KR101431867B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101431867B1
KR101431867B1 KR1020100109121A KR20100109121A KR101431867B1 KR 101431867 B1 KR101431867 B1 KR 101431867B1 KR 1020100109121 A KR1020100109121 A KR 1020100109121A KR 20100109121 A KR20100109121 A KR 20100109121A KR 101431867 B1 KR101431867 B1 KR 101431867B1
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KR
South Korea
Prior art keywords
substrate
arm
stage
substrate stage
controller
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KR1020100109121A
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English (en)
Korean (ko)
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KR20110053903A (ko
Inventor
신이찌 히라노
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3306—Horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020100109121A 2009-11-16 2010-11-04 노광 장치 및 디바이스 제조 방법 Active KR101431867B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2009-261318 2009-11-16
JP2009261318 2009-11-16
JP2010237915A JP5537380B2 (ja) 2009-11-16 2010-10-22 露光装置及びデバイス製造方法
JPJP-P-2010-237915 2010-10-22

Publications (2)

Publication Number Publication Date
KR20110053903A KR20110053903A (ko) 2011-05-24
KR101431867B1 true KR101431867B1 (ko) 2014-08-25

Family

ID=43998349

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100109121A Active KR101431867B1 (ko) 2009-11-16 2010-11-04 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US9280067B2 (https=)
JP (1) JP5537380B2 (https=)
KR (1) KR101431867B1 (https=)
CN (1) CN102063017B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7212558B2 (ja) * 2019-03-15 2023-01-25 キヤノン株式会社 基板処理装置、決定方法及び物品の製造方法
KR20210086748A (ko) * 2019-12-30 2021-07-09 세메스 주식회사 기판 리프팅 방법 및 기판 처리 장치
JP7625636B2 (ja) 2023-05-24 2025-02-03 キヤノン株式会社 基板処理装置、制御方法、および物品製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100280108B1 (ko) * 1998-11-03 2001-03-02 윤종용 오리엔터 플랫존 유니트의 웨이퍼 파손 방지 시스템
JP2002205292A (ja) * 2000-12-18 2002-07-23 Samsung Electronics Co Ltd 搬送ロボットとその制御方法
KR20070085212A (ko) * 2004-11-25 2007-08-27 가부시키가이샤 니콘 이동체 시스템, 노광 장치 및 디바이스 제조 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003163251A (ja) * 2001-11-27 2003-06-06 Sendai Nikon:Kk 搬送装置及び露光装置
JP2005114882A (ja) * 2003-10-06 2005-04-28 Hitachi High-Tech Electronics Engineering Co Ltd 処理ステージの基板載置方法、基板露光ステージおよび基板露光装置
JP4524132B2 (ja) * 2004-03-30 2010-08-11 東京エレクトロン株式会社 真空処理装置
JP2006066636A (ja) * 2004-08-26 2006-03-09 Nikon Corp 搬送装置とその方法、及び露光装置
CN100361287C (zh) * 2006-03-10 2008-01-09 友达光电股份有限公司 基板传送装置
JPWO2007116752A1 (ja) * 2006-04-05 2009-08-20 株式会社ニコン ステージ装置、露光装置、ステージ制御方法、露光方法、およびデバイス製造方法
JP4969138B2 (ja) * 2006-04-17 2012-07-04 大日本スクリーン製造株式会社 基板処理装置
JP4799325B2 (ja) * 2006-09-05 2011-10-26 東京エレクトロン株式会社 基板受け渡し装置，基板処理装置，基板受け渡し方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100280108B1 (ko) * 1998-11-03 2001-03-02 윤종용 오리엔터 플랫존 유니트의 웨이퍼 파손 방지 시스템
JP2002205292A (ja) * 2000-12-18 2002-07-23 Samsung Electronics Co Ltd 搬送ロボットとその制御方法
KR20070085212A (ko) * 2004-11-25 2007-08-27 가부시키가이샤 니콘 이동체 시스템, 노광 장치 및 디바이스 제조 방법

Also Published As

Publication number Publication date
CN102063017B (zh) 2013-03-13
CN102063017A (zh) 2011-05-18
JP5537380B2 (ja) 2014-07-02
US9280067B2 (en) 2016-03-08
KR20110053903A (ko) 2011-05-24
JP2011124548A (ja) 2011-06-23
US20110116070A1 (en) 2011-05-19

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