KR101302594B1 - 디지털 노광장치 - Google Patents

디지털 노광장치 Download PDF

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Publication number
KR101302594B1
KR101302594B1 KR1020087008154A KR20087008154A KR101302594B1 KR 101302594 B1 KR101302594 B1 KR 101302594B1 KR 1020087008154 A KR1020087008154 A KR 1020087008154A KR 20087008154 A KR20087008154 A KR 20087008154A KR 101302594 B1 KR101302594 B1 KR 101302594B1
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KR
South Korea
Prior art keywords
recording medium
exposure
stage
standby
unit
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KR1020087008154A
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English (en)
Korean (ko)
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KR20080053487A (ko
Inventor
아키히로 하시구치
카즈히로 테라다
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후지필름 가부시키가이샤
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Publication of KR20080053487A publication Critical patent/KR20080053487A/ko
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Publication of KR101302594B1 publication Critical patent/KR101302594B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
KR1020087008154A 2005-10-07 2006-10-04 디지털 노광장치 KR101302594B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00295496 2005-10-07
JP2005295496A JP4606990B2 (ja) 2005-10-07 2005-10-07 デジタル露光装置
PCT/JP2006/319869 WO2007043411A1 (ja) 2005-10-07 2006-10-04 デジタル露光装置

Publications (2)

Publication Number Publication Date
KR20080053487A KR20080053487A (ko) 2008-06-13
KR101302594B1 true KR101302594B1 (ko) 2013-09-02

Family

ID=37942655

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087008154A KR101302594B1 (ko) 2005-10-07 2006-10-04 디지털 노광장치

Country Status (5)

Country Link
JP (1) JP4606990B2 (ja)
KR (1) KR101302594B1 (ja)
CN (1) CN101283312A (ja)
TW (1) TW200719100A (ja)
WO (1) WO2007043411A1 (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4880521B2 (ja) * 2007-05-29 2012-02-22 株式会社オーク製作所 描画装置
JP2009223262A (ja) * 2008-03-19 2009-10-01 Orc Mfg Co Ltd 露光システムおよび露光方法
JP5333063B2 (ja) * 2009-08-28 2013-11-06 ウシオ電機株式会社 両面露光装置
US20110244396A1 (en) * 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
TW201224678A (en) * 2010-11-04 2012-06-16 Orc Mfg Co Ltd Exposure device
JP5550053B2 (ja) * 2011-03-25 2014-07-16 ビアメカニクス株式会社 反転装置及びそれを用いた露光装置並びに露光方法
CN102514385B (zh) * 2011-11-29 2015-04-15 深圳市华星光电技术有限公司 标识码打印方法和打印设备
TWI485533B (zh) * 2012-07-13 2015-05-21 Apone Technology Ltd 旋轉式曝光載送設備
JP6096453B2 (ja) * 2012-09-27 2017-03-15 株式会社アドテックエンジニアリング 露光描画装置、露光描画システム、プログラム及び露光描画方法
JP6198378B2 (ja) * 2012-09-27 2017-09-20 株式会社アドテックエンジニアリング 露光描画装置、露光描画システム、プログラム及び露光描画方法
KR20160046016A (ko) 2014-10-17 2016-04-28 삼성디스플레이 주식회사 마스크리스 노광 장치 및 이를 이용한 누적 조도 보정 방법
JP6398766B2 (ja) * 2015-02-06 2018-10-03 東芝ライテック株式会社 光配向用偏光光照射装置
JP6723831B2 (ja) * 2016-06-01 2020-07-15 株式会社オーク製作所 露光装置
CN106802538B (zh) * 2017-03-16 2019-01-29 无锡影速半导体科技有限公司 超大板直写式光刻机扫描曝光方法
CN107203098B (zh) * 2017-03-24 2019-08-06 无锡影速半导体科技有限公司 一种直写曝光光路系统及其一次性直写曝光方法
JP7045890B2 (ja) * 2018-03-20 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス パターン描画装置およびパターン描画方法
DE102018132001A1 (de) 2018-12-12 2020-06-18 Laser Imaging Systems Gmbh Vorrichtung zum Belichten von plattenförmigen Werkstücken mit hohem Durchsatz
CN109709775A (zh) * 2019-03-13 2019-05-03 苏州微影激光技术有限公司 一种曝光设备及曝光方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11109643A (ja) * 1997-09-30 1999-04-23 Sanee Giken Kk 分割露光装置
JP2002341550A (ja) * 2001-05-17 2002-11-27 Dainippon Screen Mfg Co Ltd レーザー露光装置
JP2004205632A (ja) 2002-12-24 2004-07-22 Ushio Inc 両面投影露光装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4113418B2 (ja) * 2002-11-15 2008-07-09 富士フイルム株式会社 露光装置
JP2004233608A (ja) * 2003-01-30 2004-08-19 Fuji Photo Film Co Ltd 露光装置
JP2005272041A (ja) * 2004-03-23 2005-10-06 Pentax Corp 基板の搬送機構
JP4478488B2 (ja) * 2004-03-23 2010-06-09 株式会社オーク製作所 基板の搬送機構
JP4497972B2 (ja) * 2004-03-23 2010-07-07 株式会社オーク製作所 描画装置の基板の搬送機構
JP4472451B2 (ja) * 2004-07-16 2010-06-02 富士フイルム株式会社 基板搬送装置及びそれを備えた画像形成装置並びに基板搬送方法
JP2006055930A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 吸着装置とその取付構造及び吸着装置を備えた搬送装置並びに画像形成装置
JP2006058496A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 基板測定装置及び基板搬送装置並びに基板測定装置を備えた画像形成装置と基板測定方法
JP2006058784A (ja) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd 基板位置決め機構、基板位置決め方法、基板搬送装置及び画像形成装置
JP2006058783A (ja) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd 基板位置決め機構、基板位置決め方法、基板搬送装置及び画像形成装置
JP2006058782A (ja) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd 基板吸着機構、基板吸着方法、基板搬送装置及び画像形成装置
JP2006062801A (ja) * 2004-08-25 2006-03-09 Fuji Photo Film Co Ltd 基板搬送装置及びそれを備えた画像形成装置並びに基板搬送方法
JP2006064875A (ja) * 2004-08-25 2006-03-09 Fuji Photo Film Co Ltd 基板搬送装置及びそれを備えた画像形成装置並びに基板搬送方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11109643A (ja) * 1997-09-30 1999-04-23 Sanee Giken Kk 分割露光装置
JP2002341550A (ja) * 2001-05-17 2002-11-27 Dainippon Screen Mfg Co Ltd レーザー露光装置
JP2004205632A (ja) 2002-12-24 2004-07-22 Ushio Inc 両面投影露光装置

Also Published As

Publication number Publication date
JP4606990B2 (ja) 2011-01-05
TW200719100A (en) 2007-05-16
CN101283312A (zh) 2008-10-08
KR20080053487A (ko) 2008-06-13
JP2007102116A (ja) 2007-04-19
WO2007043411A1 (ja) 2007-04-19

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