KR20050061224A - 액정 표시 소자의 칼럼 스페이서용 감광성 수지 조성물 - Google Patents
액정 표시 소자의 칼럼 스페이서용 감광성 수지 조성물 Download PDFInfo
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- KR20050061224A KR20050061224A KR1020030093452A KR20030093452A KR20050061224A KR 20050061224 A KR20050061224 A KR 20050061224A KR 1020030093452 A KR1020030093452 A KR 1020030093452A KR 20030093452 A KR20030093452 A KR 20030093452A KR 20050061224 A KR20050061224 A KR 20050061224A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
알칼리 가용성 공중합체 | 조성 | 중합체 용액내의 고형분 농도 |
A-1 | 2,2'-아조비스 이소부티로니트릴 5중량부스티렌 20중량부메타크릴산 30중량부메타크릴산 글리시딜 40중량부디시클로펜테닐옥시에틸 메타크릴레이트 10중량부프로필렌글리콜 모노메틸에테르 아세테이트 200중량부 | 33 중량% |
A-2 | 2,2'-아조비스 이소부티로니트릴 5중량부벤질메타크릴레이트 20중량부메타크릴산 30중량부메타크릴산 글리시딜 40중량부디시클로펜테닐옥시에틸 메타크릴레이트 10중량부프로필렌글리콜 모노메틸에테르 아세테이트 200중량부 | 33 중량% |
A-3 | 2,2'-아조비스 이소부티로니트릴 5중량부스티렌 20중량부메타크릴산 30중량부메타크릴산 글리시딜 40중량부디시클로펜타닐 메타크릴레이트 10중량부프로필렌글리콜 모노메틸에테르 아세테이트 200중량부 | 33 중량% |
A-4 | 2,2'-아조비스 이소부티로니트릴 5중량부스티렌 20중량부메타크릴산 30중량부메틸 메타아크릴산 10중량부디시클로펜테닐옥시에틸 메타크릴레이트 10중량부프로필렌글리콜 모노메틸에테르 아세테이트 200중량부 | 33 중량% |
구분 | 알칼리가용성수지 | DPHA | 에폭시실리콘올리고머 | 광중합개시제(이가큐어 907) | 불소 계면활성제 |
실시예1 | A-1 200중량부 | 100중량부 | 5중량부 | 5중량부 | 1중량부 |
실시예2 | A-1 200중량부 | 100중량부 | 10중량부 | 5중량부 | 1중량부 |
실시예3 | A-2 200중량부 | 100중량부 | 10중량부 | 5중량부 | 1중량부 |
실시예4 | A-2 200중량부 | 100중량부 | 10중량부 | 5중량부 | 1중량부 |
실시예5 | A-3 100중량부 | 200중량부 | 10중량부 | 5중량부 | 1중량부 |
비교예1 | A-1 200중량부 | 100중량부 | - | 5중량부 | 1중량부 |
비교예2 | A-1 200중량부 | 500중량부 | 10중량부 | 15중량부 | 1중량부 |
구분 | 밀착성 | 패턴모양 | 평탄도 | 내열성 | 압축변위(㎛) |
실시예1 | 양호 | 양호 | 양호 | 양호 | 1.2 |
실시예2 | 양호 | 양호 | 양호 | 양호 | 1.35 |
실시예3 | 양호 | 양호 | 양호 | 양호 | 1.48 |
실시예4 | 양호 | 양호 | 양호 | 양호 | 1.02 |
실시예5 | 양호 | 양호 | 양호 | 양호 | 0.91 |
비교예1 | 양호 | 양호 | 양호 | 양호 | 0.7 |
비교예2 | 불량 | 불량 | 불량 | 양호 | 0.6 |
Claims (3)
- (a) 알칼리 가용성 공중합체;(b) 2개 이상의 에틸렌성 불포화 결합을 갖는 다관능성 아크릴 모노머;(c) 광중합 개시제;(d) 하기 일반식 1로 표시되는 에폭시실리콘 공중합체; 및(e) 용매를 포함하는 칼럼 스페이서용 감광성 수지 조성물[일반식 1]여기서 n = 0 ~ 100, m = 0 ~ 10인 정수이다.
