereto, and can be used as a catalyst for hydrolysis of tetrahydrogen coupling agent, and the compound is hydrolyzed by (4) compound. Methods. In the case of using the polyfunctional acrylic lysate having the aforementioned hydrophobicity, the polyfunctional acrylic acid (tetra) acid is dispersed in the alcohol dispersion of the oxidized (tetra) fine particles: the heat for attaching the polyfunctional acrylic acid to the surface of the low refractive index fine particles Or by adding a polymerization initiator of another method, the acrylic yttrium δ is sub-coated on the surface of the particles of the low refractive index microparticles. Shot 4: Early menstruation; after replacement with organic solvent, the surface treatment can be obtained with a low-resolution:::::: machine solvent dispersion. As for the organic solvent, the amount of the solid component can be converted into a solid component by using a poly-(4-) coupling agent or a hydrophobic acid-smelting resin having a hydrophobicity: although it can be a low-folding material (four), 0·〇5 to 1 or f varies depending on the η ! average particle diameter, but when it is small, it is preferably in the range of 〇·5. When the weight ratio is maintained, the dispersibility in the polar solvent is insufficient, and the standing property is lowered, so that the white a chain plate of the film is formed when the coating film is formed, or the whitening is widespread. The adhesion to the substrate is insufficient, and the hardness of the film by 319293 12 200808928 is insufficient. When the aforementioned weight ratio is greater than 1 day, although the species (four) different will be used due to the use of the base, but the hydrophobicity becomes too high, the surface is at a rate of: (4) the particles are condensed in the coating, or the film is formed. When it is ugly, it causes adhesion to the substrate and insufficient film hardness. - The surface treatment agent having a high refractive index is higher than that of the low refractive index microparticles = the refractive index of the surface-treated low refractive index microparticles becomes high, performance, contrast, and the like. ^Upward, and may not improve the change of the low-refractive-index microparticles after the anti-reflection surface treatment or the top multi-step micro-variation (depending on the amount of processing), == the low-refractive-index microparticles ..., and Tianqi Department # ^ ΛΑ ^ w , the car keeps, if there is a significant increase in the + average particle size of the low refractive index particles, the refractive index of the particles. If the treatment is excessive, the analyzer which may damage the particle diameter of the low refractive index non-refractive-index microparticles used in the present invention, the surface-treated low surface-treated micro-particles and the low-refractive-index microparticles and (TEM) After the photography, the U9 sub-four (four) mirror, the old elder position $ after measuring the particle size of one particle with a caliper, the particle size is calculated and the average value is obtained. H45 is more preferably in the range of the refractive index of the low refractive index fine particles *1·20 to , ·2〇 to 1.35. Since the refractive index is surface-treated, the refractive index tends to be high, so that it is difficult to make the lower limit. If the refractive index is high, the antireflection performance will be insufficient due to the reflection radiance of the base, or the transparent film may become insufficient for the contrast of the bright portion. 319293 13 200808928 • The method for measuring the refractive index of the low-refractive-index microparticles and the refractive index microparticles used in the present invention is: (1) treating the low-refractive-index microparticles in abundance, and The low-refractive-index microparticle dispensing solution knows that you want to evaporate the dispersing agent. (2) Allow it to dry to a powder at 1203⁄4. (7) Dropping a standard refractive index of a known refractive index on a glass plate The above powder is mixed therewith. 3 /Commerce _ The refractive liquid is subjected to the above operation (3), when the mixed liquid becomes transparent (iv) The refractive material of the standard refractive liquid is the refractive index of the particles. (4) Surface-treated low-refractive-index particles 涂料 in the coating. The solid fraction is ο.1 to 10% by weight, 〇.2 to 1/2. It is k, and it is preferably in the range of 〇 5 to 3 〇 by weight. Concentrated U is not the case, and the transparent film with a low refractive index is returned to the transparent film, and the anti-reflection performance is insufficient, or the contrast of the bright spot is insufficient. When the concentration of the edge is too high, the coating property may be lowered to make it difficult to form a uniform film or to lose surface smoothness, to cause the inside of the transparent film to form a gap or to cause scattering of light, or to fog the transparent film. The (haze) value becomes high, and the scratch resistance may be insufficient. In the case of the matrix-forming component of the present invention, a tantalum-based resin and/or an acrylic resin are used. [Oxygen-based resin] Gan, '=虱-based resin, which can be used as a sulfonium-based acrylic resin and an organic ruthenium compound having a functional group such as a condensed oil sulfhydryl group or a (meth) propylene fluorenyloxy group 319293 14 200808928 ' Copolymers and their hydrolyzates, biting compounds, and more respectively, the combination of free radical polymerization or hydrolysis of mixed acid modified Shihe oxygen tree r; reading fat, f benzene-based stone oxide tree wax, B-woman 7 Shuyue, 裱 oxygen modified oxime resin. Shrinking = Ergong can, machine one can... Ethoxysilane, Y, water Gan. Rain: decane, γ' glycerol oxyethyl tripropyl trimethalone, γ-glycidyl glyceryl oxyglycidyloxyethoxy) propyl tribasic succinyl sulphate, w-based trimethoate , 7_(AA)propyl^/, Bu (methyl) propylene oxymethyl) propylene oxide oxyethyl: methoxy^T methyltriethoxylate, Y-(methotene decane, b (a Base) propylene oxypropyl triethyl sulfonium propyl sulfoxide, Y Y_(f-) propyl Y-(methyl) propyl methoxypropyl triethoxy oxime, element r: (f-based醯 醯 醯 丙基 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三Lü: base (bonding bond)' Therefore, the resin component for matrix formation is strengthened by the combination with the surface-treated low-refractive-index microparticles, and a transparent film excellent in strength and abrasion resistance can be formed. Methyl)propenyl group as a functional group (IV) Oxygen-based tree: It is preferable that the composition of the yttrium-based ketones is mutually strong and the combination with the surface-refractive-index microparticles becomes strong. base Shixi Oxygen Tree Moon School Industrial Co., Ltd. (4) Oxygen Solution: Product name m鸠, ie 1 319293 15 200808928 Chi Shi Xi Oxygen Coating Co., Ltd. · Product name: uvhc Π 0 1. These are all tetrafunctional oxime-based resins. [Propanic acid-based resin] Examples of the acrylic resin' include dipentaerythritol hexaacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, and trishydroxyl. Mercaptopropane tri (meth) acrylate, pentaerythritol tetraacrylate, bis-trihydroxyhydrin propane tetrakis(meth) acrylate, dipentaerythritol hexaacrylate, methacrylic acid methacrylate, hydrazino acrylate Methyl propyl benzoate, butyl methacrylate, 2-ethylhexyl methacrylate, isodecyl methacrylate, n-dodecyl acrylate, all-n-octadecyl acrylate, hydrazine, 6 • hexanediol dimercapto acrylate, perfluorooctyl ethyl methacrylate, trifluoroethyl decyl acrylate, amino phthalic acid acrylate, etc. The acrylic resin is a trifunctional or higher acrylic resin monomer.It is preferred to polymerize the resin. The acrylic resin has many reactive functional groups (bonding bonds), so that the resin is strongly bonded to each other and to the surface-treated low-refractive-index particles, and strength can be formed. A transparent film having excellent abrasion resistance. In the present invention, an acrylic resin having a (fluorenyl) acrylonitrile group as a functional group has a high reactivity and a low refractive index of the resin and the surface treatment. The combination of the microparticles is stronger and better. As the acrylic acid-based resin having a (meth) propyl oxime group, it is made by Qiu Rongshe Chemical: product name: light acrylate DPE-6 Α (dipentaerythritol) Hexaacrylate), manufactured by Kyoeisha Chemical Co., Ltd.: product name: light acrylate DPE_4A (dipentaerythritol tetrapropyl acrylate). 319293 16 200808928 The concentration of the matrix-forming component contained in the coating material for forming a transparent film is preferably from 0.5 to 20% by weight in terms of solid content, and more preferably in the range of from 〇 to 1% by weight. When the concentration of the right matrix forming component is too small, the thickness of the transparent film is insufficient, so that it is difficult to obtain a uniform film thickness at the time of repeated coating, and it is possible that the appearance of the transparent film is mottled. If the concentration of the components of the kibbe formation is too high, the film thickness becomes too thick, and it is difficult to pass to a uniform film thickness, which may cause mottle in the appearance of the transparent film. In particular, when a transparent film having anti-glare property is formed on a substrate having irregularities on the surface of the underlying film of the base (four), the concentration of the matrix-forming component in the coating material for forming a transparent film is converted into a solid fraction by 1 to 3 〇% of the weight is better. At this time, a transparent film having an unevenness which almost faithfully reflects the surface of the substrate or the underlying film can be formed. ^ When 'relative to the above-mentioned particles, the amount of the base f-forming component is the content of the resulting matrix-forming component, which is converted to a solid form of 2 to 99% by weight, more preferably in the range of ...% by weight, The amount of the refractive index listener is the content of the low-permeability microparticles of the obtained transmissive daily frequency financial surface ^, which can be used when converted into solid fractions! Up to 7% weight 1%, more 2 to 6 〇 center of gravity = ratio 'can reach the goal of the invention, can also form the adhesion, strength, water repellency, whitening resistance 4 A transparent film having a low refractive index, and a transparent film formed on the mask, μ, a lower surface of the convex surface, and a lower surface of the transparent film, the surface of the transparent film is made flat, but can be opened to have a transparent surface having the same unevenness as the lower unevenness. Membrane. 319293 17 200808928 [Water repellent] The coating of the present invention may also contain a polysiloxane fluorene-based oxime resin, (meth) oxime, and ancient, Tiangan, ^ & It is preferred that at least one of the long-chain alkyl-based lanthanide resin having a (meth) propylene group is used. When decane-based propylene becomes fat, 'reducing compatibility with the aforementioned matrix component'

Wencheng is located on the surface layer of the film, so it is water-based (the contact angle of water droplets is above 90 degrees), which can prevent = Table: in the stone-oxygen resin with (meth)acrylic base, water stone At the end of the temperament - the end of the end is attached to the (methyl) gamma sputum base. For example, modified polychlorinated oil manufactured by Vietnam Chemical Industry Co., Ltd.: trade name · χ _24_8 ^ energy base equivalent 2100), X_22_174_DX (functional group equivalent 46 〇〇), 4 8201, x_22-2426 (functional base equivalent pooo), etc. To apply. As a long-chain alkyl resin having a (meth)acryl fluorenyl group, it is a new medium = industrial product: product name: NK ester human ^ 013 _ _ _ _ _ diol diol di acrylate - 曰) Xinzhongcun Industrial: products Name: NK ester A-DOD (1,1〇-nonanediol diacrylate) and the like are suitable. The adhesion of the moon scorpion and the 3 scale is easy to wipe off even if it is attached.

