KR101189525B1 - 매우 높은 반복률의 협대역 가스방전 레이저 시스템 - Google Patents

매우 높은 반복률의 협대역 가스방전 레이저 시스템 Download PDF

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Publication number
KR101189525B1
KR101189525B1 KR1020067020183A KR20067020183A KR101189525B1 KR 101189525 B1 KR101189525 B1 KR 101189525B1 KR 1020067020183 A KR1020067020183 A KR 1020067020183A KR 20067020183 A KR20067020183 A KR 20067020183A KR 101189525 B1 KR101189525 B1 KR 101189525B1
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gas discharge
laser
repetition rate
output light
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Expired - Fee Related
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Korean (ko)
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KR20060130232A (ko
Inventor
토마스 디 스테이거
에드워드 피 홀터웨이
브라이언 지 무스만
라자세크하르 엠 라오
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사이머 인코포레이티드
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057Temporal shaping, e.g. pulse compression, frequency chirping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/07Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702Details of the driver electronics and electric discharge circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305Feedback control systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308Amplifier arrangements, e.g. MOPA
    • H01S3/2325Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333Double-pass amplifiers

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020067020183A 2004-03-31 2005-03-03 매우 높은 반복률의 협대역 가스방전 레이저 시스템 Expired - Fee Related KR101189525B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/815,386 2004-03-31
US10/815,386 US7006547B2 (en) 2004-03-31 2004-03-31 Very high repetition rate narrow band gas discharge laser system
PCT/US2005/007064 WO2005104312A2 (en) 2004-03-31 2005-03-03 Very high repetition rate narrow band gas discharge laser system

Publications (2)

Publication Number Publication Date
KR20060130232A KR20060130232A (ko) 2006-12-18
KR101189525B1 true KR101189525B1 (ko) 2012-10-16

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KR1020067020183A Expired - Fee Related KR101189525B1 (ko) 2004-03-31 2005-03-03 매우 높은 반복률의 협대역 가스방전 레이저 시스템

Country Status (7)

Country Link
US (2) US7006547B2 (https=)
EP (1) EP1741168B1 (https=)
JP (2) JP2007531311A (https=)
KR (1) KR101189525B1 (https=)
DE (1) DE602005027831D1 (https=)
TW (1) TWI256184B (https=)
WO (1) WO2005104312A2 (https=)

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US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
KR101194231B1 (ko) * 2005-11-01 2012-10-29 사이머 인코포레이티드 레이저 시스템
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7746913B2 (en) * 2005-11-01 2010-06-29 Cymer, Inc. Laser system
JP5179736B2 (ja) * 2006-09-21 2013-04-10 株式会社小松製作所 露光装置用レーザ装置
US7696493B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP4972427B2 (ja) * 2007-02-15 2012-07-11 株式会社小松製作所 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置
JP5371208B2 (ja) * 2007-06-13 2013-12-18 ギガフォトン株式会社 2ステージレーザのパルスエネルギー制御装置
US8374206B2 (en) 2008-03-31 2013-02-12 Electro Scientific Industries, Inc. Combining multiple laser beams to form high repetition rate, high average power polarized laser beam
JP5224939B2 (ja) * 2008-06-30 2013-07-03 ギガフォトン株式会社 高繰返しパルスガスレーザ装置
JP5454842B2 (ja) * 2008-06-30 2014-03-26 ギガフォトン株式会社 高繰返し高出力エキシマレーザー装置
JP5138480B2 (ja) * 2008-06-30 2013-02-06 ギガフォトン株式会社 高繰返し高出力パルスガスレーザ装置およびその制御方法
TWI389409B (zh) * 2008-10-21 2013-03-11 Cymer Inc 用於兩腔室氣體放電雷射之雷射控制方法及裝置
JP2012216768A (ja) 2011-03-30 2012-11-08 Gigaphoton Inc レーザシステム、極端紫外光生成システム、およびレーザ光生成方法
CN103682953B (zh) * 2012-09-10 2016-09-21 中国科学院光电研究院 一种气体放电激光光源
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
RU2679453C1 (ru) * 2018-04-05 2019-02-11 Федеральное государственное бюджетное учреждение науки Физический институт им. П.Н. Лебедева Российской академии наук (ФИАН) Способ создания импульсного повторяющегося разряда в газе и устройство для его осуществления

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US20020186739A1 (en) 1999-09-27 2002-12-12 Sandstrom Richard L. Injection seeded F2 laser with wavelength control

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Also Published As

Publication number Publication date
TWI256184B (en) 2006-06-01
EP1741168A4 (en) 2008-05-28
DE602005027831D1 (de) 2011-06-16
JP6040184B2 (ja) 2016-12-07
WO2005104312A3 (en) 2007-03-29
EP1741168B1 (en) 2011-05-04
EP1741168A2 (en) 2007-01-10
TW200541185A (en) 2005-12-16
KR20060130232A (ko) 2006-12-18
JP2007531311A (ja) 2007-11-01
US20060209916A1 (en) 2006-09-21
US7006547B2 (en) 2006-02-28
US20050226300A1 (en) 2005-10-13
JP2014096610A (ja) 2014-05-22
WO2005104312A2 (en) 2005-11-03

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