KR101368539B1 - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
KR101368539B1
KR101368539B1 KR1020090057378A KR20090057378A KR101368539B1 KR 101368539 B1 KR101368539 B1 KR 101368539B1 KR 1020090057378 A KR1020090057378 A KR 1020090057378A KR 20090057378 A KR20090057378 A KR 20090057378A KR 101368539 B1 KR101368539 B1 KR 101368539B1
Authority
KR
South Korea
Prior art keywords
resin composition
pigment
photosensitive resin
weight
composition according
Prior art date
Application number
KR1020090057378A
Other languages
English (en)
Korean (ko)
Other versions
KR20110000042A (ko
Inventor
한재국
서영성
윤경근
Original Assignee
코오롱인더스트리 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코오롱인더스트리 주식회사 filed Critical 코오롱인더스트리 주식회사
Priority to KR1020090057378A priority Critical patent/KR101368539B1/ko
Priority to CN2010800286070A priority patent/CN102460300B/zh
Priority to TW099120886A priority patent/TW201100959A/zh
Priority to PCT/KR2010/004146 priority patent/WO2010151078A2/en
Priority to JP2012517395A priority patent/JP2012531619A/ja
Publication of KR20110000042A publication Critical patent/KR20110000042A/ko
Application granted granted Critical
Publication of KR101368539B1 publication Critical patent/KR101368539B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020090057378A 2009-06-26 2009-06-26 감광성 수지 조성물 KR101368539B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020090057378A KR101368539B1 (ko) 2009-06-26 2009-06-26 감광성 수지 조성물
CN2010800286070A CN102460300B (zh) 2009-06-26 2010-06-25 光聚合树脂组合物
TW099120886A TW201100959A (en) 2009-06-26 2010-06-25 Photopolymerizable resin composition
PCT/KR2010/004146 WO2010151078A2 (en) 2009-06-26 2010-06-25 Photopolymerizable resin composition
JP2012517395A JP2012531619A (ja) 2009-06-26 2010-06-25 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090057378A KR101368539B1 (ko) 2009-06-26 2009-06-26 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
KR20110000042A KR20110000042A (ko) 2011-01-03
KR101368539B1 true KR101368539B1 (ko) 2014-02-27

Family

ID=43387069

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090057378A KR101368539B1 (ko) 2009-06-26 2009-06-26 감광성 수지 조성물

Country Status (5)

Country Link
JP (1) JP2012531619A (ja)
KR (1) KR101368539B1 (ja)
CN (1) CN102460300B (ja)
TW (1) TW201100959A (ja)
WO (1) WO2010151078A2 (ja)

Families Citing this family (12)

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Publication number Priority date Publication date Assignee Title
US7811353B2 (en) 2005-02-22 2010-10-12 Evl Inc. Enhanced fertilizer and method for producing same
JP5771944B2 (ja) * 2010-10-18 2015-09-02 Jsr株式会社 カラーフィルタの製造方法
TWI472877B (zh) * 2012-11-20 2015-02-11 Chi Mei Corp 感光性樹脂組成物、彩色濾光片及其液晶顯示元件
JP6123620B2 (ja) * 2013-09-30 2017-05-10 Jsr株式会社 感放射線性樹脂組成物、表示素子の絶縁膜、その形成方法及び表示素子
JP2015194583A (ja) * 2014-03-31 2015-11-05 Jsr株式会社 硬化膜形成用樹脂組成物、硬化膜及びその形成方法、並びに表示素子
KR101872995B1 (ko) * 2016-12-06 2018-07-02 (주)옵토레인 광각 이미션 필터, 이를 갖는 광학센서 어셈블리, 이를 포함하는 피씨알 시스템, 및 그 제조방법
KR102270594B1 (ko) * 2016-12-14 2021-06-28 쇼와 덴코 가부시키가이샤 컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터
KR102036684B1 (ko) * 2017-04-20 2019-10-25 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
US10921709B2 (en) 2018-02-06 2021-02-16 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same, and color filter
KR102154680B1 (ko) 2018-07-02 2020-09-10 삼성에스디아이 주식회사 양자점 함유 경화성 조성물, 이를 이용한 수지막 및 디스플레이 장치
KR20220091736A (ko) * 2020-12-24 2022-07-01 롬엔드하스전자재료코리아유한회사 플루오르화 아크릴레이트계 공중합체 및 이를 포함하는 감광성 수지 조성물
CN113637442B (zh) * 2021-08-12 2023-09-22 太仓申威新材料科技有限公司 一种微棱镜反光膜用紫外光固化转印胶组合物及其制备方法和应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030057090A (ko) * 2001-12-28 2003-07-04 제일모직주식회사 컬러필터용 감광성 수지 조성물
KR20050061224A (ko) * 2003-12-18 2005-06-22 주식회사 코오롱 액정 표시 소자의 칼럼 스페이서용 감광성 수지 조성물
KR20060096882A (ko) * 2005-03-04 2006-09-13 제일모직주식회사 고-색재현 컬러필터 제조용 감광성 수지 조성물

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KR100574321B1 (ko) * 1999-02-04 2006-04-26 제일모직주식회사 감광성 수지 조성물 및 블랙매트릭스
EP1560068B1 (en) * 2002-11-06 2008-01-23 Asahi Glass Company Ltd. Barrier rib and its method of preparation
JP2006133338A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
JP4745093B2 (ja) * 2006-03-17 2011-08-10 東京応化工業株式会社 黒色感光性組成物
JP4745110B2 (ja) * 2006-04-19 2011-08-10 東京応化工業株式会社 感光性組成物及びこの感光性組成物により形成されたカラーフィルタ
KR100920603B1 (ko) * 2006-12-28 2009-10-08 제일모직주식회사 감광성 수지 조성물 및 그로부터 제조되는 컬러필터
JP2008298859A (ja) * 2007-05-29 2008-12-11 Asahi Glass Co Ltd 感光性組成物、それを用いた隔壁、隔壁の製造方法、カラーフィルタの製造方法、有機ｅｌ表示素子の製造方法および有機ｔｆｔアレイの製造方法
JP5346509B2 (ja) * 2007-07-10 2013-11-20 新日鉄住金化学株式会社 カラーフィルター隔壁形成用感光性樹脂組成物及びこれを用いて形成した遮光性カラーフィルター隔壁並びにカラーフィルター

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030057090A (ko) * 2001-12-28 2003-07-04 제일모직주식회사 컬러필터용 감광성 수지 조성물
KR20050061224A (ko) * 2003-12-18 2005-06-22 주식회사 코오롱 액정 표시 소자의 칼럼 스페이서용 감광성 수지 조성물
KR20060096882A (ko) * 2005-03-04 2006-09-13 제일모직주식회사 고-색재현 컬러필터 제조용 감광성 수지 조성물

Also Published As

Publication number Publication date
WO2010151078A9 (en) 2011-03-03
WO2010151078A3 (en) 2011-06-03
CN102460300A (zh) 2012-05-16
WO2010151078A2 (en) 2010-12-29
JP2012531619A (ja) 2012-12-10
TW201100959A (en) 2011-01-01
CN102460300B (zh) 2013-11-06
KR20110000042A (ko) 2011-01-03

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