In the case of the yoke-oxygen-based acrylic resin, a resin obtained by binding an acrylic resin of a urethane acrylate to a single end of a polysulfide, for example, an ultraviolet ray manufactured by Synthetic Chemicals Co., Ltd. Hardening type resin, product name, Violet UT-3841, etc. are applicable. The water repellent content in the coating material for forming a transparent film is preferably from 0.1 to 10% by weight, more preferably from 0.05 to 5% by weight, based on the amount of the component 319293 18 200808928. When the content of the water repellent is too small, in addition to water repellency, it is difficult to obtain /, he: anti-foaming adhesion or anti-fouling effect on the elasticity of the singular ink. When the content is too large on the right side, excessive appearance of the surface of the film (bleed _), mottled, whitened, etc., or the hardness of the film is insufficient. [stress relieving agent] There are also 3 stress relieving agents. It is desirable to contain an acrylic resin which is polymerized from the following bodies. (1) When the kebei is a gas-generating resin, it is a resin monomer 丨" ene (4) (8) When the matrix is an acrylic resin, it is a difunctional acrylic resin monomer. Examples of the di-functional acrylic resin include tricyclodecane dihydroxy hydrazine: propylene hydrazine, bisphenol diacrylate, isocyanuric acid diacrylate, tripropylene glycol diacrylate vinegar, and polypropylene glycol diacrylate vinegar. , polyethylene glycol diacrylate, dipropylene susceptibility 7 ,.^ _ 叼碲 四 四 、 、 , I,10-decanediol diacrylate, 1,6-hexitol diacrylate, neopenta Diol diacrylate, dipropylene glycol

Propylene oxime-per-methyl dicyclopentanyl diacrylate vinegar, modified double AX propylene 13⁄4 butyl alcohol dimethacrylate, diethylene glycol dimercapto propylene a hexanol Methyl acrylate vinegar, polyethylene glycol dimethyl acrylate vinegar, polypropylene glycol dimethyl acrylate vinegar, triethylene glycol dimethacrylate vinegar, tetraethylene glycol dimercapto acrylate, double Phenol A ethoxy dimercapto acrylate or the like. · 319293 19 200808928 • Λ Λ Λ 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能 官能Acid-brewed methyl = dipropionate, and the like. The content of the stress relieving agent in the daily glycerin-acrylonitrile triacrylate opening coating is 0.05 to 10% by weight, and f Π 4% by weight in the range of 0.05 to 10% by weight with respect to the base 4 forming a knife. good. When the substrate is too small, the substrate is a flexible film or the like, and = Curing, if the stress relieving agent is used, the crimping hardness is insufficient. When there is too much in the case of 3, the coating agent for forming a transparent film of [Polymerization Initiator] of a transparent film contains a polymerization initiator. ^ IP, to make the matrix formation component polymerization, hard benzoin,; it phosphine ::: class, phenyl acetate, propyl benzene, rice tone smear into a syllabus § similar, In addition to the thioxanthone (thk> Xanthone), there are also cationic photopolymerization initiators and the like. Kirin oxide photopolymerization initiator or Gwangyang II == is applicable. Among them, the use of a phosphine-based photopolymerization initiator does not impair its stability and does not color, and the initiator can also be combined with other two-time: phosphine-based photopolymerization causes, two stupid groups, and 2. Mixing of the polymerization initiators of the present brewing type and the stupid J dog negative temple. 319293 20 200808928 . to the phosphine-based photopolymerization initiator, for example, 2,4,6 trimethylbenzene Basic earth oxides (manufactured by BASF Co., Ltd.: Lucirin TPO), etc. _Other cationic photopolymerization initiators are different from other polymerization initiators, and are not affected by oxygen, so nitrogen is not required. The UV radiation of the ring can be used in the life of the gt; τ (1) a 卜 寺 订 订 订 订 订 订 工 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在Ciba (4) Chemistry • 25, Japan Caoda (share) system: Product name: CI_m. Etc. Distillation of 2 starter: content, although it can also be formed into a solid form by the matrix, the composition of the matrix is formed into Q To the range of 1. Weight. It is preferably in the range of 1 to 20% by weight, more preferably in the case of .5 right polymerization initiator containing Mys, and ? If the hardening of the coating film is insufficient, and the right side is too late, the stability of the coating, and the hardness of the foot film become insufficient. ^The transparent material obtained by the k-kr [Solvent] As for the component of the crucible in the present invention, In other words, as long as it can dissolve or disperse the above specific examples, for example, a conventional solvent can be used for the age of the term. Butanol, diacetone alcohol, decyl alcohol, propanol, 2-propanol ( IPA), diol, hexanediol, isopropyl glycol, etc., esters of alcohol, tetrahydrofuran methanol, butyl acetate, etc., · diethyl, 0, alcohol, methyl acetate, ethyl acetate, single Ethyl ether, ethylene glycol monobutyl ethyl alcohol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol 罝田# - ethylene glycol monomethyl ether, diethylene glycol, early methyl bond, etc. Acetone, methylethyl 319293 21 200808928 Ketones such as ketomethyl succinyl, ethylene propyl sulfonate, sulphate, GS 曰 曰 夂 夂 、 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹 尹A solvent having a few groups such as Tr, hexanone or hexanone, such as vinegar or ketone, is suitable for use. In addition to the surface-treated low-refractive-index microparticles, the coating can be uniformly dispersed, and the stability of the coating is excellent, the uniformity, the adhesion to the substrate or other coatings, the strength, and the like are excellent, and at the same time, the unevenness is formed. Through

The bright (4)' can be (4) re-formed into a transparent film having a concave and convex corresponding to the lower layer. These solvents may be used singly or in combination of two or more kinds, but it is preferred to use a mixture of one or more different stagnation points in the month. The present invention is a solvent having a solvent (a) of 50 to a point in the foregoing solvent and a solvent (8) having a solvent (8) in an excess of 100 to 2 μm, and the ratio of the solvent (4) in the mixed solvent is in the range of 50 to 90% by weight. The ratio of the solvent (B) is preferably in the range of from 1 Torr to 5% by weight. The solvent (VIII) may, for example, be an ester of methyl hydrazine, methyl citrate, ethyl acetate or butyl acetate, such as methanol, ethanol 'propanol or 2-propanol (IPA); acetone or sulfhydryl; Ketones such as ethyl ketone; toluene, and the like. These solvents may be used in combination of two or more kinds. Further, the tablet is used as the agent (B), and examples thereof include alcohols such as butanol, dipropyl-, acenaphthyl alcohol, hydrogen flunan methanol, ethylene glycol, hexanediol, and isopropyl glycol; Alcohol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monodecyl ether, diethylene glycol monoethyl bond, propylene glycol decyl ether, etc. Isobutyl ketone, acetamidine acetone, acetamidine acetate 319293 22 200808928 "ketones, methyl cellosolve, ethyl cellosolve, butyl cellosolve, hexanone, isophor", etc. These solvents can be Use two or more kinds of mixing alone. 吧 Μ When using (4) (4) with more spray than the spray, it is faster than the transparent film (4), and may become hardness or _ foot. Water repellent ▲When the proportion of the solvent (A) in the mixed solvent is too small, the excess of the other agent (8) will slow the drying of the coating film and tend to flatten, but it will not form a substrate that can almost faithfully reflect. Or the surface of the underlying film is 2 embossed. The ideal ratio of the solvent (B) in the mixed solvent is 2 〇 to 4 〇. The ratio of the solvent in the coating material for forming a transparent film is about 7 to 99% by weight, more preferably in the range of 80 to 98% by weight. The transparent coating film of the present invention is used to form a transparent film. The method of the film can be carried out by a conventional method. Specifically, a conventional method such as a immersion plating method, a spray method, a spin method, a roll coating method, a bar coating method, a photographic printing method, or a micro-etching printing method can be used. The coating film for forming a transparent film is applied onto a substrate, dried, and then cured by a conventional method such as ultraviolet irradiation or heat treatment to form a transparent film. Further, a transparent film having antireflection performance and antiglare property is formed. In the film, a conventional substrate having irregularities on the surface of the substrate or the underlying film is used. 319293 23 200808928

