KR101362751B1 - 내열 차광 필름과, 그것의 제조방법, 및 필름을 사용한개구 및 광량 조정 장치 - Google Patents

내열 차광 필름과, 그것의 제조방법, 및 필름을 사용한개구 및 광량 조정 장치 Download PDF

Info

Publication number
KR101362751B1
KR101362751B1 KR1020070119832A KR20070119832A KR101362751B1 KR 101362751 B1 KR101362751 B1 KR 101362751B1 KR 1020070119832 A KR1020070119832 A KR 1020070119832A KR 20070119832 A KR20070119832 A KR 20070119832A KR 101362751 B1 KR101362751 B1 KR 101362751B1
Authority
KR
South Korea
Prior art keywords
film
heat
nickel
light
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020070119832A
Other languages
English (en)
Korean (ko)
Other versions
KR20080049629A (ko
Inventor
카츄시 오노
요시유키 아베
유키오 츄카코시
Original Assignee
스미토모 긴조쿠 고잔 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미토모 긴조쿠 고잔 가부시키가이샤 filed Critical 스미토모 긴조쿠 고잔 가부시키가이샤
Publication of KR20080049629A publication Critical patent/KR20080049629A/ko
Application granted granted Critical
Publication of KR101362751B1 publication Critical patent/KR101362751B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • C23C14/205Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/085Oxides of iron group metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12806Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826Group VIB metal-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12944Ni-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495Thickness [relative or absolute]
    • Y10T428/24967Absolute thicknesses specified
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Diaphragms For Cameras (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Vapour Deposition (AREA)
  • Shutters For Cameras (AREA)
KR1020070119832A 2006-11-30 2007-11-22 내열 차광 필름과, 그것의 제조방법, 및 필름을 사용한개구 및 광량 조정 장치 Expired - Fee Related KR101362751B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00323368 2006-11-30
JP2006323368 2006-11-30
JPJP-P-2007-00084119 2007-03-28
JP2007084119A JP5114995B2 (ja) 2006-11-30 2007-03-28 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置

Publications (2)

Publication Number Publication Date
KR20080049629A KR20080049629A (ko) 2008-06-04
KR101362751B1 true KR101362751B1 (ko) 2014-02-12

Family

ID=39486960

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070119832A Expired - Fee Related KR101362751B1 (ko) 2006-11-30 2007-11-22 내열 차광 필름과, 그것의 제조방법, 및 필름을 사용한개구 및 광량 조정 장치

Country Status (5)

