KR101244096B1 - 기화기 및 성막 장치 - Google Patents

기화기 및 성막 장치 Download PDF

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Publication number
KR101244096B1
KR101244096B1 KR1020097027029A KR20097027029A KR101244096B1 KR 101244096 B1 KR101244096 B1 KR 101244096B1 KR 1020097027029 A KR1020097027029 A KR 1020097027029A KR 20097027029 A KR20097027029 A KR 20097027029A KR 101244096 B1 KR101244096 B1 KR 101244096B1
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KR
South Korea
Prior art keywords
raw material
vaporizer
liquid raw
breathable member
vaporization
Prior art date
Application number
KR1020097027029A
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English (en)
Korean (ko)
Other versions
KR20100057760A (ko
Inventor
스미 다나카
무네히사 후타무라
Original Assignee
도쿄엘렉트론가부시키가이샤
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20100057760A publication Critical patent/KR20100057760A/ko
Application granted granted Critical
Publication of KR101244096B1 publication Critical patent/KR101244096B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
KR1020097027029A 2007-09-28 2008-08-20 기화기 및 성막 장치 KR101244096B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007254625A JP5179823B2 (ja) 2007-09-28 2007-09-28 気化器及び成膜装置
JPJP-P-2007-254625 2007-09-28
PCT/JP2008/064779 WO2009041189A1 (ja) 2007-09-28 2008-08-20 気化器及び成膜装置

Publications (2)

Publication Number Publication Date
KR20100057760A KR20100057760A (ko) 2010-06-01
KR101244096B1 true KR101244096B1 (ko) 2013-03-18

Family

ID=40511083

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097027029A KR101244096B1 (ko) 2007-09-28 2008-08-20 기화기 및 성막 장치

Country Status (5)

Country Link
JP (1) JP5179823B2 (ja)
KR (1) KR101244096B1 (ja)
CN (1) CN101689499B (ja)
TW (1) TW200932368A (ja)
WO (1) WO2009041189A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5595795B2 (ja) * 2009-06-12 2014-09-24 東京エレクトロン株式会社 プラズマ処理装置用の消耗部品の再利用方法
KR101084997B1 (ko) * 2011-06-30 2011-11-18 (주)그랜드 텍 캐리어 기체에 의한 화합물 기화용 버블러
JP5426616B2 (ja) * 2011-07-15 2014-02-26 株式会社リンテック 気化器及び該気化器を備えた液体原料気化供給装置
KR101721681B1 (ko) * 2016-03-24 2017-03-30 (주)티티에스 기화기
US11274367B2 (en) 2018-07-24 2022-03-15 Lintec Co., Ltd. Vaporizer
JP6694093B2 (ja) * 2018-07-24 2020-05-13 株式会社リンテック 気化器
JP7201372B2 (ja) * 2018-09-11 2023-01-10 株式会社アルバック アクリル気化器
US20230349041A1 (en) 2020-07-27 2023-11-02 Jiangsu Favored Nanotechnology Co., Ltd. Raw material gasification device, film coating device, film coating apparatus and feeding method therefor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263361A (ja) * 1994-03-25 1995-10-13 Tokyo Electron Ltd 処理装置
KR20000000946A (ko) * 1998-06-05 2000-01-15 주재현 기화기 및 이를 사용한 화학 기상 증착장치
JP2005057193A (ja) 2003-08-07 2005-03-03 Shimadzu Corp 気化器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06300197A (ja) * 1993-04-14 1994-10-28 Canon Inc 液体原料気化供給装置
JP4263206B2 (ja) * 2005-11-15 2009-05-13 東京エレクトロン株式会社 熱処理方法、熱処理装置及び気化装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263361A (ja) * 1994-03-25 1995-10-13 Tokyo Electron Ltd 処理装置
KR20000000946A (ko) * 1998-06-05 2000-01-15 주재현 기화기 및 이를 사용한 화학 기상 증착장치
JP2005057193A (ja) 2003-08-07 2005-03-03 Shimadzu Corp 気化器

Also Published As

Publication number Publication date
CN101689499A (zh) 2010-03-31
JP2009088157A (ja) 2009-04-23
WO2009041189A1 (ja) 2009-04-02
JP5179823B2 (ja) 2013-04-10
TW200932368A (en) 2009-08-01
KR20100057760A (ko) 2010-06-01
CN101689499B (zh) 2011-11-30

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