KR101485719B1 - 방오성 물품 및 그의 제조방법, 및 방오층 형성용 도포제 - Google Patents

방오성 물품 및 그의 제조방법, 및 방오층 형성용 도포제 Download PDF

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KR101485719B1
KR101485719B1 KR1020137008949A KR20137008949A KR101485719B1 KR 101485719 B1 KR101485719 B1 KR 101485719B1 KR 1020137008949 A KR1020137008949 A KR 1020137008949A KR 20137008949 A KR20137008949 A KR 20137008949A KR 101485719 B1 KR101485719 B1 KR 101485719B1
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antifouling
group
coating
antifouling layer
fluorine
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KR20130058747A (ko
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요헤이 사토
시게오 하마구치
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샌트랄 글래스 컴퍼니 리미티드
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • C09D5/1656Antifouling paints; Underwater paints characterised by the film-forming substance
    • C09D5/1662Synthetic film-forming substance
    • C09D5/1675Polyorganosiloxane-containing compositions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/46Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen
    • C08G2650/48Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen containing fluorine, e.g. perfluropolyethers

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
KR1020137008949A 2010-09-14 2011-09-08 방오성 물품 및 그의 제조방법, 및 방오층 형성용 도포제 Expired - Fee Related KR101485719B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JPJP-P-2010-206083 2010-09-14
JP2010206083 2010-09-14
JPJP-P-2010-283912 2010-12-21
JP2010283912 2010-12-21
JP2011192997A JP2012144695A (ja) 2010-09-14 2011-09-05 防汚性物品及びその製造方法、並びに防汚層形成用塗布剤
JPJP-P-2011-192997 2011-09-05
PCT/JP2011/070431 WO2012036053A1 (ja) 2010-09-14 2011-09-08 防汚性物品及びその製造方法、並びに防汚層形成用塗布剤

Publications (2)

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KR20130058747A KR20130058747A (ko) 2013-06-04
KR101485719B1 true KR101485719B1 (ko) 2015-01-22

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KR1020137008949A Expired - Fee Related KR101485719B1 (ko) 2010-09-14 2011-09-08 방오성 물품 및 그의 제조방법, 및 방오층 형성용 도포제

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JP (1) JP2012144695A (enExample)
KR (1) KR101485719B1 (enExample)
CN (1) CN103097475A (enExample)
WO (1) WO2012036053A1 (enExample)

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JP2012157856A (ja) 2011-01-13 2012-08-23 Central Glass Co Ltd 防汚性物品及びその製造方法
JP2013184856A (ja) * 2012-03-08 2013-09-19 Asahi Glass Co Ltd 浴室用撥水ガラス
JP6044211B2 (ja) * 2012-09-13 2016-12-14 ダイキン工業株式会社 フルオロオキシアルキレン基含有シラン化合物の製造方法
WO2014050798A1 (ja) * 2012-09-28 2014-04-03 Hoya株式会社 電子機器用カバーガラス及びその製造方法
US20160168397A1 (en) * 2013-07-17 2016-06-16 Jun Liu Substrate coating compositions and methods
WO2016136817A1 (ja) * 2015-02-25 2016-09-01 株式会社ニコン 含フッ素組成物、パターン形成用基板、光分解性カップリング剤、パターン形成方法及びトランジスタの製造方法
JP6640593B2 (ja) * 2015-02-25 2020-02-05 学校法人神奈川大学 含フッ素組成物、パターン形成用基板、光分解性カップリング剤、パターン形成方法及びトランジスタの製造方法
JP6685513B2 (ja) * 2016-07-15 2020-04-28 日産自動車株式会社 防汚構造体前駆体、防汚構造体及び表面改質方法
JP6711489B2 (ja) * 2017-05-26 2020-06-17 株式会社フロロテクノロジー コーティング剤
WO2018220883A1 (ja) * 2017-06-02 2018-12-06 三菱電機株式会社 コーティング膜、コーティング組成物および該コーティング膜を備えた物品
JP6529654B1 (ja) 2018-10-24 2019-06-12 デクセリアルズ株式会社 活性エネルギー線硬化性樹脂組成物、防曇防汚積層体、及びその製造方法、物品、並びに防曇方法
CN115803187B (zh) * 2020-07-13 2024-10-01 日东电工株式会社 带防污层的光学薄膜
WO2023026876A1 (ja) * 2021-08-26 2023-03-02 ダイキン工業株式会社 表面処理剤
JP7743842B2 (ja) * 2022-01-17 2025-09-25 Toto株式会社 衛生陶器
WO2023136344A1 (ja) * 2022-01-17 2023-07-20 Toto株式会社 衛生陶器

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KR20060043594A (ko) * 2004-03-09 2006-05-15 소니 가부시끼 가이샤 하드 코트용 조성물, 표면보호막 및 광디스크

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JP2003138213A (ja) * 2001-11-07 2003-05-14 Sony Corp 表面改質膜用組成物、表面改質膜、表示装置用フィルター及び表示装置
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KR20060043594A (ko) * 2004-03-09 2006-05-15 소니 가부시끼 가이샤 하드 코트용 조성물, 표면보호막 및 광디스크

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KR20130058747A (ko) 2013-06-04
WO2012036053A1 (ja) 2012-03-22
CN103097475A (zh) 2013-05-08

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