JP2007531311A - 超高繰返し数狭帯域ガス放電レーザシステム - Google Patents

超高繰返し数狭帯域ガス放電レーザシステム Download PDF

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Publication number
JP2007531311A
JP2007531311A JP2007506187A JP2007506187A JP2007531311A JP 2007531311 A JP2007531311 A JP 2007531311A JP 2007506187 A JP2007506187 A JP 2007506187A JP 2007506187 A JP2007506187 A JP 2007506187A JP 2007531311 A JP2007531311 A JP 2007531311A
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laser
gas discharge
output
electrode pairs
pulse
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JP2007531311A5 (https=
Inventor
トーマス ディー ステイガー
エドワード ピー ホルタウェイ
ブライアン ジー ムースマン
ラジャセッカー エム ラオ
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サイマー インコーポレイテッド
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333—Double-pass amplifiers

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP2007506187A 2004-03-31 2005-03-03 超高繰返し数狭帯域ガス放電レーザシステム Pending JP2007531311A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/815,386 US7006547B2 (en) 2004-03-31 2004-03-31 Very high repetition rate narrow band gas discharge laser system
PCT/US2005/007064 WO2005104312A2 (en) 2004-03-31 2005-03-03 Very high repetition rate narrow band gas discharge laser system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014027965A Division JP6040184B2 (ja) 2004-03-31 2014-02-17 超高繰返し数狭帯域ガス放電レーザシステム

Publications (2)

Publication Number Publication Date
JP2007531311A true JP2007531311A (ja) 2007-11-01
JP2007531311A5 JP2007531311A5 (https=) 2008-04-10

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JP2007506187A Pending JP2007531311A (ja) 2004-03-31 2005-03-03 超高繰返し数狭帯域ガス放電レーザシステム
JP2014027965A Expired - Fee Related JP6040184B2 (ja) 2004-03-31 2014-02-17 超高繰返し数狭帯域ガス放電レーザシステム

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Country Status (7)

Country Link
US (2) US7006547B2 (https=)
EP (1) EP1741168B1 (https=)
JP (2) JP2007531311A (https=)
KR (1) KR101189525B1 (https=)
DE (1) DE602005027831D1 (https=)
TW (1) TWI256184B (https=)
WO (1) WO2005104312A2 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008311340A (ja) * 2007-06-13 2008-12-25 Gigaphoton Inc ２ステージレーザのパルスエネルギー制御装置
JP2010010552A (ja) * 2008-06-30 2010-01-14 Gigaphoton Inc 高繰返し高出力パルスガスレーザ装置
JP2010010553A (ja) * 2008-06-30 2010-01-14 Gigaphoton Inc 高繰返し高出力エキシマレーザー装置
JP2010010551A (ja) * 2008-06-30 2010-01-14 Gigaphoton Inc 高繰返しパルスガスレーザ装置
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置

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US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
KR101194231B1 (ko) * 2005-11-01 2012-10-29 사이머 인코포레이티드 레이저 시스템
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7746913B2 (en) * 2005-11-01 2010-06-29 Cymer, Inc. Laser system
JP5179736B2 (ja) * 2006-09-21 2013-04-10 株式会社小松製作所 露光装置用レーザ装置
US7696493B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP4972427B2 (ja) * 2007-02-15 2012-07-11 株式会社小松製作所 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置
US8374206B2 (en) 2008-03-31 2013-02-12 Electro Scientific Industries, Inc. Combining multiple laser beams to form high repetition rate, high average power polarized laser beam
JP2012216768A (ja) 2011-03-30 2012-11-08 Gigaphoton Inc レーザシステム、極端紫外光生成システム、およびレーザ光生成方法
CN103682953B (zh) * 2012-09-10 2016-09-21 中国科学院光电研究院 一种气体放电激光光源
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
RU2679453C1 (ru) * 2018-04-05 2019-02-11 Федеральное государственное бюджетное учреждение науки Физический институт им. П.Н. Лебедева Российской академии наук (ФИАН) Способ создания импульсного повторяющегося разряда в газе и устройство для его осуществления

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008311340A (ja) * 2007-06-13 2008-12-25 Gigaphoton Inc ２ステージレーザのパルスエネルギー制御装置
JP2010010552A (ja) * 2008-06-30 2010-01-14 Gigaphoton Inc 高繰返し高出力パルスガスレーザ装置
JP2010010553A (ja) * 2008-06-30 2010-01-14 Gigaphoton Inc 高繰返し高出力エキシマレーザー装置
JP2010010551A (ja) * 2008-06-30 2010-01-14 Gigaphoton Inc 高繰返しパルスガスレーザ装置
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置

Also Published As

Publication number Publication date
TWI256184B (en) 2006-06-01
EP1741168A4 (en) 2008-05-28
DE602005027831D1 (de) 2011-06-16
JP6040184B2 (ja) 2016-12-07
WO2005104312A3 (en) 2007-03-29
EP1741168B1 (en) 2011-05-04
EP1741168A2 (en) 2007-01-10
TW200541185A (en) 2005-12-16
KR101189525B1 (ko) 2012-10-16
KR20060130232A (ko) 2006-12-18
US20060209916A1 (en) 2006-09-21
US7006547B2 (en) 2006-02-28
US20050226300A1 (en) 2005-10-13
JP2014096610A (ja) 2014-05-22
WO2005104312A2 (en) 2005-11-03

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