The substrate of the Hr layer is immersed in the coating for forming a transparent film of the present invention): and 1 =, when the mixture of the solvent and the high (four) sword is increased by %, the concentration of the shell forming component is converted into a solid content of 1 to 3 After hardening, & this ^24 (4), after the irradiation of the material line to make P. This % coating method is recommended for micro-etching printing. ΆίΜΜΜΜΛΛΜ. A substrate with a transparent film, characterized by a base film. The transparent base is formed on the base material of the celestial base: the base material, for example, a cellulose base such as a triethylene fluorene cellulose film, a diethyl fluorene fiber, a ruthenium film, or a cellulose acetate acetonate cellulose film. Polyurethane base material such as polystyrene diacetate, polyethylene terephthalate, polyethylene terephthalate, film, film, and polystyrene film, nylon- 6. A polyamine-based substrate such as nylon _66, etc., and other polyacrylonitrile-based film, polyurethane film, polycarbonate film, poly film, polyether film, and poly A substrate such as a styrene film, a polymethyl pentene film, a polyfluorene film, or an acrylonitrile film. Further, it is also possible to use a substrate on which a film (with other coatings) is formed on the substrate. As another film, for example, a hard coat film, a conductive film, a south refractive index film, or a conventionally known film having these functions can be mentioned. Further, when a substrate having irregularities on the surface or a substrate having a film formed with another film is used as necessary, a substrate having a transparent film having antiglare property can be obtained. 319293 24 200808928 Transparent refracted ΐ:::ΓFormed by the above coatings, consisting of surface treated low two::: particles, matrix forming components, polymerization initiator, and the necessary 4 water agent, stress buffering agent Composed of. quality. The surface-treated low-refractive-index fine particles are the same as those described above. «The forming component is obtained by polymerizing and hardening the above-mentioned polyoxygenated resin and/or eucalyptus eucalyptus. The surface-treated low-refractive-index microparticles in the transparent film are 5 to 70% by weight, more preferably 1 to 6 % by weight, in the range of 30 to 50% by weight. The best inside. As long as it is within this range, it can form a transparent film with high refractive index, high anti-reflection performance, and bright contrast, and the film is uniform, and the surface smoothness is superior, and it does not bow; 'The transparent film which can reduce the haze value of the transparent film and which is also excellent in erasability. The content of the matrix-forming component in the transparent film is 30 to 95% by weight, more preferably 40 to 9 % by weight, in terms of solid content. When the content of the matrix component is within this range, a transparent film which improves adhesion to the substrate or scratch resistance and which has a lower refractive index and excellent antireflection performance can be formed. Since the agent has a low compatibility with the matrix component and is located on the surface layer of the transparent film, the water repellency is exhibited on the surface of the transparent film (the contact angle of the water droplets is 90 degrees or more), thereby preventing fingerprints, skins, and Adhesion of dirt such as sweat' Even if it is attached, it is easy to wipe off. 319293 25 200808928 • The content of the water-repellent agent in the film is divided into...% by weight, more preferably 〇5 to; weight: two consumption is better As long as it is within this range, sufficient water repellency can be imparted, and the antifouling property such as fingerprint adhesion or singular ink elasticity can be improved, and appearance abnormalities such as flow marks, mottles, and whitening do not occur or The phenomenon that the film is hardly insufficient. The stress buffering agent contained in the transparent film t is obtained by polymerizing the above-mentioned difunctional and/or difunctional (meth)acrylic resin. It is divided into 0.05 to 1% by weight in the form of a wide-formed solid with respect to the matrix, and more in the range of 1 to 4

It is better to have a range of % straight. As long as μR · and / are to be in this target, the curl of the substrate can be suppressed and the hardness of the transparent film can be improved. ^ The film contains the aforementioned polymerization initiator. The polymerization initiator is used for the polymerization of the matrix component and the stress relaxation agent, and remains in the transparent film after the polymerization. The amount of the residual amount of the polymerization initiator is different depending on the polymerization initiation example: exchange:::, the type of the matrix component, etc., but it is preferable. Second, ^ 20% by weight of the matrix component, and 10 weights and 1% or less is preferred, especially in the range, that is, not in the scenery; the township, the following are best. Only a 曰~ tone to a transparent bedding tone. The transparent film of the present invention is 1. To, and to 2. = It is different for J's use, but it is about 30〇nm, and it is best in the 200nm range. Transparent film film house girl? Animal husbandry, valley too%, may make anti-reflection performance, strength, etc. 319293 26 200808928 «Insufficient. Further, when the film thickness of the transparent film is too thick, it may become a film thickness other than the Fresnel principle, and the anti-reflection performance may be insufficient or the contrast of the bright portion may be lowered, so that a white chalk surface is exhibited. Further, the base material of the mat film or the like may be curled. The substrate to which the transparent film is applied according to the present invention is obtained by applying the above-mentioned coating material for forming a transparent film onto a substrate, and drying it to be cured. As for the coating method, the coating material is applied to a substrate by a immersion plating method, a spray method, a spin method, a light coating method, a bar coating method, a photographic printing method, or a micro-printing method, and then coated. Drying, if it is a thermosetting tree, it is heat-treated and then heat-treated, and if it is an ultraviolet-ray hardening resin, it is formed by irradiating with ultraviolet rays of about 40 〇mJ/cm2 and hardening it. Further, in the substrate with a transparent film of the present invention, the transparent film, the film, and the film may be provided between the transparent film and/or the transparent film of the substrate gold. Further, the transparent film may be provided on the opposite side of the other film. Further, "the antiglare property of the underlayer film of the substrate or the transparent film is made to have irregularities on the surface. For example, a conventional hard coating film, a refracting ruthenium film, a fine-grained infrared ray barrier film, or the like can be given. The transparent film formed by using the coating film for forming a transparent film according to the present invention has a low refractive index, and has a concave-convex effect, which has anti-reflection properties, anti-glare properties, and bright spots to 319293 27 200808928. The conductive film is provided to provide antistatic properties and electromagnetic wave barrier properties. Therefore, a substrate with a transparent film suitable for an LCD display, a plasma display, a projection display 'EL display ϋ, a CRT display or the like can be provided. [Examples] Hereinafter, the present invention will be described by way of examples, but the scope of the invention is not limited to the examples. [Example 1] • Antimony film forming coating material iECM) r r r r r r 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 1.8 81.2%) mixed in pentoxide pentoxide microparticle dispersion (manufactured by Catalyst Chemicals Co., Ltd.; ELCOM V-4560; average particle size 20 nm, Sb2 〇 5 concentration 30.5 wt%, dispersant: isopropanol,

