JP2005272041A - Conveying mechanism of substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce the size and cost of a conveying mechanism, and to accurately position a substrate and mount it on a support pedestal preventing flaw and waste adhesion on the substrate surface, in a conveyance work in a substrate manufacturing process. <P>SOLUTION: Rollers 41-48 are disposed on a drawing table 30 of a drawing device 10, and many air vents AR are formed on a supporting surface 30S of the table. The rollers 41 and 42 and rollers 43 and 44 are disposed on the supporting surface, and compressed air is blown off from the supporting surface. When the substrate SW is conveyed by a conveyor 70 and comes into the drawing table in a floated state of the substrate SW, the substrate is moved to a predetermined position in the conveyance direction by driving of the rollers 42 and 44. The position displacement of the substrate is measured by gage measuring sections 62, 64 and 66, and a corresponding roller is rotated in a predetermined direction so as to eliminate the tilt of the substrate. The gas between the substrate and the supporting surface are decompressed via the air vents, and the substrate is mounted on the supporting surface. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a process for manufacturing a pattern forming substrate such as a glass substrate, and more particularly to a transport mechanism and a transport method for transporting a substrate.

When patterning a glass or film substrate using photolithography technology, the work from one process to the next is automated. For example, when a substrate coated with a photosensitive material such as a photoresist is moved to a drawing (exposure) apparatus for forming a circuit pattern, a transfer robot is used (see Patent Document 1). When the transfer robot holds the glass substrate carried by a roller or the like, the transfer robot transfers it to the table of the drawing apparatus and places it on the table. When the drawing operation on the substrate is completed, the transfer robot lifts the substrate and transfers it to the developing device used in the next process. Further, when a positional deviation is detected by a linear gauge or the like, pattern data is corrected, and drawing is performed in accordance with the position of the substrate (see, for example, Patent Document 2).
Japanese Unexamined Patent Publication No. 2002-116555 (FIGS. 1, 2, and 3) JP 2000-122303 A

  When the transfer robot is used, the robot arm comes into contact with the substrate, so that the substrate surface is scratched and dust is attached. Further, when a large-sized substrate such as a glass substrate for PDP is transported, the mechanism of the transport robot is enlarged and complicated due to the large substrate size, resulting in cost increase in the substrate manufacturing process and deterioration of work efficiency.

  The transport mechanism and transport method of the present invention is a transport mechanism for placing a pattern forming substrate transported from another process by a transport device such as a conveyor on a support surface of a support base, and includes an arm that directly touches the substrate surface. It is possible to mount the substrate on the support table without using a transfer robot. For example, the conveyance mechanism can be applied to an apparatus (a developing apparatus, a resist removing apparatus, an etching apparatus, or the like) provided in the drawing apparatus or used in other processes in pattern formation.

  The transport mechanism and transport method of the present invention include a levitation unit, a guide unit, and a mounting unit, and moves the substrate while the substrate is floated, and moves the substrate while only contacting the side surface of the substrate end surface. It is a feature. Here, the side surface of the substrate represents a substrate end surface along the moving direction of the substrate. Arbitrary substrates can be applied, but they are applied to substrates such as glass substrates that have uniform density and good end surface accuracy (dimensional accuracy, straightness) without being greatly deformed by the force acting on the end surface. Is good. The substrate enters the support table through a position at a predetermined height from the support surface. For example, the height may be set to a minute height (0.1 mm to 1.0 mm).

  The levitation means can hold the substrate in a state of floating from the support surface by blowing a gas from the support surface toward the substrate with respect to the substrate entering at a predetermined height. For example, on the support surface, a plurality of holes are formed in accordance with a moving region where the substrate moves, and a gas blowing pipe is provided below the support surface in accordance with the arrangement of the plurality of holes, and a gas blown out from the plurality of holes. Good. A gas supply means such as a compressor supplies the gas to the gas blowing pipe line, so that a gas such as air blows out from the support surface. The substrate is held in a floating state by the gas discharge pressure.

  The guide means urges the substrate from both side surfaces in a floating state and guides it to a predetermined position along the transport direction. By energizing, a force to move the substrate reliably acts, and the substrate moves accurately in the transport direction. As the guide means, various configurations such as a configuration in which they are translated together along with the movement of the substrate can be applied, but the simple structure around the support base and the movement of the substrate in order to move in a systematic manner Are preferably arranged to operate so as to feed out the substrate while being arranged at the same position. Providing a plurality of elastic guide guide members that are arranged in positions positioned at least one each along both side surfaces of the substrate and that apply a force along the transport direction to the substrate while urging the side surfaces of the substrate. Good. For example, at least one member that rotates in the same place is provided at both ends of the substrate, and the substrate is moved by the action of force when rotating. Stopping the action of the force stops the substrate. By urging the end face of the substrate with the elastic member, it is possible to absorb a minute shift in the moving direction of the substrate and to transmit a force for moving the substrate to the side surface with certainty. Further, even a slight shift in the moving direction of the substrate can be absorbed by elastic deformation, and the substrate can be stably guided in a prescribed direction. As the guide member, it is preferable to apply a roller capable of transmitting force while rotating.

  The mounting means places the substrate on the support surface from the floating state by controlling the flow of gas between the substrate and the support surface. Here, “controlling the gas flow” means that the substrate is placed on the support surface without contact other than the end face. For example, the gas blowing may be stopped to raise the support surface, or to lower the support surface while energizing the substrate end surface. Moreover, you may make it mount, reducing the discharge pressure of gas gradually. In particular, when the weight and size of a glass substrate for a plasma display is large, it is preferable to mount the substrate so that the substrate is adsorbed to the support surface by reducing the pressure between the substrate and the support surface using a vacuum pump or the like.

  When the support platform is equipped with a transport mechanism, if the substrate is tilted with respect to the transport direction (traveling direction) when the substrate is moved while floating on the support platform, the substrate cannot be mounted at an accurate position and pattern formation is possible. This impedes the processing in each process. In particular, when transporting to a drawing apparatus, there are cases where it cannot be dealt with by rotation of the tilt correction table and correction of pattern data. Therefore, the transport mechanism and the transport method enable the position correction of the substrate before mounting on the support base. A positional deviation detecting means for detecting a positional deviation related to the inclination of the board based on a predetermined mounting position in a floating state of the board, and if the positional deviation of the board occurs, the board floats in a direction to eliminate the positional deviation. Misalignment correcting means for biasing the side surface of the substrate so as to yaw in a state. By correcting the displacement by urging the end face of the substrate in a floating state, the substrate surface can be positioned without being damaged.

