WO2010151078A3 - Photopolymerizable resin composition - Google Patents
Photopolymerizable resin composition Download PDFInfo
- Publication number
- WO2010151078A3 WO2010151078A3 PCT/KR2010/004146 KR2010004146W WO2010151078A3 WO 2010151078 A3 WO2010151078 A3 WO 2010151078A3 KR 2010004146 W KR2010004146 W KR 2010004146W WO 2010151078 A3 WO2010151078 A3 WO 2010151078A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- photopolymerizable resin
- ink
- color ink
- film
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010800286070A CN102460300B (en) | 2009-06-26 | 2010-06-25 | Photopolymerizable resin composition |
JP2012517395A JP2012531619A (en) | 2009-06-26 | 2010-06-25 | Photosensitive resin composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090057378A KR101368539B1 (en) | 2009-06-26 | 2009-06-26 | Photopolymerizable resin composition |
KR10-2009-0057378 | 2009-06-26 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2010151078A2 WO2010151078A2 (en) | 2010-12-29 |
WO2010151078A9 WO2010151078A9 (en) | 2011-03-03 |
WO2010151078A3 true WO2010151078A3 (en) | 2011-06-03 |
Family
ID=43387069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/004146 WO2010151078A2 (en) | 2009-06-26 | 2010-06-25 | Photopolymerizable resin composition |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2012531619A (en) |
KR (1) | KR101368539B1 (en) |
CN (1) | CN102460300B (en) |
TW (1) | TW201100959A (en) |
WO (1) | WO2010151078A2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006089416A2 (en) | 2005-02-22 | 2006-08-31 | Evl Inc. | Enhanced fertilizer and method for producing same |
JP5771944B2 (en) * | 2010-10-18 | 2015-09-02 | Jsr株式会社 | Manufacturing method of color filter |
TWI472877B (en) * | 2012-11-20 | 2015-02-11 | Chi Mei Corp | Photosensitive resin composition, color filter and liquid crystal display device |
JP6123620B2 (en) * | 2013-09-30 | 2017-05-10 | Jsr株式会社 | Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element |
JP2015194583A (en) * | 2014-03-31 | 2015-11-05 | Jsr株式会社 | Resin composition for forming cured film, cured film and method for forming the same, and display element |
KR101872995B1 (en) * | 2016-12-06 | 2018-07-02 | (주)옵토레인 | Wide-angle emission filter, optical sensor assembly having the same, pcr system having the same, and method of manufactring the same |
JP6890613B2 (en) * | 2016-12-14 | 2021-06-18 | 昭和電工株式会社 | Resin composition for color filter, its manufacturing method and color filter |
KR102036684B1 (en) * | 2017-04-20 | 2019-10-25 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer using the same and color filter |
US10921709B2 (en) | 2018-02-06 | 2021-02-16 | Samsung Sdi Co., Ltd. | Photosensitive resin composition, photosensitive resin layer using the same, and color filter |
KR102154680B1 (en) | 2018-07-02 | 2020-09-10 | 삼성에스디아이 주식회사 | Curable composition including quantum dot, resin layer using the same and display device |
KR20220091736A (en) * | 2020-12-24 | 2022-07-01 | 롬엔드하스전자재료코리아유한회사 | Fluorinated acrylate-based copolymer and photosensitive resin composition comprising same |
CN113637442B (en) * | 2021-08-12 | 2023-09-22 | 太仓申威新材料科技有限公司 | Ultraviolet light curing transfer printing adhesive composition for microprism reflective film and preparation method and application thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030057090A (en) * | 2001-12-28 | 2003-07-04 | 제일모직주식회사 | Photosensitive resin composition for color filter |
KR20050061224A (en) * | 2003-12-18 | 2005-06-22 | 주식회사 코오롱 | Photoresist composition for column spacer of liquid crystal display |
KR20060096882A (en) * | 2005-03-04 | 2006-09-13 | 제일모직주식회사 | Photosensitive resin composition for high-resolusion color filter |
KR20080061191A (en) * | 2006-12-28 | 2008-07-02 | 제일모직주식회사 | Photosensitive resin composition and a color filter prepared therefrom |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100574321B1 (en) * | 1999-02-04 | 2006-04-26 | 제일모직주식회사 | Photosensitive resin composition and black matrix |
EP1560068B1 (en) * | 2002-11-06 | 2008-01-23 | Asahi Glass Company Ltd. | Barrier rib and its method of preparation |
JP2006133338A (en) * | 2004-11-04 | 2006-05-25 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for forming light shielding film and black matrix formed of the photosensitive composition for forming light shielding film |
JP4745093B2 (en) * | 2006-03-17 | 2011-08-10 | 東京応化工業株式会社 | Black photosensitive composition |
JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
JP2008298859A (en) * | 2007-05-29 | 2008-12-11 | Asahi Glass Co Ltd | Photosensitive composition, partition using the same, method for producing partition, method for producing color filter, method for producing organic el display element and method for producing organic tft array |
JP5346509B2 (en) * | 2007-07-10 | 2013-11-20 | 新日鉄住金化学株式会社 | Photosensitive resin composition for forming color filter partition walls, light-shielding color filter partition walls and color filters formed using the same |
-
2009
- 2009-06-26 KR KR1020090057378A patent/KR101368539B1/en active IP Right Grant
-
2010
- 2010-06-25 CN CN2010800286070A patent/CN102460300B/en not_active Expired - Fee Related
- 2010-06-25 JP JP2012517395A patent/JP2012531619A/en active Pending
- 2010-06-25 TW TW099120886A patent/TW201100959A/en unknown
- 2010-06-25 WO PCT/KR2010/004146 patent/WO2010151078A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030057090A (en) * | 2001-12-28 | 2003-07-04 | 제일모직주식회사 | Photosensitive resin composition for color filter |
KR20050061224A (en) * | 2003-12-18 | 2005-06-22 | 주식회사 코오롱 | Photoresist composition for column spacer of liquid crystal display |
KR20060096882A (en) * | 2005-03-04 | 2006-09-13 | 제일모직주식회사 | Photosensitive resin composition for high-resolusion color filter |
KR20080061191A (en) * | 2006-12-28 | 2008-07-02 | 제일모직주식회사 | Photosensitive resin composition and a color filter prepared therefrom |
Also Published As
Publication number | Publication date |
---|---|
TW201100959A (en) | 2011-01-01 |
CN102460300A (en) | 2012-05-16 |
JP2012531619A (en) | 2012-12-10 |
CN102460300B (en) | 2013-11-06 |
WO2010151078A2 (en) | 2010-12-29 |
KR101368539B1 (en) | 2014-02-27 |
WO2010151078A9 (en) | 2011-03-03 |
KR20110000042A (en) | 2011-01-03 |
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