In the particle refractive index of 1.6 〇) l〇〇g, 3.1 g of ultrapure water was added, and the mixture was stirred at 50 ° C for 20 hours to obtain a cerium pentoxide fine particle sol (solid content: 30.5%). The surface-treated pentoxide recording microparticle sol 29.51g, di-hexaerythritol triacetate (manufactured by Kyoeisha Chemical Co., Ltd.; DPE-6A) 18.9g and 1, hexyl alcohol Propionate (manufactured by Kokusai Chemical Co., Ltd.; light cyanine vinegar 1 · 6 HX-Α) 2· 1 g in 'photopolymerization initiator (BASF Japan); RushirinTP0 to 1PA Dissolved to a solid concentration of 1% by weight) 8.4 §, isopropyl alcohol 2 〇. 5g and ethylene glycol monobutyl _ 20·5 § After mixing, it is prepared to have both high refractive index and hard coating Film-based antistatic film forming coating (ECM). Transparent film-shaped preparation 28 319293 200808928 Pure liquid iLP_n shop y In the hollow dioxide stone 夕 ψ 铽 7 铽 particle dispersion (catalytic chemical industry (stock) system ^ w 〇 1 inch special 叩 'average particle size 60nm, 20.5% by weight of solid content, 1'2〇 of 政1 particle 〇〇1) 曱 中 中 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( _ _ _ _ _ _ _ _ _ _ _ _ 'Sl〇2 component 81.2% by weight) 2.52 g at 50. . After 15 hours of scrambling, it can be adjusted to a solid concentration of 22.5 wt% = surface treated low refractive index microparticle dispersion (called). The surface-treated low-refractive-index microparticles have a refractive index of ^, an average particle diameter of 60 nm, and a surface-treated low-refractive-index microparticle dispersion (LP-1) of 6.67 g T to make λ Κ 夕 氧 oxygen tree The purpose of the product is (available in the following), manufactured by Shin-Etsu Chemical Co., Ltd., X-12_24〇〇, solid concentration: 28.5% by weight) 4.74§, Acrylic resin for stress relieving agentΜ _Hexanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd.; light acrylate 16 Ηχ Α 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力 应力(stock) k'X_22-174DX, dissolved in IPA to a solids concentration of 1 () weight 0 /. (fire-fired sheet 丨 a) (the same below)) 〇.3g, photopolymerization initiator (gASF transcript (RichrmTPO: dissolved in IPA (polymerization initiator a · p system) to a solid knife / 10% by weight) 〇 9g, with isopropanol 58.24g, decyl isobutyl ketone 15g, 9 g of isopropyl diol and ethylene glycol monobutyl ether 5 are mixed with a mixed solvent a), that is, a coating for forming a transparent film having a solid content concentration of 3·〇 weight 〇/0 ( ARL, 1) 〇

29 319293 200808928 'The antistatic film forming coating (EC-1) was applied to a TAC film (thickness 80/am) by bar coating method (#10), dried in 8 〇t for 12 〇 seconds, and passed through 600 mJ. The ultraviolet light of /cm2 hardens it to form an antistatic film. The antistatic film has a film thickness of 3. After several times, the coating material for transparent film formation (ARL_1} was applied by a bar coating method (#4), and then calcined at 8 (TC for 120 seconds, and hardened by irradiation with ultraviolet rays of 6 〇〇mJ/cm2, that is, A substrate (ARK) having a transparent film was formed. The film thickness of the transparent film at this time was 100 nm. The surface resistance of the substrate (ARF-1) with a transparent film obtained by Xin was a surface resistance meter (Mitsubishi Chemical) In the case of the measurement, the result is shown in Table j. In addition, a part of the transparent film was cut vertically, and the cross section was measured by a laser microscope (Keyence Co., Ltd. VE-3〇 (10)). The average light transmittance and the fog value are measured by a haze meter (Nippon Electric Co., Ltd. 1325A), and the results are shown in Table 1. The sensitivities and integral reflectances are spectrophotometers (曰The spectroscopy (U vest) is measured by the bottom reflectance at a wavelength of 7 〇〇 nm. The results are shown in Table 1. The water repellency is the contact angle with the film when the water drops on the film. The results are shown in Table 1. At the same time, the pencil hardness was evaluated by the following method and evaluation criteria. The abrasion resistance and the adhesion were as shown in Table 1. The hardness was measured in accordance with JIS-K-5400 using a pencil hardness tester. 319293 30 200808928 'The measurement of scratch resistance was made using #〇〇〇〇钢毛(steel) Wool), after sliding back and forth 10 times with a load of 500 g/cm2, the surface of the film was visually observed and evaluated on the basis of the following criteria. The results are shown in Table 1. Evaluation criteria: No streaks were observed. Streak: 〇 see most streaks: △

• Full-face cutting: X Measurement of close-fitting twins Measured according to nS-K-5400. [Example 2] Preparation of a coating film for transparent film formation (ARL-2) Preparation of a surface-treated low-refractive-index fine particle dispersion (LP-2) in a hollow cerium oxide fine particle dispersion (catalytic conversion industry) Manufactured by φ; Cataloid special product, average particle size 60nm, solid content 20.5wt%, isopropyl alcohol dispersion, particle refractive index 1.20) 100g added 7-mercapto propylene oxypropyl trioxane oxylate (surface Treatment agent A, Shin-Etsu Chemical Co., Ltd.; KBM-503, SiO 2 component 81·2 weight 〇 / 〇) 1.26 g, heated and stirred at 50 ° C for 15 hours, can be adjusted to a solid concentration of 21.5 wt% Surface treated low refractive index microparticle dispersion (LP-2). The obtained surface-treated low-refractive-index microparticles have a refractive index of 1.22 and an average particle diameter of 60 nm. In the surface-treated low-refractive-index microparticle dispersion (LP-2) 6.98 g 31 319293 200808928 Resin (polyoxygenated resin A, manufactured by Shin-Etsu Chemical Co., Ltd.; Χ-12_240Ό, solid content concentration: 28.5% by weight) 4.74 §, acrylic resin 1,6-hexanediol diacrylate (stress mitigator a , manufactured by Kyung Shing Chemical Co., Ltd.; light acrylate 1.6 HX-A) 0.15g, reactive polyoxyxide oil (water repellent A, manufactured by Shin-Etsu Chemical Co., Ltd.; X-22-174DX, dissolved in IPA to Solid content concentration: 10% by weight) 〇.3g, photopolymerization initiator @人8下曰本(股); RushirinTPO: dissolved in IPA to a solids concentration of 10% by weight) 0.9g, with isopropanol 57.93 g, a mixture of 15 g of methyl isobutyl ketone, 107 g of isopropyl diol, and 7 g of ethylene glycol monobutyl ether (mixed solvent a), and prepared into a coating material for transparent film formation (ARL-2) having a solid content concentration of 3.0% by weight. . Preparation of a substrate (ARF-2) having a transparent film was carried out in the same manner as in Example 1 by applying a coating material (EC-1) for an antistatic film to a TAC film (thickness: 80/zm) by a bar coating method (#10). After drying, it was dried at 80 ° C for 120 seconds, and then hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form an antistatic film. φ Next, the coating material for transparent film formation (ARL-2) is applied by a bar coating method (#4), and then calcined at 8 ° C for 120 seconds, and cured by irradiation with ultraviolet rays of 600 mJ/cm 2 to prepare a film. A substrate with a transparent film (ARF-2). The film thickness of the transparent film at this time was 100 nm. The surface resist, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, pencil hardness, and resistance were obtained in the same manner as in Example 1 with respect to the obtained substrate (ARF-2) having a transparent film. After the measurement of the scratch and the adhesion, the results are shown in Table 1. [Example 3] 32 319293 200808928 Preparation of a transparent film forming coating (ARL-3) Preparation of a surface-treated low-refractive-index fine particle dispersion (LP-3) in a hollow cerium oxide fine particle dispersion (catalyzed into Industrial (stock) manufacturing; Cataloid special product, average particle size 60nm, solid content 20.5% by weight, IPA dispersion, particle refractive index 1.20) 100g, Y-methyl propylene oxypropyl tridecyloxy decane (surface Treatment agent A, Shin-Etsu Chemical Co., Ltd.; KBM_503, SiO2 component 81.2% by weight) 5.05 g, heated and stirred at 50 ° C for 15 hours, can be prepared to a solid concentration of 24.6% by weight _ low surface treatment Refractive Index Microparticle Dispersion (LP-3). The surface-treated low-refractive-index microparticles have a refractive index of 1.28 and an average particle diameter of 60 nm. The surface-treated low-refractive-index microparticle dispersion (LP-3) 6.1 g is used to make a polyfluorene-based resin (polyfluorene). Oxygen resin A, manufactured by Shin-Etsu Chemical Co., Ltd.; X-12-2400, solid content concentration: 28.5% by weight) 4.74g, acrylic resin tripropylene glycol diacrylate (stress damper b, East Asia Synthetic Co., Ltd.) ; _ Aronix M-220) 0.15g, reactive polyoxime oil (water repellent a, manufactured by Shin-Etsu Chemical Co., Ltd.; X-22-174DX, dissolved in IPA to a solids concentration of 10% by weight) 0.3g Photopolymerization initiator (manufactured by BASF Co., Ltd.; Riishirin TPO: dissolved in IPA to a solid content of 10% by weight) G.9g, with isopropanol 58.8lg, decyl isobutyl ketone 15g, isopropyl glycol 9 g of the mixture and 5 g of ethylene glycol monobutyl ether (mixed solvent a) were prepared to prepare a coating film for transparent film formation (ARL-3) having a solid concentration of 3.0% by weight. Preparation of a substrate (ARF-3) with a transparent film was carried out in the same manner as in Example 1 by a bar coating method (#10). 