KR101439216B1 - 중기공 실리카 미립자의 제조 방법, 중기공 실리카 미립자, 중기공 실리카 미립자 분산액, 중기공 실리카 미립자 함유 조성물, 및 중기공 실리카 미립자 함유 성형물 - Google Patents
중기공 실리카 미립자의 제조 방법, 중기공 실리카 미립자, 중기공 실리카 미립자 분산액, 중기공 실리카 미립자 함유 조성물, 및 중기공 실리카 미립자 함유 성형물 Download PDFInfo
- Publication number
- KR101439216B1 KR101439216B1 KR1020127006057A KR20127006057A KR101439216B1 KR 101439216 B1 KR101439216 B1 KR 101439216B1 KR 1020127006057 A KR1020127006057 A KR 1020127006057A KR 20127006057 A KR20127006057 A KR 20127006057A KR 101439216 B1 KR101439216 B1 KR 101439216B1
- Authority
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- South Korea
- Prior art keywords
- particles
- fine particles
- silica
- silica fine
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
- G02B2207/107—Porous materials, e.g. for reducing the refractive index
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Composite Materials (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Dispersion Chemistry (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009185014 | 2009-08-07 | ||
| JPJP-P-2009-185014 | 2009-08-07 | ||
| PCT/JP2010/058367 WO2011016277A1 (ja) | 2009-08-07 | 2010-05-18 | メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子、メソポーラスシリカ微粒子分散液、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120065344A KR20120065344A (ko) | 2012-06-20 |
| KR101439216B1 true KR101439216B1 (ko) | 2014-09-11 |
Family
ID=43544181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127006057A Expired - Fee Related KR101439216B1 (ko) | 2009-08-07 | 2010-05-18 | 중기공 실리카 미립자의 제조 방법, 중기공 실리카 미립자, 중기공 실리카 미립자 분산액, 중기공 실리카 미립자 함유 조성물, 및 중기공 실리카 미립자 함유 성형물 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8999052B2 (https=) |
| EP (1) | EP2463236A4 (https=) |
| JP (1) | JP5624361B2 (https=) |
| KR (1) | KR101439216B1 (https=) |
| CN (1) | CN102574693B (https=) |
| TW (1) | TW201105581A (https=) |
| WO (1) | WO2011016277A1 (https=) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2463236A4 (en) * | 2009-08-07 | 2015-05-06 | Panasonic Corp | METHOD FOR PRODUCING TEN MESOPOROUS SILICON PARTICLES, FINE MESOPOROUS SILICON PARTICLES, LIQUID DISPERSION FROM FINE MESOPOROUS SILICON PARTICLES, COMPOSITION WITH FINE MESOPOROUS SILICON PARTICLES AND MOLDING MATERIALS WITH FINE MESOPOROUS SILICON PARTICLES |
| US9193599B2 (en) | 2010-09-23 | 2015-11-24 | Nanolith Sverige Ab | Manufacture of structures comprising silicon dioxide on a surface |
| JP6199864B2 (ja) * | 2011-08-17 | 2017-09-20 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造物品及びそれを製造するための方法 |
| JP6004528B2 (ja) * | 2011-08-29 | 2016-10-12 | 地方独立行政法人東京都立産業技術研究センター | 多孔質シリカ内包粒子の製造方法および多孔質シリカ |
| US20130196140A1 (en) * | 2012-01-30 | 2013-08-01 | Guardian Industries Corp. | Coated article with antireflection coating including porous nanoparticles, and/or method of making the same |
| US20150017386A1 (en) * | 2012-02-01 | 2015-01-15 | 3M Innovative Properties Company | Nanostructured materials and methods of making the same |
| US10059622B2 (en) | 2012-05-07 | 2018-08-28 | Guardian Glass, LLC | Anti-reflection glass with tin oxide nanoparticles |