  In order to be able to correct both the right and left tilts with respect to the substrate transport direction, it is preferable to generate a moment in the misalignment correction direction while the substrate is biased. For example, one is arranged on each side of the substrate, and one of them is operated in accordance with the tilt direction. When the elastic guide member is provided as a guide means, a member at a position where a moment can be generated is preferably operated as a misalignment correcting member. Regarding the arrangement of the rollers, a plurality of rollers may be arranged along both side surfaces of the substrate so as to define the moving direction of the substrate. For example, what is necessary is just to arrange | position on a support surface so that four rollers may be arrange | positioned as a pair of rollers at the four corners of a rectangle. In particular, the driving roller is preferably arranged so as to face both side surfaces of the substrate in order to move the substrate at a stable and constant speed. In addition, the driving roller is preferably disposed in the vicinity of the substrate entry opening because a force for feeding the substrate entering the both sides of the substrate forward is applied.

  There are various sizes of substrates, and the width of the substrate along the direction perpendicular to the transport direction varies. Therefore, it is preferable to selectively arrange the rollers according to each size. In this case, the guide means includes roller arrangement means for arranging a roller arranged on one side of the substrate among the plurality of rollers as a selective arrangement roller according to the width of the substrate. For example, a plurality of rollers are assigned to each of a plurality of width lines defined according to a predetermined width of the plurality of substrates, and are moved up and down so that they can be retracted below the support surface. Then, among the selectively arranged rollers, a roller corresponding to the width of the substrate being conveyed is selectively raised.

  As for substrate control while moving the substrate to a predetermined position on the support surface, it may be simply moved at a constant speed and stopped, but it is composed of a transport roller etc., and the substrate is supported by a transport member outside the transport mechanism. When transporting to a table, it is preferable to guide while considering the motion state of the substrate on the transport member. For example, when carrying a substrate at a substantially constant speed while supporting the back surface of the substrate, a structure is provided that prohibits or prevents speed fluctuations in the direction opposite to the transport direction so as not to damage the back surface of the substrate. Yes. In this case, the substrate must be stably guided even in a moving state in which a part of the substrate is on the support base and a part is still supported by the conveying member. In this case, the guiding means may guide the substrate in the transport direction by increasing the moving speed from the moving speed of the substrate in the transport member.

  When the substrate enters the support base with speed, it is preferable to guide the substrate while making use of the speed. When the plurality of guide members such as rollers are provided, the transport member is disposed at a position where the distance from the support base side end portion does not exceed the length of the substrate. And in order to make the action of the urging force and the force in the moving direction work most effectively on the side surface of the substrate, the guide means moves the plurality of guide members after the front edge surface of the substrate passes through the plurality of guide members. Energize to the side of the substrate to apply force. The substrate that has entered the support base maintains the speed at the time of entry while being partially supported by the conveying member, and the guide member simply defines the moving direction. Then, the entire substrate is moved onto the support base, and the guide member is biased before being supported by the carrying member, and a force in the moving direction is applied. If accurate positioning is taken into consideration, it is better to advance in the direction opposite to the conveying direction and then stop.

  As a structure for floating the substrate, it is preferable to provide a gas blowing mechanism below the support surface and the support surface. For example, the support surface has a plurality of holes formed in accordance with a moving region in which the substrate moves, and is disposed under the support surface in accordance with the arrangement of the plurality of holes, And a gas supply means for supplying a gas to the gas blowing line. Since the substrate moves in a floating state on the support base, it is necessary to prevent the front edge surface from falling and contacting the support surface when the substrate enters. Therefore, the levitation means defines a first blowing area that blows out in the vicinity of the entrance of the substrate and a second blowing area that blows out gas according to the movement area of the substrate, and the discharge pressure in the first blowing area is set to the second blowing area. It is better to make it larger than the balloon area. Moreover, you may comprise so that gas may be blown out according to the size of a board | substrate.

  As a mounting means, in order not to damage the glass surface, it is preferable to place the substrate so that the substrate is adsorbed to the support surface by reducing the pressure between the support surface and the substrate. It is preferable to reduce the pressure according to the size of the substrate so that the substrate can be stably mounted while maintaining a state parallel to the support surface. When a predetermined process such as patterning is completed, the transport mechanism transports the substrate to the outside of the support base in order to proceed to the next process. The levitation means levitates the substrate mounted on the support surface, and the guide means urges the substrate from both side surfaces in a floating state and guides the substrate toward the outside of the support base.

  As described above, according to the present invention, with respect to the transport operation in the substrate manufacturing process, the transport mechanism can be reduced in size and cost, the substrate surface is not damaged, and dust does not adhere. Furthermore, the positional deviation with respect to the conveyance direction of the substrate can be reliably corrected without correcting the pattern data.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a perspective view schematically showing a pattern drawing apparatus according to this embodiment.

  The drawing apparatus 10 includes a gate-like structure 12 and a base 14. A pair of guide rails 36 that support the X table 34 are mounted on the base 14, and the X table 34 is movable along the guide rails 36. A θ table 32 and a drawing table 30 are mounted on the X table 34 so that the drawing table 30 moves as the X table 34 moves. A pair of guide rails 28 that support the exposure unit 20 are mounted on the gate-shaped structure 12, and the exposure unit 20 is movable along the guide rails 28.

  The Y-direction drive mechanism 27 and the X-direction drive mechanism 37, which are linear motors, are disposed along the guide rails 28 and 36, respectively, and move the exposure unit 20 and the drawing table 30. The drawing apparatus 10 also includes a drawing control unit (not shown here) that controls the movement of the drawing table 30 and the exposure unit 20 and the exposure operation. The moving direction of the drawing table 30 (hereinafter referred to as the X direction) and the moving direction of the exposure unit 20 (hereinafter referred to as the Y direction) are orthogonal to each other, with the X direction being the main scanning direction and the Y direction being the sub scanning direction. Stipulate.

  As the substrate SW, a glass substrate having a uniform density, straightness, and good end face accuracy is used. The substrate SW conveyed by the conveyor 70 is a substrate (blanks) at the previous stage of patterning, and a photoresist layer is formed on the surface of the layer to be processed. As for blanks production, the substrate is polished, washed, etc., and a material to be processed for forming a circuit pattern such as a conductive material is coated on the substrate in advance, and polishing, washing, coating, etc. are performed. As for the application of the photoresist, a photoresist layer, which is a photosensitive material, is applied onto the substrate SW by a roll coater or the like. When the pre-baking process is performed on the substrate SW on which the photoresist layer is formed, the substrate SW is transported at a substantially constant speed by the conveyor 70 including a plurality of transport rollers. Each conveyor roller of the conveyor 70 has a one-way clutch (in which a rotational speed can be varied in the rotational direction corresponding to the conveying direction and the rotational speed is not varied in the reverse direction in order to prevent scratches due to slip on the back surface of the glass substrate. (Not shown).

  The drawing table 30 is provided with eight cylindrical rollers 41 to 48 for guiding the substrate SW to a predetermined position on the table along the transport direction (see arrow M). The two rollers 41 and 42 are rotatably installed on the one end piece 30R1 side of the drawing table 30 along the transport direction M. The six rollers 43 to 48 are respectively disposed on the roller support portions 73 to 78, and each roller support portion can be moved up and down so as to be retracted below the support surface 30S.

  The rollers 43, 45, and 47 are arranged along the main scanning direction (X direction) perpendicular to the transport direction, and face the roller 41 with the substrate SW interposed therebetween. In other words, the rollers 43, 45, 47 are arranged at positions separated from the rollers 41 by a predetermined distance according to the width B of the glass substrate SW. Similarly, the rollers 44, 46 and 48 are arranged so as to face the roller 42 with a predetermined distance therebetween. The rollers 43 and 44, the rollers 45 and 46, and the rollers 47 and 48 are arranged along lines (width lines) AA, BB, and CC along the conveying direction, respectively. In the present embodiment, substrates of three sizes (large, medium, and small) can be conveyed, and the width B of the medium-sized glass substrate SW shown in FIG. 1 is the distance between the rollers 41 and 42 and the rollers 45 and 46. Corresponding to the interval, only the two roller support portions 45 and 46 are raised to the support surface 30S. In the case of a small size glass substrate SW, the rollers 43 and 44 are raised, and in the case of a large size glass substrate SW, the rollers 47 and 48 are raised. In addition, the rollers 41, 43, 45, 47 so that the distance from the rollers 41, 43, 45, 47 to the transport roller 70A closest to the drawing table of the conveyor 70 does not exceed the length L along the transport direction of the substrate SW. 47 positions are defined.

  A plurality of air holes AR are formed at regular intervals on the support surface 30S of the drawing table 30, and air is blown out from the support surface 30S through the air holes AR, and is also supported through the air holes AR. Air on the surface 30S is sucked. In the drawing table 30, air grooves (not shown here) for float and vacuum are formed. Gauge measuring units 62, 64, 66 provided on the drawing table 30 detect the position of the glass substrate SW on the support surface 30S. Two gauge measuring units 62 and 64 are installed near the end piece 30R1 of the drawing table 30, and a gauge measuring unit 66 is installed near the other end piece 30X. The gauge measuring units 62, 64, and 66 can be moved up and down so as to retreat below the support surface 30S.

  The height of the support surface 30 </ b> S of the drawing table 30, that is, the height along the vertical direction (Z direction) perpendicular to the X and Y directions is lower than the height of the transport surface of the conveyor 70. Here, the transport surface represents the bottom surface of the substrate SW on which the substrate SW is moving on the conveyor 70. Therefore, when the substrate SW is transported from the conveyor 70 to the drawing table 30, the front edge surface S1 of the substrate SW enters the support surface 30S through a predetermined distance from the support surface 30S. When the air blows out from the air holes AR, the substrate SW is held in a floating state by the discharge pressure of the air. The side surfaces S2, S3 of the substrate SW are urged by rollers 41, 42, 45, 46, and the substrate SW moves toward the center of the drawing table 30 by the rotation of the rollers 41, 42, 45, 46. Go.

  When the rear edge surface S4 of the substrate SW, that is, the entire substrate SW enters the drawing table 30, the substrate SW returns by a predetermined distance in the reverse direction of the transport direction, that is, the direction of the conveyor 70 and stops as described later. Then, the position deviation of the substrate SW is detected by the gauge measuring units 62, 64, 66, and when the position deviation of the substrate SW is corrected by rotating a predetermined roller among the rollers 41, 42, 45, 46, the air Air between the bottom surface of the substrate SW and the support surface 30S is sucked (depressurized) through the hole AR. As a result, the substrate SW is adsorbed on the support surface 30S. That is, it is mounted on the support surface 30S.

  The exposure unit 20 includes a plurality of semiconductor lasers 22 used as a light source, a plurality of reflection mirrors 24, and a plurality of exposure optical systems 26 each provided with a DMD (Digital Micro-mirror Device). Are arranged at predetermined intervals along the sub-scanning direction (Y direction). The laser beam emitted from each of the plurality of semiconductor lasers 22 is reflected by the corresponding reflecting mirror 24 and guided to the corresponding exposure optical system.

  The DMD provided in each exposure optical system is a light modulation unit in which minute rectangular micromirrors of the order of micrometers are arranged in a matrix, and each micromirror is rotated by an electrostatic field effect (posture change). To do. The micromirror is positioned in either the first posture (ON state) for reflecting the laser beam toward the substrate SW or the second posture (OFF state) for reflecting the laser beam to the outside, and a control signal from the drawing control unit The posture is switched by. When the micromirrors are independently turned on / off, the light irradiated with the DMD irradiates the substrate SW as light composed of light beams selectively reflected by the micromirrors. As a result, the substrate SW on which the photoresist layer is formed is irradiated with light corresponding to the circuit pattern to be formed at that location.

  When the drawing table 30 is moved along the X direction, a plurality of exposure areas serving as beam spots move along the main scanning direction (X direction). When scanning for one band (one line) is completed, the exposure unit 20 moves in the Y direction by a predetermined distance, and the drawing table 30 moves in the opposite direction, thereby scanning the next one band. The In this way, the exposure unit 20 and the drawing table 30 are alternately moved in the main scanning direction (X direction) and the sub-scanning direction (Y direction) alternately, whereby drawing processing is performed on the entire exposure surface SU. When the drawing process is completed, the substrate SW floats again on the drawing table 30 by blowing out air, moves toward the conveyor 70 by the rotation of the rollers 41, 42, 45, and 46, and is mounted.

  The substrate SW transported again to the conveyor 70 is subjected to processing such as development processing, post-baking, descum, etching, and resist peeling / cleaning. The development process is performed by a dipping method, a spray method, or a paddle method. By etching after the resist layer surface is processed by descum, a circuit pattern is formed in a layer to be processed which is a lower layer of the photoresist. Then, the resist layer is removed by resist peeling / washing, and the substrate SW on which the circuit pattern is formed is finally manufactured.