33 319293 200808928 • Coating (EC_1) was applied to a TAC film (thickness 80/). After zm), it was dried at 80 ° C for 120 seconds, and then hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form an antistatic film. Then, the coating material for transparent film formation (ARL-3) was applied by a bar coating method (#4), and then calcined at 80 ° C for 120 seconds, and cured by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a film. Transparent film substrate (ARF-3). The film thickness of the transparent film at this time was 10 nm. The surface resist, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, pencil hardness, and the like were obtained in the same manner as in Example 10 except for the obtained substrate (ARF-3) having a transparent film. After the measurement of the scratch resistance and the adhesion, the results are shown in Table 1. [Example 4] Preparation of coating material for transparent film formation (ARL-4) In a 1.33 g of a low refractive index fine particle dispersion (LP-1) prepared in the same manner as in Example 1, a polyfluorene-based resin (Shin-Etsu Chemical) was used. (Stock) Manufacture; Xin X-12-2400, solid content concentration: 28.5% by weight) 2.21 §, acrylic resin tripropylene glycol diacrylate (stress damper b, manufactured by East Asia Synthetic Co., Ltd.; Aronix M-220) 0.07g , Reactive polyoxygenated oil (water repellent b, manufactured by Shin-Etsu Chemical Co., Ltd.; X-22-2426, dissolved in IPA to a solids concentration of 10% by weight) 0.28g, photopolymerization initiator (BASF Japan ( Manufactured; Rushirin TPO: dissolved in IPA to a solids concentration of 10% by weight) 0.7g, with isopropanol 66.41g, decyl isobutyl ketone 15 §, isopropyl diol 9 § and ethylene glycol monobutyl ether 5g After mixing (mixing solvent a), a coating material for transparent film formation (ARL-4) having a solid content concentration of 1.0% by weight was prepared. 34 319293 200808928 • Preparation of substrate with transparent film (ARF-4) The same method as in Example 1 was used to apply an antistatic film forming coating (EC-1) to a TAC film (thickness) by a bar coating method (#10). After 80/zm), it was dried at 80 ° C for 120 seconds, and then hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form an antistatic film. Then, the coating material for transparent film formation (ARL-4) was applied by a bar coating method (#4), and then calcined at 80 ° C for 120 seconds, and then cured by ultraviolet irradiation of 60 〇 1 1 / 7 1112. That is, a substrate (ARF-4) having a transparent film was formed. At this time, the film thickness of the transparent film was 100 nm. The surface resist, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, pencil hardness, and resistance were obtained in the same manner as in Example 1 with respect to the obtained substrate (ARF-4) having a transparent film. After the measurement of the scratch and the adhesion, the results are shown in Table 1. [Example 5] Preparation of coating material for transparent film formation (ARL·5) φ In a low refractive index fine particle dispersion (LP-1) prepared in the same manner as in Example 1, 15.56 g of a low-refractive-index fine particle dispersion (LP-1) was used. (Shin-Etsu Chemical Co., Ltd.; X-12-2400, solid content concentration: 28.5% by weight) 4.74g, acrylic resin 1,6-hexanediol diacrylate (stress mitigator a, Kyoeisha Chemical Co., Ltd.) Manufacture; light acrylic acid 1 · 6 HX-Α) 0 · 15g, reactive poly-shiow oxygen oil (water repellent b, manufactured by Shin-Etsu Chemical Co., Ltd.; X-22-2426, dissolved in IPA to solid concentration 10 wt%) 〇.3 §, photopolymerization initiator (BASF 制造 (manufactured by BASF); Rushirin TPO · dissolved in IPA to a solid concentration of 10% by weight) 0.45 g, and isopropanol 50.25 g, 曱15 g of isobutyl ketone, isopropyl alcohol diol 35 319293 200808928 9 g, and 5 g of ethylene glycol monobutyl ether (mixed solvent a), prepared into a coating material for transparent film formation having a solid content concentration of 5.0% by weight (ΑΕΧ-5) ). Production of a transparent film (ARF-5) was carried out in the same manner as in Example 1 except that the antistatic film-forming coating material (EC-1) was applied to a TAC film (thickness 80# m) by a bar coating method (#1〇). ) After, at 80. After drying for 120 seconds in the crucible, it was hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form an antistatic film. Next, the coating material for transparent film formation (ARL-5) was applied by a bar coating method (#3), and then calcined at 80 ° C for 120 seconds, and cured by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a film. A substrate of a transparent film (ArF_5). The film thickness of the transparent film at this time was 100 nm. For the obtained substrate (ARF-5) with a transparent film, and the examples! After measuring the surface impedance, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, pencil hardness, scratch resistance and adhesion of the same plate, the results are shown in Table 1 as D φ [Example 6] 遂一明 Coating for film formation (ARLO shop f In Example 1, except that the water repellent was changed from 3 g of reactive polyoxyxylene oil to 0.3 g of isopropyl alcohol, the rest was carried out. After the same operation as in Example i, the coating material for forming a transparent film (Arl-6) was prepared. The substrate (ARF·6) having a transparent film was treated by the same method as in Example 1 by a bar coating method ( #1〇) The antistatic film-forming coating material (EC-1) was applied onto a TAC film (thickness: 8 Å/m), dried in ribs for 120 seconds, and then hardened by irradiation with ultraviolet rays of 600 mJ/cm2. , 319293 36 200808928 f The antistatic film is formed. Then, after applying the coating for transparent film formation (ARL-6) by the bar coating method (#4), it is simmered in 80 C for 120 seconds, and after 60 〇 111: [ The base material (ARF_6) having a transparent film was formed by curing by ultraviolet irradiation of 〇1112. The film thickness of the transparent film at this time was 100 nm. The substrate (ARF_6) to which the transparent film was obtained was subjected to surface resistance, total light transmittance, haze value, reflectance, blade reflection V, contact angle, film thickness, stagger hardness, and resistance in the same manner as in Example 1. The results of the measurement of the scratch and the adhesion 10 are shown in Table [. [Example 7] (ARL-7) ^ mf In Example 1, except that the stress relieving acrylic resin was changed to 0.15 g. The same procedure as in Example 1 was carried out, and the coating material for forming a transparent film (ARL_7) was prepared in the same manner as in Example 1. Preparation of the substrate (ARF-7) • Bar coating was carried out in the same manner as in Example 1. Method (#10) Coating an antistatic film forming coating (ECM) on a TAC film (thickness 80/zm), drying it at 80 ° C for 120 seconds, and irradiating it with ultraviolet rays of 6 〇〇mJ/cm 2 After it is hardened, an antistatic film is formed. Next, the coating material for transparent film formation (arl-7) is k-coated by a bar coating method (#4), and then calcined in C for 120 seconds, and irradiated with ultraviolet rays of 600 mJ/cm2. The film is cured to form a substrate (ARF_7) with a transparent film. The film thickness of the transparent film at this time is 1 〇〇 nm. The substrate (ARF-7) of the film was subjected to surface resistance, total light transmittance, haze value, reflectance, knife reflectance, contact angle, film thickness, stagger hardness, and resistance in the same manner as in Example j 319293 37 200808928. The results of the measurement of the scratch resistance and the adhesion were as shown in Table 1. [Example 8] Modulation of yt film formation with skew rARL_8) In Example 1, except that the water repellent was used for reactive polyfluorene 3 g of oxyhydrazine and 0.15 g of acrylic resin for stress relaxation agent were changed to 异丙45 g of isopropyl alcohol. The rest of the operation was carried out in the same manner as in Example 1 to prepare a coating for transparent film formation (ARL-8). ). The base material (ARF-8) of the stranded jjJL film was coated with a coating material (EC-1) for antistatic film formation on a butadiene AC film (thickness 8 Å) by the bar coating method (#10) in the same manner as in Example 1. /zm) After 8 years. After drying for 120 seconds in the crucible, it was hardened by irradiation with ultraviolet rays of 600 mj/cm2 to form an antistatic