| EP2752387B1 (en) * | 2012-12-13 | 2018-06-27 | Guardian Glass, LLC | Method of making coated article including anti-reflection coating with double coating layers including mesoporous materials, and products containing the same |
| EP2752388A1 (en) * | 2012-12-13 | 2014-07-09 | Guardian Industries Corp. | Method of making coated article including anti-reflection coating and products containing the same |
| EP2752386B1 (en) * | 2012-12-13 | 2019-08-28 | Guardian Glass, LLC | Method of making coated article including anti-reflection coating with porosity differences in two layers, and products containing the same |
| JP6153093B2 (ja) * | 2013-09-03 | 2017-06-28 | 株式会社豊田中央研究所 | 反射防止膜及びその製造方法 |
| JP6323861B2 (ja) * | 2013-09-04 | 2018-05-16 | リコーイメージング株式会社 | 表面修飾メソポーラスシリカナノ粒子の製造方法 |
| US10088603B2 (en) | 2013-12-11 | 2018-10-02 | 3M Innovative Properties Company | Siloxane nanoparticle coating useful for antireflection |
| CN103738970B (zh) * | 2013-12-25 | 2015-06-24 | 上海纳米技术及应用国家工程研究中心有限公司 | 高透过率纳米多孔气凝胶材料及其制备方法 |
| US10451771B2 (en) * | 2014-11-10 | 2019-10-22 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Antireflection member, transfer member, and method for producing antireflection member |
| WO2016084909A1 (ja) * | 2014-11-26 | 2016-06-02 | デンカ株式会社 | シリカ被覆カーボンブラック並びにそれを用いた電極用組成物、二次電池用電極及び二次電池 |
| US10434496B2 (en) | 2016-03-29 | 2019-10-08 | Agilent Technologies, Inc. | Superficially porous particles with dual pore structure and methods for making the same |
| CA3105678C (en) * | 2018-07-17 | 2022-10-18 | Evonik Operations Gmbh | Thermal insulating composition based on silica granulates |
| JP7480070B2 (ja) * | 2021-01-15 | 2024-05-09 | 株式会社豊田中央研究所 | 冷却液 |
| CN112920499B (zh) * | 2021-01-31 | 2022-07-12 | 温州强大新材料科技有限公司 | 一种用于防护服和雨衣的eva膜及其制备工艺 |
| CN112919483B (zh) * | 2021-04-13 | 2023-07-18 | 扬州大学 | 一种双模板法制备介孔二氧化硅纳米球的方法 |
| CN119100408B (zh) * | 2024-11-08 | 2025-02-21 | 内蒙古大学 | 一种凹凸曲率可调的介孔SiO2纳米颗粒的制备方法和应用 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006069824A (ja) | 2004-08-31 | 2006-03-16 | Univ Of Miyazaki | ミクロ孔を有するメソポーラスシリカナノ粒子及びその製造方法 |
| JP2009040967A (ja) * | 2007-08-10 | 2009-02-26 | Panasonic Electric Works Co Ltd | 低屈折率被膜形成用樹脂組成物、低屈折率被膜、反射防止基材 |
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| DE19601415A1 (de) * | 1995-02-04 | 1996-08-08 | Degussa | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| JP4046921B2 (ja) | 2000-02-24 | 2008-02-13 | 触媒化成工業株式会社 | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
| EP1276824A4 (en) * | 2000-04-21 | 2005-03-16 | Stc Unm | PROTOTYPING OF STRUCTURED, FUNCTIONAL NANOSTRUCTURES |
| CA2317056A1 (en) * | 2000-08-25 | 2002-02-25 | Universite Laval | Formation of hydrophilic sites in partially silylated micelle templated silica |
| KR20070011650A (ko) * | 2001-10-25 | 2007-01-24 | 마츠시다 덴코 가부시키가이샤 | 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품 |
| JP2004083307A (ja) | 2002-08-23 | 2004-03-18 | Sumitomo Osaka Cement Co Ltd | シリカ微粒子と低屈折率膜形成用塗料、及び低屈折率膜とその製造方法、並びに反射防止膜 |
| KR100715296B1 (ko) | 2003-07-29 | 2007-05-08 | 가부시끼가이샤 도꾸야마 | 중세공성 실리카 미립자 및 그 제조 방법 |
| JP4519433B2 (ja) * | 2003-09-17 | 2010-08-04 | 株式会社トクヤマ | 微粒子状メソポーラスシリカ |
| JP4737922B2 (ja) * | 2003-07-29 | 2011-08-03 | 株式会社トクヤマ | 微粒子状メソポーラスシリカの製造方法 |