Country Link
US (1) US7670673B2 (enExample)
JP (1) JP5114995B2 (enExample)
KR (1) KR101362751B1 (enExample)
CN (1) CN101191843B (enExample)
TW (1) TWI363691B (enExample)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101408510B1 (ko) * 2007-05-18 2014-06-17 삼성전자주식회사 표시소자용 연성기판 및 이를 이용한 디스플레이 소자
US20090286103A1 (en) * 2008-05-14 2009-11-19 Xtalic Corporation Coated articles and related methods
US20090283410A1 (en) * 2008-05-14 2009-11-19 Xtalic Corporation Coated articles and related methods
JP4941412B2 (ja) * 2008-06-19 2012-05-30 住友金属鉱山株式会社 耐熱遮光フィルムの製造方法
JP4735672B2 (ja) * 2008-06-27 2011-07-27 住友金属鉱山株式会社 フィルム状遮光板、及び、それを用いた絞り、光量調整用絞り装置、又はシャッター
JP5239630B2 (ja) * 2008-08-26 2013-07-17 住友金属鉱山株式会社 吸収型多層膜ndフィルター
CN102144177B (zh) * 2008-09-05 2014-11-19 住友金属矿山株式会社 黑色覆膜及其制造方法、黑色遮光板及使用它的光圈、光量调节用光圈装置、快门以及耐热遮光带
JP5199162B2 (ja) * 2009-03-27 2013-05-15 富士フイルム株式会社 機能性フィルムの製造方法、及び製造装置
CN101872033B (zh) * 2009-04-24 2014-04-30 鸿富锦精密工业(深圳)有限公司 遮光片阵列、遮光片阵列制造方法及镜头模组阵列
JP5614218B2 (ja) 2009-11-20 2014-10-29 東洋紡株式会社 黒色耐熱遮光フィルムとその製造方法、および、それを用いた絞り、光量調整モジュール並びに耐熱遮光テープ
JP5183754B2 (ja) * 2010-02-12 2013-04-17 キヤノン株式会社 光学素子
JP5195792B2 (ja) * 2010-03-11 2013-05-15 住友金属鉱山株式会社 耐熱遮光フィルムとその製造方法
WO2012071144A1 (en) * 2010-11-22 2012-05-31 3M Innovative Properties Company Electronic display including an obscuring layer and method of making same
CN102053455B (zh) * 2010-12-07 2013-08-07 北京富纳特创新科技有限公司 快门装置及快门叶片
CN102053456B (zh) * 2010-12-07 2013-08-07 北京富纳特创新科技有限公司 快门装置及快门叶片
CN102053454B (zh) * 2010-12-07 2013-08-07 北京富纳特创新科技有限公司 快门装置及快门叶片
CN102073198B (zh) 2010-12-07 2013-08-07 北京富纳特创新科技有限公司 垫片
CN102073199B (zh) * 2010-12-07 2013-11-06 北京富纳特创新科技有限公司 垫片
CN103460080B (zh) * 2011-03-28 2015-07-15 木本股份有限公司 光学设备用遮光材料
CN102978570B (zh) * 2012-11-26 2014-10-08 蔡莳铨 金属蒸镀薄膜及其制作中间体和相关制作方法
CN103031081A (zh) * 2013-01-22 2013-04-10 昆山汉品电子有限公司 一种遮光热扩散膜
JP6036363B2 (ja) * 2013-02-08 2016-11-30 住友金属鉱山株式会社 遮光フィルムとその製造方法、および、それを用いた絞り、シャッター羽根、光量調整絞り羽根
JP6098373B2 (ja) * 2013-05-31 2017-03-22 住友金属鉱山株式会社 遮光フィルムとその製造方法、および、それを用いたフォーカルプレーンシャッター羽根
JP6164145B2 (ja) * 2014-03-31 2017-07-19 住友金属鉱山株式会社 導電性基板、導電性基板の製造方法
EP2977202A1 (fr) * 2014-07-25 2016-01-27 AGC Glass Europe Vitrage chauffant
US10550034B2 (en) * 2014-07-25 2020-02-04 Agc Glass Europe Decorative glass panel
CN104865787B (zh) * 2015-06-01 2016-08-24 大东集团有限公司 真空晒版机
JP2017097234A (ja) * 2015-11-26 2017-06-01 日本電産コパル株式会社 シャッタ羽根、シャッタユニットおよび赤外線撮像装置
CN106626648B (zh) * 2016-10-17 2019-02-22 东莞市瑞年塑胶科技有限公司 遮光静电薄膜及其制作工艺
JP6368445B1 (ja) * 2017-03-27 2018-08-01 株式会社きもと 積層遮光フィルム、並びに、これを用いた光学機器用遮光リング、レンズユニット及びカメラモジュール
TWI621891B (zh) * 2017-05-25 2018-04-21 大立光電股份有限公司 二次模造環型光學元件、成像鏡片組、成像裝置及電子裝置
CN108728841B (zh) * 2018-05-04 2021-03-02 瑞声光学解决方案私人有限公司 压延铜遮光圈片制备方法及压延铜遮光圈片
TWI676852B (zh) * 2018-10-31 2019-11-11 白金科技股份有限公司 遮光片
JP7157042B2 (ja) * 2019-12-27 2022-10-19 ソマール株式会社 黒色遮光部材
BE1029160B1 (nl) * 2021-03-04 2022-10-03 Soleras Advanced Coatings Bv Depositie van niet-stoichiometrische metaalverbindingen
TWI836408B (zh) * 2022-04-22 2024-03-21 大立光電股份有限公司 成像鏡頭、相機模組及電子裝置
WO2024075547A1 (ja) * 2022-10-07 2024-04-11 株式会社プロテリアル Ni合金膜およびNi合金膜形成用スパッタリングターゲット材