film. Next, the coating material for a transparent film formation (arl_8)_ was applied by a bar coating method (#4), and then it was 80. The crucible was fired for 12 G seconds in a crucible, and hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a substrate (ARF_8) with a transparent film. The film thickness of the transparent film at this time was 10 nm. The surface resist, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, pencil hardness, and scratch resistance were obtained in the same manner as in Example i with respect to the obtained substrate (ARF_8) having a transparent film. After the measurement of the adhesion, the results are shown in Table 1. [Example 9] Balance of fine particle rate splitting splitter (χρ-4) _ 319293 38 200808928 # In the hollow cerium oxide microparticle dispersion (catalytic chemical industry (stock) clothing; Cataloid special product, average grain Propylene oxypropyltrimethoxy decane (surface treatment agent Β, Shin-Etsu Chemical Co., Ltd., ΚΒΜ-5103, added to 100 g of a diameter of 60 nm, a solid content of 20% by weight, an isopropyl alcohol dispersion, and a particle refractive index of 1200) Si02 component 81.2% by weight) 2.52 §, After heating and stirring at 50 ° C for 15 hours, a surface-treated low refractive index fine particle dispersion (LP-4) having a solid concentration of 22.5 % by weight was prepared. The surface-treated low refractive index fine particles had a refractive index of 1.24 and an average particle diameter of 6 〇 nm. • Coating for transparent film formation (ARL-QjiaA· In the surface treated low refractive index fine particle dispersion (LP-4) 6.66 g, the acrylic resin dipentaerythritol hexaacrylate (matrix forming component, Gongrongshe Chemical Co., Ltd.) ); DPE-6A) l.35g, acrylic resin j, hexanediol diacrylate (stress mitigator A, manufactured by Kyoeisha Chemical Co., Ltd.; light acrylate 1.6 HX-A) 0.15g, reaction Synthetic polyoxic acid (water repellent a, Shin-Etsu Chemical Co., Ltd.; X-22-174DX, dissolved in 1PA to a solids concentration of 1010% by weight) 0.3g, photopolymerization initiator (BASF Japan) ); RushirinTPO: dissolved in benzene, I solid concentration of 10% by weight) 〇.6g, (1rgacure 184 ' made of steam bat chemicals (stock) dissolved in 曱, solid concentration of 10% by weight) 〇. 3§, after being combined with isopropanol 60.64§, methyl isobutyl ketone 10g, propylene glycol monopropyl ether l〇g and ethylene glycol monobutyl ether l〇g (mixed solvent a), it is prepared into a solid form A coating material for transparent film formation (ARL-9) having a concentration of 3·0% by weight. A substrate with a transparent film (ARF·^^·^ and In the same manner as in Example 1, the antistatic film was formed by coating the 319293 39 200808928 coating (ECM) on the TAC film (thickness 8 〇 #m) by the bar coating method (#1〇), and then drying it in 8 〇. _, it is hardened by irradiation with ultraviolet rays of 600 mJ/cm2 to form an antistatic film. Next, the coating material for transparent film formation (ARL-9) is applied by a bar coating method (#4), and then it is applied in 8 (TC). After burning for 12 Gsec, it was hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a substrate (ARF-9) having a transparent film. The film thickness of the transparent film at this time was 100 nm. (ARF-9), and Example i, the measurement of surface impedance, total light transmittance, haze value, reflectance, combined blade reflectance contact angle, film thickness, pencil hardness, scratch resistance and adhesion After that, the results are shown in Table 1. [Example 10] The coating film for the formation of the roofing film (1) was adjusted to y. The cerium oxide microparticles (catalyzed into industrial (manufactured by the company): cerium oxide microparticles at 00' average The particle size is dispersed in water/methanol=1: i port~j 160g, after which m-methyl methoxy oxalate is added to it. Learning (stock) system: KBM_503) 0.73g, stir in the grasping Μ = hours = after separation, after drying in 10 generations, the surface treated oxidized dream particles are obtained. In the 9 g of propyl benzoate (manufactured by Kyoeisha Chemical Co., Ltd.: light acrylic vinegar _6A), surface-treated cerium oxide granules lg, photopolymerization initiator (for steam block chemicals): Bribe 〇.36g and 2-propanol/propylene glycol monoethyl ^9/ι %•岣, after dispersing for 15 minutes in an ultrasonic disperser, the anti-glare film is formed. 319293 40 200808928 ' AG-1). The first layer has a backing material (AGF-n double coating is applied by a bar coating method (#8) to coat the underlying film forming coating (AG-丨) on the TAC binding film (thickness 8〇# m), at 8〇〇 After drying for 12 sec seconds in c, it was hardened by irradiation with ultraviolet rays of 600 mJ/cm to form a substrate with an underlying film (AGF-1) having an uneven surface. For the obtained substrate with an underlying film (AGF-1) In the case of a section of the film, the average film thickness, the height of the convex portion (Τι), and the south of the concave portion are measured by a laser microscope (made by Keyence Co., Ltd.: VE-300 〇). After the degree (Τ2), the results are shown in Table 1. The substrate of the transparent film substrate fARF_10) was attached to the substrate of the underlying film (AGF-U1, the same as in Example 1 by the bar coating method) #3) Applying a coating material for transparent film formation (ARF-1), and drying the transparent film to a thickness of 100 nm, drying it at 8 ° C for 12 〇 seconds, and then curing it by ultraviolet irradiation at 600 mJ/cm 2 , that is, A substrate (ARF-10) with a transparent film was prepared. For the obtained substrate (ARF_1〇) with a transparent film, the average film thickness and convexity were measured by the aforementioned methods. The height (το, the height of the concave portion (τ4), the results are shown in Table 1. Further, in the same manner as in Example 1, the surface impedance, the total light transmittance, the duty, the reflectance, the integral reflectance, the pencil hardness, and the resistance were performed. After the measurement of the abrasion resistance, the adhesion and the anti-glare property, the results are shown in Table 1. The measurement of the glare lightness was carried out by blackening the coated inner surface with a de-gloss black sprayer at a distance of 319293 41 200808928 'Fluorescent lamp After visually observing the reflected light of the fluorescent light, the evaluation was performed according to the following criteria. The results are shown in Table 1. Evaluation criteria·· Cannot see the fluorescent lamp: ◎ The edge of the fluorescent lamp can be seen slightly: The edge of the fluorescent lamp is seen. △ The edge of the fluorescent lamp can be clearly seen, and the glare: x [Example 11] The substrate of the smudged blush film (ARF-m is the same as that of the embodiment 10) On the substrate (jGF 1) to which the underlayer film was formed, the coating film for transparent film formation (ARL-9) prepared in Example 9 was applied by a bar coating method (#3) so that the average thickness of the transparent film was 丨. After 〇〇nm, after drying at 80 ° C for 120 seconds, UV rays of 600 mJ / / cm 2 The film is hardened to form a substrate with a transparent film (into). For the resulting base #(ARF_11) with a transparent film, the surface impedance and total light transmittance of Example 1 are measured. , haze value, reflectance, average film thickness of accumulated reflectance, height of convex portion (T3), height of concave portion (D4), hardness of pen, scratch resistance, adhesion, and antiglare The results are shown in Table 1. "Comparative Example 1] Tuning, & In the middle of the work - Oxide granules dispersion (catalytic chemical industry (stock) Catal id 4 inch special product, average grain In the case of a diameter of 60 nm, a solid content of 20·5 weight 〇/0, a dispersion, and a particle refractive index of 1.2 〇), 7.32 g, a polyfluorene-based tree 42 319293 200808928 J (a matrix-forming polyoxyl resin A, Shin-Etsu Chemical (stock) manufacturing; X_12-2400, solid content concentration: 28.5% by weight) 4, stress relief = acrylic resin: 1,6-hexanediol diacrylate (stress mitigator & Chemical (stock) system; light acrylate L6 HX-A) 〇.15g, water repellent with reactive polyoxime oil (Shin-Etsu Chemical Co., Ltd.) ; U2-174DX, dissolved in ιρΑ to a solids concentration of 10% by weight) 0 3g, photopolymerization initiator (basf 曰本(股); RushirinTPO: dissolved in IPA to a solid concentration of 10% by weight) 0.9g After mixing with 58.89 g of isopropyl alcohol, 15 sec of methyl isobutyl ketone, 9 g of isopropyl diol, and 5 g of ethylene glycol monobutyl ether, it is prepared to form a transparent film having a solid content concentration of 3.0% by weight. Coating (ARL-R1). Preparation of a substrate having a transparent #膜 The coating of an antistatic film forming (EC-1) was applied to a TAC film (thickness: 8 Å/m) by the bar coating method (#1 〇) in the same manner as in the first embodiment. After the upper layer, after drying for 120 seconds, it is hardened by ultraviolet irradiation of 6〇〇mj/cm2 to form an antistatic film. # Next'The transparent film is formed by the bar coating method (#4). After coating with a coating material (ARL-R1), it was dried at 80 C for 120 seconds, and hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a substrate (ArF-R1) with a transparent film. The transparent film at this time The thickness of the film was 100 nm. The substrate (ARF_R1) having the transparent film was obtained, and the surface resistance, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, and the like were performed in the same manner as in Example i. The results of the pencil hardness, the scratch resistance, and the adhesion were as shown in Table 1. [Comparative Example 2] 43 319293 200808928 Preparation of coating material ΓARL-R2) In Comparative Example 1, except for the water repellent Reactive polyxanthene oil.3g and stress relieving agent were replaced with acrylic resin 〇.15g to isopropanol 〇.45g, the rest In the same manner as in the first example, the substrate (ARF-R2) prepared by forming the coating material for transparent film formation (ARL-R2) was formed in the same manner as in Example 1 by the bar coating method (#10). After coating on a butadiene AC film (thickness 80//m) by coating phase ECM, it was dried at 80 ° C for 120 seconds, and then hardened by irradiation with ultraviolet rays of 6 (10) mJ/cm 2 to form an antistatic film. Then, the coating material for transparent film formation (ARL_R2) = cloth was applied by a bar coating method (#4) at 80°. (: It was dried for 120 seconds, and it was cured by ultraviolet rays of 6 〇〇mJ/cm2 to form a base material with a transparent film. The film thickness of the transparent film at this time was 1 〇〇 nm. A substrate (ARF-R2) having a transparent film was subjected to surface resistance, total light transmittance, haze value, reflectance, product, contact angle, film thickness, pencil hardness, scratch resistance, and the like in Example i. After the measurement of the adhesion, the results are shown in Table 。. [Comparative Example 3]

Made; Ca_id special two = sub-dispersion (catalytic chemical industry (stock) system inch density mouth per thousand particle size 00nm, solid shape 20 · 5 weight 〇 = Α two ^ bulk, particle refractive index! But. Kiss towel , adding acrylic tree 曰 ', pentaerythritol tri- ate (surface treatment agent A, Kyoeisha Chemical) 319293 44 200808928 system: DPE-6A) 1.35g, acrylic resin 1,6-hexanediol Acrylate (stress retarder a, manufactured by Kyoeisha Chemical Co., Ltd.; light acrylate 1·6 HX-A) 〇.15g, reactive polyoxygenated oil (manufactured by Shin-Etsu Chemical Co., Ltd.; x-22_174DX, IPA dissolved to a solid content concentration of 1% by weight) 〇.3g, photopolymerization initiator (BASF ( ( (R): Rushirin TPO: dissolved in toluene to a solid concentration of 10% by weight) 〇.6g and (Cadbat chemical: irgacure 184, dissolved in toluene, solid concentration of 1% by weight) 〇.3g, isopropanol 59.98g, decyl isobutyl ketone i 〇 g, propylene glycol monopropyl ether After mixing i〇g and 10 g of ethylene glycol monobutyl ether (mixed solvent b), a coating material for transparent film formation (ARL-R3) having a solid content concentration of 3% by weight was prepared. In the same manner as in Example 1, the coating material for antistatic film formation (EC-1) was applied to a TAC film (thickness 80/) by the bar coating method (#10). After zm), it was dried at 80 ° C for 120 seconds, and then hardened by irradiation with ultraviolet rays of 600 mJ/cm 2 to form an antistatic film. Then, the coating material for transparent film formation (ARL-R3) was applied by a bar coating method (#4), and then calcined at 80 ° C for 120 seconds, and cured by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a film. Transparent film substrate (ARF-R3). The film thickness of the transparent film at this time is 1 〇〇 ηπ. The surface resist, total light transmittance, haze value, reflectance, integral reflectance, contact angle, film thickness, pencil hardness, and resistance were obtained in the same manner as in Example 1 with respect to the obtained substrate (ARF-R3) having a transparent film. After the measurement of the scratch and the adhesion, the results are shown in Table 1. [Comparative Example 4] 45 319293 200808928 Preparation of coating material for transparent film formation (ARL-R4) In a low refractive index fine particle dispersion (LP-1) prepared in the same manner as in Example 1, a polyester resin ( Matrix forming component, polyester 'Bundle Spinning Co., Ltd.: Vylonal MD-1200, solid concentration of 34 耋. /〇) 4.41g, reactive polyoxygenated oil (water repellent a, Shin-Etsu Chemical Co., Ltd.) Manufactured; x_22-2426, dissolved in IPA to a solids concentration of 1% by weight) 〇.3g, coating agent (Disparlon NSH-8430HF made from Nanben Chemical Co., Ltd., solid concentration of 10% by weight) 0.5 §, and After the 78.12 g of the propanol and the ethylene glycol monoethyl ether were combined, the coating material for transparent film formation (ARL-R4) having a solid concentration of 3% by weight was prepared. The substrate of the film (ARF-R4) was applied, and then the coating for forming a transparent film (arl-R4) was applied by a bar coating method (#4), and then hardened at 100 ° C for 120 seconds and then hardened. That is, a substrate (ARF-R4) with a transparent film is formed. The film thickness of the transparent film at this time was l 〇〇 nm. The surface impedance, total light transmittance, haze value, reflectance, knife reflectance, contact angle, and film were measured in the same manner as in Example 1 with respect to the obtained substrate (ARF-R4) having a transparent film. The results of thickness, pencil hardness, scratch resistance and adhesion are shown in Table 1. [Comparative Example 5] Preparation of a substrate (ARF-R5) of a film A substrate (AGF-1) having an underlayer film was produced in the same manner as in Example 10. With respect to the substrate (AGH) to which the underlayer film is attached, the film/L· ' 乂, ° 卩彳 77 is vertically cut, and the cross section of the film is measured by a laser microscope (Keyence Co., Ltd.: 319293 46 200808928 VE-3000). The average thickness, the height of the convex portion (Τι), and the southness of the concave portion (2) are shown in Table 1. Then, the coating material for transparent film formation (ARL-R1) prepared in the same manner as in Comparative Example 1 was applied by a bar coating method (#3), and the average film thickness of the transparent film was 100 urn, and then dried at 80 ° C for 120 seconds. It is cured by UV irradiation of 6〇〇!111/2, and is made into a substrate with a transparent film (ARF-R5). The substrate (ARF-R6) of the obtained transparent film is attached to the above. Substrate _ film substrate (AGF-1) Similarly, a part of the film was cut vertically, and the average film thickness and convex portion were measured by a laser microscope (Keyence Co., Ltd.: VE-3000) for the cross section of the film. The height (τ3) and the height of the recess (D4) are shown in Table 1. At the same time, in the same manner as in Example 10, surface resistance, total light transmittance, haze value, reflectance, integral reflectance, average film thickness, height of convex portion (Τ3), height of concave portion (D), and hardness of the pen were performed. The results of the measurement of scratch resistance, adhesion and anti-sweetness are shown in Table 1. [Comparative Example 0] Preparation of a base material (ARF-R6) having a transparent film A substrate (AGF-1) having an underlayer film was produced in the same manner as in Example 10. After a part of the film (1) was cut perpendicularly to the substrate (AgF-1) of the underlayer film, the average film thickness was measured by a laser microscope (Keyence Co., Ltd. VE-3000) for the cross section of the film. The height of the convex portion (Τι) and the south degree of the concave portion (D 2) are shown in Table 1. Then, a coating material for coating film formation (ARL-R3) prepared in the same manner as in Comparative Example 3 was applied by a bar coating method (#3) so that the average film thickness of the transparent film was 10 nm, and then 80 . (: After drying for 120 seconds, it is hardened by irradiation with ultraviolet rays of 6〇〇11^/2, to form a substrate with a transparent film (ARF-R6). For the substrate of the obtained transparent film (ARF- R6), in the same manner as the substrate (AGF-1) with the