| CN1186253C (zh) * | 2003-08-12 | 2005-01-26 | 上海交通大学 | 介孔二氧化硅球形纳米颗粒的制备方法 |
| CN1715184A (zh) * | 2004-06-28 | 2006-01-04 | 中国科学院理化技术研究所 | 球形介孔二氧化硅的制备方法 |
| WO2006030537A1 (ja) * | 2004-09-13 | 2006-03-23 | Asahi Kasei Chemicals Corporation | 感光性樹脂硬化物の製造方法 |
| US20060130855A1 (en) * | 2004-09-28 | 2006-06-22 | Philip Morris Usa Inc. | Smoking article with mercaptopropyl functionalized sorbent and method |
| CN100384726C (zh) * | 2005-05-19 | 2008-04-30 | 同济大学 | 表面活性可调的纳米多孔二氧化硅气凝胶及其制备方法 |
| JP2007161518A (ja) | 2005-12-13 | 2007-06-28 | Sumitomo Osaka Cement Co Ltd | 低誘電率フィラーと、これを用いた低誘電率組成物および低誘電率膜 |
| WO2008053695A1 (en) * | 2006-10-31 | 2008-05-08 | Kao Corporation | Mesoporous silica particles |
| US7868198B2 (en) * | 2007-06-15 | 2011-01-11 | Laine Richard M | Multi-functional silsesquioxanes for novel coating applications |
| JP2009040966A (ja) | 2007-08-10 | 2009-02-26 | Panasonic Electric Works Co Ltd | 低熱伝導率被膜形成用樹脂組成物、低熱伝導率被膜、低熱伝導率被膜の製造方法 |
| JP2009040965A (ja) | 2007-08-10 | 2009-02-26 | Panasonic Electric Works Co Ltd | 低誘電率被膜形成用樹脂組成物、低誘電率被膜、低誘電率被膜の製造方法 |
| JP5426869B2 (ja) * | 2008-11-19 | 2014-02-26 | パナソニック株式会社 | メソポーラスシリカ微粒子の製造方法、メソポーラスシリカ微粒子含有組成物、及びメソポーラスシリカ微粒子含有成型物 |
| US20110048282A1 (en) * | 2009-07-29 | 2011-03-03 | Quijada Abarca Raul | Hybrid nanoparticles with controlled morphology and their use in thermoplastic polymer matrix nanocomposites |
| EP2463236A4 (en) * | 2009-08-07 | 2015-05-06 | Panasonic Corp | METHOD FOR PRODUCING TEN MESOPOROUS SILICON PARTICLES, FINE MESOPOROUS SILICON PARTICLES, LIQUID DISPERSION FROM FINE MESOPOROUS SILICON PARTICLES, COMPOSITION WITH FINE MESOPOROUS SILICON PARTICLES AND MOLDING MATERIALS WITH FINE MESOPOROUS SILICON PARTICLES |
-
2010
- 2010-05-18 EP EP10806277.9A patent/EP2463236A4/en not_active Withdrawn
- 2010-05-18 KR KR1020127006057A patent/KR101439216B1/ko not_active Expired - Fee Related
- 2010-05-18 CN CN201080035044.8A patent/CN102574693B/zh active Active
- 2010-05-18 WO PCT/JP2010/058367 patent/WO2011016277A1/ja not_active Ceased
- 2010-05-18 JP JP2010114295A patent/JP5624361B2/ja active Active
- 2010-05-18 US US13/389,095 patent/US8999052B2/en active Active
- 2010-05-19 TW TW099115926A patent/TW201105581A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006069824A (ja) | 2004-08-31 | 2006-03-16 | Univ Of Miyazaki | ミクロ孔を有するメソポーラスシリカナノ粒子及びその製造方法 |
| JP2009040967A (ja) * | 2007-08-10 | 2009-02-26 | Panasonic Electric Works Co Ltd | 低屈折率被膜形成用樹脂組成物、低屈折率被膜、反射防止基材 |
Non-Patent Citations (2)
| Title |
|---|
| Microporous and Mesoporous Materials, 120, 2009, p.447-453 * |
| Microporous and Mesoporous Materials, 120, 2009, p.447-453* |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2463236A1 (en) | 2012-06-13 |
| JP5624361B2 (ja) | 2014-11-12 |
| EP2463236A4 (en) | 2015-05-06 |
| JP2011051878A (ja) | 2011-03-17 |
| KR20120065344A (ko) | 2012-06-20 |
| WO2011016277A1 (ja) | 2011-02-10 |
| CN102574693B (zh) | 2016-01-20 |
| US20120192762A1 (en) | 2012-08-02 |
| US8999052B2 (en) | 2015-04-07 |
| CN102574693A (zh) | 2012-07-11 |
| TW201105581A (en) | 2011-02-16 |
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