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01120503A (ja) * 1987-11-05 1989-05-12 Somar Corp 導電性を有する粗面化遮光性フイルム
US20060088690A1 (en) 2002-08-08 2006-04-27 Fumihiro Arakawa Electromagnetic wave shielding sheet

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02116837A (ja) 1988-10-27 1990-05-01 Nikon Corp 遮光羽根
JP2962769B2 (ja) 1990-04-27 1999-10-12 株式会社きもと 光学機器用遮光部材
JP3729566B2 (ja) * 1996-07-24 2005-12-21 三井化学株式会社 積層体
JPH10307204A (ja) * 1997-03-07 1998-11-17 Asahi Glass Co Ltd 遮光層付き基板及びその製造方法並びにカラーフィルタ基板及び液晶表示素子
JPH1124058A (ja) * 1997-06-30 1999-01-29 Asahi Glass Co Ltd 遮光層付き基板及びその製造方法及びカラーフィルタ基板及び液晶表示素子
JPH1195008A (ja) * 1997-09-16 1999-04-09 Sti Technology Kk ニッケル系ブラックマスク及びその製造方法、それを用いるカラーフィルター並びに液晶ディスプレイ
JP3215815B2 (ja) 1998-09-02 2001-10-09 日本電産コパル株式会社 光学機器用遮光羽根材
JP2000206314A (ja) * 1999-01-11 2000-07-28 Asahi Glass Co Ltd 遮光層付き基板、カラ―フィルタ基板、表示素子、遮光層付き基板を形成するためのタ―ゲット及び遮光層付き基板の製造方法
JP2000307139A (ja) * 1999-04-21 2000-11-02 Fuji Electric Co Ltd 薄膜太陽電池の製造方法及び薄膜電極層形成装置
JP3853591B2 (ja) * 1999-12-17 2006-12-06 ジオマテック株式会社 遮光膜、低反射膜およびその用途
US6372538B1 (en) * 2000-03-16 2002-04-16 University Of Delaware Fabrication of thin-film, flexible photovoltaic module
JP3918721B2 (ja) * 2002-03-27 2007-05-23 住友金属鉱山株式会社 透明導電性薄膜、その製造方法と製造用焼結体ターゲット、及び有機エレクトロルミネッセンス素子とその製造方法
KR100505536B1 (ko) * 2002-03-27 2005-08-04 스미토모 긴조쿠 고잔 가부시키가이샤 투명한 도전성 박막, 그것의 제조방법, 그것의 제조를위한 소결 타겟, 디스플레이 패널용의 투명한 전기전도성기재, 및 유기 전기루미네선스 디바이스
JP3797317B2 (ja) * 2002-05-30 2006-07-19 住友金属鉱山株式会社 透明導電性薄膜用ターゲット、透明導電性薄膜およびその製造方法、ディスプレイ用電極材料、有機エレクトロルミネッセンス素子
KR20060115324A (ko) * 2003-11-14 2006-11-08 니덱 코팔 가부시키가이샤 Nd 필터 및 이것을 이용한 광량 조리개 장치
JP4595687B2 (ja) * 2004-07-20 2010-12-08 住友金属鉱山株式会社 吸収型多層膜ndフィルター
JP4613706B2 (ja) * 2004-11-24 2011-01-19 住友金属鉱山株式会社 吸収型多層膜ndフィルター
CN100393784C (zh) * 2004-12-08 2008-06-11 三之星机带株式会社 一种在聚酰亚胺树脂上形成无机薄膜的方法
JP2006210891A (ja) * 2004-12-27 2006-08-10 Mitsuboshi Belting Ltd ポリイミド樹脂の無機薄膜パターン形成方法
US20060165877A1 (en) * 2004-12-27 2006-07-27 Mitsuboshi Belting Ltd. Method for forming inorganic thin film pattern on polyimide resin
JP4962100B2 (ja) * 2007-01-16 2012-06-27 住友金属鉱山株式会社 耐熱遮光フィルムとその製造方法、及び絞り、光量調整装置
JP5092520B2 (ja) * 2007-02-06 2012-12-05 住友金属鉱山株式会社 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01120503A (ja) * 1987-11-05 1989-05-12 Somar Corp 導電性を有する粗面化遮光性フイルム
US20060088690A1 (en) 2002-08-08 2006-04-27 Fumihiro Arakawa Electromagnetic wave shielding sheet

