DE602005027831D1 - Schmalbandiges gasentladungslasersystem mit einer sehr hohen repetitionsrate - Google Patents

Schmalbandiges gasentladungslasersystem mit einer sehr hohen repetitionsrate

Info

Publication number
DE602005027831D1
DE602005027831D1 DE602005027831T DE602005027831T DE602005027831D1 DE 602005027831 D1 DE602005027831 D1 DE 602005027831D1 DE 602005027831 T DE602005027831 T DE 602005027831T DE 602005027831 T DE602005027831 T DE 602005027831T DE 602005027831 D1 DE602005027831 D1 DE 602005027831D1
Authority
DE
Germany
Prior art keywords
narrow
gas discharge
laser system
repetition rate
high repetition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005027831T
Other languages
English (en)
Inventor
Thomas D Steiger
Edward P Holtaway
Bryan G Moosman
Rajasekhar M Rao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of DE602005027831D1 publication Critical patent/DE602005027831D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333—Double-pass amplifiers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE602005027831T 2004-03-31 2005-03-03 Schmalbandiges gasentladungslasersystem mit einer sehr hohen repetitionsrate Active DE602005027831D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/815,386 US7006547B2 (en) 2004-03-31 2004-03-31 Very high repetition rate narrow band gas discharge laser system
PCT/US2005/007064 WO2005104312A2 (en) 2004-03-31 2005-03-03 Very high repetition rate narrow band gas discharge laser system

Publications (1)

Publication Number Publication Date
DE602005027831D1 true DE602005027831D1 (de) 2011-06-16

Family

ID=35060496

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005027831T Active DE602005027831D1 (de) 2004-03-31 2005-03-03 Schmalbandiges gasentladungslasersystem mit einer sehr hohen repetitionsrate

Country Status (7)

Country Link
US (2) US7006547B2 (de)
EP (1) EP1741168B1 (de)
JP (2) JP2007531311A (de)
KR (1) KR101189525B1 (de)
DE (1) DE602005027831D1 (de)
TW (1) TWI256184B (de)
WO (1) WO2005104312A2 (de)

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US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
JP5506194B2 (ja) * 2005-11-01 2014-05-28 サイマー インコーポレイテッド レーザシステム
US7746913B2 (en) * 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
JP5179736B2 (ja) * 2006-09-21 2013-04-10 株式会社小松製作所 露光装置用レーザ装置
US7696493B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP4972427B2 (ja) * 2007-02-15 2012-07-11 株式会社小松製作所 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置
JP5371208B2 (ja) * 2007-06-13 2013-12-18 ギガフォトン株式会社 ２ステージレーザのパルスエネルギー制御装置
CN101990729B (zh) * 2008-03-31 2013-02-27 伊雷克托科学工业股份有限公司 结合多重激光束以形成高重复率、高平均功率的极化激光束
JP5138480B2 (ja) * 2008-06-30 2013-02-06 ギガフォトン株式会社 高繰返し高出力パルスガスレーザ装置およびその制御方法
JP5454842B2 (ja) * 2008-06-30 2014-03-26 ギガフォトン株式会社 高繰返し高出力エキシマレーザー装置
JP5224939B2 (ja) * 2008-06-30 2013-07-03 ギガフォトン株式会社 高繰返しパルスガスレーザ装置
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置
JP2012216768A (ja) 2011-03-30 2012-11-08 Gigaphoton Inc レーザシステム、極端紫外光生成システム、およびレーザ光生成方法
CN103682953B (zh) * 2012-09-10 2016-09-21 中国科学院光电研究院 一种气体放电激光光源
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
RU2679453C1 (ru) * 2018-04-05 2019-02-11 Федеральное государственное бюджетное учреждение науки Физический институт им. П.Н. Лебедева Российской академии наук (ФИАН) Способ создания импульсного повторяющегося разряда в газе и устройство для его осуществления

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Also Published As

Publication number Publication date
EP1741168A4 (de) 2008-05-28
US20060209916A1 (en) 2006-09-21
EP1741168B1 (de) 2011-05-04
WO2005104312A2 (en) 2005-11-03
KR101189525B1 (ko) 2012-10-16
TWI256184B (en) 2006-06-01
US20050226300A1 (en) 2005-10-13
KR20060130232A (ko) 2006-12-18
US7006547B2 (en) 2006-02-28
JP6040184B2 (ja) 2016-12-07
TW200541185A (en) 2005-12-16
JP2007531311A (ja) 2007-11-01
WO2005104312A3 (en) 2007-03-29
JP2014096610A (ja) 2014-05-22
EP1741168A2 (de) 2007-01-10

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