  FIG. 2 is a diagram schematically showing the surface and the internal configuration of the drawing table 30, and FIG. 3 is a partial cross-sectional view of the drawing table 30 along I-I 'of FIG.

  Inside the drawing table 30, air grooves AG <b> 1 to AG <b> 3 for air float and vacuum are regularly formed along the X direction and the Y direction, and air is formed along the positions where the air grooves AG <b> 1 to AG <b> 3 are formed. The holes AR are formed in the support surface 30S at regular intervals. Further, in the area A4 near the rear edge surface 30B of the substrate SW, an air groove AG4 dedicated to air blowing is formed, and air holes AR are regularly formed along the air groove AG4. Regarding air blowing and suction, air grooves are formed in accordance with regions A1, A2, and A3 corresponding to small, medium, and large substrates, respectively, and the air grooves AG1, AG2, and AG3 do not communicate with each other. Further, the air groove AG4 corresponding to the region A4 does not communicate with the other air grooves AG1 to AG3.

  For each of the regions A1 to A3, a vacuum pump (vacuum) and an air float compressor (both not shown here) are prepared, and one of the air tubes AT1 to AT3 communicating with the air grooves AG1 to AG3, respectively. Electromagnetic valves (not shown here) for switching the connection between the compressor and the vacuum pump are connected to the end portions. On the other hand, the air tube AT4 communicating with the air groove AG4 is directly connected to the compressor. Air grooves AG1, AG4 are used when entering a small-sized substrate, air grooves AG1, AG2, AG4 are used when loading a medium-sized substrate, and air grooves AG1, AG2, AG3, AG4 are used when loading a large-sized substrate. The Similarly, air grooves are used according to the size when the substrate is transported after the drawing process is completed.

  4 is a plan view of the roller support portion 74 as viewed from above, and FIG. 5 is a schematic cross-sectional view of the roller support portion 74 taken along line II-II ′ in FIG. The structure and lifting operation of the roller support portion 75 including the roller 44 will be described with reference to FIGS.

  The roller support unit 74 includes a roller 44, a motor 132A that rotates the roller 44, an air cylinder 129 that moves the roller 44 up and down, and an air cylinder integrated slider that translates the roller 44 along the support surface 30S of the drawing table 30. 140, 144. The slider 140 is installed on a U-shaped support base 143 having an opening 143A formed in the X direction, and the support base 143 is disposed in parallel to the support surface 30S. The support base 143 is supported by the air cylinder 129 together with the extendable guide columns 122, 124, 126, and 128. In FIG. 5, the guide columns 126 and 128 are not shown.

  A circumferential surface serving as a surface of the roller 44 is formed of an elastic member such as rubber resin, and is elastically deformed in a state in contact with the substrate SW. A shaft (not shown) extends along the vertical direction at the center 45X of the roller 44, and a bearing 133 is attached to the lower part of the roller 44 so as to cover the shaft, and the shaft includes a bearing (not shown). The stepping motor 132 </ b> A is connected via a coupling 130.

  An air tube (not shown) is connected to the air cylinder 129, and the support base 143 is raised and lowered along the vertical direction (Z direction) by discharging and injecting air. The cylinder-integrated slider 140 is slidably supported on a guide rail 142 disposed along the X direction on the support base 143, and air is supplied through an air tube (not shown) connected to the slider 140. By injecting and exhausting, the slider 140 moves along the X direction.

  A guide rail 146 is mounted on the slider 140, and an air cylinder integrated slider 144 is slidably supported along the guide rail 146. An urging member 113 is attached to the upper portion of the slider 144, and the urging member 113 is fixed to the contact member 131 with a screw 135, and the motor 132 </ b> A is fixed to the contact member 131. Further, the slider 144 is movable along the guide rail 146. When air is injected through an air tube (not shown) connected to the slider 144, the slider 144 biases the roller 44, and the roller 44 moves in the direction of the substrate SW along the X-axis direction. The slider 140 is provided to support driving of another size substrate (here, 20 mm smaller) slightly different in the X direction.

  A rectangular cover plate 112 covering the roller 44 is attached to the urging member 148 via the plate 173, and both ends 112R of the cover plate 112 are formed in a step shape. 30 corresponds to the concave shape of the end portion 110 </ b> R of the surface member 110 configured as a part of the surface member 110. While the roller 44 is accommodated under the support surface 30S (while the roller support portion 74 does not rise), the end portion 110R of the surface member 110 and the both ends 112R of the cover plate 112 are engaged, and the surface 112S of the cover plate 112 is engaged. Constitutes the support surface 30S together with the surface 110S of the surface member 110.

  When air is injected into the air cylinder 129, the support base 143 rises in the vertical direction (Z direction). At this time, the support base 143 rises using the columns 122, 124, 126, and 128 as guides. When the support base 143 is raised to a predetermined height and the roller 44 is disposed on the support surface 30, the slider 140 once moves in the direction opposite to the roller 44. When the substrate SW is carried between the rollers 41 and 44, air is injected into the slider 144, and the motor 132 fixed to the biasing member 148 moves along the opening 143A of the support base 143. The roller 44 biases the side surface S3 of the substrate SW. When the air is discharged, the slider 144 moves backward and the bias to the substrate SW is released.

  The other roller support portions 73, 75, 76, 77, and 78 are configured in the same manner as the roller support portion 74, and the rollers 41 to 43 and 45 to 48 are configured in the same manner as the roller 44. However, no motor is installed in the roller support portions 73, 75, 77, and the rollers 43, 45, 47 do not rotate by themselves (not driven by the motor). Further, the rollers 41 and 42 are disposed on the support surface 30S. In FIG. 1, the cover plates of the rollers 45 and 46 are not shown.

  6 is a schematic side view of the measurement unit 66 as viewed from the X direction, and FIG. 7 is a schematic plan view of the gauge measurement unit 66 as viewed vertically downward from the line III-III ′ of FIG. . The gauge measuring unit 66 will be described with reference to FIGS. The other gauge measuring units 62 and 64 are configured in the same manner as the gauge measuring unit 66.

  The gauge measurement unit 66 includes a linear gauge 210 that detects the position (positional deviation) of the substrate SW by contacting the rear edge surface S4 of the substrate SW. The linear gauge 210 is covered with a cover member 220 and mounted on the support plate 260 by screws. The flat plate 255 constituting a part of the support surface 30S is a U-shaped plate having an opening 255A facing the direction of the conveyor 70, and the linear gauge 210 is disposed in the opening 255A. In FIG. 1, only the linear gauge 210 is shown.