underlayer film described above, a part of the film was vertically cut, and the cross section of the film was measured by a laser microscope (Keyence Co., Ltd.: VE-3000). The film thickness, the height of the convex portion (Τ3), and the height d of the concave portion d) are shown in Table 1. At the same time, in the same manner as in Example 10, the surface impedance, the total light transmittance, the haze value, the reflectance, the integral reflectance, the average film thickness, the height of the convex portion (D3), the concavity of the concave portion (T4), and the wrong pen were performed. After the measurement of hardness, scratch resistance, adhesion, and glare resistance, the results are shown in Table 1. [Comparative Example 7] A soap of a base material (ARF_R7) having a clear film was used. • A substrate (AGF-1) having an underlayer film was produced in the same manner as in Example 10. After a part of the film (1) was cut perpendicularly to the substrate (agu) of the underlayer film, the average film thickness and the convex portion were measured by a laser microscope (Keyence Co., Ltd.: VE-3000) for the cross section of the film. The height (Τι) and the height of the recess (Τ2) are shown in Table 1. Then, the coating material for transparent film formation (ARL-R4) prepared in the same manner as in Comparative Example 4 was applied by a bar coating method (#3), and the average film thickness of the transparent film was 100 nm, and then dried at 8 (TC for 120 seconds). The substrate is cured by irradiation with ultraviolet rays of 600 mJ/cm 2 to form a substrate 319293 48 200808928 (ARF_R7) with a transparent film. The substrate of the obtained transparent film (ARF-R7) is bonded to the substrate with the underlying film. In the same manner, a part of the film was cut perpendicularly, and the average film thickness and the height of the convex portion were measured by a laser microscope (Keyence Co., Ltd.: VE-3000) for the cross section of the film (D). The height of the concave portion (after d, the results are shown in Table 1. At the same time, the surface impedance, total light transmittance, haze value, reflectance, integral reflectance, average film thickness, and convex portion were performed in the same manner as in Example 1 After the height (τ3), the height of the concave portion, the pencil hardness, and the glare resistance, the results are shown in Table i. Table;

319293 49 200808928 # [Table 1]

Town £1S 骖<< X Adhesion mAm 100/100 100/100 100/100 § S 100/100 8 1 nw/uw ii 100/100 S 1 ιοσ/ιοο 8 1 100/100 s 1' 100 /100 100/100 § it Xiaogang wool hardness 0 <D 6> 0 0 0 0 0 XXXKXKX hardness iiiiiiiiiii X m Σ sr X GO Underlayer film 彳 transparent beaked four convex τ, -τ, nm 1 ί ί 1 1 1 J r 1 I 1 t I i 1 δ 1 Η. ! 1 1 i ϊ 1 J 1 II 1 铤1 * ί ί S ♦ mg Η” I 1 \ t I 1 1 ϊ i 1 in tfj ΙΛ 5 1 1 1 1 wear · u» * ie> 苒tn CO embossing of the underlying film, -Τ, nm i 1 ί ί 1 i 1 1 ri I 1 \ 1 1 s Q& i Bu-I 1 1 1 I 1 J Ii 1 5 ί i 1 1 in tn ubiquitous tn ubiquinone I f 1 1 1 ί 1 il 1 male u> ΙΓΪ \ 1 ! • ί S 2 in S dial water contact η degree 〇 S s ο § s § u> So δ § S 画 CD mo optical characteristic integral reflectance % Γ» D 2 3 - GO 5 5 ID· r* 6Ρ· ». m reflection series Η flB u> 2 5 tg s 0 S ss in r^· α s u> 3 fog value % g S ο* 3 3 csi s cw n rw CO 3 3 s 1 full light transmission string Η i CO « Ο) in i S mii «Λ m » m «Ϊ 9Z.SS m 〇> ms I» si s O) 3 m array anti-1EHI Ξ β> 1E10 1_ 9E10 3 CO | Ο I1 I ss 119 8E10 5 η V 1 Pancreatic thickness nm B 8 8 s δ 8 ssss § sss δ s 8 8 substrate species m TAG f TAC TAC TAC TAC TAC TAC TAC TAC bump TAC bump TAG TAG TAC r!j TAC bump TAG bump TAG pa^ 鸢IS 1 Γ» Γ9 - tf»' ΓΪ « «> Λ CO W « P> Γ» Ρ» m PJ f·» The initial amount of polymerization added to the matrix is compared to wiX m ο 0 〇 « CD CD 9 IP o Φ CD ( D m ο CD 0> 〇 睬 . 0. β 痗 0. ή 庵 a. B & R 戚a. a 睬tL ά D. ί 1 h J) t hide 0. « a+b 0. « 廉fi . β ....1 e+b 1 J} + c I 4 force mitigation 琍 to matrix ratio wW ο Ο oo 〇ooooo 〇oo ο eo 〇· I _ « e JB Λ m 0 Irrigation 1 〇n « 鬌l « r β 1 1 dial water 1_ concentration vs. trade ratio wtX μ t4 C4 f f 〇 \ 〇Ctf σ 94 CX Dl C4 type 1_ η mold « Λ M m 蔑j solvent seed cheek ί_ IS J3 0 >0 鳟β Λ « β base If concentration into wtX 3 2 in ID 2 IO In ID 2 m j2 2 in tf» in cheek 1_ poly 矽氡 poly 矽 矽 ft ft ft 矽 矽 矽 矽 矽 矽 矽 矽 矽 矽 矽 矽 矽 氡 氡 氡 氡 氡 氡 氡 氡 氡 氡Polyfluorene polyester polyoxypropylene is a surface treated low refractive string particle concentration of 2% F> 2 Γ» s u> 2 s in ΙΑ ΙΟ II) u>t in IC> s average particle size nm S Ο 〇sos S so OS Ο s S ο O s D 姆 · - Ά Μ m Si s· s :ss * -ί S Ά sos —s £ Surface treatment δ ίο g ξ s δ § s Μ S g 荽—_ 3 3 a d from the category 6-« <«: ¢-3⁄4 brick vibration ss-« 56-« 蜱 蜱 C C® e« ϊ 鸯ίκ 蘼璇靡<i Ϊ molybdenum Ν 5 P5 U) Φ Οα :« ms Ο 5 1 £ CVi ε 嵩ϋ S u Comparative example 5| 1 tD sm ±j S ϊ±ϊ 50 319293

Claims (1)

200808928, X. Patent application scope: 1. A coating film for transparent film formation, which is a transparent film forming coating composed of low refractive index microparticles, a matrix formed into a knife, a combination initiator and a solvent, and is characterized by: (1) The low-refractive-index microparticles are treated by a sulphur coupling agent. The surface-treated low-refractive-index microparticles have a refractive index of 120 Å. The concentration of the low-refractive-index microparticles is 0.1 to 10 by weight in terms of solid content. In the range of %, (ii) the matrix is formed into t, which is a resin, and/or an acrylic resin, and the concentration of the matrix-forming component is in the range of 0.5 to 2% by weight in terms of solid content. . (2) The coating film for forming a transparent film according to the first aspect of the invention, wherein the (one-core substrate-forming component is a resin having a trifunctional or higher functional oxygen-based resin: a resin obtained by polymerizing an oxygen-based resin monomer and Or a resin obtained by polymerizing a propylene-based resin monomer having a difunctional or higher functionality. 3. A coating for forming a transparent film according to the second paragraph of the patent application, wherein: (11) The matrix-forming component is a neodymium-based resin having a (meth)acrylonitrile group and/or an acrylic resin is a (meth)acrylic acid-based (fluorenyl)acrylic resin. The coating material for forming a transparent film according to any one of the first aspect of the present invention, wherein (ii) the matrix-forming component further comprises a resin obtained by polymerizing a resin monomer having a difunctional or lower resin as a water repellent agent, the resin It is selected from the group consisting of a fluorenyl resin having a (meth) acrylonitrile group, a fluoro resin having a (fluorenyl) acryl fluorenyl group, a long-chain alkyl sulphate having a (meth) acryl fluorenyl group, and a sulphuric acid One or more of acrylic resins 319293 51 200808928 噶5. For the application of the patent range 〗 〖 to the hopper, in which the acrylic resin is formed as a stress buffering agent by the transparent film of the following:: propylene (1) When the matrix is a fluorene-based resin, it is a divalent urethane-based resin, a bismuth and/or two g of the propyl-lipid mono-base is an acrylic resin, and is a divalent uronic acid-based tree. Patent Application No. 2-4 to a coating material, wherein the polymerization initiation start:: transparent film formation or cationic photopolymerization initiator 1 L polymerization initiator is formed into a transparent film according to any one of items 1 to 6 ( A ^ and ancient, Γ,, the solvent is a solvent having a enthalpy of 5 〇 to 1 (four) stagnation of a solvent of more than 100 to 200 c of the point of solvent (B) mixed solvent, the solvent of the solvent (eight) ratio of 5 0 The proportion of the granules of the granules (B) is in the range of 10 to 5% by weight. The transparent film forming the main material of any one of the first to seventh aspects of the 耗 patent is used. Wherein (1) the surface-treated low refractive index particles of the aforementioned 矽2 coupling agent are selected a (meth)acrylic acid group, an epoxy group (glycidol=1, an aminocarboxylic acid group, an amine group, a fluorine group, or a combination of two or more lanokeyl decane coupling agents). It is composed of a transparent film formed of the coating material for forming a transparent film according to any one of the first to eighth aspects of the invention, in the substrate and the substrate. 319293 52 9 200808928 VII. Designated representative figure: no representative figure ( a) The representative representative of the case is: () Figure (2) The symbol of the symbol of the representative figure is simple: 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: This case is not represented by the chemical formula 4 319293