TW200707084A - Receiving container for pellicle - Google Patents

Receiving container for pellicle

Info

Publication number
TW200707084A
TW200707084A TW095113137A TW95113137A TW200707084A TW 200707084 A TW200707084 A TW 200707084A TW 095113137 A TW095113137 A TW 095113137A TW 95113137 A TW95113137 A TW 95113137A TW 200707084 A TW200707084 A TW 200707084A
Authority
TW
Taiwan
Prior art keywords
tray
pellicle
cover
receiving container
lid
Prior art date
Application number
TW095113137A
Other languages
Chinese (zh)
Other versions
TWI349829B (en
Inventor
Toshitsugu Yajima
Uataru Kikuchi
Original Assignee
Shinetsu Polymer Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Polymer Co filed Critical Shinetsu Polymer Co
Publication of TW200707084A publication Critical patent/TW200707084A/en
Application granted granted Critical
Publication of TWI349829B publication Critical patent/TWI349829B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A tray and a lid that structures a receiving container for pellicle are easily and firmly fixed by using a tape. The receiving container (1) for transporting pellicle (5) having a pellicle film (6) and a support frame (7) for supporting the pellicle film (6) has the tray (3) and a cover (2) as the lid for the tray (3). Flat surface bent sections (21d, 31d) bent to form flat surfaces are provided on the outer peripheries of the tray (3) and the cover (2). A flat section (4) is formed by the outer periphery of the tray (3) and the outer periphery of the cover (2) when the cover (2) is laid on the tray (3).
TW095113137A 2005-08-05 2006-04-13 Receiving container for pellicle TW200707084A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005227880A JP4694299B2 (en) 2005-08-05 2005-08-05 Pellicle storage container

Publications (2)

Publication Number Publication Date
TW200707084A true TW200707084A (en) 2007-02-16
TWI349829B TWI349829B (en) 2011-10-01

Family

ID=37727157

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095113137A TW200707084A (en) 2005-08-05 2006-04-13 Receiving container for pellicle

Country Status (4)

Country Link
JP (1) JP4694299B2 (en)
KR (1) KR101087356B1 (en)
TW (1) TW200707084A (en)
WO (1) WO2007017963A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI384530B (en) * 2007-05-10 2013-02-01 Shinetsu Chemical Co Pellicle storage container

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012106799A (en) * 2012-02-23 2012-06-07 Shin-Etsu Chemical Co Ltd Pellicle storage container
TWI705522B (en) 2019-07-30 2020-09-21 家登精密工業股份有限公司 Apparatus for containing a substrate and method of manufacturing the apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62143948U (en) * 1986-03-07 1987-09-10
JP3157664B2 (en) * 1993-11-22 2001-04-16 信越化学工業株式会社 Pellicle storage container
JPH10133359A (en) * 1996-11-05 1998-05-22 Shin Etsu Polymer Co Ltd Pellicle housing vessel
JP4236535B2 (en) * 2003-07-31 2009-03-11 旭化成エレクトロニクス株式会社 Large pellicle storage container

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI384530B (en) * 2007-05-10 2013-02-01 Shinetsu Chemical Co Pellicle storage container

Also Published As

Publication number Publication date
JP2007041458A (en) 2007-02-15
WO2007017963A1 (en) 2007-02-15
JP4694299B2 (en) 2011-06-08
KR20080041648A (en) 2008-05-13
TWI349829B (en) 2011-10-01
KR101087356B1 (en) 2011-11-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees