TW200719100A - Digital exposure apparatus - Google Patents

Digital exposure apparatus

Info

Publication number
TW200719100A
TW200719100A TW095137008A TW95137008A TW200719100A TW 200719100 A TW200719100 A TW 200719100A TW 095137008 A TW095137008 A TW 095137008A TW 95137008 A TW95137008 A TW 95137008A TW 200719100 A TW200719100 A TW 200719100A
Authority
TW
Taiwan
Prior art keywords
recording medium
exposure apparatus
exposed
transporting
digital exposure
Prior art date
Application number
TW095137008A
Other languages
Chinese (zh)
Inventor
Akihiro Hashiguchi
Kazuhiro Terada
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200719100A publication Critical patent/TW200719100A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

Disclosed is a digital exposure apparatus structured such that a recording medium is exposed by a light beam, which is modulated based on image information, so that an image is recorded on the recording medium. The digital exposure apparatus includes: an exposure unit that performs scanning exposure on the recording medium while the recording medium is transported; a transporting unit that is disposed orthogonally to the transporting direction of the recording medium and transports the recording medium along a transporting path; a first waiting stage that is provided at a first portion of the transporting path and causes the recording medium, which is non-exposed, to wait thereat; and a second waiting stage that is provided at a second portion of the transporting path and causes the recording medium, which has been exposed, to wait thereat; and a reversing unit that receives the recording medium from the second waiting stage and reverses the front and back sides of the recording medium.
TW095137008A 2005-10-07 2006-10-05 Digital exposure apparatus TW200719100A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005295496A JP4606990B2 (en) 2005-10-07 2005-10-07 Digital exposure equipment

Publications (1)

Publication Number Publication Date
TW200719100A true TW200719100A (en) 2007-05-16

Family

ID=37942655

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137008A TW200719100A (en) 2005-10-07 2006-10-05 Digital exposure apparatus

Country Status (5)

Country Link
JP (1) JP4606990B2 (en)
KR (1) KR101302594B1 (en)
CN (1) CN101283312A (en)
TW (1) TW200719100A (en)
WO (1) WO2007043411A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427426B (en) * 2007-05-29 2014-02-21 Orc Mfg Co Ltd Drawing device
TWI485533B (en) * 2012-07-13 2015-05-21 Apone Technology Ltd A rotary conveying equipment

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009223262A (en) * 2008-03-19 2009-10-01 Orc Mfg Co Ltd Exposure system and exposure method
JP5333063B2 (en) * 2009-08-28 2013-11-06 ウシオ電機株式会社 Double-side exposure system
US20110244396A1 (en) * 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
TW201224678A (en) * 2010-11-04 2012-06-16 Orc Mfg Co Ltd Exposure device
JP5550053B2 (en) * 2011-03-25 2014-07-16 ビアメカニクス株式会社 Inversion apparatus, exposure apparatus using the same, and exposure method
CN102514385B (en) * 2011-11-29 2015-04-15 深圳市华星光电技术有限公司 Identification code printing method and identification code printing device
JP6198378B2 (en) * 2012-09-27 2017-09-20 株式会社アドテックエンジニアリング Exposure drawing apparatus, exposure drawing system, program, and exposure drawing method
JP6096453B2 (en) * 2012-09-27 2017-03-15 株式会社アドテックエンジニアリング Exposure drawing apparatus, exposure drawing system, program, and exposure drawing method
KR20160046016A (en) 2014-10-17 2016-04-28 삼성디스플레이 주식회사 Maskless exposure device and method for compensating cumulative of illumination using the same
JP6398766B2 (en) * 2015-02-06 2018-10-03 東芝ライテック株式会社 Polarized light irradiation device for photo-alignment
JP6723831B2 (en) * 2016-06-01 2020-07-15 株式会社オーク製作所 Exposure equipment
CN106802538B (en) * 2017-03-16 2019-01-29 无锡影速半导体科技有限公司 Super large plate direct-write type lithography machine scanning exposure method
CN107203098B (en) * 2017-03-24 2019-08-06 无锡影速半导体科技有限公司 A kind of direct write exposure light path system and its disposable direct write exposure method
JP7045890B2 (en) * 2018-03-20 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス Pattern drawing device and pattern drawing method
DE102018132001A1 (en) 2018-12-12 2020-06-18 Laser Imaging Systems Gmbh Device for exposing plate-shaped workpieces with high throughput
CN109709775A (en) * 2019-03-13 2019-05-03 苏州微影激光技术有限公司 A kind of exposure sources and exposure method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11109643A (en) * 1997-09-30 1999-04-23 Sanee Giken Kk Divided exposure device
JP2002341550A (en) * 2001-05-17 2002-11-27 Dainippon Screen Mfg Co Ltd Laser exposure device
JP4113418B2 (en) * 2002-11-15 2008-07-09 富士フイルム株式会社 Exposure equipment
JP4158514B2 (en) 2002-12-24 2008-10-01 ウシオ電機株式会社 Double-sided projection exposure system
JP2004233608A (en) * 2003-01-30 2004-08-19 Fuji Photo Film Co Ltd Exposure apparatus
JP2005272041A (en) * 2004-03-23 2005-10-06 Pentax Corp Conveying mechanism of substrate
JP4478488B2 (en) * 2004-03-23 2010-06-09 株式会社オーク製作所 Substrate transport mechanism
JP4497972B2 (en) * 2004-03-23 2010-07-07 株式会社オーク製作所 Substrate transport mechanism of drawing apparatus
JP4472451B2 (en) * 2004-07-16 2010-06-02 富士フイルム株式会社 Substrate transport apparatus, image forming apparatus including the same, and substrate transport method
JP2006058496A (en) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd Substrate measurement device, substrate carrying device, and image forming apparatus equipped with substrate measuring device, and substrate measuring method
JP2006055930A (en) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd Suction device, its mounting structure, and carrying device and image forming device provided with suction device
JP2006058783A (en) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd Substrate positioning mechanism, substrate positioning method, substrate carrying apparatus and image forming apparatus
JP2006058784A (en) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd Substrate positioning mechanism, substrate positioning method, substrate carrying apparatus and image forming apparatus
JP2006058782A (en) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd Substrate suction mechanism, substrate suction method, substrate carrying apparatus and image forming apparatus
JP2006064875A (en) * 2004-08-25 2006-03-09 Fuji Photo Film Co Ltd Substrate conveying device, image forming apparatus equipped with the same, and method for conveying substrate
JP2006062801A (en) * 2004-08-25 2006-03-09 Fuji Photo Film Co Ltd Substrate conveying device, image forming device provided with it and substrate conveying method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427426B (en) * 2007-05-29 2014-02-21 Orc Mfg Co Ltd Drawing device
TWI485533B (en) * 2012-07-13 2015-05-21 Apone Technology Ltd A rotary conveying equipment

Also Published As

Publication number Publication date
KR20080053487A (en) 2008-06-13
WO2007043411A1 (en) 2007-04-19
JP4606990B2 (en) 2011-01-05
KR101302594B1 (en) 2013-09-02
JP2007102116A (en) 2007-04-19
CN101283312A (en) 2008-10-08

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