  The support plate 260 that supports the linear gauge 210 is supported by the support base 251 via a pair of sliders 252 and 254, and the sliders 252 and 254 attached to the lower surface of the support plate 260 are each in the transport direction of the support base 251. Are movable along the guide rails 256 and 258, respectively. A rectangular opening 251 </ b> A is formed at the center of the support base 251, and the four guide columns 212, 214, 216, 218 support the support base 251 in a state of being arranged at the four corners of the support base 251. To do. In FIG. 6, the guide columns 216 and 218 are not shown.

  The pair of cylindrical bearings 236 and 237 are contact stop members that preliminarily stop the movement of the substrate SW, and are provided to prevent the substrate SW from excessively moving to the linear gauge 210 side. The pair of bearings 236 and 237 are installed on the support base 251 so as to sandwich the slider therebetween, and are arranged along the outline K of the opening 255A of the flat plate 255 constituting the support surface 30S. In FIG. 6, the bearing is not shown.

  A pair of rectangular plates 242 and 244 are attached to the lower surface 255U of the flat plate 255 along the vertical direction so as to sandwich the plate of the support plate 260 therebetween. The rectangular plates 242 and 244 are respectively formed with L-shaped slits 231 and 232 that function as cam grooves, and the cam pins 234 are inserted through the slits 231 and 232. Washers 234A and 234B are interposed at both ends of the cam pin 234, and the cam pin 234 can rotate and slide along the slits 231 and 232. On the other hand, an L-shaped projection plate 261 is attached between the sliders 252 and 254 on the lower surface 260U of the support plate 260, and extends along the direction in which the cam pins 234 extend (here, the X direction). The projection plate 261 is formed with a through hole (not shown) through which the cam pin is rotatably inserted.

  An air cylinder 230 is disposed below the support base 251, and an outer cylinder 230 </ b> B that includes a cylinder member 230 </ b> C projects from the main body 230 </ b> A. A pair of polygonal connecting portions 233 are attached to the front end portion of the outer cylinder 230B with a protruding plate 261 attached below the support plate 260 interposed therebetween, and a cam pin 234 rotates on the pair of connecting portions 233. A through hole (not shown) that is freely inserted is formed. The air cylinder 230 is rotatable about the pivot 230D.

  In a state where the linear gauge 210 is disposed under the support surface 30S, the cover member 220 constitutes a part of the support surface 30S. At this time, the cam pin 234 is positioned at the lowermost part SK of the slits 231 and 232. When the linear gauge 210 is raised from this state, air is first injected into the air cylinder 230. Thereby, the cylinder member 230C tends to extend. Since the cam pins 234 are engaged with the pair of connecting portions 233, the pair of connecting portions 233 urge the cam pins 234 along the slits 231 and 232 in the vertically upward direction.

  The rectangular plates 242 and 244 in which the slits 231 and 232 are formed are fixed to a flat plate 255 constituting the support table 30. Therefore, when the cam pin 234 is biased vertically upward of the slits 231 and 232, the projection plate 261 that engages with the cam pin 234 is biased vertically upward, and the support plate 260 on which the linear gauge 210 is mounted is also vertically upward. Biased in the direction. The support base 251 supported by the guide columns 212, 214, 216, and 218 is integrally attached to the support plate 260 via the sliders 252 and 254. Therefore, when the support plate 260 is urged vertically upward, the support plate 260 rises along the guide columns 212, 214, 216, and 218, and the cam pins 234 rise along the slits 231 and 232.

  When the cam pin 234 is raised, the linear gauge 210 placed on the support plate 260 and the pair of bearings 236 and 237 placed on the support base 251 appear on the support surface 30S through the opening 255K of the flat plate 255. When the cam pin 234 rises to the position of the uppermost portion ST of the slits 231 and 232, the height of the linear gauge becomes substantially the same as that of the support surface 30S. When the cylinder member 230C further extends, the cam pin 234 moves along the slits 231 and 232 in the transport direction. As a result, the support plate 260 slides through the sliders 252 and 254 that are movable in the transport direction. When the cam pin 234 moves to the position of the most distal end SE of the slits 231 and 232, the support plate 260 on which the linear gauge 210 is mounted moves to the position shown in FIG. Thereby, the front end surface 210T of the linear gauge 210 is in contact with the rear edge surface S4 of the substrate SW, and the displacement amount of the gauge is detected.

  When the linear gauge 210 is lowered, air is discharged from the air cylinder 230 and the cylinder member 232 contracts. Since the cam pin 234 is not biased by the contraction of the cylinder member 232, the cam pin 234 moves to the bottom part SK of the slits 231 and 232. As a result, the support plate 260 and the support base 251 are lowered along the guide columns 212, 214, 216, and 218, and the linear gauge 210 is stored under the support surface 30S.

  FIG. 8 is a block diagram of the drawing control unit 11 in the pattern drawing apparatus 10.

  The drawing controller 11 includes a light source controller 23 that controls the semiconductor laser 22, a raster converter 29, a table air controller 31, a system control circuit 50, a table controller 38, a DMD controller 21, a roller controller 35, and an air cylinder control. A system control circuit 50 including a CPU controls the entire drawing apparatus 10.

  When the circuit pattern data is sent to the raster conversion unit 29 as CAM data, the CAM data is converted into raster data and stored in the bitmap memory 25 of the DMD control unit 21. The bit map memory 25 stores pattern data so as to correspond to the two-dimensional pattern on the substrate SW.

  The table control unit 38 controls the X-direction drive mechanism 37 and the Y-direction drive mechanism 27 provided with linear motors, and the movement and stop timings and movement speeds of the drawing table 30 and the exposure unit 20 are controlled. The table position detection unit 40 detects the relative position data of the exposure area on the substrate SW based on the position data of the exposure unit 20 and the drawing table 30 sent from the table control unit 38 and sends it to the DMD control unit 21. . In the DMD control unit 21, corresponding pattern data is read from the bitmap memory 25 based on the relative position of the exposure area. Then, a control signal for ON / OFF control of the micromirrors independently according to the data is output from the DMD control unit 21 to each DMD of the exposure optical system 26.