Also Published As

Publication number Publication date
KR20080049629A (ko) 2008-06-04
CN101191843A (zh) 2008-06-04
US20080213555A1 (en) 2008-09-04
JP5114995B2 (ja) 2013-01-09
US7670673B2 (en) 2010-03-02
CN101191843B (zh) 2011-01-19
JP2008158479A (ja) 2008-07-10
TWI363691B (en) 2012-05-11
TW200836915A (en) 2008-09-16

Similar Documents

Publication Publication Date Title
KR101362751B1 (ko) 내열 차광 필름과, 그것의 제조방법, 및 필름을 사용한개구 및 광량 조정 장치
JP4962100B2 (ja) 耐熱遮光フィルムとその製造方法、及び絞り、光量調整装置
TWI480674B (zh) 黑色被覆膜與其製造方法、黑色遮光板及運用其之光圈、光量調整用光圈裝置、快門以及耐熱遮光帶
JP5338034B2 (ja) 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置
TWI589448B (zh) 溫度及腐蝕穩定的表面反射器
KR20080092242A (ko) 내열 차광 필름, 그것의 제조방법, 및 그것을 사용한조리개 또는 광량 조정 장치
TWI403762B (zh) 吸收型多層nd濾光片及其製法
KR20110029122A (ko) 필름상 차광판 및 이를 적용한 조리개, 조리개 장치, 및 셔터
JP5092520B2 (ja) 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置
JP5056190B2 (ja) 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整用装置
JP2012203310A (ja) 耐熱遮光多層フィルムとその製造方法、及び用途
JP4941412B2 (ja) 耐熱遮光フィルムの製造方法
CN111826622B (zh) 一种手机摄像头盖板镀膜方法
JP6036363B2 (ja) 遮光フィルムとその製造方法、および、それを用いた絞り、シャッター羽根、光量調整絞り羽根
US20080254256A1 (en) Heat-resistant light-shading film and production method thereof, and diaphragm or light intensity adjusting device using the same
JP2010096842A (ja) 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置
TW201309821A (zh) 類鑽碳傾斜構造黑色被覆膜與其製造方法及黑色遮光板、使用其之快門葉
JP2012068536A (ja) 耐熱遮光フィルムとその製造方法、および耐熱遮光フィルムを用いた絞りと光量調整用絞り装置
JP2012203309A (ja) 耐熱遮光フィルム
JP5067149B2 (ja) 吸収型多層膜ndフィルター
JP2011197602A (ja) 吸収型多層膜ndフィルター及びその製造方法
JP2011107496A (ja) 吸収型多層膜ndフィルターとその製造方法
JP2025013054A (ja) 反射フィルム
JP2014122946A (ja) フッ素系樹脂被覆黒色遮光フィルム、それを用いたシャッター羽根、絞り

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20170119

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

FPAY Annual fee payment

Payment date: 20180119

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20190117

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20220208

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20220208

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000