KR101311505B1 - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
KR101311505B1
KR101311505B1 KR1020070016497A KR20070016497A KR101311505B1 KR 101311505 B1 KR101311505 B1 KR 101311505B1 KR 1020070016497 A KR1020070016497 A KR 1020070016497A KR 20070016497 A KR20070016497 A KR 20070016497A KR 101311505 B1 KR101311505 B1 KR 101311505B1
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KR
South Korea
Prior art keywords
group
photosensitive resin
meth
resin composition
acid
Prior art date
Application number
KR1020070016497A
Other languages
English (en)
Korean (ko)
Other versions
KR20070085142A (ko
Inventor
유수케 야마모토
타쿠로 오이케
신야 아다치
Original Assignee
산요가세이고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006045676A external-priority patent/JP4568237B2/ja
Priority claimed from JP2006296791A external-priority patent/JP4231076B2/ja
Application filed by 산요가세이고교 가부시키가이샤 filed Critical 산요가세이고교 가부시키가이샤
Publication of KR20070085142A publication Critical patent/KR20070085142A/ko
Application granted granted Critical
Publication of KR101311505B1 publication Critical patent/KR101311505B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
KR1020070016497A 2006-02-22 2007-02-16 감광성 수지 조성물 KR101311505B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006045676A JP4568237B2 (ja) 2006-02-22 2006-02-22 感光性樹脂組成物
JPJP-P-2006-00045676 2006-02-22
JPJP-P-2006-00296791 2006-10-31
JP2006296791A JP4231076B2 (ja) 2006-10-31 2006-10-31 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
KR20070085142A KR20070085142A (ko) 2007-08-27
KR101311505B1 true KR101311505B1 (ko) 2013-09-25

Family

ID=38613158

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070016497A KR101311505B1 (ko) 2006-02-22 2007-02-16 감광성 수지 조성물

Country Status (2)

Country Link
KR (1) KR101311505B1 (zh)
TW (1) TWI396941B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100924103B1 (ko) * 2009-02-02 2009-10-29 주식회사 엠.에스.라이팅 등기구

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101225126B1 (ko) * 2009-03-19 2013-01-22 주식회사 엘지화학 머켑토 화합물을 포함하는 감광성 실리콘 수지 조성물 및 이를 이용한 반도체 소자 및 디스플레이 소자
CN105190440B (zh) * 2013-05-30 2019-08-06 三洋化成工业株式会社 感光性树脂组合物、光学间隔件、彩色滤色器用保护膜和触摸面板的保护膜或绝缘膜
KR102219054B1 (ko) * 2017-12-04 2021-02-22 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001226449A (ja) 1999-12-10 2001-08-21 Nippon Shokubai Co Ltd 液晶スペーサー用感光性樹脂および感光性樹脂組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW482817B (en) * 1998-06-18 2002-04-11 Jsr Corp Photosetting compositions and photoset articles
JP3726652B2 (ja) * 2000-07-27 2005-12-14 Ｊｓｒ株式会社 感放射線性組成物、スペーサーおよびカラー液晶表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001226449A (ja) 1999-12-10 2001-08-21 Nippon Shokubai Co Ltd 液晶スペーサー用感光性樹脂および感光性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100924103B1 (ko) * 2009-02-02 2009-10-29 주식회사 엠.에스.라이팅 등기구

Also Published As

Publication number Publication date
TW200736830A (en) 2007-10-01
KR20070085142A (ko) 2007-08-27
TWI396941B (zh) 2013-05-21

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