  The roller supports 72, 74, 76, 78 are provided with stepping motors 132A, 132B, 132C, 132D for rotating the rollers 42, 44, 46, 48, respectively. A roller controller connected to the system control circuit 50 The rotation direction, rotation speed, and rotation amount are controlled by 35. Under the support surface 30S of the drawing table 30, a stop sensor 92 and a rewind sensor 94 are arranged near the linear gauge 66. The rewind sensor 94 is a sensor that detects a direction change start position for moving the substrate SW sent onto the drawing table 30 in the reverse direction, and includes a photo interrupter or the like. The stop sensor 92 is a sensor that detects the position of the substrate SW that stops the rotation of the rollers 42 and 44 (or 46 and 48), and is similarly configured by a photo interrupter or the like. Further, a roller drive start sensor 93 configured by a photo interrupter or the like, which detects the rotation and energizing timing of the rollers 42, 44, 46, 48, is disposed in front of the rollers 41, 43, 45, 47 as viewed from the conveyor 70. Is provided.

  A detection sensor 71 for detecting the size of the substrate SW is provided under the conveyor 70, and the size data of the substrate SW that is carried in is sent to the system control circuit 50. The air cylinder control unit 39 includes an air cylinder 129 provided on the roller support unit 74, cylinder-integrated sliders 140 and 144, an air cylinder 230 provided on the gauge measurement unit 66, and other gauge measurement units and roller support units. Controls the injection and discharge of air to each cylinder provided. The linear gauges 410, 310, and 210 provided in the gauge measuring units 62, 64, and 66 are connected to an encoder that converts the displacement amount of the gauge into an electrical signal, and a detection signal is sent to the system control circuit 50. .

  The table air control unit 31 controls switching of the electromagnetic valve 95 corresponding to the air groove AG1, operation of the compressor 97 and the vacuum pump 96, and electronic valves, compressors and vacuum pumps corresponding to other air grooves AG2, AG3 and AG4. Also controls.

  FIG. 9 and FIG. 10 are flowcharts showing the substrate transport processing, position detection, and position deviation correction processing. FIGS. 11 to 15 are diagrams showing the state of transport of the substrate SW. The substrate SW transport operation will be described with reference to FIGS.

  In step S <b> 101, the size of the substrate SW carried on the conveyor 70 is detected by the size detection sensor 71. When the size of the substrate SW is detected, in step S102, the corresponding roller support portion is raised so that a roller corresponding to the size is installed on the support surface 30S. That is, the rollers are arranged at predetermined positions by injecting air into the cylinders provided on the corresponding roller support portions. Here, the roller support portions 73 and 74 corresponding to the small size are raised.

  Further, in step S102, the solenoid valve 95 is switched so that the air groove AG1 communicates with the compressor 97, and the compressor 97 operates. Further, since the air having a relatively high discharge pressure is blown out, the compressor connected to the air groove AG4 operates. Thereby, air blows off from the support surface 30S. The substrate SW that has entered the drawing table 30 enters between the rollers 42 and 44 in a state of being slightly lifted from the support surface 30S (about 0.1 mm in this case) by blowing out air.

  While the front end surface of the substrate SW passes to the position of the rollers 41 and 43, the rollers 42 and 44 are not driven. During this time, the rollers 41 to 44 simply serve to define (guide) the transport direction of the substrate SW, and the substrate SW moves forward without the rollers 42 and 44 rotating. The rear edge surface S4 side of the substrate SW is supported by the conveyor 70. (See FIG. 11). In step S103, it is determined whether or not the front edge surface S1 of the substrate SW has passed the sensor 93 based on a signal from a roller drive sensor 93 provided in front of the rollers 41 and 43. If it is determined that the front edge surface S1 of the substrate SW has passed the sensor 93, the process proceeds to step S104, and the motors 132A and 132B are driven so that the rollers 42 and 44 rotate clockwise and counterclockwise, respectively. . The rotation speed at this time is determined so that the speed of the substrate SW is higher than the approach speed. In step S104, air is injected into the corresponding cylinder-integrated slider so that the rollers 43 and 44 are biased toward the side surface S3 of the substrate, and the slider moves toward the substrate SW.

  Since the rollers 43 and 44 are urged toward the side surface S3 of the substrate SW, the elastic rollers 42 and 44 in contact with the side surfaces S2 and S3 of the substrate SW urge the substrate SW toward the center of the substrate. ing. Therefore, the frictional force generated along the side surfaces S2 and S3 by the rotating action of the rollers 42 and 44 moves the substrate SW toward the center of the drawing table 30 along the transport direction. The elastic rollers 41 and 43 are in contact with both side surfaces S2 and S3 of the moving substrate SW, and the roller 43 is urged toward the side surface S3 of the substrate SW. Therefore, as with the rollers 42 and 44, the rollers 41 and 43 move the substrate SW along the transport direction while rotating clockwise and counterclockwise, respectively. (See FIG. 12).

  In step S105, based on the detection signal from the rewind sensor 94, it is determined whether or not the rear edge surface S4 of the substrate SW has passed the rewide sensor 94. That is, after the entire substrate SW is once placed on the drawing table 30, it is determined whether or not it has reached a position to start moving in the direction opposite to the transport direction. If it is determined that the rear end surface S4 of the substrate SW has passed the rewind sensor 94, the process proceeds to step S106.

  In step S106, the cylinder control unit 39 controls the air injection of each cylinder so as to raise the gauge measurement units 62, 64, 66 onto the support surface 30S. Further, the linear gauges 310 and 410 slide toward the substrate SW so that the front end surfaces of the linear gauges 310 and 410 abut on the side surface S2 of the substrate SW. In step S107, the motors 132A and 132B are driven so that the rollers 42 and 44 rotate counterclockwise and clockwise, respectively. When the rollers 42 and 44 rotate in the reverse direction, the substrate SW moves in the direction of the conveyor 70 in a floating state, and the rollers 41 and 43 also rotate in the reverse direction as the substrate SW moves in the reverse direction (see FIG. 13).

  In step S108, based on the detection signal from the stop sensor 94, it is determined whether or not the rear edge surface S4 of the substrate SW is positioned on the stop sensor 94. That is, it is determined whether or not there is a substrate SW at the mounting position where the substrate SW is stopped. If it is determined that the substrate SW has reached the mounting position, the process proceeds to step S109. In step S109, the motors 132A and 132B are stopped to stop the rotation of the rollers 42 and 44. Since the rollers 41 to 44 are biased toward the center of the substrate SW, the substrate SW stops in a floating state. The linear gauge 210 is in contact with the rear edge surface S4 of the substrate SW. In a state where the substrate SW is stopped, the linear gauges 210, 310, 410 are displaced by a predetermined amount. When step S109 is executed, the process proceeds to step S110 in FIG.

