KR101450683B1 - 펠리클 수납 용기 - Google Patents

펠리클 수납 용기 Download PDF

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Publication number
KR101450683B1
KR101450683B1 KR1020080031280A KR20080031280A KR101450683B1 KR 101450683 B1 KR101450683 B1 KR 101450683B1 KR 1020080031280 A KR1020080031280 A KR 1020080031280A KR 20080031280 A KR20080031280 A KR 20080031280A KR 101450683 B1 KR101450683 B1 KR 101450683B1
Authority
KR
South Korea
Prior art keywords
pellicle
container
container body
ribs
storage container
Prior art date
Application number
KR1020080031280A
Other languages
English (en)
Korean (ko)
Other versions
KR20080099780A (ko
Inventor
카즈토시 세키하라
Original Assignee
신에쓰 가가꾸 고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신에쓰 가가꾸 고교 가부시끼가이샤 filed Critical 신에쓰 가가꾸 고교 가부시끼가이샤
Publication of KR20080099780A publication Critical patent/KR20080099780A/ko
Application granted granted Critical
Publication of KR101450683B1 publication Critical patent/KR101450683B1/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
    • B65D81/02—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packages (AREA)
  • Containers Having Bodies Formed In One Piece (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020080031280A 2007-05-10 2008-04-03 펠리클 수납 용기 KR101450683B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007125691A JP4955449B2 (ja) 2007-05-10 2007-05-10 ペリクル収納容器
JPJP-P-2007-00125691 2007-05-10

Publications (2)

Publication Number Publication Date
KR20080099780A KR20080099780A (ko) 2008-11-13
KR101450683B1 true KR101450683B1 (ko) 2014-10-14

Family

ID=40113483

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080031280A KR101450683B1 (ko) 2007-05-10 2008-04-03 펠리클 수납 용기

Country Status (4)

Country Link
JP (1) JP4955449B2 (zh)
KR (1) KR101450683B1 (zh)
CN (2) CN102126586B (zh)
TW (1) TWI384530B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160089276A (ko) * 2015-01-19 2016-07-27 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 수납 용기

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011007827A (ja) * 2009-06-23 2011-01-13 Shin Etsu Polymer Co Ltd 大型精密部材収納容器
JP5528190B2 (ja) * 2010-04-23 2014-06-25 信越化学工業株式会社 ペリクル収納容器
JP5626850B2 (ja) * 2010-05-10 2014-11-19 旭化成イーマテリアルズ株式会社 ペリクル収納容器
JP5646412B2 (ja) * 2011-08-24 2014-12-24 株式会社神戸製鋼所 圧力容器
JP5646414B2 (ja) * 2011-08-24 2014-12-24 株式会社神戸製鋼所 圧力容器
JP5684752B2 (ja) * 2012-03-29 2015-03-18 信越化学工業株式会社 ペリクル収納容器
US9658525B2 (en) * 2012-08-02 2017-05-23 Mitsui Chemicals Inc. Pellicle
KR102460875B1 (ko) * 2014-04-17 2022-10-31 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 수납 용기
US11628032B2 (en) * 2019-08-01 2023-04-18 Medtronic Vascular, Inc. Stress-absorbing buffer zone for sealed tray

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09325471A (ja) * 1996-06-05 1997-12-16 Mitsui Petrochem Ind Ltd シール切れに優れたペリクル収納用ケース
JP2000173887A (ja) 1998-12-02 2000-06-23 Asahi Kasei Denshi Kk ペリクル収納ケース
JP2006267179A (ja) 2005-03-22 2006-10-05 Shin Etsu Chem Co Ltd ペリクル収納容器
JP2007041458A (ja) 2005-08-05 2007-02-15 Shin Etsu Polymer Co Ltd ペリクル用収納容器

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4521162B2 (ja) * 2003-05-30 2010-08-11 本田技研工業株式会社 電子回路基板の収容ケース
JP4236535B2 (ja) * 2003-07-31 2009-03-11 旭化成エレクトロニクス株式会社 大型ペリクル収納容器
JP2006303246A (ja) * 2005-04-21 2006-11-02 Miraial Kk 枚葉収納容器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09325471A (ja) * 1996-06-05 1997-12-16 Mitsui Petrochem Ind Ltd シール切れに優れたペリクル収納用ケース
JP2000173887A (ja) 1998-12-02 2000-06-23 Asahi Kasei Denshi Kk ペリクル収納ケース
JP2006267179A (ja) 2005-03-22 2006-10-05 Shin Etsu Chem Co Ltd ペリクル収納容器
JP2007041458A (ja) 2005-08-05 2007-02-15 Shin Etsu Polymer Co Ltd ペリクル用収納容器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160089276A (ko) * 2015-01-19 2016-07-27 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 수납 용기
KR102544490B1 (ko) 2015-01-19 2023-06-16 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 수납 용기

Also Published As

Publication number Publication date
JP2008280066A (ja) 2008-11-20
KR20080099780A (ko) 2008-11-13
TWI384530B (zh) 2013-02-01
CN101303520A (zh) 2008-11-12
TW200845130A (en) 2008-11-16
CN102126586B (zh) 2013-01-16
CN102126586A (zh) 2011-07-20
JP4955449B2 (ja) 2012-06-20

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