JP2007041458A - ペリクル用収納容器 - Google Patents
ペリクル用収納容器 Download PDFInfo
- Publication number
- JP2007041458A JP2007041458A JP2005227880A JP2005227880A JP2007041458A JP 2007041458 A JP2007041458 A JP 2007041458A JP 2005227880 A JP2005227880 A JP 2005227880A JP 2005227880 A JP2005227880 A JP 2005227880A JP 2007041458 A JP2007041458 A JP 2007041458A
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- JP
- Japan
- Prior art keywords
- pellicle
- tray
- cover
- storage container
- flat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000005452 bending Methods 0.000 claims abstract description 10
- 230000002093 peripheral effect Effects 0.000 claims description 43
- 239000000463 material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 238000000465 moulding Methods 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 238000007789 sealing Methods 0.000 description 4
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 238000007666 vacuum forming Methods 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
【解決手段】
ペリクル膜6と当該ペリクル膜6を支持する支持枠7とを有するペリクル5を輸送するためのペリクル用収納容器1であって、トレイ3と、当該トレイ3の蓋となるカバー2と、を有し、トレイ3およびカバー2の外周部に、平面を形成するように折り曲げた平面折曲部21d,31dを備え、トレイ3にカバー2を被せた状態において、トレイ3の外周部とカバー2の外周部によって平面部4を形成する構成とした。
【選択図】 図5
Description
図1は、本発明の第1の実施の形態に係るペリクル用収納容器1の分解斜視図である。また、図2は、図1に示すペリクル用収納容器1を示す斜視図である。
次に、本発明の第2の実施の形態に係るペリクル用収納容器40について説明する。なお、第2の実施の形態では、第1の実施の形態と多くの共通部分を有しているため、主として第1の実施の形態との相違部分について説明する。また、第1の実施の形態と同一の部材、同一の部分には同一の符号を付すと共にその説明を省略または簡略化する。
2…カバー
3…トレイ
4,54,62,64,67…平面部
5…ペリクル
6…ペリクル膜
7…支持枠
21d,31d,41b,51f,61,63,65,66…平面折曲部
Claims (4)
- ペリクル膜と当該ペリクル膜を支持する支持枠とを有するペリクルを輸送するためのペリクル用収納容器であって、
トレイと、
当該トレイの蓋となるカバーと、
を有し、
上記トレイおよび上記カバーのうち少なくともいずれか一方の外周部に、平面を形成するように折り曲げた平面折曲部を備え、上記トレイに上記カバーを被せた状態において、上記トレイの外周部と上記カバーの外周部によって平面部を形成する構成としたことを特徴とするペリクル用収納容器。 - 前記トレイおよび前記カバーにそれぞれ前記平面折曲部を備え、前記各平面折曲部は、互いに逆方向に向かって延出し、前記平面部を形成していることを特徴とする請求項1記載のペリクル用収納容器。
- 前記トレイおよび前記カバーにそれぞれ前記平面折曲部を備え、前記各平面折曲部は互いに同方向に向かって延出し、前記平面部を形成していることを特徴とする請求項1記載のペリクル用収納容器。
- 前記平面部の幅は20mm以上であることを特徴とする請求項1から3のいずれか1項記載のペリクル用収納容器。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005227880A JP4694299B2 (ja) | 2005-08-05 | 2005-08-05 | ペリクル用収納容器 |
KR1020087003468A KR101087356B1 (ko) | 2005-08-05 | 2006-01-06 | 펠리클용 수납 용기 |
PCT/JP2006/300048 WO2007017963A1 (ja) | 2005-08-05 | 2006-01-06 | ペリクル用収納容器 |
TW095113137A TW200707084A (en) | 2005-08-05 | 2006-04-13 | Receiving container for pellicle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005227880A JP4694299B2 (ja) | 2005-08-05 | 2005-08-05 | ペリクル用収納容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007041458A true JP2007041458A (ja) | 2007-02-15 |
JP4694299B2 JP4694299B2 (ja) | 2011-06-08 |
Family
ID=37727157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005227880A Expired - Fee Related JP4694299B2 (ja) | 2005-08-05 | 2005-08-05 | ペリクル用収納容器 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4694299B2 (ja) |
KR (1) | KR101087356B1 (ja) |
TW (1) | TW200707084A (ja) |
WO (1) | WO2007017963A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008280066A (ja) * | 2007-05-10 | 2008-11-20 | Shin Etsu Chem Co Ltd | ペリクル収納容器 |
JP2012106799A (ja) * | 2012-02-23 | 2012-06-07 | Shin-Etsu Chemical Co Ltd | ペリクル収納容器 |
JP2021022719A (ja) * | 2019-07-30 | 2021-02-18 | 家登精密工業股▲ふん▼有限公司 | 基板を収容するための装置およびこの装置を製造する方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62143948U (ja) * | 1986-03-07 | 1987-09-10 | ||
JPH07142562A (ja) * | 1993-11-22 | 1995-06-02 | Shin Etsu Chem Co Ltd | ペリクル収納容器 |
JPH10133359A (ja) * | 1996-11-05 | 1998-05-22 | Shin Etsu Polymer Co Ltd | ペリクル収納容器 |
JP2005049765A (ja) * | 2003-07-31 | 2005-02-24 | Asahi Kasei Electronics Co Ltd | 大型ペリクル収納容器 |
-
2005
- 2005-08-05 JP JP2005227880A patent/JP4694299B2/ja not_active Expired - Fee Related
-
2006
- 2006-01-06 WO PCT/JP2006/300048 patent/WO2007017963A1/ja active Application Filing
- 2006-01-06 KR KR1020087003468A patent/KR101087356B1/ko not_active IP Right Cessation
- 2006-04-13 TW TW095113137A patent/TW200707084A/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62143948U (ja) * | 1986-03-07 | 1987-09-10 | ||
JPH07142562A (ja) * | 1993-11-22 | 1995-06-02 | Shin Etsu Chem Co Ltd | ペリクル収納容器 |
JPH10133359A (ja) * | 1996-11-05 | 1998-05-22 | Shin Etsu Polymer Co Ltd | ペリクル収納容器 |
JP2005049765A (ja) * | 2003-07-31 | 2005-02-24 | Asahi Kasei Electronics Co Ltd | 大型ペリクル収納容器 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008280066A (ja) * | 2007-05-10 | 2008-11-20 | Shin Etsu Chem Co Ltd | ペリクル収納容器 |
KR101450683B1 (ko) | 2007-05-10 | 2014-10-14 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 펠리클 수납 용기 |
JP2012106799A (ja) * | 2012-02-23 | 2012-06-07 | Shin-Etsu Chemical Co Ltd | ペリクル収納容器 |
JP2021022719A (ja) * | 2019-07-30 | 2021-02-18 | 家登精密工業股▲ふん▼有限公司 | 基板を収容するための装置およびこの装置を製造する方法 |
US11314176B2 (en) | 2019-07-30 | 2022-04-26 | Gudeng Precision Industrial Co., Ltd | Apparatus for containing a substrate and method of manufacturing the apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWI349829B (ja) | 2011-10-01 |
WO2007017963A1 (ja) | 2007-02-15 |
TW200707084A (en) | 2007-02-16 |
KR101087356B1 (ko) | 2011-11-25 |
KR20080041648A (ko) | 2008-05-13 |
JP4694299B2 (ja) | 2011-06-08 |
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