- 제1항에 있어서, 상기 알칼리 가용성 공중합체는(a1) 불포화 카르복실산, 불포화 카르복실산 무수물 또는 이 두 물질의 혼합물; 및(a2) 올레핀계 불포화 화합물에서 선택되는 최소한 2종 이상의 화합물을 라디칼 중합하여 얻어지는 것인 칼럼 스페이서용 감광성 수지 조성물.
- 제1항에 있어서,상기 감광성 수지 조성물은 고형분을 기준으로 상기 알칼리 가용성 공중합체 약20 ~ 약70중량%, 상기 다관능성 아크릴 모노머 약20 ~ 약60중량%, 상기 에폭시실리콘 공중합체 약0.1 ~ 약20중량%, 상기 광중합 개시제 약1 ~ 약15% 포함하는 것인 칼럼 스페이서용 감광성 수지 조성물.
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100838001B1 (ko) * | 2005-08-26 | 2008-06-13 | 제이에스알 가부시끼가이샤 | 중합체, 감방사선성 수지 조성물 및 액정 표시 소자용스페이서 |
WO2010151078A2 (en) * | 2009-06-26 | 2010-12-29 | Kolon Industries, Inc. | Photopolymerizable resin composition |
KR101041310B1 (ko) * | 2006-12-08 | 2011-06-14 | 주식회사 엘지화학 | 감광성 수지 조성물 |
KR101316397B1 (ko) * | 2008-09-30 | 2013-10-10 | 코오롱인더스트리 주식회사 | 유기 절연막용 감광성 수지 조성물 |
WO2013176517A1 (ko) * | 2012-05-25 | 2013-11-28 | 주식회사 엘지화학 | 감광성 수지 조성물, 이를 이용하여 형성된 패턴 및 이를 포함하는 디스플레이 패널 |
Family Cites Families (4)
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JPH04254857A (ja) * | 1991-01-30 | 1992-09-10 | Konica Corp | 湿し水不要感光性平版印刷版 |
JP2934098B2 (ja) * | 1992-06-30 | 1999-08-16 | タムラ化研株式会社 | 感光性樹脂組成物 |
JP3324200B2 (ja) * | 1993-06-04 | 2002-09-17 | チッソ株式会社 | 感光性樹脂組成物 |
JP2004198906A (ja) | 2002-12-20 | 2004-07-15 | Sumitomo Chem Co Ltd | 感光性組成物 |
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- 2003-12-18 KR KR1020030093452A patent/KR100673296B1/ko active IP Right Grant
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100838001B1 (ko) * | 2005-08-26 | 2008-06-13 | 제이에스알 가부시끼가이샤 | 중합체, 감방사선성 수지 조성물 및 액정 표시 소자용스페이서 |
KR101041310B1 (ko) * | 2006-12-08 | 2011-06-14 | 주식회사 엘지화학 | 감광성 수지 조성물 |
KR101316397B1 (ko) * | 2008-09-30 | 2013-10-10 | 코오롱인더스트리 주식회사 | 유기 절연막용 감광성 수지 조성물 |
WO2010151078A2 (en) * | 2009-06-26 | 2010-12-29 | Kolon Industries, Inc. | Photopolymerizable resin composition |
WO2010151078A3 (en) * | 2009-06-26 | 2011-06-03 | Kolon Industries, Inc. | Photopolymerizable resin composition |
KR101368539B1 (ko) * | 2009-06-26 | 2014-02-27 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 |
WO2013176517A1 (ko) * | 2012-05-25 | 2013-11-28 | 주식회사 엘지화학 | 감광성 수지 조성물, 이를 이용하여 형성된 패턴 및 이를 포함하는 디스플레이 패널 |
US9341946B2 (en) | 2012-05-25 | 2016-05-17 | Lg Chem, Ltd. | Photosensitive resin composition, pattern formed using same and display panel comprising same |
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