KR101473069B1 - 몰드의 제조 방법 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법 - Google Patents

몰드의 제조 방법 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법 Download PDF

Info

Publication number
KR101473069B1
KR101473069B1 KR1020127024356A KR20127024356A KR101473069B1 KR 101473069 B1 KR101473069 B1 KR 101473069B1 KR 1020127024356 A KR1020127024356 A KR 1020127024356A KR 20127024356 A KR20127024356 A KR 20127024356A KR 101473069 B1 KR101473069 B1 KR 101473069B1
Authority
KR
South Korea
Prior art keywords
mold
group
convex structure
pores
meth
Prior art date
Application number
KR1020127024356A
Other languages
English (en)
Korean (ko)
Other versions
KR20120130220A (ko
Inventor
유스케 나카이
다다시 나카무라
사토루 오자와
데츠야 지가미
Original Assignee
미쓰비시 레이온 컴퍼니, 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쓰비시 레이온 컴퍼니, 리미티드 filed Critical 미쓰비시 레이온 컴퍼니, 리미티드
Publication of KR20120130220A publication Critical patent/KR20120130220A/ko
Application granted granted Critical
Publication of KR101473069B1 publication Critical patent/KR101473069B1/ko

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/58—Applying the releasing agents
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/045—Anodisation of aluminium or alloys based thereon for forming AAO templates
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • B29C2033/3864—Spraying at least one layer to create the mould
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0016—Lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0058—Mirrors
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/246—Chemical after-treatment for sealing layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Surface Treatment Of Optical Elements (AREA)
KR1020127024356A 2010-03-25 2011-03-22 몰드의 제조 방법 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법 KR101473069B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2010-070281 2010-03-25
JP2010070281 2010-03-25
PCT/JP2011/056860 WO2011118591A1 (ja) 2010-03-25 2011-03-22 モールドの製造方法および微細凹凸構造を表面に有する物品の製造方法

Publications (2)

Publication Number Publication Date
KR20120130220A KR20120130220A (ko) 2012-11-29
KR101473069B1 true KR101473069B1 (ko) 2014-12-15

Family

ID=44673142

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127024356A KR101473069B1 (ko) 2010-03-25 2011-03-22 몰드의 제조 방법 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법

Country Status (5)

Country Link
JP (1) JP5549943B2 (ja)
KR (1) KR101473069B1 (ja)
CN (1) CN102791454B (ja)
TW (1) TW201144028A (ja)
WO (1) WO2011118591A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012133390A1 (ja) * 2011-03-30 2012-10-04 シャープ株式会社 離型処理方法および反射防止膜の製造方法
US9821494B2 (en) * 2012-03-26 2017-11-21 Sharp Kabushiki Kaisha Mold release treatment method and method for producing anti-reflective film
JP6046505B2 (ja) 2013-01-29 2016-12-14 株式会社ダイセル シート状モールド及びその製造方法並びにその用途
CN105137712A (zh) * 2015-07-21 2015-12-09 苏州大学 利用纳米压印技术构筑有机液晶分子单晶微米线阵列图案化的方法
CN109311191B (zh) * 2016-06-14 2020-11-06 大金工业株式会社 具有转印图案的被转印物的制造方法
CN106670744B (zh) * 2016-12-21 2018-09-25 西安理工大学 一种轴瓦内表面耐磨疏水滑移功能膜的制备方法
EP3511292A1 (en) * 2018-01-10 2019-07-17 SABIC Global Technologies B.V. A hydrophobic impact textured surface and a method of making the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010005841A (ja) * 2008-06-25 2010-01-14 Mitsubishi Rayon Co Ltd モールドの製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2820022B2 (ja) * 1994-03-25 1998-11-05 信越化学工業株式会社 剥離シートの製造方法
JP4067718B2 (ja) * 1999-09-20 2008-03-26 Ｊｓｒ株式会社 樹脂製型の処理法および樹脂製型
JP4194063B2 (ja) * 2001-03-14 2008-12-10 菱栄エンジニアリング株式会社 ダイカスト機用離型剤噴霧方法及びその装置
JP4500928B2 (ja) * 2004-10-25 2010-07-14 アルプス電気株式会社 金型の製造方法
JP2006264187A (ja) * 2005-03-24 2006-10-05 Fuji Xerox Co Ltd 多層型離型層の形成方法、円筒状金型、及びシームレス管状物の製造方法
JP4930517B2 (ja) * 2007-02-07 2012-05-16 旭硝子株式会社 インプリント用モールドおよびその製造方法
JP5309579B2 (ja) * 2008-02-01 2013-10-09 コニカミノルタ株式会社 樹脂成形金型及びその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010005841A (ja) * 2008-06-25 2010-01-14 Mitsubishi Rayon Co Ltd モールドの製造方法

Also Published As

Publication number Publication date
CN102791454B (zh) 2015-01-07
CN102791454A (zh) 2012-11-21
WO2011118591A1 (ja) 2011-09-29
TW201144028A (en) 2011-12-16
JP5549943B2 (ja) 2014-07-16
JPWO2011118591A1 (ja) 2013-07-04
KR20120130220A (ko) 2012-11-29

Similar Documents

Publication Publication Date Title
JP5005114B2 (ja) 微細凹凸構造を表面に有する物品の製造方法
KR101424371B1 (ko) 활성 에너지선 경화성 수지 조성물, 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법
JP5162726B2 (ja) 微細凹凸構造を表面に有する物品の製造方法
JP4990414B2 (ja) 微細凹凸構造を表面に有する物品の製造方法、金型の離型処理方法、および金型表面離型処理用活性エネルギー線硬化性樹脂組成物
KR101473069B1 (ko) 몰드의 제조 방법 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법
KR101598729B1 (ko) 반사 방지 물품 및 디스플레이 장치
JP2010005841A (ja) モールドの製造方法
JP2010000719A (ja) フィルム状レプリカモールド、その製造方法および微細凹凸構造を有するフィルム製品の製造方法
JP2011025683A (ja) モールドの製造方法
JP5768711B2 (ja) 有機系離型剤の性能評価方法、モールドの製造方法および微細凹凸構造を表面に有する透明フィルムの製造方法
KR101389245B1 (ko) 활성 에너지선 경화성 조성물, 및 미세 요철 구조를 표면에 갖는 투명 필름의 제조 방법
JP2009271298A (ja) 防曇性透明部材、およびこれを具備した物品
JP2009271205A (ja) 光学ミラー
JP2013224015A (ja) 光透過性フィルムおよびその製造方法
JP2012108502A (ja) 微細凹凸構造を表面に有する物品の製造方法
JP5269467B2 (ja) 照明装置用保護板、およびこれを具備した照明装置
JP2009270327A (ja) 壁材、およびこれを具備した壁構造物
JP2011245767A (ja) 積層体、およびこれを有する物品
JP2017032756A (ja) 透明フィルム及びその製造方法
JP2013182007A (ja) 微細凹凸構造を表面に有する物品の製造方法および製造装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20171117

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20181115

Year of fee payment: 5