  In step S110 shown in FIG. 10, the position of the substrate SW is detected based on the amount of displacement measured by the linear gauges 210, 310, and 410. In the present embodiment, the inclination of the substrate SW with respect to the transport direction, that is, the sub-scanning direction (Y direction) is detected as a positional deviation. In step S111, it is determined whether or not the positional deviation (inclination) of the substrate SW has substantially occurred, that is, whether or not the deviation amount is within an allowable range. Since the rollers 41 to 44 are made of an elastic member, it is conceivable that the substrate SW tilts and stops within the range of elastic displacement of each roller. When the positional deviation occurs, the substrate SW is inclined to the left side or the right side (see FIG. 14) when viewed from the transport direction (Y direction).

  For example, when the substrate SW on the conveyor 70 enters the drawing table 30, the substrate SW may be slightly inclined with respect to the transport direction. If it moves between the rollers 41, 42, 43, 44 in this state, the substrate SW may stop in an inclined state. Further, when the rollers 42 and 44 to be driven are in contact with the side surfaces S2 and S3 of the substrate SW, a difference occurs between the rollers in the force for moving the substrate SW, and as a result, the substrate SW may stop in an inclined state. is there. Furthermore, the substrate SW may be tilted and stopped due to a minute difference in the rotation speeds of the rollers 42 and 44.

  If it is determined in step S111 that a positional deviation has occurred, the process proceeds to step S112, and a positional deviation amount (degree of inclination) is calculated. In step S113, it is determined whether the substrate SW is tilted to the left. If it is determined that it is not tilted to the left side, that is, it is tilted to the right side as shown in FIG. 14, the process proceeds to step S115. In step S115, the motor 132B is driven so that the roller 44 rotates clockwise by a predetermined amount. The rotation of the roller 44 causes a moment to act on the substrate SW, and the substrate SW yaws so as to return to an accurate position without inclination. (See FIG. 15). On the other hand, if it is determined that the substrate SW is tilted to the left, the process proceeds to step S114, and the motor 132A is driven so that the roller 42 rotates counterclockwise by a predetermined amount. When step S114 or S115 is executed, the process returns to step S110, and steps S110 to S115 are repeatedly executed until the substrate SW reaches a predetermined position without inclination.

  On the other hand, if it is determined in step S111 that there is substantially no displacement, the process proceeds to step S116. In step S116, the operation of the corresponding compressor is controlled so that the air blowing from the air groove AG4 stops, the electromagnetic valve 95 corresponding to the air groove AG1 is switched, and the air groove AG1 communicates with the vacuum pump 96. At the same time, the vacuum pump 96 operates. Thereby, the air between the substrate SW and the support surface 30S is sucked (depressurized) and mounted on the support surface 30S so that the substrate SW is adsorbed. In order to release the biasing of the rollers 43 and 44 toward the side surface S3 of the substrate SW, the air discharge of the corresponding air cylinder is executed. This completes the process of mounting a series of substrates SW, and then patterning is performed.

  FIG. 16 is a flowchart showing a transfer process executed after the patterning on the substrate SW is completed.

  In step S201, the operation of the vacuum pump 96 is stopped, and air is injected into the air cylinder 144 in order to bias the rollers 43 and 44 toward the side surface S3 of the substrate SW. In step S202, the electromagnetic valve 95 is switched so that the compressor 97 and the air grooves AG1 and AG4 communicate with each other, and air is blown out through the air hole AR by operating the compressor 97. As a result, the substrate SW floats up to a predetermined distance (about 0.1 mm) from the support surface SW. In step S203, air is discharged from the corresponding cylinder so that the gauge measuring units 62, 64, 66 are lowered. In step S204, the rollers 42 and 44 rotate counterclockwise and clockwise so that the substrate SW is placed on the conveyor 70, respectively, whereby the substrate SW is mounted on the conveyor 70 and is transferred to the next development processing apparatus. It will be released.

  As described above, according to the present embodiment, the rollers 41 to 48 are provided on the drawing table 30 of the drawing apparatus 10, and a large number of air holes AR are regularly formed on the support surface 30 </ b> S of the table 30. Then, rollers 43 and 44 (or 45, 46, or 47 and 48) are disposed on the support surface 30S together with the rollers 41 and 42, and the air compressed by the compressor from the support surface 30S is blown out. When the substrate SW carried by the conveyor 70 enters the drawing table 30 in a floating state, the substrate SW moves between the rollers to a predetermined position along the conveyance direction by driving the rollers 42 and 44. Then, after moving by a predetermined distance in the direction opposite to the transport direction, it stops. At this time, the gauge measuring units 62 and 64 rise together with the gauge measuring unit 66 disposed near the entrance of the substrate SW, the linear gauges 410 and 310 of the gauge measuring units 62 and 64 are in contact with the side surface S2 of the substrate SW, and the gauge The linear gauge 210 of the measurement unit 62 contacts the rear edge surface S4 of the substrate SW. Thereby, the position shift of the substrate SW is detected. When there is no positional deviation in the stopped substrate SW, the air between the substrate SW and the support surface 30S is sucked by the vacuum pump, and the substrate SW is mounted on the support surface 30S. When the positional deviation occurs, the position of the substrate SW is corrected by rotating one of the rollers 42 and 44. After correcting the misalignment, air between the substrate SW and the support surface 30S is sucked by the vacuum pump 96, and the substrate SW is mounted on the support surface 30S.

  It is not limited to the arrangement of rollers and the number of rollers shown in the embodiment. For example, the rollers 41, 43, 45, and 47 may be driven, and the rollers on both sides of the substrate may be arranged in a staggered arrangement. In addition, six or eight rollers may be arranged on both sides of the substrate. If there is no need to correct the positional deviation and the accuracy of the substrate end face is good, the roller may be made of an inelastic member. In this case, since the positioning is accurately performed in advance with respect to the width direction (X direction) of the substrate by the roller, the position detection may be performed by measuring only the end surface S4 of the substrate.

  Furthermore, a force for feeding the substrate in the transport direction may be applied by a configuration other than the roller. For example, the urging and driving members that are rotatable and arranged at predetermined distance intervals may be intermittently applied to the side surface of the substrate.

  In the present embodiment, the substrate is sucked and mounted on the support surface, but other configurations that can be mounted so as not to damage the substrate surface may be applied. For example, it may be mounted by stopping air blowing and biasing the substrate side surface or raising the support surface. Further, the substrate may be levitated and mounted with a gas other than air.

  The substrate may be urged and driven by a roller immediately after the substrate enters the support base. The conveyor 70 is constituted by a conveyance roller, but other conveyance members may be applied. In this case, the urging force and driving timing of the roller are adjusted depending on the configuration of the conveying member.

  In this embodiment, a glass substrate is applied, but other substrates may be used. For example, it may be a substrate made of metal or the like that is straight and has good end face accuracy, uniform density, and is not deformed by a force in the direction of the substrate side surface.

  In the present embodiment, the drawing apparatus is provided with the transport mechanism, but may be applied to apparatuses (development processing apparatus, etching, etc.) used in other processes.

  In the present embodiment, the substrate moves in the direction opposite to the transport direction when detecting the position of the substrate, but may be stopped without moving in the reverse direction. In this case, you may comprise so that the gauge detection part 66 may be moved along a conveyance direction.

  In this embodiment, the rollers 42 and 44 are driven to correct the positional deviation of the substrate. However, the positional deviation may be corrected using a dedicated roller. Further, other rollers such as the rollers 41 and 43 may be driven only at the time of correcting the misalignment, or the misalignment may be corrected using a roller on the same side.

It is the perspective view which showed schematically the pattern drawing apparatus which is this embodiment. It is the figure which showed roughly the surface and internal structure of the drawing table. FIG. 3 is a partial cross-sectional view of a drawing table along I-I ′ in FIG. 2. It is the top view which looked at the roller support part from the top. FIG. 5 is a schematic cross-sectional view of the roller support portion taken along line II-II ′ in FIG. 4. It is the schematic side view which looked at the measurement part from the X direction. FIG. 7 is a schematic plan view of a gauge measurement unit viewed vertically downward from line III-III ′ in FIG. 6. It is a block diagram of the drawing control part in a pattern drawing apparatus. It is the flowchart which showed the conveyance process of a board | substrate. It is the flowchart which showed the position detection of a board | substrate, and a position shift correction process. It is the figure which showed the conveyance state of the board | substrate. It is the figure which showed the conveyance state of the board | substrate. It is the figure which showed the conveyance state of the board | substrate. It is the figure which showed the conveyance state of the board | substrate. It is the figure which showed the conveyance state of the board | substrate. It is the flowchart which showed the conveyance process performed after completion | finish of patterning.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Drawing apparatus 11 Drawing control part 30 Drawing table 30S Support surface 50 System control circuit 41-48 Roller (guide member)
73 to 78 Roller support part 62, 64, 66 Gauge measuring part (position detecting means)
70 Conveyor (conveying member)
92 Stop sensor 93 Roller drive start sensor 94 Rewind sensor 95 Solenoid valve 96 Vacuum pump (mounting means)
97 Compressor (Floating means)
132A to 132D Stepping motor 140 Air cylinder integrated slider (second slider)
144 Air cylinder integrated slider (first slider, biasing means)
210, 310, 410 Linear gauge SW board AR Air hole (levitation means, mounting means)
AG1 air groove (levitation means, mounting means, second blowing area)
AG2 air groove (levitation means, mounting means, second blowing area)
AG3 air groove (levitation means, mounting means, second blowing area)
AG4 air groove (levitation means, mounting means, first blowing area)
S1 Front edge surface S2, S3 Side surface S4 Rear edge surface B Substrate width L Substrate length M Transport direction AA, BB, CC Multiple width lines

Claims (7)

A transport mechanism capable of positioning and mounting the pattern forming substrate being transported on the support surface of the support base,
A state in which the substrate is floated from the support surface by blowing gas from the support surface toward the substrate with respect to the substrate entering the support table through a position of a predetermined height from the support surface. Levitation means to hold in,
Urging from both sides of the substrate in a floating state, and guiding means for guiding to a predetermined position along the transport direction;
A positional deviation detecting means for detecting a positional deviation related to the inclination of the substrate based on a predetermined mounting position in a state where the substrate is floated;
If the substrate is misaligned, misalignment correcting means for biasing the side surface of the substrate so as to yaw in a state where the substrate floats in a direction to cancel the misalignment
A transport mechanism comprising: mounting means for placing the substrate on the support surface from a floating state by controlling a gas flow between the substrate and the support surface. At least one of the misregistration correction means is disposed along the side surface of the substrate, and each of the misregistration correction means has a plurality of misregistration correction members in contact with the side surface of the substrate;
2. The force according to claim 1, wherein the misalignment correcting member applies a force to a side surface of the substrate so as to generate a moment in the misalignment correcting direction with respect to the biased substrate. Transport mechanism. The guiding means is
There are a plurality of elastic guide members that are arranged at least one along each side surface of the substrate and that apply a force along the transport direction to the substrate while urging the side surface of the substrate. And
Among the plurality of guide members, at least one power transmission member is defined as a position deviation correction member,
The transport mechanism according to claim 1, wherein the misalignment correcting unit operates the misalignment correcting member so as to generate a moment on the substrate. The guiding means is
A plurality of elastic rollers arranged on the support surface according to the width of the substrate entering and rotating in contact with the side surface of the substrate;
Drive means for rotating at least one of the plurality of rollers as a drive roller;
Roller control means for controlling rotation of the drive roller;
Biasing means for biasing the drive roller toward the side surface of the substrate;
The transport mechanism according to claim 1, wherein the misalignment correcting unit rotates a roller capable of generating a moment among the driving rollers in a predetermined direction. Of the plurality of rollers, two rollers are arranged as a pair of drive rollers so as to face each other with the substrate interposed therebetween,
The drawing apparatus according to claim 4, wherein the misalignment correcting unit rotates one of the pair of driving rollers in a predetermined direction.   The transport mechanism according to claim 5, wherein the pair of drive rollers are arranged in the vicinity of an entrance of the substrate on the support surface. A transport mechanism capable of positioning and mounting the pattern forming substrate being transported on the support surface of the support base,
A state in which the substrate is floated from the support surface by blowing gas from the support surface toward the substrate with respect to the substrate entering the support table through a position of a predetermined height from the support surface. Hold on,
Energizing from both sides of the substrate in a floating state, guiding to a predetermined position along the transport direction,
Detecting a positional shift related to the inclination of the substrate based on a predetermined mounting position in a floating state of the substrate;
If the substrate is misaligned, bias the side of the substrate so that it yaws in a state where the substrate floats in a direction to eliminate the misalignment,
The substrate is placed on the support surface from a floating state by controlling a gas flow between the substrate and the support surface.

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